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1. 发明申请

WO2013135532A1 ILLUMINATION OPTICAL UNIT FOR A PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：投影曝光装置的照明光学单元
公开(公告)号：WO2013135532A1
公开(公告)日：2013-09-19
申请号：PCT/EP2013/054404
申请日：2013-03-05
申请人： CARL ZEISS SMT GMBH
发明人： SÄNGER, Ingo
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G02B26/0858 , G02B5/3066 , G02B19/0023 , G02B19/0095 , G03F7/70058 , G03F7/70075 , G03F7/70116 , G03F7/70191 , G03F7/70566
摘要： An illumination optical unit (25) for a projection exposure apparatus serves for guiding illumination light (16) toward an illumination field (5), in which a lithography mask (7) can be arranged. A first facet mirror (19) has a plurality of individual mirrors (26) that provide illumination channels for guiding illumination light partial beams (16j) toward the illumination field (5). The individual mirrors (26) each bear a multilayer reflective coating. A second facet mirror (20) is disposed downstream of the first facet mirror (19) in the beam path of the illumination light (16). A respective facet (35) of the second facet mirror (20) with at least one of the individual mirrors (26) of the first facet mirror (19) completes the illumination channel for guiding the illumination light partial beam (16j) toward the illumination field (5). The individual mirrors (26) are arranged such that the respective illumination light partial beam (16j) is incident on the individual mirror (26) with an angle (I) of incidence, whereby a plane of incidence is defined. The angle (I) of incidence is predefined such that a ratio Rp/Rs between a reflectivity Rp for illumination light (16) polarized in the plane of incidence and a reflectivity Rs for illumination light (16) polarized perpendicularly to the plane of incidence is less than 0.8. This results in an illumination optical unit in which the illumination is adaptable for obtaining an optimum resolution capability during the projection exposure.
摘要翻译：用于投影曝光装置的照明光学单元（25）用于将照明光（16）引导到可布置光刻掩模（7）的照明场（5）。第一刻面镜（19）具有多个单独的反射镜（26），其提供用于将照射光部分光束（16j）朝向照明场（5）引导的照明通道。各个反射镜（26）各自承载多层反射涂层。在照明光（16）的光束路径中，第一刻面镜（20）设置在第一刻面镜（19）的下游。具有第一分面反射镜（19）的各个反射镜（26）中的至少一个的第二分面反射镜（20）的相应小面（35）完成照明通道，用于将照明光部分光束（16j）引向照明字段（5）。各个反射镜（26）被布置成使得各个照明光部分光束（16j）以入射角（I）入射在各个反射镜（26）上，从而定义入射平面。入射角（I）被预先定义，使得在入射平面中偏振的照明光（16）的反射率Rp与垂直于入射平面偏振的照明光（16）的反射率Rs之间的比Rp / Rs为小于0.8。这导致照明光学单元，其中照明适于在投影曝光期间获得最佳分辨能力。

