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1. 发明申请

WO0038286A9 ArF LASER WITH LOW PULSE ENERGY AND HIGH REP RATE 审中-公开
标题翻译：具有低脉冲能量和高反射率的ArF激光
公开(公告)号：WO0038286A9
公开(公告)日：2002-08-29
申请号：PCT/US9929682
申请日：1999-12-13
申请人： CYMER INC , BESAUCELE HERVE A , HUEBER JEAN-MARC , ERSHOV ALEXANDER I , HOFMANN THOMAS , FLEUROV VLADIMIR B
发明人： BESAUCELE HERVE A , HUEBER JEAN-MARC , ERSHOV ALEXANDER I , HOFMANN THOMAS , FLEUROV VLADIMIR B
IPC分类号： G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/223 , H01S3/225 , H01S3/22
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/223 , H01S3/225
摘要： A reliable modular production quality ArF excimer laser capable of producing laser pulses at repetition rates in the range of 3,000 to 4,000 Hz or greater with pulse repetition energies in the range of about 2mJ to 5mJ or greater with a full width half maximum bandwidth of about 0.4 pm or less and dose stability of less than 0.4 percent. Using this laser as an illumination source, stepper or scanner equipment can produce integrated circuit resolution of 0.10 mu m (100nm) or less, replaceable modules include a laser chamber (80); a modular pulse power system; and a line narrowing module (86) for a given laser power output. The higher repetition rate provides two important advantages. The lower per pulse energy means less optical damage and the larger number of pulses for a specified illumination dose means better dose stability.
摘要翻译：一种可靠的模块化生产质量的ArF准分子激光器，其能够以3,000至4,000Hz或更大的重复频率产生激光脉冲，脉冲重复能量在约2mJ至5mJ或更大的范围内，全宽度半最大带宽约为0.4 pm以下，剂量稳定性小于0.4％。使用该激光器作为照明源，步进器或扫描仪设备可以产生0.10μm（100nm）或更小的集成电路分辨率，可更换模块包括激光室（80）; 模块式脉冲电源系统; 以及用于给定激光功率输出的线窄模块（86）。较高的重复率提供了两个重要的优点。较低的每脉冲能量意味着更少的光学损伤，并且指定照射剂量的较大数量的脉冲表示更好的剂量稳定性。

2. 发明申请

WO0038286A8 ArF LASER WITH LOW PULSE ENERGY AND HIGH REP RATE 审中-公开
标题翻译：具有低脉冲能量和高反射率的ArF激光
公开(公告)号：WO0038286A8
公开(公告)日：2001-07-12
申请号：PCT/US9929682
申请日：1999-12-13
申请人： CYMER INC , BESAUCELE HERVE A , HUEBER JEAN MARC , ERSHOV ALEXANDER I , HOFMANN THOMAS , FLEUROV VLADIMIR B
发明人： BESAUCELE HERVE A , HUEBER JEAN-MARC , ERSHOV ALEXANDER I , HOFMANN THOMAS , FLEUROV VLADIMIR B
IPC分类号： G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/223 , H01S3/225 , H01S3/22
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/223 , H01S3/225
摘要： A reliable modular production quality ArF excimer laser capable of producing laser pulses at repetition rates in the range of 3,000 to 4,000 Hz or greater with pulse repetition energies in the range of about 2mJ to 5mJ or greater with a full width half maximum bandwidth of about 0.4 pm or less and dose stability of less than 0.4 percent. Using this laser as an illumination source, stepper or scanner equipment can produce integrated circuit resolution of 0.10 mu m (100nm) or less, replaceable modules include a laser chamber (80); a modular pulse power system; and a line narrowing module (86) for a given laser power output. The higher repetition rate provides two important advantages. The lower per pulse energy means less optical damage and the larger number of pulses for a specified illumination dose means better dose stability.
摘要翻译：一种可靠的模块化生产质量的ArF准分子激光器，其能够以3,000至4,000Hz或更大的重复频率产生激光脉冲，脉冲重复能量在约2mJ至5mJ或更大的范围内，全宽度半最大带宽约为0.4 pm以下，剂量稳定性小于0.4％。使用该激光器作为照明源，步进器或扫描仪设备可以产生0.10μm（100nm）或更小的集成电路分辨率，可更换模块包括激光室（80）; 模块式脉冲电源系统; 以及用于给定激光功率输出的线窄模块（86）。较高的重复率提供了两个重要的优点。较低的每脉冲能量意味着更少的光学损伤，并且指定照射剂量的较大数量的脉冲表示更好的剂量稳定性。

