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1. 发明申请

US20090314951A1 ION SOURCE CLEANING METHOD AND APPARATUS 有权
标题翻译：离子源清洁方法和装置
公开(公告)号：US20090314951A1
公开(公告)日：2009-12-24
申请号：US12143247
申请日：2008-06-20
申请人： Costel Biloiu , Craig R. Chaney , Eric R. Cobb , Bon-Woong Koo , Wilhelm P. Platow
发明人： Costel Biloiu , Craig R. Chaney , Eric R. Cobb , Bon-Woong Koo , Wilhelm P. Platow
IPC分类号： H01J27/02 , B08B6/00
CPC分类号： H01J37/08 , H01J37/3171 , H01J2237/022 , H01J2237/024 , H01J2237/0458 , H01J2237/061
摘要： In a cleaning process for an ion source chamber, an electrode positioned outside of the ion source chamber includes a suppression plug. When the cleaning gas is introduced into the source chamber, the suppression plug may engage an extraction aperture of the source chamber to adjust the gas pressure within the chamber to enhance chamber cleaning via. plasma-enhanced chemical reaction. The gas conductance between the source chamber aperture and the suppression plug can be adjusted during the cleaning process to provide optimum cleaning conditions and to exhaust unwanted deposits.
摘要翻译：在离子源室的清洁处理中，位于离子源室外的电极包括抑制塞。当清洁气体被引入源室中时，抑制塞可以接合源室的提取孔以调节室内的气体压力以增强室清洁。等离子体增强化学反应。在清洁过程中可以调节源室孔和抑制塞之间的气体传导，以提供最佳的清洁条件并排出不需要的沉积物。

2. 发明授权

US07888662B2 Ion source cleaning method and apparatus 有权
标题翻译：离子源清洗方法及装置
公开(公告)号：US07888662B2
公开(公告)日：2011-02-15
申请号：US12143247
申请日：2008-06-20
申请人： Costel Biloiu , Craig R. Chaney , Eric R. Cobb , Bon-Woong Koo , Wilhelm P. Platow
发明人： Costel Biloiu , Craig R. Chaney , Eric R. Cobb , Bon-Woong Koo , Wilhelm P. Platow
IPC分类号： H01J37/08
CPC分类号： H01J37/08 , H01J37/3171 , H01J2237/022 , H01J2237/024 , H01J2237/0458 , H01J2237/061
摘要： In a cleaning process for an ion source chamber, an electrode positioned outside of the ion source chamber includes a suppression plug. When the cleaning gas is introduced intothe source chamber, the suppression plug may engage an extraction aperture of the source chamber to adjust the gas pressure within the chamber to enhance chamber cleaning via. plasma-enhanced chemical reaction. The gas conductance between the source chamber aperture and the suppression plug can be adjusted during the cleaning process to provide optimum cleaning conditions and to exhaust unwanted deposits.
摘要翻译：在离子源室的清洁处理中，位于离子源室外的电极包括抑制塞。当清洁气体被引入源室中时，抑制塞可以接合源室的提取孔以调节室内的气体压力以增强室清洁。等离子体增强化学反应。在清洁过程中可以调节源室孔和抑制塞之间的气体传导，以提供最佳的清洁条件并排出不需要的沉积物。

