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1. 发明申请

US20050151443A1 Piezoelectric micro positioner for large temperature range 审中-公开
标题翻译：压电式微型定位器适用于大温度范围
公开(公告)号：US20050151443A1
公开(公告)日：2005-07-14
申请号：US11014282
申请日：2004-12-16
申请人： Charles Seeley , Matthew Nielsen , Jeffrey Fortin
发明人： Charles Seeley , Matthew Nielsen , Jeffrey Fortin
IPC分类号： H01L41/053 , H02N2/00 , H01L41/04
CPC分类号： H02N2/02 , H01L41/053
摘要： Disclosed are a piezoelectric actuator operable over a temperature range, and a method of operating a piezoelectric actuator. The piezoelectric actuator, generally, comprises a support structure, a piezoelectric material supported by the support structure, and an insert disposed between the support structure and the piezoelectric material. The piezoelectric material and the insert are positioned in series, the piezoelectric material and the insert each have a respective length, and together the piezoelectric material and the insert have a combined length. The length of the piezoelectric material changes in response to a voltage applied to the piezoelectric material. Also, the respective lengths of the piezoelectric material and the insert change, in opposite directions, in response to the same change in temperature, and, in this way, the insert mitigates changes in the combined length of the insert and the piezoelectric material due to temperature changes.
摘要翻译：公开了一种在温度范围内可操作的压电致动器以及操作压电致动器的方法。压电致动器通常包括支撑结构，由支撑结构支撑的压电材料以及设置在支撑结构和压电材料之间的插入件。压电材料和插入件串联放置，压电材料和插入件各自具有相应的长度，并且压电材料和插入件的组合长度一起组合。压电材料的长度响应于施加到压电材料的电压而变化。此外，压电材料和插入件的相应长度响应于相同的温度变化而相反地改变，并且以这种方式，插入件减轻了插入件和压电材料的组合长度的变化，由于温度变化。

2. 发明申请

US20050058959A1 Gas flow control for gas burners utilizing a micro-electro-mechanical valve 审中-公开
标题翻译：采用微机电阀的气体燃烧器的气流控制
公开(公告)号：US20050058959A1
公开(公告)日：2005-03-17
申请号：US10666180
申请日：2003-09-17
申请人： Jeffrey Fortin , Warren Bessler , Joel Haynes , Charles Seeley
发明人： Jeffrey Fortin , Warren Bessler , Joel Haynes , Charles Seeley
IPC分类号： F23N1/00
CPC分类号： F23N1/002 , F23C2900/03001 , F23N2035/18 , F23N2900/01001
摘要： An electronically controlled gas burner system and method using a micro-electro-mechanical (MEMS) valve. The system includes at least one gas burner and MEMS valves comprising an array of microvalves in fluid communication with the gas burner. The system also includes a microvalve controller for controlling the opening of each of the microvalves in the MEMS valve. The MEMS valve may be positioned remote from, or within, the gas burner. A method for controlling microvalves in a MEMS valve for firing a gas burner may include issuing a command for a desired gas flow and controlling an opening of at least some of the microvalves in the array to provide the desired gas flow corresponding to the command.
摘要翻译：一种电子控制气体燃烧器系统和使用微机电（MEMS）阀的方法。该系统包括至少一个气体燃烧器和MEMS阀，其包括与气体燃烧器流体连通的一组微型阀。该系统还包括用于控制MEMS阀中的每个微型阀的开启的微型阀控制器。 MEMS阀可以位于气体燃烧器的远离或在气体燃烧器内。用于控制用于燃烧气体燃烧器的MEMS阀中的微型阀的方法可以包括发出用于期望气体流的命令并控制阵列中的至少一些微型阀的开口以提供对应于该命令的期望气体流。

3. 发明申请

US20050285569A1 Power conversion system and method 审中-公开
标题翻译：电力转换系统及方法
公开(公告)号：US20050285569A1
公开(公告)日：2005-12-29
申请号：US10878087
申请日：2004-06-28
申请人： Samantha Rao , Robert Steigerwald , Jeffrey Fortin , Somashekhar Basavaraj
发明人： Samantha Rao , Robert Steigerwald , Jeffrey Fortin , Somashekhar Basavaraj
IPC分类号： B60C23/04 , H02J7/00 , H02J7/34
CPC分类号： B60C23/0411 , H02J7/34 , H02J7/345
摘要： According to one aspect of the present technique, a power regulating system for providing a regulated voltage to a load is provided. The system comprises an energy source and a regulator circuit that receives energy from the energy source and produces a regulated voltage, which is supplied to the load. An energy storage device is charged once the regulated voltage reaches a predetermined level. In accordance with another aspect of the present technique, a method for providing a regulated voltage to a load is provided. The method includes regulating power from an energy source and controlling charging of an energy storage device. The charging is controlled by allowing the energy storage device to charge when a regulated voltage provided by a regulator circuit reaches a predetermined level.
摘要翻译：根据本技术的一个方面，提供了一种用于向负载提供调节电压的功率调节系统。该系统包括能量源和调节器电路，其从能量源接收能量并产生被提供给负载的调节电压。一旦调节电压达到预定水平，就能对蓄能装置进行充电。根据本技术的另一方面，提供了一种向负载提供调节电压的方法。该方法包括调节能量源的功率并控制能量存储装置的充电。当由调节器电路提供的调节电压达到预定水平时，允许储能装置充电来控制充电。