2. 发明申请

WO2013104744A1 POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：特别是在微波投影曝光装置中的极化影响光学布置
公开(公告)号：WO2013104744A1
公开(公告)日：2013-07-18
申请号：PCT/EP2013/050462
申请日：2013-01-11
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , SCHLESENER, Frank
发明人： SÄNGER, Ingo , SCHLESENER, Frank
IPC分类号： G02B5/30 , G03F7/20
CPC分类号： G03F7/7015 , G02B5/3083 , G02B27/281 , G03F7/70275 , G03F7/70308 , G03F7/70566 , G03F7/70891 , G03F7/70966
摘要： The invention relates to a polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus. According to an aspect of the disclosure, a polarization-influencing optical arrangement comprises a first retardation element (110, 310, 410), which comprises at least one first partial element (111, 311, 411) composed of optically positively uniaxial crystal material and at least one second partial element (112, 312, 412) composed of optically negatively uniaxial crystal material, and a second retardation element (120, 320, 420), which comprises at least one third partial element (121, 321, 421) composed of optically positively uniaxial crystal material and at least one fourth partial element (122, 322, 422) composed of optically negatively uniaxial crystal material, wherein in at least one configuration of the polarization-influencing optical arrangement (100, 300, 400) the polarization-influencing effect of the first retardation element (110, 310, 410) corresponds to the effect of a first lambda/2 plate having a first fast axis of the birefringence and the polarization-influencing effect of the second retardation element (120, 320, 420) corresponds to the effect of a second lambda/2 plate having a second fast axis of the birefringence, wherein the angle between the first fast axis and the second fast axis is 45°±5°.
摘要翻译：本发明涉及一种偏振影响光学装置，特别是在微光刻投影曝光装置中。根据本公开的一个方面，偏振影响光学装置包括第一延迟元件（110,310,410），其包括由光学正性单轴晶体材料构成的至少一个第一部分元件（111,311,411）和由光学负单轴晶体材料构成的至少一个第二部分元件（112,312,412）和包括至少一个第三部分元件（121,321,421）的第二延迟元件（120,320,420），所述第三部分元件的光学正单轴晶体材料和由光学负单轴晶体材料构成的至少一个第四部分元件（122,322,422），其中在偏振影响光学装置（100,300,400）的至少一个配置中，极化第一延迟元件（110,310,410）的影响对应于具有双折射的第一快轴和偏振影响的第一λ/ 2板的效果第二延迟元件（120,320,420）的效果对应于具有双折射的第二快轴的第二λ/ 2板的作用，其中第一快轴和第二快轴之间的角度为45°± 5°。

3. 发明申请

WO2014048828A1 OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MICROLITHOGRAPHIC EXPOSURE METHOD 审中-公开
标题翻译：微观投影曝光装置和微观曝光方法的光学系统
公开(公告)号：WO2014048828A1
公开(公告)日：2014-04-03
申请号：PCT/EP2013/069458
申请日：2013-09-19
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , SCHLESENER, Frank
发明人： SÄNGER, Ingo , SCHLESENER, Frank
IPC分类号： G03F7/20 , G02B27/28
CPC分类号： G03F7/70191 , G02B5/3075 , G02B17/002 , G02B26/0816 , G02B27/286 , G03F7/70116 , G03F7/70566
摘要： The invention relates to an optical system for a microlithographic projection exposure apparatus, and to a microlithographic exposure method. An optical system for a microlithographic projection exposure apparatus comprises at least one mirror arrangement (200, 400) having a plurality of mirror elements (200a, 200b, 200c,..., 400a, 400b, 400c,... ), wherein these mirror elements can be adjusted independently of one another for changing an angular distribution of the light reflected by the mirror arrangement, and a polarization-influencing optical arrangement (110, 210, 310, 320, 330) which is arranged downstream of the mirror arrangement (200, 400) in the light propagation direction, wherein the polarization-influencing optical arrangement (110, 210, 310, 320, 330) reflects a light beam incident on the arrangement (110, 210, 310, 320, 330) in at least two reflections, which do not occur in a common plane, for at least one angular distribution of the light reflected by the mirror arrangement (200, 400).
摘要翻译：本发明涉及一种用于微光刻投影曝光装置的光学系统和一种微光刻曝光方法。一种用于微光刻投影曝光装置的光学系统包括至少一个具有多个反射镜元件（200a，200b，200c，...，400a，400b，400c，...）的反射镜装置（200,400），其中这些镜子元件可以彼此独立地调节，以改变由反射镜装置反射的光的角度分布;以及偏振影响光学装置（110,210,310,320,330），其布置在反射镜装置的下游 200,140,320,330）在光传播方向上偏振影响光学布置（110,210,310,320,330）至少反射入射在所述布置（110,210,310,320,330）上的光束对于由反射镜装置（200,400）反射的光的至少一个角度分布，在公共平面中不发生两个反射。

4. 发明申请

WO2014040866A3 MIRROR 审中-公开
公开(公告)号：WO2014040866A3
公开(公告)日：2014-03-20
申请号：PCT/EP2013/067965
申请日：2013-08-30
申请人： CARL ZEISS SMT GMBH
发明人： SÄNGER, Ingo , RUOFF, Johannes , ENDRES, Martin , EISENMANN, Thomas
IPC分类号： G03F7/20
摘要： Mirror having a fragmented total surface area, wherein the fragmentation forms an aperiodic arrangement.

