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1. 发明申请

WO2022135953A1 OPTIMIZATION OF LITHOGRAPHIC PROCESS BASED ON BANDWIDTH AND SPECKLE 审中-公开
公开(公告)号：WO2022135953A1
公开(公告)日：2022-06-30
申请号：PCT/EP2021/084967
申请日：2021-12-09
申请人： ASML NETHERLANDS B.V. , CYMER, LLC.
发明人： CONLEY, Willard, Earl , HSU, Duan-Fu, Stephen , THORNES, Joshua, Jon , BASELMANS, Johannes, Jacobus, Matheus
IPC分类号： G03F7/20
摘要： A method for improving a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus. The method includes computing a multi-variable cost function that is a function of: (i) a plurality of design variables that affect characteristics of the lithographic process and (ii) a radiation bandwidth of a radiation source of the lithographic apparatus; and reconfiguring one or more of the characteristics (e.g., EPE, image contrast, resist, etc.) of the lithographic process by adjusting one or more of the design variables (e.g., source, mask layout, bandwidth, etc.) until a termination condition is satisfied. The termination condition includes a speckle characteristic (e.g., a speckle contrast) maintained within a speckle specification associated with the radiation source and also maintaining an image contrast associated with the lithographic process within a desired range. The speckle characteristic being a function of the radiation bandwidth.

2. 发明申请

WO2020078844A1 METHOD TO CREATE THE IDEAL SOURCE SPECTRA WITH SOURCE AND MASK OPTIMIZATION 审中-公开
公开(公告)号：WO2020078844A1
公开(公告)日：2020-04-23
申请号：PCT/EP2019/077587
申请日：2019-10-11
申请人： ASML NETHERLANDS B.V. , CYMER, LLC
发明人： CONLEY, Willard, Earl , THORNES, Joshua, Jon , HSU, Duan-Fu, Stephen , RECHTSTEINER, Gregory, Allen
IPC分类号： G03F7/20
摘要： Systems, methods, and computer programs for increasing a depth of focus for a lithography system are disclosed. In one aspect, a method includes providing an optical spectrum, a mask pattern, and a pupil design, that together are configured to provide the lithography system with a depth of focus. The method also includes iteratively varying the optical spectrum and an assist feature in the mask pattern to provide a modified optical spectrum and a modified mask pattern that increases the depth of focus. The method further includes configuring a component of the lithography system based on the modified optical spectrum and the modified mask pattern that increases the depth of focus.

3. 发明申请

WO2020177979A1 METHOD AND APPARATUS FOR IMAGING USING NARROWED BANDWIDTH 审中-公开
公开(公告)号：WO2020177979A1
公开(公告)日：2020-09-10
申请号：PCT/EP2020/053252
申请日：2020-02-10
申请人： ASML NETHERLANDS B.V. , CYMER, LLC
发明人： CONLEY, Willard, Earl , THORNES, Joshua, Jon , HSU, Duan-Fu, Stephen
IPC分类号： G03F7/20
摘要： Systems, methods, and computer programs for increasing a contrast for a lithography system are disclosed. In one aspect, a method includes method of optimizing a method for imaging a feature on a substrate using a photolithography system, the method including obtaining an optical spectrum of a light beam for the imaging, wherein the light beam includes pulses having a plurality of different wavelengths, narrowing the optical spectrum of the pulses of the light beam for the imaging to improve a quality metric of the imaging.

4. 发明申请

WO2017112060A1 ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES 审中-公开
标题翻译：重复频率相关性能变量的在线标定
公开(公告)号：WO2017112060A1
公开(公告)日：2017-06-29
申请号：PCT/US2016/057552
申请日：2016-10-18
申请人： CYMER, LLC , ASML NETHERLANDS B.V.
发明人： THORNES, Joshua, Jon , AGGARWAL, Tanuj , O'BRIEN, Kevin, Michael , EVERTS, Frank , GODFRIED, Herman, Phillip , BURDT, Russell, Allen
IPC分类号： G01J1/42 , G01J3/28 , G03F7/20 , H01S3/13
CPC分类号： G01J11/00 , G01J1/0228 , G01J1/0448 , G01J1/4257 , G03F7/70041 , G03F7/70516 , G03F7/7055 , G03F7/70558 , G03F7/70575 , H01S3/0014 , H01S3/10046 , H01S3/10069
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
摘要翻译：公开了作为激光器工作重复频率的函数的在线校准激光器性能。校准可以是周期性的，并且在非暴露期间的计划期间进行。可以使用各种标准来自动选择导致可靠规格性能的重复率。重复频率的可靠值然后被提供给扫描仪，因为允许的值和激光/扫描仪系统然后被允许使用那些允许的重复率。

