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1. 发明授权

US08901820B2 Ribbon antenna for versatile operation and efficient RF power coupling 有权
标题翻译：带状天线，用于多功能操作和高效射频功率耦合
公开(公告)号：US08901820B2
公开(公告)日：2014-12-02
申请号：US13362052
申请日：2012-01-31
申请人： Costel Biloiu , Craig Chaney
发明人： Costel Biloiu , Craig Chaney
IPC分类号： H01J7/24
CPC分类号： H01J37/3211 , H01J37/32174
摘要： A plasma processing apparatus and method are disclosed which allows switching between the E and H operation modes and also increase the coupling efficiency of the RF power to the plasma. This apparatus may increase plasma density by a factor of about 1.25-1.65 for a given power output. Simultaneously, due to the high efficiency, the need to cool the antenna may be eliminated. A new antenna geometry which increases the amount of surface area for a given volume is used to take advantage of skin effects associated with RF electric current. In some embodiments, the antenna has a single turn to reduce proximity effects. The antenna may also be embedded in a ferrite material to further optimize its performance.
摘要翻译：公开了一种允许在E和H操作模式之间切换并且还增加RF功率对等离子体的耦合效率的等离子体处理装置和方法。对于给定的功率输出，该装置可以将等离子体密度提高约1.25-1.65倍。同时，由于高效率，可以消除对天线进行冷却的需要。使用增加给定体积的表面积的新天线几何形状来利用与RF电流相关的皮肤效应。在一些实施例中，天线具有单个转弯以减少邻近效应。天线也可以嵌入铁氧体材料中以进一步优化其性能。

2. 发明申请

US20130193848A1 RIBBON ANTENNA FOR VERSATILE OPERATION AND EFFICIENT RF POWER COUPLING 有权
标题翻译： RIBBON天线，用于多种操作和有效的射频功率耦合
公开(公告)号：US20130193848A1
公开(公告)日：2013-08-01
申请号：US13362052
申请日：2012-01-31
申请人： Costel Biloiu , Craig Chaney
发明人： Costel Biloiu , Craig Chaney
IPC分类号： H05H1/46
CPC分类号： H01J37/3211 , H01J37/32174
摘要： A plasma processing apparatus and method are disclosed which allows switching between the E and H operation modes and also increase the coupling efficiency of the RF power to the plasma. This apparatus may increase plasma density by a factor of about 1.25-1.65 for a given power output. Simultaneously, due to the high efficiency, the need to cool the antenna may be eliminated. A new antenna geometry which increases the amount of surface area for a given volume is used to take advantage of skin effects associated with RF electric current. In some embodiments, the antenna has a single turn to reduce proximity effects. The antenna may also be embedded in a ferrite material to further optimize its performance.
摘要翻译：公开了一种允许在E和H操作模式之间切换并且还增加RF功率对等离子体的耦合效率的等离子体处理装置和方法。对于给定的功率输出，该装置可以将等离子体密度提高约1.25-1.65倍。同时，由于高效率，可以消除对天线进行冷却的需要。使用增加给定体积的表面积的新天线几何形状来利用与RF电流相关的皮肤效应。在一些实施例中，天线具有单个转弯以减少邻近效应。天线也可以嵌入铁氧体材料中以进一步优化其性能。

3. 发明申请

US20070085021A1 Technique for improving performance and extending lifetime of inductively heated cathode ion source 有权
标题翻译：提高感应加热阴极离子源的性能和延长使用寿命的技术
公开(公告)号：US20070085021A1
公开(公告)日：2007-04-19
申请号：US11505168
申请日：2006-08-16
申请人： Eric Cobb , Russell Low , Craig Chaney , Leo Klos
发明人： Eric Cobb , Russell Low , Craig Chaney , Leo Klos
IPC分类号： H01J27/00
CPC分类号： H01J37/08 , H01J37/302 , H01J37/3171 , H01J2237/022
摘要： A technique improving performance and lifetime of inductively heated cathode ion sources is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for improving performance and lifetime of an inductively heated cathode (IHC) ion source in an ion implanter. The method may comprise maintaining an arc chamber of the IHC ion source under vacuum during a maintenance of the ion implanter, wherein no gas is supplied to the arc chamber. The method may also comprise heating a cathode of the IHC ion source by supplying a filament with a current. The method may further comprise biasing the cathode with respect to the filament at a current level of 0.5-5 A without biasing the arc chamber with respect to the cathode. The method additionally comprise keeping a source magnet from producing a magnetic field inside the arc chamber.
摘要翻译：公开了一种提高感应加热的阴极离子源的性能和寿命的技术。在一个特定的示例性实施例中，该技术可以被实现为用于改善离子注入机中的感应加热的阴极（IHC）离子源的性能和寿命的方法。该方法可以包括在维护离子注入机期间将IHC离子源的电弧室保持在真空下，其中没有气体被供应到电弧室。该方法还可以包括通过向灯丝提供电流来加热IHC离子源的阴极。该方法还可以包括以0.5-5A的电流水平相对于灯丝偏置阴极而不使电弧室相对于阴极偏置。该方法还包括保持源磁体在电弧室内产生磁场。

