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1. 发明申请

WO1986003610A1 METHOD AND APPARATUS FOR COMPRESSING IMAGE DATA 审中-公开
标题翻译：用于压缩图像数据的方法和装置
公开(公告)号：WO1986003610A1
公开(公告)日：1986-06-19
申请号：PCT/JP1985000671
申请日：1985-12-06
申请人： DAINIPPON SCREEN MFG. CO., LTD. , INOUE, Toshifumi
发明人： DAINIPPON SCREEN MFG. CO., LTD.
IPC分类号： G06F15/62
CPC分类号： G06T3/40 , H04N1/3935
摘要： To display image data of an original on a monitor, and to compress image data in reproducing the original at a reduction by a desired factor. Picture element data of an original is successively input in synchronism with a clock (CY), and an average value of image data up to that time is renewed by an averaging circuit (40) every time when the image data is input. The renewal of average value is repeated until a DDA circuit (30) produces a signal (CX) which divides the original into the same number of blocks as the number of picture elements of a compressed image adapted to a desired image compression. Output of the averaging circuit (40) represents an average value of image data for each block of the original in the vertical direction. A DDA circuit (50) determines division of the original into blocks in the lateral direction, and an averaging circuit (60) produces an average value of picture element data for each block adapted to desirably compressing the image. These values are used as picture element data for the compressed image.

2. 发明申请

WO2004106949A1 BOARD FOR PROBE CARD, INSPECTION APPARATUS, PHOTO-FABRICATION APPARATUS AND PHOTO-FABRICATION METHOD 审中-公开
标题翻译：探针卡，检查装置，照相装置和照相制作方法
公开(公告)号：WO2004106949A1
公开(公告)日：2004-12-09
申请号：PCT/JP2004/006569
申请日：2004-05-10
申请人： DAINIPPON SCREEN MFG. CO., LTD. , JSR CORPORATION , KOYAGI, Yasuyuki , SHIMOZUMA, Hiroko , TANABE, Takayoshi , YASHIRO, Takao
发明人： KOYAGI, Yasuyuki , SHIMOZUMA, Hiroko , TANABE, Takayoshi , YASHIRO, Takao
IPC分类号： G01R1/073
CPC分类号： G01R3/00 , G01R1/06716 , G01R1/07378
摘要： A photo-fabrication apparatus (1) has a stage (2) for holding a base board (9) thereon, a feeding part (3) for feeding photosensitive material onto the base board (9), a layer forming part (4) for smoothly spreading the fed photosensitive material to form a material layer and a light emitting part (5) for emitting a spatially-modulated light beam onto the material layer. The photo-fabrication apparatus (1) forms a lot of elastic microstructures for fine probe and arranges the microstructures at microscopic intervals in a very small range with high positional accuracy on the base board (9) by repeating formation of a material layer and light emission. The microstructures become elastic probes through plating in a later process.
摘要翻译：一种光制造装置（1）具有用于在其上保持基板（9）的载物台（2），用于将感光材料馈送到基板（9）上的馈送部分（3），用于平滑地扩展馈送的感光材料以形成材料层，以及用于将空间调制的光束发射到材料层上的发光部分（5）。光致制造装置（1）形成大量用于精细探针的弹性微结构，并且通过重复形成材料层和发光，在基板（9）上以非常小的范围以非常小的范围以高位置精度布置微结构。微结构在后续工艺中通过电镀成为弹性探针。

3. 发明申请

WO1989007329A1 SLOT-TYPE SHADOW MASK 审中-公开
标题翻译： SLOT型阴影面膜
公开(公告)号：WO1989007329A1
公开(公告)日：1989-08-10
申请号：PCT/JP1989000077
申请日：1989-01-27
申请人： DAINIPPON SCREEN MFG. CO., LTD. , YAMAMOTO, Toshio
发明人： DAINIPPON SCREEN MFG. CO., LTD.
IPC分类号： H01J29/07
CPC分类号： H01J29/076
摘要： A slot-type shadow mask (3) used for a color picture tube. The slot-type shadow mask (3) according to the invention has a shadow mask plate (4) composed of a front plate (4a) and a back plate (4b), and the relationship between them is such that the bridges (6a, 6b) on one plate divide the slot holes (5b, 5a) of the other.