3. 发明申请

US20110240876A1 APPARATUS FOR CONTROLLING THE TEMPERATURE OF AN RF ION SOURCE WINDOW 失效
标题翻译：用于控制RF离子源窗口温度的装置
公开(公告)号：US20110240876A1
公开(公告)日：2011-10-06
申请号：US12754258
申请日：2010-04-05
申请人： Frank Sinclair , Costel Biloiu , Bon-Woong Koo , Victor Benveniste , Shardul Patel
发明人： Frank Sinclair , Costel Biloiu , Bon-Woong Koo , Victor Benveniste , Shardul Patel
IPC分类号： H01J27/02
CPC分类号： H01J37/32495 , H01J27/16 , H01J37/08 , H01J37/3171 , H01J37/321 , H01J37/32412 , H01J37/32422 , H01J37/32522 , H01J2237/022 , H01J2237/0266 , H01J2237/0817
摘要： An RF ion source utilizing a heating/RF-shielding element for controlling the temperature of an RF window and to act as an RF shielding element for the RF ion source. When the heating/RF shielding element is in a heating mode, it suppresses formation of unwanted deposits on the RF window which negatively impacts the transfer of RF energy from an RF antenna to a plasma chamber. When the heating/RF-shielding element is in a shielding mode, it provides an electrostatic shielding for the RF ion source.
摘要翻译： RF离子源，其利用加热/ RF屏蔽元件来控制RF窗口的温度并用作RF离子源的RF屏蔽元件。当加热/ RF屏蔽元件处于加热模式时，它抑制在RF窗口上形成不需要的沉积物，这对RF能量从RF天线到等离子体室的转移产生负面影响。当加热/ RF屏蔽元件处于屏蔽模式时，它为RF离子源提供静电屏蔽。

4. 发明授权

US08436318B2 Apparatus for controlling the temperature of an RF ion source window 失效
标题翻译：用于控制RF离子源窗口的温度的装置
公开(公告)号：US08436318B2
公开(公告)日：2013-05-07
申请号：US12754258
申请日：2010-04-05
申请人： Frank Sinclair , Costel Biloiu , Bon-Woong Koo , Victor Benveniste , Shardul Patel
发明人： Frank Sinclair , Costel Biloiu , Bon-Woong Koo , Victor Benveniste , Shardul Patel
IPC分类号： H01J27/00
CPC分类号： H01J37/32495 , H01J27/16 , H01J37/08 , H01J37/3171 , H01J37/321 , H01J37/32412 , H01J37/32422 , H01J37/32522 , H01J2237/022 , H01J2237/0266 , H01J2237/0817
摘要： An RF ion source utilizing a heating/RF-shielding element for controlling the temperature of an RF window and to act as an RF shielding element for the RF ion source. When the heating/RF shielding element is in a heating mode, it suppresses formation of unwanted deposits on the RF window which negatively impacts the transfer of RF energy from an RF antenna to a plasma chamber. When the heating/RF-shielding element is in a shielding mode, it provides an electrostatic shielding for the RF ion source.
摘要翻译： RF离子源，其利用加热/ RF屏蔽元件来控制RF窗口的温度并用作RF离子源的RF屏蔽元件。当加热/ RF屏蔽元件处于加热模式时，它抑制在RF窗口上形成不需要的沉积物，这对RF能量从RF天线到等离子体室的转移产生负面影响。当加热/ RF屏蔽元件处于屏蔽模式时，它为RF离子源提供静电屏蔽。

5. 发明申请

US20130313971A1 Gallium ION Source and Materials Therefore 有权
标题翻译：因此，镓离子源和材料
公开(公告)号：US20130313971A1
公开(公告)日：2013-11-28
申请号：US13477253
申请日：2012-05-22
申请人： Costel Biloiu , Craig R. Chaney , Neil J. Bassom , Benjamin Colombeau , Dennis P. Rodier
发明人： Costel Biloiu , Craig R. Chaney , Neil J. Bassom , Benjamin Colombeau , Dennis P. Rodier
IPC分类号： H01J27/20
CPC分类号： H01J27/20 , H01J7/24 , H01J37/02 , H01J37/08
摘要： In one embodiment, a method for generating an ion beam having gallium ions includes providing at least a portion of a gallium compound target in a plasma chamber, the gallium compound target comprising gallium and at least one additional element. The method also includes initiating a plasma in the plasma chamber using at least one gaseous species and providing a source of gaseous etchant species to react with the gallium compound target to form a volatile gallium species.
摘要翻译：在一个实施方案中，用于产生具有镓离子的离子束的方法包括在等离子体室中提供镓化合物靶的至少一部分，所述镓化合物靶包含镓和至少一个附加元素。该方法还包括使用至少一种气态物质在等离子体室中引发等离子体，并提供气态蚀刻剂物质源以与镓化合物靶反应以形成挥发性镓物质。

