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1. 发明申请

WO2014111098A1 METHOD OF LITHOGRAPHICALLY TRANSFERRING A PATTERN ON A LIGHT SENSITIVE SURFACE AND ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：在光敏表面上的图案传输方法和微波投影曝光装置的照明系统
公开(公告)号：WO2014111098A1
公开(公告)日：2014-07-24
申请号：PCT/EP2013/000118
申请日：2013-01-17
申请人： CARL ZEISS SMT GMBH
发明人： SCHLESENER, Frank , SÄNGER, Ingo , DITTMANN, Olaf , GÖHNERMEIER, Aksel , PAZIDIS, Alexandra , SCHICKETANZ, Thomas , PATRA, Michael , DEGÜNTHER, Markus
IPC分类号： G03F7/20 , G02B27/10
CPC分类号： G03F7/70158 , G02B27/12 , G03F7/70208 , G03F7/70466
摘要： A method of lithographically transferring a pattern (18) on a light sensitive surface (22) in a multiple exposure process comprises the following steps: a) providing a mask (16; 216; 316) comprising a first mask pattern area (181; 2181; 3181) and a second mask pattern area (182; 2182; 3182); b) directing projection light on the mask, thereby producing on the light sensitive surface a first exposed pattern area (301; 2301; 3301), which is an image of the first mask pattern area (181; 2181; 3181), and a second exposed pattern area (302; 232; 3302), which is an image of the second mask pattern area (182; 2182; 3182). The projection light illuminating the first and second mask pattern area has different angular light distributions. c) repeating step b) using the same mask (16; 216; 316) so that an image of the first mask pattern area (181; 2181; 3181) is superimposed on the second exposure pattern area (302; 232; 3302).
摘要翻译：在多次曝光过程中在光敏表面（22）上光刻传输图案（18）的方法包括以下步骤：a）提供包括第一掩模图案区域（181; 2181）的掩模（16; 216; 316） ; 3181）和第二掩模图案区域（182; 2182; 3182）; b）将投影光引导到掩模上，从而在光敏表面上产生作为第一掩模图案区域（181; 2181; 3181）的图像的第一曝光图案区域（301; 2301; 3301），第二裸露图案区域曝光图案区域（302; 232; 3302），其是第二掩模图案区域（182; 2182; 3182）的图像。照射第一和第二掩模图案区域的投影光具有不同的角度光分布。 c）重复步骤b）使用相同的掩模（16; 216; 316），使得第一掩模图案区域（181; 2181; 3181）的图像叠加在第二曝光图案区域（302; 232; 3302）上。

2. 发明申请

WO2011154244A1 ILLUMINATION OPTICAL SYSTEM FOR EUV PROJECTION LITHOGRAPHY 审中-公开
标题翻译：用于EUV投影光刻的照明光学系统
公开(公告)号：WO2011154244A1
公开(公告)日：2011-12-15
申请号：PCT/EP2011/058418
申请日：2011-05-24
申请人： CARL ZEISS SMT GMBH , PATRA, Michael , DITTMANN, Olaf , KIRCH, Marc , ENDRES, Martin , WALTER, Markus , BIELING, Stig , DÖRN, Sebastian
发明人： PATRA, Michael , DITTMANN, Olaf , KIRCH, Marc , ENDRES, Martin , WALTER, Markus , BIELING, Stig , DÖRN, Sebastian
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70116 , G02B26/0833 , G03F7/70075
摘要： An illumination optical system for EUV projection lithography for illuminating an illumination field, in which an object field of a following imaging optical system can be arranged, has a first facet mirror with a plurality of first facets (7 1 ) for the reflective guidance of part bundles of a bundle of EUV illumination light (3). A downstream second facet mirror (10) with a plurality of second facets (11) is used for the reflective guidance of the part bundles (3 1 ; 3 1' ) reflected by the first facets (7 1 ), so object field illumination channels, to which, in each case, a first (7 1 ) and a second (11 1 ; 11 1' ) facet is allocated in each case, are predetermined by the first facets (7) and the second facets (11 1 ; 11 1' ) allocated by means of the reflected bundle guidance. The reflection faces of at least some of the first facets (7 1 ) are tiltable in each case between at least one illumination tilting position to guide the part bundle along an object field illumination channel (3 1 ; 3 1' ) in the direction of one of the second facets (11 1 ; 11 1' ) and at least one switch-off tilting position to guide the part bundle in the direction of a switch-off beam path (30) not impinging on the object field. The direction of the switch-off beam path (30) differs from the direction of the object field illumination channel (3 1 ; 3 1' ). In addition, methods for predetermining a set of switch-off tilting positions of the tiltable first facets (7) are disclosed. The result is an illumination optical system, with which a fine adjustment of illumination settings to be predetermined for the illumination of the illumination field is possible.
摘要翻译：一种用于EUV投影光刻的照明光学系统，用于照亮其中可以布置后续成像光学系统的物场的照明场，具有第一刻面镜，其具有多个第一刻面（71），用于部分束的反射引导的一束EUV照明灯（3）。具有多个第二小面（11）的下游第二分面反射镜（10）用于由第一面（71）反射的部分束（31; 31'）的反射引导，因此物场照明通道在每种情况下，在每种情况下分配第一（71）和第二（111; 111'）面是由第一面（7）和第二面（111; 111'）预先分配反映束指导。第一小面（71）中的至少一些的反射面在每种情况下可在至少一个照明倾斜位置之间倾斜，以沿着物场照明通道（31; 31'）沿着物体照明通道第二小面（111; 111'）和至少一个关闭倾斜位置，以沿着不撞击物体场的关闭光束路径（30）的方向引导部分束。关闭光束路径（30）的方向与物场照明通道（31; 31'）的方向不同。此外，公开了用于预先确定可倾斜第一面（7）的一组关闭倾斜位置的方法。结果是照明光学系统，可以对照明场的照明进行预定的照明设置的微调。