5. 发明申请

WO2013156335A1 OPTICAL SYSTEM, IN PARTICULAR OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：光学系统，特别是微波投影曝光装置
公开(公告)号：WO2013156335A1
公开(公告)日：2013-10-24
申请号：PCT/EP2013/057329
申请日：2013-04-08
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo
发明人： SÄNGER, Ingo
IPC分类号： G03F7/20 , G02B5/30 , G02B27/28
CPC分类号： G03F7/70191 , G02B5/3075 , G02B5/3083 , G02B27/286 , G03F7/70566 , G03F7/70966
摘要： The invention relates to an optical system, in particular of a microlithographic projection exposure apparatus, with an optical system axis (OA) and a polarization-influencing optical arrangement (100, 400, 500). According to one aspect, the polarization-influencing optical arrangement (100, 400, 500) comprises at least one polarization-influencing optical element (101, 401-404, 501-504), which has a monolithic design and linear birefringence, wherein the overall absolute value of the birefringence of all of the polarization-influencing optical elements (101, 401-404, 501-504) deviates by at most ±15% from the value lambda/2, wherein lambda is the working wavelength of the optical system, wherein the direction of the fast axis of this birefringence varies in a plane perpendicular to the optical system axis (OA) in the at least one polarization- influencing optical element (101, 401-404, 501-504), and wherein the distribution of the fast axis of the birefringence of the polarization-influencing optical element is brought about by radiation-induced defects, which are situated in at least one optically unused region (101b, 301b, 301c) of the element.
摘要翻译：本发明涉及具有光学系统轴（OA）和偏振影响光学装置（100,400,500）的光学系统，特别是微光刻投影曝光装置。根据一个方面，偏振影响光学装置（100,400,500）包括至少一个偏振影响光学元件（101,401-404,501-504），其具有单片设计和线性双折射，其中所有偏振影响光学元件（101,401-404,501-504）的双折射的总绝对值与λ/ 2值偏差至多±15％，其中λ是光学系统的工作波长，其中所述双折射的快轴的方向在至少一个偏振影响光学元件（101,401-404,501-504）中垂直于光学系统轴线（OA）的平面中变化，并且其中所述分布偏振影响光学元件的双折射的快轴通过位于元件的至少一个光学未使用区域（101b，301b，301c）中的辐射诱发缺陷引起。

6. 发明申请

WO2013156251A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND METHOD FOR ADJUSTING AN OPTICAL SYSTEM 审中-公开
标题翻译：微波投影曝光装置的光学系统和调整光学系统的方法
公开(公告)号：WO2013156251A1
公开(公告)日：2013-10-24
申请号：PCT/EP2013/056079
申请日：2013-03-22
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , PATRA, Michael , HENNERKES, Christoph , TRAUTER, Bastian
发明人： SÄNGER, Ingo , PATRA, Michael , HENNERKES, Christoph , TRAUTER, Bastian
IPC分类号： G03F7/20 , G02B26/08 , G02B27/28
CPC分类号： G03F7/70141 , G02B26/0833 , G02B27/286 , G03F7/70116 , G03F7/70566
摘要： The invention relates to an optical system of a microlithographic projection exposure apparatus, and to a method for adjusting an optical system. An optical system comprises a mirror arrangement (120, 200, 400, 500, 800, 900) having a plurality of mirror elements (120a, 120b, 120c,... ) which are adjustable independently of one another for the purpose of changing an angular distribution of the light reflected by the mirror arrangement, a polarization-influencing optical arrangement (110) having at least one polarization-influencing component (111, 112, 113, 310, 320, 411, 511), wherein, by displacing said polarization-influencing component, a degree of overlap between the polarization-influencing component and the mirror arrangement can be set in a variable manner, and a light coupling-out region (630, 730, 830, 930), which, for the purpose of taking account of a possible incorrect positioning of the polarization-influencing component, couples out light from the beam path of the optical system in such a way that no light passes into a pupil plane of the projection exposure apparatus from a partial region of the mirror arrangement during the operation of the optical system.
摘要翻译：本发明涉及一种微光刻投影曝光装置的光学系统以及调整光学系统的方法。光学系统包括具有多个镜子元件（120a，120b，120c，...）的反射镜装置（120,200,400,500,800,900），它们彼此独立地调节，以便改变由反射镜装置反射的光的角度分布，具有至少一个偏振影响分量（111,112,113,310,320,411,511）的偏振影响光学装置（110），其中，通过移位所述偏振可以以可变的方式设置偏振影响部件和反射镜装置之间的重叠程度，以及用于拍摄的光耦合输出区域（630,730,830,930）考虑到偏振影响分量的可能的不正确的定位，将光从光学系统的光束路径耦合出来，使得光不会从镜子的部分区域进入投影曝光装置的光瞳平面 t在光学系统的操作期间。

