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    • 1. 发明申请
    • Thin Film Transistor, Thin Film Transistor Substrate, and Methods for Manufacturing the Same
    • 薄膜晶体管,薄膜晶体管基板及其制造方法
    • US20080316386A1
    • 2008-12-25
    • US12197416
    • 2008-08-25
    • Chin-Lung TingCheng-Chi Wang
    • Chin-Lung TingCheng-Chi Wang
    • G02F1/136
    • H01L29/78696H01L29/66757H01L29/78606H01L29/78675
    • A thin film transistor includes a channel layer of a specific shape, a thermal gradient inducer body, a gate insulating film, a gate electrode and an interlayer insulating film, a source electrode and a drain electrode. The channel layer is formed on a substrate. The channel layer has a nucleation region and a crystal end. The thermal gradient inducer body partially circumscribes the channel layer. The gate insulating film is formed on the substrate, and the channel layer is at least partially covered with the gate insulating film. The gate electrode is formed on the gate insulating film. The interlayer insulating film is formed on the gate insulating film, and the gate electrode is at least partially covered with the interlayer insulating film. The source electrode and the drain electrode are formed on the interlayer insulating film, passed through the gate insulating film and the interlayer insulating film, and electrically connected to the channel layer.
    • 薄膜晶体管包括特定形状的沟道层,热梯度诱导体,栅极绝缘膜,栅电极和层间绝缘膜,源电极和漏电极。 沟道层形成在基板上。 沟道层具有成核区域和晶体端部。 热梯度诱导体主体部分地界定通道层。 栅极绝缘膜形成在基板上,沟道层至少部分地被栅极绝缘膜覆盖。 栅电极形成在栅极绝缘膜上。 层间绝缘膜形成在栅极绝缘膜上,并且栅电极至少部分被层间绝缘膜覆盖。 源电极和漏极形成在层间绝缘膜上,通过栅极绝缘膜和层间绝缘膜,并与沟道层电连接。
    • 2. 发明授权
    • Thin film transistor, thin film transistor substrate, and methods for manufacturing the same
    • 薄膜晶体管,薄膜晶体管基板及其制造方法
    • US08139175B2
    • 2012-03-20
    • US12197416
    • 2008-08-25
    • Chin-Lung TingCheng-Chi Wang
    • Chin-Lung TingCheng-Chi Wang
    • G02F1/136
    • H01L29/78696H01L29/66757H01L29/78606H01L29/78675
    • A thin film transistor includes a channel layer of a specific shape, a thermal gradient inducer body, a gate insulating film, a gate electrode and an interlayer insulating film, a source electrode and a drain electrode. The channel layer is formed on a substrate. The channel layer has a nucleation region and a crystal end. The thermal gradient inducer body partially circumscribes the channel layer. The gate insulating film is formed on the substrate, and the channel layer is at least partially covered with the gate insulating film. The gate electrode is formed on the gate insulating film. The interlayer insulating film is formed on the gate insulating film, and the gate electrode is at least partially covered with the interlayer insulating film. The source electrode and the drain electrode are formed on the interlayer insulating film, passed through the gate insulating film and the interlayer insulating film, and electrically connected to the channel layer.
    • 薄膜晶体管包括特定形状的沟道层,热梯度诱导体,栅极绝缘膜,栅电极和层间绝缘膜,源电极和漏电极。 沟道层形成在基板上。 沟道层具有成核区域和晶体端部。 热梯度诱导体主体部分地界定通道层。 栅极绝缘膜形成在基板上,沟道层至少部分地被栅极绝缘膜覆盖。 栅电极形成在栅极绝缘膜上。 层间绝缘膜形成在栅极绝缘膜上,并且栅电极至少部分被层间绝缘膜覆盖。 源电极和漏极形成在层间绝缘膜上,通过栅极绝缘膜和层间绝缘膜,并与沟道层电连接。
    • 3. 发明授权
    • Thin film transistor, thin film transistor substrate, and methods for manufacturing the same
    • 薄膜晶体管,薄膜晶体管基板及其制造方法
    • US07432140B2
    • 2008-10-07
    • US11623214
    • 2007-01-15
    • Chin-Lung TingCheng-Chi Wang
    • Chin-Lung TingCheng-Chi Wang
    • H01L21/00
    • H01L29/78696H01L29/66757H01L29/78606H01L29/78675
    • A thin film transistor includes a channel layer of a specific shape, a thermal gradient inducer body, a gate insulating film, a gate electrode and an interlayer insulating film, a source electrode and a drain electrode. The channel layer is formed on a substrate. The channel layer has a nucleation region and a crystal end. The thermal gradient inducer body partially circumscribes the channel layer. The gate insulating film is formed on the substrate, and the channel layer is at least partially covered with the gate insulating film. The gate electrode is formed on the gate insulating film. The interlayer insulating film is formed on the gate insulating film, and the gate electrode is at least partially covered with the interlayer insulating film. The source electrode and the drain electrode are formed on the interlayer insulating film, passed through the gate insulating film and the interlayer insulating film, and electrically connected to the channel layer.