3. 发明申请

WO2011154227A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的光学系统
公开(公告)号：WO2011154227A1
公开(公告)日：2011-12-15
申请号：PCT/EP2011/058040
申请日：2011-05-18
申请人： CARL ZEISS SMT GMBH , SAENGER, Ingo , DITTMANN, Olaf , ZIMMERMANN, Joerg
发明人： SAENGER, Ingo , DITTMANN, Olaf , ZIMMERMANN, Joerg
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70566
摘要： The invention concerns an optical system of a microlithographic projection exposure apparatus comprising at least one mirror arrangement (200) having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement, and a polarisation-influencing optical arrangement (300, 800, 900) comprising a first lambda/2 plate (310, 810, 910) and at least one second lambda/2 plate (320, 820, 920).
摘要翻译：本发明涉及一种微光刻投影曝光装置的光学系统，该光学系统包括至少一个具有多个反射镜元件的反射镜装置（200），所述多个反射镜装置可互相独立地移位，以改变由反射镜装置反射的光的角分布，偏振影响光学布置（300,800,900）包括第一λ/ 2板（310,810,910）和至少一个第二λ/ 2板（320,820,920）。

4. 发明申请

WO2011147658A1 OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION APPARATUS 审中-公开
标题翻译：用于微晶投影装置的光学系统
公开(公告)号：WO2011147658A1
公开(公告)日：2011-12-01
申请号：PCT/EP2011/056830
申请日：2011-04-29
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , SCHARNWEBER, Ralf , DITTMANN, Olaf , GRUNER, Toralf , WEIß, Gundula , MAJOR, András G. , VOGT, Martin , DEGÜNTHER, Markus , WANGLER, Johannes , KORB, Thomas , WALDIS, Severin
发明人： SÄNGER, Ingo , SCHARNWEBER, Ralf , DITTMANN, Olaf , GRUNER, Toralf , WEIß, Gundula , MAJOR, András G. , VOGT, Martin , DEGÜNTHER, Markus , WANGLER, Johannes , KORB, Thomas , WALDIS, Severin
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70566
摘要： The invention concerns an optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement (200, 720, 730, 920) having a plurality of mirror elements (200a, 200b, 200c, 721, 722, 733, 731, 732, 733,...) which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement (200, 720, 730, 920), and at least one manipulator (300, 720, 910) which is arranged downstream of said mirror arrangement (200, 720, 730, 920) in the light propagation direction and has a raster arrangement of manipulator elements (301, 302,..., 600, 721, 722, 723,... ) in such a way that light incident on the manipulator (300, 600, 720, 910) in operation of the optical system is influenced differently in its polarisation state and/or in its intensity in dependence on the incidence location, wherein at least two mutually different illumination settings (420, 520) are adjustable by the variation in an angular distribution of the light reflected by the mirror arrangement (200), wherein said illumination settings (420, 520) differ from each other in that identical regions of a pupil plane of the illumination system (10) are illuminated with light of a different polarisation state.
摘要翻译：本发明涉及一种用于微光刻投影曝光装置和微光刻曝光方法的光学系统。在一个实施例中，用于微光刻投影曝光装置的光学系统包括具有多个反射镜元件（200a，200b，200c，721,722,733,731,732,920）的至少一个反射镜装置（200,720,730,920） 733，...），其可彼此独立地移位，以改变由反射镜装置（200,720,730,920）反射的光的角分布，以及至少一个操纵器（300,720,910），其是在光传播方向上布置在所述反射镜装置（200,720,730,920）的下游，并且具有光栅装置，其中所述操纵元件（301,302，...，600,721,722,723，...）入射在光学系统操作的操纵器（300,600,720,910）上的光的偏振状态和/或其强度根据入射位置受到不同的影响，其中至少两个相互不同照明设置（420,520）可通过角度dist的变化进行调节由反射镜装置（200）反射的光的贡献，其中所述照明设置（420,520）彼此不同，因为照明系统（10）的光瞳平面的相同区域被不同偏振态的光照射。