3. 发明申请

WO2007143145A2 HIGH POWER EXCIMER LASER WITH A PULSE STRETCHER 审中-公开
标题翻译：高功率激光器与脉冲拉伸器
公开(公告)号：WO2007143145A2
公开(公告)日：2007-12-13
申请号：PCT/US2007013032
申请日：2007-05-31
申请人： CYMER INC , ERSHOV ALEXANDER I , FERRELL JAMES J , HOFMANN THOMAS , REILEY DANIEL J , REMEN CHRIS R
发明人： ERSHOV ALEXANDER I , FERRELL JAMES J , HOFMANN THOMAS , REILEY DANIEL J , REMEN CHRIS R
IPC分类号： H01S3/22
CPC分类号： H01S3/225 , H01S3/0057 , H01S3/03 , H01S3/034
摘要： An apparatus and method is disclosed which may comprise a high power excimer or molecular fluorine gas discharge laser DUV light source system which may comprise: a pulse stretcher which may comprise: an optical delay path mirror, an optical delay path mirror gas purging assembly which may comprise: a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror may comprise a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system may comprise: a purging gas supply line; a purging gas distributing and directing mechanism which may direct purging gas across the face of the respective optical delay path mirror.
摘要翻译：公开了一种装置和方法，其可以包括高功率准分子或分子氟气体放电激光DUV光源系统，其可以包括：脉冲展宽器，其可以包括：光学延迟路径反射镜，光学延迟路径镜气体清洗组件，其可以包括：吹扫气体供应系统，其引导净化气体穿过光学延迟线反射镜的表面。光学延迟路径镜可以包括多个光学延迟路径镜; 净化气体供应系统可以引导净化气体穿过多个光学延迟线反射镜中的每一个的表面。净化气体供应系统可以包括：净化气体供应管线; 吹扫气体分配和引导机构，其可以将吹扫气体引导通过相应的光学延迟路径反射镜的表面。

4. 发明申请

WO2007126693A3 CONFOCAL PULSE STRETCHER 审中-公开
标题翻译： CONFOCAL脉冲拉伸器
公开(公告)号：WO2007126693A3
公开(公告)日：2008-11-27
申请号：PCT/US2007007201
申请日：2007-03-23
申请人： CYMER INC , DAS PALASH P , HOFMANN THOMAS , LEI GANG
发明人： DAS PALASH P , HOFMANN THOMAS , LEI GANG
IPC分类号： H01S3/22
CPC分类号： H01S3/0057 , G03F7/7055 , H01S3/225
摘要： A gas discharge laser system producing a laser output pulse and a method of operating such a system is disclosed which may comprise a pulse stretcher which may comprise a laser output pulse optical delay initiating optic directing a portion of the laser output pulse along a laser system output pulse optical axis and diverting a portion of the output pulse into an optical delay having an optical delay path and which may comprise a plurality of confocal resonators in series aligned to deliver an output of the optical delay to the laser output pulse optical delay initiating optic; an optical axis alignment mechanism comprising an radial mirror positioning mechanism operable to position the output of the optical delay to the align with the portion of the laser output pulse transmitted along the optical axis of the portion of the laser system output pulse transmitted by the laser output pulse optical delay initiating optic.
摘要翻译：公开了一种产生激光输出脉冲的气体放电激光器系统和这种系统的操作方法，其可以包括脉冲展宽器，其可以包括激光输出脉冲光学延迟启动光学器件，以将激光输出脉冲的一部分沿激光系统输出脉冲光轴并将输出脉冲的一部分转移成具有光学延迟路径的光学延迟，并且可以包括串联对准的多个共焦谐振器，以将光学延迟的输出传递到激光输出脉冲光学延迟启动光学器件; 光轴对准机构，其包括径向镜定位机构，其可操作以将光学延迟的输出定位成与激光输出脉冲的沿激光输出脉冲发射的激光系统输出脉冲部分的光轴传输的部分对准脉冲光学延迟启动光学器件。

5. 发明申请

WO2007143144A9 DEVICE AND METHOD TO CREATE A LOW DIVERGENCE, HIGH POWER LASER BEAM FOR MATERIAL PROCESSING APPLICATIONS 审中-公开
标题翻译：用于材料加工应用的低功率激光束的低成本设备和方法
公开(公告)号：WO2007143144A9
公开(公告)日：2008-02-07
申请号：PCT/US2007013029
申请日：2007-05-31
申请人： CYMER INC , HOFMANN THOMAS
发明人： HOFMANN THOMAS
IPC分类号： B23K26/00
CPC分类号： B23K26/03 , B23K26/034 , B23K26/0622 , B23K26/0665 , B23K26/0738 , B23K26/0853 , B23K26/40 , B23K2201/34 , B23K2201/40 , B23K2203/50 , C30B13/24 , C30B29/06
摘要： A thin beam laser crystallization apparatus for selectively melting a film deposited on a substrate is disclosed having a laser source producing a pulsed laser output beam, the source having an oscillator comprising a convex reflector and a piano output coupler; and an optical arrangement focusing the beam in a first axis and spatially expanding the beam in a second axis to produce a line beam for interaction with the film.
摘要翻译：公开了一种用于选择性地熔化沉积在基板上的薄膜的薄射束激光结晶装置，其具有产生脉冲激光输出光束的激光源，该源具有包括凸反射器和钢琴输出耦合器的振荡器; 以及光学布置，将光束聚焦在第一轴线上，并且在第二轴线上空间地扩展光束以产生用于与胶片相互作用的线束。