7. 发明申请

WO2013056981A1 MICROLITHOGRAPHIC EXPOSURE METHOD AND ILLUMINATION DEVICE 审中-公开
标题翻译：微观曝光方法和照明装置
公开(公告)号：WO2013056981A1
公开(公告)日：2013-04-25
申请号：PCT/EP2012/069621
申请日：2012-10-04
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , SINGER, Wolfgang , GÖHNERMEIER, Aksel , SCHLESENER, Frank
发明人： SÄNGER, Ingo , SINGER, Wolfgang , GÖHNERMEIER, Aksel , SCHLESENER, Frank
IPC分类号： G02F1/01 , G03F7/20
CPC分类号： G03F7/70116 , G02F1/0131 , G03F7/70566
摘要： The invention relates to a microlithographic exposure method and to an illumination device. In a microlithographic exposure method an illumination device illuminates an object plane of a projection lens, wherein the object plane is imaged into an image plane of the projection lens (20) by means of the projection lens (20), wherein the illumination device (10) comprises at least one retardation element by means of which, for light impinging on the retardation element, a temporally varying retardation dependent on the location of the impingement can be generated, wherein at least two light rays are directed through different regions of the retardation element, which differ from one another with regard to the retardation respectively generated by the retardation element, and wherein the retardation element is a photoelastic modulator (100).
摘要翻译：本发明涉及微光刻曝光方法和照明装置。在微光刻曝光方法中，照明装置照射投影透镜的物平面，其中通过投影透镜（20）将物平面成像到投影透镜（20）的像平面中，其中照明装置）包括至少一个延迟元件，通过该延迟元件，对于光照射在延迟元件上，可产生取决于冲击位置的随时间变化的延迟，其中至少两个光线被引导通过延迟元件的不同区域，其相对于由相位差元件分别产生的延迟而彼此不同，并且其中延迟元件是光弹性调制器（100）。

8. 发明申请

WO2014139815A1 OPTICAL ASSEMBLY FOR INCREASING THE ETENDUE 审中-公开
标题翻译：光大会增加信息
公开(公告)号：WO2014139815A1
公开(公告)日：2014-09-18
申请号：PCT/EP2014/054047
申请日：2014-03-03
申请人： CARL ZEISS SMT GMBH
发明人： SÄNGER, Ingo , HENNERKES, Christoph
IPC分类号： G03F7/20
CPC分类号： G03F7/70033 , G03F7/70075 , G03F7/70116 , G03F7/70191 , G21K1/065 , G21K1/067 , G21K1/12
摘要： An optical system has a light source (2) having an original etendue of less than 0.1 mm 2 for an illumination system (5) for projection lithography. An optical assembly (13) serves for simultaneously increasing the etendue of a used emission (12) of the light source (2). The optical assembly (13) is embodied such that an increase in the etendue by at least a factor of 10 results. A component of the optical assembly (13) that is impinged on is displaced relative to the light source (2) such that an impingement region of the emission (12) of the light source (2) on the optical component of the optical assembly (13) varies temporally.
摘要翻译：光学系统具有对于用于投影光刻的照明系统（5）具有小于0.1mm 2的原始流明度的光源（2）。光学组件（13）用于同时增加光源（2）的使用的发射（12）的光密度。光学组件（13）被实施为使得光密度增加至少10倍的结果。被照射的光学组件（13）的部件相对于光源（2）移位，使得光学组件的光学部件上的光源（2）的发射（12）的冲击区域 13）暂时变化。