4. 发明授权

US09887106B2 Ejection inspection apparatus and substrate processing apparatus 有权
公开(公告)号：US09887106B2
公开(公告)日：2018-02-06
申请号：US14207232
申请日：2014-03-12
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Itaru Furukawa , Hiroshi Sano
IPC分类号： H01L21/67 , G06T7/00 , G06T7/194
CPC分类号： H01L21/67023 , G06T7/0004 , G06T7/194 , G06T2207/10016 , G06T2207/30148 , H01L21/67051 , H01L21/67253
摘要： An ejection inspection part of a substrate processing apparatus includes a light emitting part and an imaging part. The light emitting part emits light along a predetermined light existing plane to irradiate a processing liquid ejected from outlets of an ejection head with the light. The imaging part captures an image of the processing liquid passing through planar light emitted from the light emitting part to acquire an inspection image including bright dots. In the ejection inspection part, a determination frame setting part sets normal ejection determination frames corresponding to the outlets in the inspection image. The determination part acquires existence information indicating whether or not a bright dot exists in each normal ejection determination frame and uses the existence information to determine the quality of the ejection operation of the outlet corresponding to the normal ejection determination frame. It is thus possible to individually and accurately determine the quality of the ejection operations of the outlets.

5. 发明授权

US09649660B2 Substrate treatment method and substrate treatment apparatus 有权
公开(公告)号：US09649660B2
公开(公告)日：2017-05-16
申请号：US14039710
申请日：2013-09-27
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Tatsuya Fujii
IPC分类号： B08B7/04 , B08B7/00 , B05D3/00 , B05C5/00 , B05D1/00 , H01L21/67
CPC分类号： B05D3/002 , B05C5/00 , B05D1/005 , B08B7/00 , B08B7/04 , H01L21/67028
摘要： A substrate treatment method includes a rinsing step of supplying a rinse liquid to a front surface of a substrate while rotating the substrate at a first rotation speed, a liquid mixture film forming step of forming a liquid film of a liquid mixture of water and an organic solvent having a smaller surface tension than the water on the front surface after the rinsing step by supplying the water and the organic solvent to the front surface while reducing the rotation speed of the substrate from the first rotation speed to a second rotation speed lower than the first rotation speed, and an organic solvent replacing step of replacing the liquid mixture supplied to the front surface with the organic solvent after the liquid mixture film forming step by supplying the organic solvent to the front surface.

6. 发明授权

US09600874B2 Method for evaluating culture quality 有权
公开(公告)号：US09600874B2
公开(公告)日：2017-03-21
申请号：US14275949
申请日：2014-05-13
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Hiroki Fujimoto , Sanzo Moriwaki
IPC分类号： G06K9/00 , G06T7/00 , G06K9/03
CPC分类号： G06T7/0012 , G06K9/00134 , G06K9/03 , G06T2207/10056 , G06T2207/20021 , G06T2207/30024
摘要： A culture quality evaluation method comprises: a first step of culturing a pluripotent stem cell under a predetermined culture condition and creating a sample; a second step of imaging a proliferated cell colony in the sample and accordingly capturing an original image; a third step of dividing the original image into smaller images of a predetermined size and calculating standard deviations of pixel values of pixels of the smaller images; and a fourth step of judging whether the sample is an acceptable sample based upon a ratio of a number of the smaller images whose values of the standard deviations are within a predetermined range to a total number of the smaller images.

7. 发明授权

US09493000B2 Liquid ejecting device, head unit, and liquid ejecting method 有权
标题翻译：液体喷射装置，头部单元和液体喷射方法
公开(公告)号：US09493000B2
公开(公告)日：2016-11-15
申请号：US14498764
申请日：2014-09-26
申请人： Seiko Epson Corporation , DAINIPPON SCREEN MFG. CO., LTD.
发明人： Toshiyuki Yamagata , Toshiki Usui , Naoki Yonekubo , Kiyoomi Mitsuki
IPC分类号： B41J2/045
CPC分类号： B41J2/04588 , B41J2/04573 , B41J2/04581
摘要： A liquid ejecting device includes: a piezoelectric element that is deformed by applying at least one drive waveform among a plurality of drive waveforms to the piezoelectric element, the plurality of drive waveforms including a first drive waveform and a second drive waveform; a cavity that is filled with a liquid and is increased or decreased in internal pressure due to deformation of the piezoelectric element; a nozzle that communicates with the cavity, and ejects the liquid as a liquid droplet; and a selection section that selects at least one drive waveform from the plurality of drive waveforms, the liquid droplet including a first liquid droplet ejected when the first drive waveform has been selected, and a second liquid droplet ejected when the second drive waveform has been selected, an ejection volume of the first liquid droplet being almost equal to an ejection volume of the second liquid droplet.
摘要翻译：一种液体喷射装置，包括：压电元件，其通过在多个驱动波形中施加至少一个驱动波形而变形，所述多个驱动波形包括第一驱动波形和第二驱动波形; 填充有液体的空腔并且由于压电元件的变形而在内部压力中增加或减少; 喷嘴，与所述空腔连通，并将液体喷射成液滴; 以及选择部，其从所述多个驱动波形中选择至少一个驱动波形，所述液滴包括当选择了所述第一驱动波形时喷射的第一液滴，以及当选择所述第二驱动波形时喷射的第二液滴第一液滴的喷射量几乎等于第二液滴的喷射体积。

