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1. 发明申请

WO2022258280A1 VERFAHREN ZUR MINIMIERUNG VON SPANNUNGEN IN EINER SCHICHT 审中-公开
公开(公告)号：WO2022258280A1
公开(公告)日：2022-12-15
申请号：PCT/EP2022/062586
申请日：2022-05-10
申请人： CARL ZEISS SMT GMBH
发明人： SIX, Stephan , MUELLENDER, Stephan , SCHARNWEBER, Ralf
IPC分类号： G02B5/22
摘要： Die Erfindung betrifft ein Verfahren zur Minimierung von Spannungen in einer auf einem Substrat (2) für die Halbleitertechnologie aufgebrachten Schicht (3) durch Erwärmung der Schicht (3) mittels elektromagnetischer Strahlung (11) umfassend folgende Verfahrensschritte: - Aufbringen einer die elektromagnetische Strahlung (11) zumindest teilweise absorbierenden Absorptionsschicht (9) auf die Schicht (3). - Erwärmung der Absorptionsschicht (9) durch Bestrahlung mit der elektromagnetischen Strahlung (11). - Entfernen der Absorptionsschicht (11).

2. 发明申请

WO2011147658A1 OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION APPARATUS 审中-公开
标题翻译：用于微晶投影装置的光学系统
公开(公告)号：WO2011147658A1
公开(公告)日：2011-12-01
申请号：PCT/EP2011/056830
申请日：2011-04-29
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , SCHARNWEBER, Ralf , DITTMANN, Olaf , GRUNER, Toralf , WEIß, Gundula , MAJOR, András G. , VOGT, Martin , DEGÜNTHER, Markus , WANGLER, Johannes , KORB, Thomas , WALDIS, Severin
发明人： SÄNGER, Ingo , SCHARNWEBER, Ralf , DITTMANN, Olaf , GRUNER, Toralf , WEIß, Gundula , MAJOR, András G. , VOGT, Martin , DEGÜNTHER, Markus , WANGLER, Johannes , KORB, Thomas , WALDIS, Severin
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70566
摘要： The invention concerns an optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement (200, 720, 730, 920) having a plurality of mirror elements (200a, 200b, 200c, 721, 722, 733, 731, 732, 733,...) which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement (200, 720, 730, 920), and at least one manipulator (300, 720, 910) which is arranged downstream of said mirror arrangement (200, 720, 730, 920) in the light propagation direction and has a raster arrangement of manipulator elements (301, 302,..., 600, 721, 722, 723,... ) in such a way that light incident on the manipulator (300, 600, 720, 910) in operation of the optical system is influenced differently in its polarisation state and/or in its intensity in dependence on the incidence location, wherein at least two mutually different illumination settings (420, 520) are adjustable by the variation in an angular distribution of the light reflected by the mirror arrangement (200), wherein said illumination settings (420, 520) differ from each other in that identical regions of a pupil plane of the illumination system (10) are illuminated with light of a different polarisation state.
摘要翻译：本发明涉及一种用于微光刻投影曝光装置和微光刻曝光方法的光学系统。在一个实施例中，用于微光刻投影曝光装置的光学系统包括具有多个反射镜元件（200a，200b，200c，721,722,733,731,732,920）的至少一个反射镜装置（200,720,730,920） 733，...），其可彼此独立地移位，以改变由反射镜装置（200,720,730,920）反射的光的角分布，以及至少一个操纵器（300,720,910），其是在光传播方向上布置在所述反射镜装置（200,720,730,920）的下游，并且具有光栅装置，其中所述操纵元件（301,302，...，600,721,722,723，...）入射在光学系统操作的操纵器（300,600,720,910）上的光的偏振状态和/或其强度根据入射位置受到不同的影响，其中至少两个相互不同照明设置（420,520）可通过角度dist的变化进行调节由反射镜装置（200）反射的光的贡献，其中所述照明设置（420,520）彼此不同，因为照明系统（10）的光瞳平面的相同区域被不同偏振态的光照射。

3. 发明授权

EP1984788B1 OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：用于照明系统的光学积分器的微投影光刻曝光装置
公开(公告)号：EP1984788B1
公开(公告)日：2011-09-21
申请号：EP07703501.2
申请日：2007-02-16
申请人： Carl Zeiss SMT GmbH
发明人： WOLF, Oliver , SIEKMANN, Heiko , KALCHBRENNER, Eva , RENNON, Siegfried , WANGLER, Johannes , BRESAN, Andre , GERHARD, Michael , HAVERKAMP, Nils , SCHOLZ, Axel , SCHARNWEBER, Ralf , LAYH, Michael , BURKART, Stefan
IPC分类号： G03F7/20
CPC分类号： G03F7/70958 , G03F7/70075 , Y10T83/0304 , Y10T83/04
摘要： An optical integrator for producing a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus comprises a first array of elongated convexly curved first microlenses (112X) that are arranged side by side in a first plane and have first vertex lines (V). The optical integrator further comprises a second array of elongated convexly curved second microlenses (114X; 214X) that are arranged side by side in a second plane and have second vertex lines (V1 to V4). At least one second vertex line or a portion thereof does not coincide, in a projection along an optical axis of the optical integrator, with any one of the first vertex lines (V) or portions thereof.

4. 发明公开

EP2577399A1 OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION APPARATUS 审中-公开
标题翻译：光学系统的微光刻投影设备
公开(公告)号：EP2577399A1
公开(公告)日：2013-04-10
申请号：EP11720415.6
申请日：2011-04-29
申请人： Carl Zeiss SMT GmbH
发明人： SÄNGER, Ingo , SCHARNWEBER, Ralf , DITTMANN, Olaf , GRUNER, Toralf , WEIß, Gundula , MAJOR, András G. , VOGT, Martin , DEGÜNTHER, Markus , WANGLER, Johannes , KORB, Thomas , WALDIS, Severin
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70566
摘要： An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.

5. 发明授权

EP1984787B1 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 失效转让
标题翻译：照明系统，微型投影光刻曝光装置
公开(公告)号：EP1984787B1
公开(公告)日：2013-05-08
申请号：EP07703454.4
申请日：2007-02-14
申请人： Carl Zeiss SMT GmbH
发明人： WANGLER, Johannes , SIEKMANN, Heiko , WEIBLE, Kenneth , SCHARNWEBER, Ralf , MAUL, Manfred , DEGUENTHER, Markus , LAYH, Michael , SCHOLZ, Axel , SPENGLER, Uwe , VÖLKEL, Reinhard
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B3/0056 , G02B27/0911 , G03F7/70058 , G03F7/70075 , G03F7/70083 , G03F7/70158

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