4. 发明申请

US20070143934A1 Method and apparatus for determining detergent concentration 审中-公开
标题翻译：洗涤剂浓度测定方法及装置
公开(公告)号：US20070143934A1
公开(公告)日：2007-06-28
申请号：US11318301
申请日：2005-12-22
申请人： Radislav Potyrailo , Jeffrey Fortin , William Morris , Patrick Pastecki , Derek Watkins
发明人： Radislav Potyrailo , Jeffrey Fortin , William Morris , Patrick Pastecki , Derek Watkins
IPC分类号： D06F33/00 , B08B7/04 , B08B3/00 , D06F35/00
CPC分类号： D06F39/004
摘要： A method for determining detergent concentration includes performing a photometric analysis of a wash fluid during an article laundering process, and determining a concentration of a detergent within the wash fluid based at least in part upon the photometric analysis. Furthermore, an apparatus for determining detergent concentration includes a fluid chamber to hold a wash fluid for washing articles, and an optical sensor optically coupled to the fluid chamber to determine a detergent concentration within the wash fluid based at least in part upon photometric properties of the wash fluid.
摘要翻译：用于测定洗涤剂浓度的方法包括在制品洗涤过程中进行洗涤液的光度分析，以及至少部分地基于光度分析确定洗涤液中洗涤剂的浓度。此外，用于确定洗涤剂浓度的装置包括用于保持用于洗涤物品的洗涤流体的流体室和光学耦合到流体室的光学传感器，以至少部分地基于所述洗涤流体的光度特性来确定洗涤流体中的洗涤剂浓度洗液。

5. 发明申请

US20060289386A1 Etchant, method of etching, laminate formed thereby, and device 有权
标题翻译：蚀刻剂，蚀刻方法，由此形成的层压体和装置
公开(公告)号：US20060289386A1
公开(公告)日：2006-12-28
申请号：US11167719
申请日：2005-06-27
申请人： Steven Tysoe , Steven LeBoeuf , Mark D'Evelyn , Venkat Venkataramani , Vinayak Tilak , Jeffrey Fortin , Charles Becker , Stephen Arthur , Samhita Dasgupta , Kanakasabapathi Subramanian , Robert Wojnarowski , Abasifreke Ebong
发明人： Steven Tysoe , Steven LeBoeuf , Mark D'Evelyn , Venkat Venkataramani , Vinayak Tilak , Jeffrey Fortin , Charles Becker , Stephen Arthur , Samhita Dasgupta , Kanakasabapathi Subramanian , Robert Wojnarowski , Abasifreke Ebong
IPC分类号： B44C1/22 , C09K13/00 , G01L9/00
CPC分类号： H01L21/31111
摘要： An etchant including a halogenated salt, such as Cryolite (Na3AlF6) or potassium tetrafluoro borate (KBF4), is provided. The salt may be present in the etchant in an amount sufficient to etch a substrate and may have a melt temperature of greater than about 200 degrees Celsius. A method of wet etching may include contacting an etchant to at least one surface of a support layer of a multi-layer laminate, wherein the support layer may include aluminum oxide; or contacting an etchant to at least one surface of a support layer of a multi-layer laminate, wherein the etchant may include Cryolite (Na3AlF6), potassium tetrafluoro borate (KBF4), or both; and etching at least a portion of the support layer. The method may provide a laminate produced by growing a crystal onto an aluminum oxide support layer, and chemically removing at least a portion of the support layer by wet etch. An electronic device, optical device or combined device including the laminate is provided.
摘要翻译：提供了包括卤化盐的蚀刻剂，例如Cryolite（Na 3 AlF 6）或四氟硼酸钾（KBF 4 N 4）。盐可以以足以蚀刻基材的量存在于蚀刻剂中，并且可以具有大于约200摄氏度的熔体温度。湿蚀刻的方法可以包括使蚀刻剂与多层层压体的支撑层的至少一个表面接触，其中所述支撑层可以包括氧化铝; 或使蚀刻剂与多层层压体的支撑层的至少一个表面接触，其中所述蚀刻剂可以包括冰晶石（Na 3 AlF 6 N），四氟硼酸钾（KBF 4）或两者; 并蚀刻所述支撑层的至少一部分。该方法可以提供通过将结晶生长到氧化铝载体层上并通过湿蚀刻化学去除至少一部分载体层而制备的层压体。提供了包括层压板的电子设备，光学设备或组合设备。