    • 薄膜晶体管包括特定形状的沟道层,热梯度诱导体,栅极绝缘膜,栅电极和层间绝缘膜,源电极和漏电极。 沟道层形成在基板上。 沟道层具有成核区域和晶体端部。 热梯度诱导体主体部分地界定通道层。 栅极绝缘膜形成在基板上,沟道层至少部分地被栅极绝缘膜覆盖。 栅电极形成在栅极绝缘膜上。 层间绝缘膜形成在栅极绝缘膜上,并且栅电极至少部分被层间绝缘膜覆盖。 源电极和漏极形成在层间绝缘膜上,通过栅极绝缘膜和层间绝缘膜,并与沟道层电连接。
    • 4. 发明授权
    • Thin film transistor structure
    • 薄膜晶体管结构
    • US06998640B2
    • 2006-02-14
    • US10659117
    • 2003-09-10
    • Cheng-Chi WangChin-Lung Ting
    • Cheng-Chi WangChin-Lung Ting
    • H01L29/04
    • H01L29/66765
    • The invention provides a method of manufacturing a thin film transistor capable of reducing the induced photo-electric current and thus improving the quality of the liquid crystal display, and reducing the number of required photo masks saving on the cost of fabrication. A stack structure is formed first, by successively depositing a gate electrode, a first insulation layer, a semiconductor layer, an ohmic contact layer, and a photoresist layer. Subsequently, a second insulation layer is deposited on the substrate, and the photoresist layer and the second insulation layer on the photoresist layer are removed in a lift-off process. Last, a source electrode, a drain electrode, a passivation layer, and a transparent electrode layer, are formed to complete the thin film transistor process.
    • 本发明提供了一种能够减少感应光电流并因此提高液晶显示器质量的薄膜晶体管的制造方法,并且减少了所需的照相掩模的数量,从而节省了制造成本。 首先通过依次沉积栅电极,第一绝缘层,半导体层,欧姆接触层和光致抗蚀剂层来形成堆叠结构。 随后,在衬底上沉积第二绝缘层,并且在剥离过程中去除光致抗蚀剂层上的光致抗蚀剂层和第二绝缘层。 最后,形成源电极,漏电极,钝化层和透明电极层,以完成薄膜晶体管工艺。
    • 10. 发明申请
    • Overload regulating structure for trackball device
    • 轨迹球装置过载调节结构
    • US20090225032A1
    • 2009-09-10
    • US12073509
    • 2008-03-06
    • Cheng-Chi Wang
    • Cheng-Chi Wang
    • G06F3/033
    • G06F3/03549
    • An overload regulating structure for trackball device includes a base, a top cover, a ball, a circuit board, a plurality of rotatable shafts and disks, and an overload regulator. The ball is three-point supported in the base between the rotatable shafts and the overload regulator. When the ball is subject to an overload, springs in the overload regulator are compressed, allowing the ball to sink into a locating recess in the base and be restricted from rotating freely and thereby protected against the overload. When the ball is released from the overload, the springs in the overload regulator elastically push the ball to the original three-point supported position again.
    • 用于轨迹球装置的过载调节结构包括基座,顶盖,球,电路板,多个可旋转的轴和盘,以及过载调节器。 该球在可旋转轴和过载调节器之间的基座中三点支撑。 当球受到过载时,过载调节器中的弹簧被压缩,允许球沉入基座中的定位凹槽中并被限制自由旋转,从而防止过载。 当球从过载中释放时,过载调节器中的弹簧将球弹性地推动到原来的三点支撑位置。