6. 发明申请

WO2007145791A2 DEVICE AND METHOD TO STABILIZE BEAM SHAPE AND SYMMETRY FOR HIGH ENERGY PULSED LASER APPLICATIONS 审中-公开
标题翻译：用于稳定高能激光激光应用的光束形状和对称性的装置和方法
公开(公告)号：WO2007145791A2
公开(公告)日：2007-12-21
申请号：PCT/US2007012389
申请日：2007-05-22
申请人： CYMER INC , HOFMANN THOMAS
发明人： HOFMANN THOMAS
IPC分类号： G02B27/00 , G02B1/10
CPC分类号： G02B19/0095 , G02B19/0028 , G02B19/0052 , G02B19/0061 , G02B27/0977 , H01S3/005 , H01S3/225
摘要： A beam mixer for increasing intensity symmetry along a selected axis of a beam (wherein the beam extends from a first edge to a second edge along the axis) is disclosed and may include a plurality of mirrors establishing a spatially inverting path. For the beam mixer, the inverting path may have a beginning and an end and may be characterized in that a part of the beam near the first beam edge at the beginning of the path translates to the second beam edge at the end of the path. For this aspect, the beam mixer may further include an optic dividing the beam into first and second beam portions, the optic placing the first portion onto the inverting path and recombining the first and second portions onto a common path after the first portion has traveled along the inverting path thereby mixing the beam.
摘要翻译：公开了一种用于沿着选定的光束轴（其中光束沿着轴从第一边缘延伸到第二边缘）增加强度对称性的束混合器，并且可以包括建立空间反转路径的多个反射镜。对于光束混合器，反转路径可以具有开始和结束，并且其特征在于，在路径开始处靠近第一波束边缘的波束的一部分平移到路径末端处的第二波束边缘。对于该方面，光束混合器还可以包括将光束分成第一和第二光束部分的光学部件，光学元件将第一部分放置在反转路径上，并且在第一部分沿着沿着第一部分行进之后将第一部分和第二部分复合到公共路径上反转路径由此混合光束。

7. 发明申请

WO2007143144A3 DEVICE AND METHOD TO CREATE A LOW DIVERGENCE, HIGH POWER LASER BEAM FOR MATERIAL PROCESSING APPLICATIONS 审中-公开
标题翻译：设备和方法创造一个低发散，高功率激光束材料加工应用程序
公开(公告)号：WO2007143144A3
公开(公告)日：2008-10-23
申请号：PCT/US2007013029
申请日：2007-05-31
申请人： CYMER INC , HOFMANN THOMAS
发明人： HOFMANN THOMAS
IPC分类号： B23K26/08
CPC分类号： B23K26/03 , B23K26/034 , B23K26/0622 , B23K26/0665 , B23K26/0738 , B23K26/0853 , B23K26/40 , B23K2201/34 , B23K2201/40 , B23K2203/50 , C30B13/24 , C30B29/06
摘要： A thin beam laser crystallization apparatus for selectively melting a film deposited on a substrate is disclosed having a laser source producing a pulsed laser output beam, the source having an oscillator comprising a convex reflector and a piano output coupler; and an optical arrangement focusing the beam in a first axis and spatially expanding the beam in a second axis to produce a line beam for interaction with the film.
摘要翻译：公开了一种用于选择性熔化沉积在衬底上的薄膜的薄光束激光结晶设备，其具有产生脉冲激光输出光束的激光源，该光源具有包括凸面反射镜和钢琴输出耦合器的振荡器; 以及将光束聚焦在第一轴上并且使光束在第二轴上空间扩张以产生用于与薄膜相互作用的线光束的光学布置。