6. 发明申请

US20060137456A1 Static and dynamic pressure sensor 失效
标题翻译：静态和动态压力传感器
公开(公告)号：US20060137456A1
公开(公告)日：2006-06-29
申请号：US11023202
申请日：2004-12-27
申请人： Samhita Dasgupta , Jeffrey Fortin , Steven LeBoeuf , Vinayak Tilak , Chayan Mitra , Kanakasabapathi Subramanian , Steven Tysoe
发明人： Samhita Dasgupta , Jeffrey Fortin , Steven LeBoeuf , Vinayak Tilak , Chayan Mitra , Kanakasabapathi Subramanian , Steven Tysoe
IPC分类号： G01L9/00
CPC分类号： G01H9/00 , G01L1/142 , G01L1/18 , G01L9/0052 , G01L9/0073 , G01L9/0075 , G01L9/008 , G01L9/08 , G01L19/04
摘要： A sensor, in accordance with aspects of the present technique, is provided. The sensor comprises a membrane formed of gallium nitride. The membrane is disposed on a substrate, which is wet-etched to form a closed cavity. The membrane exhibits both a capacitive response and a piezo-response to an external stimulus. The sensor further includes a circuit for measuring at least one of the capacitive response or the piezo-response. In certain aspects, the sensor may be operable to measure external stimuli, such as, pressure, force and mechanical vibration.
摘要翻译：提供了根据本技术方面的传感器。传感器包括由氮化镓形成的膜。膜被布置在衬底上，其被湿蚀刻以形成闭合腔。膜对外部刺激具有电容响应和压电响应。传感器还包括用于测量电容响应或压电响应中的至少一个的电路。在某些方面，传感器可操作以测量外部刺激，例如压力，力和机械振动。

7. 发明申请

US20060117839A1 Microdebris monitor 审中-公开
标题翻译：微型显示器
公开(公告)号：US20060117839A1
公开(公告)日：2006-06-08
申请号：US11001851
申请日：2004-12-02
申请人： Jeffrey Fortin , Todd Wetzel
发明人： Jeffrey Fortin , Todd Wetzel
IPC分类号： G01N11/00
CPC分类号： G01N3/567 , G01N15/0618
摘要： An apparatus and method are provided for monitoring wear of a component disposed within a fluid stream. The apparatus comprises at least one particle trap configured to capture particles from a fluid stream. The trap comprises a trapping medium having a minimum orifice size. The apparatus further comprises at least one sampler configured to divert at least a portion of the fluid stream through the trapping medium; and at least one sensor system configured to determine at least one flow characteristic in the apparatus. The method comprises flowing fluid from the stream through the apparatus described above, and determining the extent of wear in the component based on flow characteristic data obtained from the sensor system of the apparatus.
摘要翻译：提供了一种用于监测设置在流体流内的部件的磨损的装置和方法。该装置包括构造成从流体流中捕获颗粒的至少一个颗粒捕集阱。捕集器包括具有最小孔口尺寸的捕集介质。该装置还包括至少一个采样器，其构造成将至少一部分流体流转移通过捕集介质; 以及配置成确定所述装置中的至少一个流动特性的至少一个传感器系统。该方法包括使流体通过上述装置流动，并且基于从装置的传感器系统获得的流量特征数据确定部件中的磨损程度。