6. 发明授权

US09396902B2 Gallium ION source and materials therefore 有权
标题翻译：因此，镓离子源和材料
公开(公告)号：US09396902B2
公开(公告)日：2016-07-19
申请号：US13477253
申请日：2012-05-22
申请人： Costel Biloiu , Craig R. Chaney , Neil J. Bassom , Benjamin Colombeau , Dennis P. Rodier
发明人： Costel Biloiu , Craig R. Chaney , Neil J. Bassom , Benjamin Colombeau , Dennis P. Rodier
IPC分类号： H01J7/24 , H01J27/20 , H01J37/02 , H01J37/08
CPC分类号： H01J27/20 , H01J7/24 , H01J37/02 , H01J37/08
摘要： In one embodiment, a method for generating an ion beam having gallium ions includes providing at least a portion of a gallium compound target in a plasma chamber, the gallium compound target comprising gallium and at least one additional element. The method also includes initiating a plasma in the plasma chamber using at least one gaseous species and providing a source of gaseous etchant species to react with the gallium compound target to form a volatile gallium species.
摘要翻译：在一个实施方案中，用于产生具有镓离子的离子束的方法包括在等离子体室中提供镓化合物靶的至少一部分，所述镓化合物靶包含镓和至少一个附加元素。该方法还包括使用至少一种气态物质在等离子体室中引发等离子体，并提供气态蚀刻剂物质源以与镓化合物靶反应以形成挥发性镓物质。

7. 发明申请

US20130193848A1 RIBBON ANTENNA FOR VERSATILE OPERATION AND EFFICIENT RF POWER COUPLING 有权
标题翻译： RIBBON天线，用于多种操作和有效的射频功率耦合
公开(公告)号：US20130193848A1
公开(公告)日：2013-08-01
申请号：US13362052
申请日：2012-01-31
申请人： Costel Biloiu , Craig Chaney
发明人： Costel Biloiu , Craig Chaney
IPC分类号： H05H1/46
CPC分类号： H01J37/3211 , H01J37/32174
摘要： A plasma processing apparatus and method are disclosed which allows switching between the E and H operation modes and also increase the coupling efficiency of the RF power to the plasma. This apparatus may increase plasma density by a factor of about 1.25-1.65 for a given power output. Simultaneously, due to the high efficiency, the need to cool the antenna may be eliminated. A new antenna geometry which increases the amount of surface area for a given volume is used to take advantage of skin effects associated with RF electric current. In some embodiments, the antenna has a single turn to reduce proximity effects. The antenna may also be embedded in a ferrite material to further optimize its performance.
摘要翻译：公开了一种允许在E和H操作模式之间切换并且还增加RF功率对等离子体的耦合效率的等离子体处理装置和方法。对于给定的功率输出，该装置可以将等离子体密度提高约1.25-1.65倍。同时，由于高效率，可以消除对天线进行冷却的需要。使用增加给定体积的表面积的新天线几何形状来利用与RF电流相关的皮肤效应。在一些实施例中，天线具有单个转弯以减少邻近效应。天线也可以嵌入铁氧体材料中以进一步优化其性能。