4. 发明申请

US20090078883A1 TECHNIQUES FOR OPTICAL ION BEAM METROLOGY 有权
标题翻译：光离子束计量技术
公开(公告)号：US20090078883A1
公开(公告)日：2009-03-26
申请号：US11859219
申请日：2007-09-21
申请人： Alexander S. Perel , Wilhelm Platow , Craig Chaney , Frank Sinclair , Tyler Rockwell
发明人： Alexander S. Perel , Wilhelm Platow , Craig Chaney , Frank Sinclair , Tyler Rockwell
IPC分类号： G21K1/00
CPC分类号： H01J37/3171 , H01J37/244 , H01J37/304 , H01J2237/2445 , H01J2237/24507 , H01J2237/24542 , H01J2237/2482 , H01J2237/30472
摘要： Techniques for providing optical ion beam metrology are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for controlling beam density profile, the apparatus may include one or more camera systems to capture at least one image of an ion beam and a control system coupled to the one or more camera systems to control a beam density profile of the ion beam. The control system may further include a dose profiler to provide information to one or more ion implantation components in at least one of a feedback loop and a feedforward loop to improve dose and angle uniformity.
摘要翻译：公开了提供光学离子束计量的技术。在一个特定的示例性实施例中，技术可以被实现为用于控制光束密度分布的装置，该装置可以包括一个或多个相机系统以捕获离子束的至少一个图像和耦合到一个或多个相机的控制系统用于控制离子束的束密度分布的系统。控制系统还可以包括剂量分析器，以在反馈环路和前馈环路中的至少一个中向一个或多个离子注入组件提供信息，以改善剂量和角度均匀性。

5. 发明授权

US09076625B2 Indirectly heated cathode cartridge design 有权
标题翻译：间接加热阴极筒设计
公开(公告)号：US09076625B2
公开(公告)日：2015-07-07
申请号：US13082495
申请日：2011-04-08
申请人： Craig Chaney , Leo Klos , Anthony Renau , Alexander Perel
发明人： Craig Chaney , Leo Klos , Anthony Renau , Alexander Perel
IPC分类号： H01J9/02 , H01J37/067 , H01J19/20 , H01J29/48 , H01J19/14 , H01J37/02 , H01J37/075 , H01J37/317
CPC分类号： H01J37/067 , H01J19/14 , H01J19/20 , H01J29/485 , H01J37/026 , H01J37/075 , H01J37/3171 , H01J2237/06308 , H01J2237/06375
摘要： An apparatus and method for producing electrons in a plasma flood gun is disclosed. The apparatus includes an indirectly heated cathode (IHC) which is contained within a pre-fabricated cartridge. This cartridge can be readily replaced in a plasma flood gun. In addition, the use of an IHC reduces the amount of contaminants that are injected into the workpiece or wafer.
摘要翻译：公开了一种用于在等离子体喷枪中产生电子的装置和方法。该装置包括一个间接加热的阴极（IHC），其被包含在一个预制的盒中。这种墨盒可以在等离子喷枪中轻松更换。此外，IHC的使用减少了注入工件或晶片的污染物的量。

6. 发明授权

US07723697B2 Techniques for optical ion beam metrology 有权
标题翻译：光离子束计量技术
公开(公告)号：US07723697B2
公开(公告)日：2010-05-25
申请号：US11859219
申请日：2007-09-21
申请人： Alexander S. Perel , Wilhelm Platow , Craig Chaney , Frank Sinclair , Tyler Rockwell
发明人： Alexander S. Perel , Wilhelm Platow , Craig Chaney , Frank Sinclair , Tyler Rockwell
IPC分类号： G01K11/00 , G21K5/02 , G21K5/10
CPC分类号： H01J37/3171 , H01J37/244 , H01J37/304 , H01J2237/2445 , H01J2237/24507 , H01J2237/24542 , H01J2237/2482 , H01J2237/30472
摘要： Techniques for providing optical ion beam metrology are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for controlling beam density profile, the apparatus may include one or more camera systems to capture at least one image of an ion beam and a control system coupled to the one or more camera systems to control a beam density profile of the ion beam. The control system may further include a dose profiler to provide information to one or more ion implantation components in at least one of a feedback loop and a feedforward loop to improve dose and angle uniformity.
摘要翻译：公开了提供光学离子束计量的技术。在一个特定的示例性实施例中，技术可以被实现为用于控制光束密度分布的装置，该装置可以包括一个或多个相机系统以捕获离子束的至少一个图像和耦合到一个或多个相机的控制系统用于控制离子束的束密度分布的系统。控制系统还可以包括剂量分析器，以在反馈环路和前馈环路中的至少一个中向一个或多个离子注入组件提供信息，以改善剂量和角度均匀性。

7. 发明申请

US20070045570A1 Technique for improving ion implanter productivity 有权
标题翻译：提高离子注入机生产率的技术
公开(公告)号：US20070045570A1
公开(公告)日：2007-03-01
申请号：US11394825
申请日：2006-03-31
申请人： Craig Chaney , Russell Low , Jonathan England
发明人： Craig Chaney , Russell Low , Jonathan England
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J37/08 , H01J2237/022 , H01J2237/082 , H01J2237/0822 , H01J2237/0827 , H01J2237/31705
摘要： A technique for improving ion implanter productivity is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for improving productivity of an ion implanter having an ion source chamber. The method may comprise supplying a gaseous substance to the ion source chamber, the gaseous substance comprising one or more reactive species for generating ions for the ion implanter. The method may also comprise stopping the supply of the gaseous substance to the ion source chamber. The method may further comprise supplying a hydrogen containing gas to the ion source chamber for a period of time after stopping the supply of the gaseous substance.
摘要翻译：公开了一种改善离子注入机生产率的技术。在一个特定的示例性实施例中，该技术可以被实现为用于提高具有离子源室的离子注入机的生产率的方法。该方法可以包括向离子源室供应气态物质，该气态物质包含用于产生用于离子注入机的离子的一种或多种反应性物质。该方法还可以包括停止向离子源室供应气态物质。该方法还可以包括在停止供应气态物质后的一段时间内向离子源室供应含氢气体。

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