5. 发明授权

EP2580625B1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微光刻投影曝光装置光学系统
公开(公告)号：EP2580625B1
公开(公告)日：2016-08-03
申请号：EP11723898.0
申请日：2011-05-18
申请人： Carl Zeiss SMT GmbH
发明人： SAENGER, Ingo , DITTMANN, Olaf , ZIMMERMANN, Joerg
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70566

6. 发明公开

EP2580625A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微光刻投影曝光装置光学系统
公开(公告)号：EP2580625A1
公开(公告)日：2013-04-17
申请号：EP11723898.0
申请日：2011-05-18
申请人： Carl Zeiss SMT GmbH
发明人： SAENGER, Ingo , DITTMANN, Olaf , ZIMMERMANN, Joerg
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70566
摘要： The invention concerns an optical system of a microlithographic projection exposure apparatus comprising at least one mirror arrangement (200) having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement, and a polarisation-influencing optical arrangement (300, 800, 900) comprising a first lambda/2 plate (310, 810, 910) and at least one second lambda/2 plate (320, 820, 920).

7. 发明授权

EP2115522B1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 失效转让
标题翻译：微光刻投影曝光设备中的照明系统
公开(公告)号：EP2115522B1
公开(公告)日：2012-04-18
申请号：EP07820745.3
申请日：2007-10-01
申请人： Carl Zeiss SMT GmbH
发明人： FIOLKA, Damian , MAUL, Manfred , SCHWAB, Markus , SEITZ, Wolfgang , DITTMANN, Olaf
IPC分类号： G02B27/28 , G03F7/20
CPC分类号： G03F7/70191 , G02B3/0056 , G02B5/1876 , G02B27/283 , G02B27/285 , G02B27/286 , G03F7/70566
摘要： The invention relates to an illumination system of a microlithographic projection exposure apparatus comprising a depolariser (10, 500-900) which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser (10, 500-900) and a microlens array (20) which is arranged upstream of the light mixing system in the light propagation direction and in which a plurality of microlenses (20a, 20b,... ) are arranged with a periodicity, wherein the depolariser (10, 500-900) is such that a contribution afforded by interaction of the depolariser (10, 500-900) on the one hand with the periodicity of the microlens array (20) on the other hand, to a residual polarisation distribution occurring in a pupil plane (PP) arranged downstream of the microlens array (20) in the light propagation direction has a maximum degree of polarisation of not more than 5%.

8. 发明公开

EP2577399A1 OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION APPARATUS 审中-公开
标题翻译：光学系统的微光刻投影设备
公开(公告)号：EP2577399A1
公开(公告)日：2013-04-10
申请号：EP11720415.6
申请日：2011-04-29
申请人： Carl Zeiss SMT GmbH
发明人： SÄNGER, Ingo , SCHARNWEBER, Ralf , DITTMANN, Olaf , GRUNER, Toralf , WEIß, Gundula , MAJOR, András G. , VOGT, Martin , DEGÜNTHER, Markus , WANGLER, Johannes , KORB, Thomas , WALDIS, Severin
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70566
摘要： An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.

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