8. 发明申请

WO2004081503A3 DISCHARGE PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：排放生产等离子体光源
公开(公告)号：WO2004081503A3
公开(公告)日：2005-10-06
申请号：PCT/US2004006551
申请日：2004-03-03
申请人： CYMER INC , PARTLO WILLIAM N , BLUMENSTOCK GERRY M , BOWERING NORBERT , BRUZZONE KENT A , COBB DENNIS W , DYER TIMOTHY S , DUNLOP JOHN , FOMENKOV IGOR V , HYSHAM JAMES CHRISTOPHER , OLIVER ROGER I , PALENSCHAT FREDERICK A , PAN XIAOJIANG J , RETTIG CURTIS L , SIMMONS RODNEY S , WALKER JOHN , WEBB KYLE R , HOFMANN THOMAS , KHODYKIN OLEH
发明人： PARTLO WILLIAM N , BLUMENSTOCK GERRY M , BOWERING NORBERT , BRUZZONE KENT A , COBB DENNIS W , DYER TIMOTHY S , DUNLOP JOHN , FOMENKOV IGOR V , HYSHAM JAMES CHRISTOPHER , OLIVER ROGER I , PALENSCHAT FREDERICK A , PAN XIAOJIANG J , RETTIG CURTIS L , SIMMONS RODNEY S , WALKER JOHN , WEBB KYLE R , HOFMANN THOMAS , KHODYKIN OLEH
IPC分类号： G01J20060101 , G03F7/20 , H01J1/52 , H01S3/00 , H01S3/225 , H05G2/00 , H05H1/06
CPC分类号： H01S3/005 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70908 , G03F7/70916 , H01S3/225 , H05G2/003 , H05G2/005 , H05H1/06
摘要： An EUV source (20) includes a debris mitigation apparatus (60) employing a metal halogen gas producing a metal halide from debris exiting the plasma, a debris shield (36) having a plurality of curvilinear shield members (102) having inner and outer surface connected by light passages (104) and electrodes (28,88) for providing a discharged plasma (32) in a chamber (22).
摘要翻译： EUV源（20）包括使用从离开等离子体的碎屑产生金属卤化物的金属卤素气体的碎片减缓装置（60），具有多个曲线形屏蔽构件（102）的碎片屏蔽（36），其具有内表面和外表面通过光通道（104）和用于在腔室（22）中提供排出的等离子体（32））的电极（28,88）连接。

9. 发明申请

WO2006127891A3 SYSTEMS AND METHODS INTERACTING BETWEEN A LASER AND FILM DEPOSITED 审中-公开
标题翻译：激光和电影之间的相互影响的系统和方法
公开(公告)号：WO2006127891A3
公开(公告)日：2009-04-16
申请号：PCT/US2006020223
申请日：2006-05-25
申请人： CYMER INC , DAS PALASH P , HOFMANN THOMAS , DAVIS JESSE D , SMITH SCOT T , PARTLO WILLIAM N
发明人： DAS PALASH P , HOFMANN THOMAS , DAVIS JESSE D , SMITH SCOT T , PARTLO WILLIAM N
IPC分类号： H01L29/04 , H01S3/08
CPC分类号： B23K26/04 , B23K26/0622 , B23K26/0738
摘要： A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam.
摘要翻译：公开了一种激光结晶装置和方法，用于选择性地熔融沉积在基底上的诸如非晶硅的膜。该装置可以包括用于产生用于熔化膜的拉伸激光脉冲的光学系统。在本发明实施例的另一方面，提供一种用于拉伸激光脉冲的系统和方法。在另一方面，提供了一种系统，用于在预定范围内沿着光束路径的位置维持脉冲激光束的发散（拉伸或未拉伸）。在另一方面，可以提供一种系统，用于在膜与成形线束的相互作用期间将膜处的能量密度保持在预定范围内。

10. 发明专利

JP2008022026A Reliable, modular, production-quality narrow-band high repetition-rate f2 laser 审中-公开
标题翻译：可靠，模块化，生产质量窄带高反射率F2激光
公开(公告)号：JP2008022026A
公开(公告)日：2008-01-31
申请号：JP2007236405
申请日：2007-09-12
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： HOFMANN THOMAS , HUEBER JEAN-MARC , DAS PALASH P , ISHIHARA TOSHIHIKO , THOMAS P DAFFY , JOHN T MELCHIOR , BESAUCELE HERVE A , MORTON RICHARD G , NESS RICHARD M , NEWMAN PETER C , PARTLO WILLIAM N , ROTHWEIL DANIEL A , SANDSTROM RICHARD L
IPC分类号： H01S3/03 , H01S3/097 , G03F7/20 , H01S3/137 , H01S3/225
CPC分类号： G03F7/70575
摘要： PROBLEM TO BE SOLVED: To provide a reliable, modular, production-quality narrow-band high repetition-rate F 2 laser. SOLUTION: A reliable, modular, production-quality excimer laser capable of producing 10 mJ laser pulses in the range of 1,000 Hz to 2,000 Hz or greater is provided. Replaceable modules include a laser chamber, a pulse power system including three modules, an optical resonator comprised of a line narrowing module and an output coupler module, a wavemeter module, an electrical control module, a cooling water module, and a gas control module. COPYRIGHT: (C)2008,JPO&INPIT

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