8. 发明申请

US20110259269A1 SMALL FORM FACTOR PLASMA SOURCE FOR HIGH DENSITY WIDE RIBBON ION BEAM GENERATION 有权
标题翻译：用于高密度宽度RIBBON离子束生成的小形状因子等离子体源
公开(公告)号：US20110259269A1
公开(公告)日：2011-10-27
申请号：US12767125
申请日：2010-04-26
申请人： Costel Biloiu , Jay Scheuer , Joseph Olson , Frank Sinclair , Daniel Distaso
发明人： Costel Biloiu , Jay Scheuer , Joseph Olson , Frank Sinclair , Daniel Distaso
IPC分类号： C23C16/00
CPC分类号： H01J37/08 , H01J27/16 , H01J37/3171 , H01J2237/061 , H01J2237/065 , H01J2237/0815 , H05H1/30
摘要： An ion source, capable of generating high-density wide ribbon ion beam, utilizing inductively coupled plasma production is disclosed. As opposed to conventional ICP sources, the present disclosure describes an ICP source which is not cylindrical. Rather, the source is defined such that its width, which is the dimension along which the beam is extracted, is greater than its height. The depth of the source may be defined to maximize energy transfer from the antenna to the plasma. In a further embodiment, a multicusp magnetic field surrounding the ICP source is used to further increase the current density and improve the uniformity of the extracted ion beam. Ion beam uniformity can also be controlled by means of several independent controls, including gas flow rate, and input RF power.
摘要翻译：公开了一种能够利用电感耦合等离子体生产产生高密度宽带状离子束的离子源。与常规ICP源相反，本公开描述了不是圆柱形的ICP源。相反，源被限定为使得其宽度（其是提取梁的尺寸）大于其高度。可以定义源的深度以最大化从天线到等离子体的能量传递。在另一个实施例中，围绕ICP源的多谐振磁场用于进一步增加电流密度并提高所提取的离子束的均匀性。离子束均匀性也可以通过几个独立的控制来控制，包括气体流速和输入射频功率。

9. 发明申请

US20090309041A1 TECHNIQUES FOR PROVIDING A MULTIMODE ION SOURCE 有权
标题翻译：提供多个离子源的技术
公开(公告)号：US20090309041A1
公开(公告)日：2009-12-17
申请号：US12137225
申请日：2008-06-11
申请人： Peter Kurunczi , Rajesh Dorai , Costel Biloiu , Wilhelm Platow
发明人： Peter Kurunczi , Rajesh Dorai , Costel Biloiu , Wilhelm Platow
IPC分类号： H01J27/02 , G21K5/00
CPC分类号： H01J37/08 , H01J27/08 , H01J27/16 , H01J37/3171 , H01J2237/061 , H01J2237/0817 , H01J2237/082 , H01J2237/0827 , H01J2237/304
摘要： Techniques for providing a multimode ion source are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation comprising an ion source that operates in multiple modes such that a first mode is an arc-discharge mode and a second mode is an RF mode.
摘要翻译：公开了提供多模离子源的技术。在一个特定示例性实施例中，可以将技术实现为用于离子注入的装置，其包括以多种模式操作的离子源，使得第一模式是电弧放电模式，而第二模式是RF模式。

10. 发明授权

US08901820B2 Ribbon antenna for versatile operation and efficient RF power coupling 有权
标题翻译：带状天线，用于多功能操作和高效射频功率耦合
公开(公告)号：US08901820B2
公开(公告)日：2014-12-02
申请号：US13362052
申请日：2012-01-31
申请人： Costel Biloiu , Craig Chaney
发明人： Costel Biloiu , Craig Chaney
IPC分类号： H01J7/24
CPC分类号： H01J37/3211 , H01J37/32174
摘要： A plasma processing apparatus and method are disclosed which allows switching between the E and H operation modes and also increase the coupling efficiency of the RF power to the plasma. This apparatus may increase plasma density by a factor of about 1.25-1.65 for a given power output. Simultaneously, due to the high efficiency, the need to cool the antenna may be eliminated. A new antenna geometry which increases the amount of surface area for a given volume is used to take advantage of skin effects associated with RF electric current. In some embodiments, the antenna has a single turn to reduce proximity effects. The antenna may also be embedded in a ferrite material to further optimize its performance.
摘要翻译：公开了一种允许在E和H操作模式之间切换并且还增加RF功率对等离子体的耦合效率的等离子体处理装置和方法。对于给定的功率输出，该装置可以将等离子体密度提高约1.25-1.65倍。同时，由于高效率，可以消除对天线进行冷却的需要。使用增加给定体积的表面积的新天线几何形状来利用与RF电流相关的皮肤效应。在一些实施例中，天线具有单个转弯以减少邻近效应。天线也可以嵌入铁氧体材料中以进一步优化其性能。

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