8. 发明申请

US20060055048A1 Method of wet etching vias and articles formed thereby 失效
标题翻译：湿法蚀刻通孔和由此形成的制品的方法
公开(公告)号：US20060055048A1
公开(公告)日：2006-03-16
申请号：US10938247
申请日：2004-09-13
申请人： Kanakasabapathi Subramanian , Jeffrey Fortin , Wei-Cheng Tian
发明人： Kanakasabapathi Subramanian , Jeffrey Fortin , Wei-Cheng Tian
IPC分类号： H01L23/48 , H01L29/04 , H01L29/06
CPC分类号： H01L21/30617 , H01L21/76898 , H01L23/481 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： A method for forming smooth walled, prismatically-profiled through-wafer vias and articles formed through the method. An etch stop material is provided on a wafer, which may be a silicon wafer. A mask material is provided on the etch stop material and patterned in such a way as to lead to the formation of vias that have at least one pair of opposing side walls that run parallel to a plane in the wafer. A wet etchant, such as potassium hydroxide, is used to etch vias in the wafer. The use of a wet etchant leads to the formation of smooth side walls. This method allows an aspect ratio of height versus width of the vias of greater than 75 to 1.
摘要翻译：用于形成通过该方法形成的平滑壁，棱镜通孔晶片通孔和制品的方法。在晶片上提供蚀刻停止材料，晶片可以是<110>硅晶片。在蚀刻停止材料上提供掩模材料，并以这样的方式图案化，以便导致形成通孔，其具有平行于晶片中的111平面延伸的至少一对相对的侧壁。使用诸如氢氧化钾的湿蚀刻剂来蚀刻晶片中的通孔。使用湿蚀刻剂导致形成平滑的侧壁。该方法允许通孔的高度与宽度的长宽比大于75至1。

9. 发明申请

US20070143933A1 Method and apparatus for controlling a laundering process 有权
标题翻译：用于控制洗涤过程的方法和装置
公开(公告)号：US20070143933A1
公开(公告)日：2007-06-28
申请号：US11318297
申请日：2005-12-22
申请人： Radislav Potyrailo , Patrick Pastecki , Derek Watkins , Jeffrey Fortin , William Morris
发明人： Radislav Potyrailo , Patrick Pastecki , Derek Watkins , Jeffrey Fortin , William Morris
IPC分类号： D06F33/00 , D06F35/00
CPC分类号： D06F39/004
摘要： A method for controlling a laundering process includes determining a concentration of a detergent within a wash fluid during at least one cycle of an article laundering process, and dynamically adjusting at least one characteristic of the laundering process based at least in part upon the determined concentration of the detergent. An apparatus for controlling a laundering process includes a fluid chamber to contain a wash fluid, a sensor coupled to the fluid chamber to determine a detergent concentration within the wash fluid, and a controller coupled to the sensor and configured to dynamically adjust at least one characteristic of the laundering process based at least in part upon the determined detergent concentration.
摘要翻译：用于控制洗涤过程的方法包括在物品洗涤过程的至少一个循环期间确定洗涤液中的洗涤剂的浓度，并且至少部分地基于所确定的洗涤过程的浓度来动态地调节洗涤过程的至少一个特性洗涤剂。一种用于控制洗涤过程的装置包括：流体室，其容纳洗涤流体;耦合到流体室的传感器，以确定洗涤流体内的洗涤剂浓度;以及控制器，耦合到所述传感器并被配置为动态地调节至少一个特性的洗涤方法至少部分地基于所确定的洗涤剂浓度。

10. 发明申请

US20070000330A1 Pressure sensor 审中-公开
标题翻译：压力传感器
公开(公告)号：US20070000330A1
公开(公告)日：2007-01-04
申请号：US11516237
申请日：2006-09-06
申请人： Steven Tysoe , Mark D'Evelyn , Charles Becker , Abasifreke Ebong , Stephen Arthur , Steven LeBoeuf , Robert Wojnarowski , Samhita Dasgupta , Vinayak Tilak , Kanakasabapathi Subramanian , Jeffrey Fortin
发明人： Steven Tysoe , Mark D'Evelyn , Charles Becker , Abasifreke Ebong , Stephen Arthur , Steven LeBoeuf , Robert Wojnarowski , Samhita Dasgupta , Vinayak Tilak , Kanakasabapathi Subramanian , Jeffrey Fortin
IPC分类号： G01L7/00
CPC分类号： H01L21/31111
摘要： A pressure sensor is provided. The pressure sensor includes a multi-layer laminate comprising a substrate and a semiconductor layer, wherein the substrate comprises single crystal or quasi-single crystal aluminum oxide, and a portion of the substrate that is spaced from a peripheral edge is wet etched to form an inwardly facing sidewall that defines a volume; and a substrate to which the multi-layer laminate is secured. The volume is an enclosed volume further defined by a substrate surface.
摘要翻译：提供压力传感器。压力传感器包括多层层压体，其包括基底和半导体层，其中基底包括单晶或准单晶氧化铝，并且与周边边缘间隔开的部分基底被湿蚀刻以形成限定体积的面向内的侧壁; 以及固定有多层层叠体的基板。体积是由衬底表面进一步限定的封闭体积。

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