8. 发明授权

US09466513B2 Treatment liquid supply apparatus and substrate treatment apparatus including the same 有权
标题翻译：处理液供给装置及包括其的基板处理装置
公开(公告)号：US09466513B2
公开(公告)日：2016-10-11
申请号：US14483556
申请日：2014-09-11
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Hiroshi Yoshida
IPC分类号： H01L21/67 , B08B3/00 , B08B3/02 , B08B3/14
CPC分类号： H01L21/67051 , B08B3/00 , B08B3/02 , B08B3/14 , H01L21/67017 , H01L21/67248
摘要： A treatment liquid supply apparatus supplies a treatment liquid to a predetermined object for treatment of a substrate, and recovers the supplied treatment liquid for reuse. The apparatus includes: a first tank in which the treatment liquid to be supplied to the object is stored; a second tank in which the treatment liquid recovered from the object is stored; a transfer unit which transfers the treatment liquid from the second tank to the first tank; a first temperature regulating unit which regulates the temperature of the treatment liquid to be supplied from the first tank to the object; and a second temperature regulating unit which regulates the temperature of the treatment liquid to be transferred from the second tank to the first tank by the transfer unit.
摘要翻译：处理液供给装置向处理基板的规定对象供给处理液，回收供给的处理液再利用。该装置包括：第一罐，其中存储供给到物体的处理液体; 存储从物体回收的处理液的第二罐; 转移单元，其将处理液体从第二罐转移到第一罐; 第一温度调节单元，其调节从第一罐供给到物体的处理液的温度; 以及第二温度调节单元，其通过所述传送单元来调节要从所述第二箱转移到所述第一箱的处理液的温度。

9. 发明授权

US09436087B2 Substrate processing apparatus with a cleaning processing section for cleaning a chemical liquid processing section 有权
标题翻译：具有清洗处理部的基板处理装置，用于清洗药液处理部
公开(公告)号：US09436087B2
公开(公告)日：2016-09-06
申请号：US14322982
申请日：2014-07-03
申请人： DAINIPPON SCREEN MFG. CO., LTD. , SOKUDO CO., LTD.
发明人： Kazuo Morioka , Masanori Imamura , Satoshi Yamamoto , Hideki Shimizu
IPC分类号： B08B3/08 , B08B3/04 , B05B15/00 , H01L21/67 , B05C11/10 , G03F7/16 , B05B15/02 , B08B9/02 , G03F7/42
CPC分类号： G03F7/16 , B05B15/55 , B08B3/04 , B08B3/08 , B08B9/02 , G03F7/42 , H01L21/67017 , H01L21/6715 , H01L21/67253
摘要： Each chemical processing section includes a chemical liquid bottle, a buffer tank, a pump, a filter, a discharge valve and a discharge nozzle. A chemical liquid stored in the chemical liquid bottle is led to the discharge nozzle and is discharged from the discharge nozzle to a substrate. A cleaning processing section includes a solvent bottle, a cleaning liquid bottle, the buffer tank and the pump. A solvent stored in the solvent bottle, a cleaning liquid stored in the cleaning liquid bottle and a gas supplied from a gas supply source are selectively led to the discharge nozzle in each chemical liquid processing section.
摘要翻译：每个化学处理部分包括化学液体瓶，缓冲罐，泵，过滤器，排放阀和排出喷嘴。存储在药液瓶中的化学液体被引导到排出喷嘴，并从排出喷嘴排出到基板。清洗处理部包括溶剂瓶，清洗液瓶，缓冲罐和泵。存储在溶剂瓶中的溶剂，存储在清洗液体瓶中的清洗液和从气体供给源供给的气体被选择性地引导到每个化学液体处理部中的排出喷嘴。

10. 发明授权

US09390904B2 Substrate processing apparatus and substrate processing method 有权
公开(公告)号：US09390904B2
公开(公告)日：2016-07-12
申请号：US13957869
申请日：2013-08-02
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Toshimitsu Namba
IPC分类号： H01L21/02 , H01L21/687 , H01L21/67
摘要： A substrate processing apparatus includes a substrate holding part, a substrate rotating mechanism, and a chamber. The substrate rotating mechanism incudes an annular rotor part disposed in an internal space of the chamber and a stator part disposed around the rotor part outside the chamber. The substrate holding part is attached to the rotor part in the internal space of the chamber. In the substrate rotating mechanism, a rotating force is generated about a central axis between the stator part and the rotor part. The rotor part is thereby rotated about the central axis, being in a floating state, together with a substrate and the substrate holding part. In the substrate processing apparatus, the substrate can be easily rotated in the internal space having excellent sealability. As a result, it is possible to easily perform single-substrate processing in a sealed internal space.

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