9. 发明申请

WO2014114494A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的光学系统
公开(公告)号：WO2014114494A1
公开(公告)日：2014-07-31
申请号：PCT/EP2014/050261
申请日：2014-01-09
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , HENNERKES, Christoph
发明人： SÄNGER, Ingo , HENNERKES, Christoph
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/70566
摘要： The invention relates to an optical system of a microlithographic projection exposure apparatus, comprising at least one mirror arrangement (200) having a plurality of mirror elements which are adjustable independently of one another for the purpose of changing an angular distribution of the light reflected by the mirror arrangement, and a polarization-influencing optical element (110, 210-212, 310, 411, 412, 510, 610, 710), which generates,for impinging light having a constantly linear or a circular input polarization distribution, an output polarization distribution having a direction of polarization that varies continuously over the light beam cross section.
摘要翻译：本发明涉及一种微光刻投影曝光装置的光学系统，其包括至少一个反射镜装置（200），该反射镜装置具有多个可独立调节的反射镜元件，以便改变由反射镜布置和偏振影响光学元件（110,210-212,310,411,412,510,610,710），其产生用于入射具有恒定线性或圆形输入偏振分布的光，输出偏振分布具有在光束截面上连续变化的偏振方向。

10. 发明申请

WO2014111098A1 METHOD OF LITHOGRAPHICALLY TRANSFERRING A PATTERN ON A LIGHT SENSITIVE SURFACE AND ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：在光敏表面上的图案传输方法和微波投影曝光装置的照明系统
公开(公告)号：WO2014111098A1
公开(公告)日：2014-07-24
申请号：PCT/EP2013/000118
申请日：2013-01-17
申请人： CARL ZEISS SMT GMBH
发明人： SCHLESENER, Frank , SÄNGER, Ingo , DITTMANN, Olaf , GÖHNERMEIER, Aksel , PAZIDIS, Alexandra , SCHICKETANZ, Thomas , PATRA, Michael , DEGÜNTHER, Markus
IPC分类号： G03F7/20 , G02B27/10
CPC分类号： G03F7/70158 , G02B27/12 , G03F7/70208 , G03F7/70466
摘要： A method of lithographically transferring a pattern (18) on a light sensitive surface (22) in a multiple exposure process comprises the following steps: a) providing a mask (16; 216; 316) comprising a first mask pattern area (181; 2181; 3181) and a second mask pattern area (182; 2182; 3182); b) directing projection light on the mask, thereby producing on the light sensitive surface a first exposed pattern area (301; 2301; 3301), which is an image of the first mask pattern area (181; 2181; 3181), and a second exposed pattern area (302; 232; 3302), which is an image of the second mask pattern area (182; 2182; 3182). The projection light illuminating the first and second mask pattern area has different angular light distributions. c) repeating step b) using the same mask (16; 216; 316) so that an image of the first mask pattern area (181; 2181; 3181) is superimposed on the second exposure pattern area (302; 232; 3302).
摘要翻译：在多次曝光过程中在光敏表面（22）上光刻传输图案（18）的方法包括以下步骤：a）提供包括第一掩模图案区域（181; 2181）的掩模（16; 216; 316） ; 3181）和第二掩模图案区域（182; 2182; 3182）; b）将投影光引导到掩模上，从而在光敏表面上产生作为第一掩模图案区域（181; 2181; 3181）的图像的第一曝光图案区域（301; 2301; 3301），第二裸露图案区域曝光图案区域（302; 232; 3302），其是第二掩模图案区域（182; 2182; 3182）的图像。照射第一和第二掩模图案区域的投影光具有不同的角度光分布。 c）重复步骤b）使用相同的掩模（16; 216; 316），使得第一掩模图案区域（181; 2181; 3181）的图像叠加在第二曝光图案区域（302; 232; 3302）上。

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