5. 发明申请

WO2017050506A1 LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：WO2017050506A1
公开(公告)日：2017-03-30
申请号：PCT/EP2016/069879
申请日：2016-08-23
申请人： ASML NETHERLANDS B.V. , CYMER INC.
发明人： EVERTS, Frank , OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria , GODFRIED, Herman, Philip , THORNES, Joshua, Jon , O'BRIEN, Kevin, Michael , SAANEN, Leon, Pieter, Paul , AGGARWAL, Tanuj
IPC分类号： G03F7/20
CPC分类号： G03F7/70558 , G03F7/70066 , G03F7/70525
摘要： A method of controlling output of a radiation source, the method including: periodically monitoring an output energy of the radiation source; determining a difference between a reference energy signal and the monitored output energy; determining a feedback value; determining a desired output energy of the radiation source for a subsequent time period; and controlling an input parameter of the radiation source in dependence on the determined desired output energy during the subsequent time period. If the magnitude of the determined difference between the monitored output energy of the radiation source and the reference energy signal exceeds a threshold value: the determined difference does not contribute to the feedback value; and the determined difference is spread over the subsequent time period according to a reference energy signal adjustment profile and the reference energy signal adjustment profile is added to the reference energy signal for the subsequent time period.
摘要翻译：一种控制辐射源输出的方法，所述方法包括：周期性地监测辐射源的输出能量; 确定参考能量信号和所监视的输出能量之间的差异; 确定反馈值; 在随后的时间段内确定辐射源的期望输出能量; 以及根据所确定的期望的输出能量在随后的时间段期间控制辐射源的输入参数。如果所监测的辐射源的输出能量与参考能量信号之间所确定的差值的大小超过阈值：所确定的差值对反馈值无贡献; 并且根据参考能量信号调整曲线将确定的差分扩展到随后的时间段，并且将参考能量信号调整曲线添加到随后时间段的参考能量信号。

6. 发明申请

WO2016191114A1 SPECTRAL FEATURE METROLOGY OF A PULSED LIGHT BEAM 审中-公开
标题翻译：脉冲光束的光谱特征量纲
公开(公告)号：WO2016191114A1
公开(公告)日：2016-12-01
申请号：PCT/US2016/032214
申请日：2016-05-12
申请人： CYMER, LLC (A NEVADA COMPANY)
发明人： THORNES, Joshua, Jon
IPC分类号： G01J1/42 , G01J3/28 , G01J11/00 , G03F7/20
CPC分类号： G01J3/26 , G01J3/027 , G01J3/18 , G01J3/2803 , G01J9/00
摘要： A metrology system includes an optical frequency separation apparatus in the path of the pulsed light beam and configured to interact with the pulsed light beam and output a plurality of spatial components that correspond to the spectral components of the pulsed light beam; a plurality of sensing regions that receive and sense the output spatial components; and a control system connected to an output of each sensing region. The control system is configured to: measure, for each sensing region output; a property of the output spatial components from the optical frequency separation apparatus for one or more poises; analyze the measured properties including averaging the measured properties to calculate an estimate of the spectral feature of the pulsed light beam; and determine whether tire estimated spectral feature of the pulsed light beam is within an acceptable range of values of spectral features.
摘要翻译：计量系统包括在脉冲光束的路径中的光学频率分离装置，并被配置为与脉冲光束相互作用并输出与脉冲光束的光谱分量相对应的多个空间分量; 多个感测区域，其接收和感测输出空间分量; 以及连接到每个感测区域的输出的控制系统。控制系统被配置为：对于每个感测区域输出进行测量; 来自光频分离装置的输出空间分量的性质用于一个或多个泊; 分析测量的性质，包括对测量的性质进行平均，以计算脉冲光束的光谱特征的估计; 并且确定脉冲光束的轮胎估计光谱特征是否在光谱特征值的可接受范围内。

7. 发明申请

WO2019190700A1 SPECTRAL FEATURE SELECTION AND PULSE TIMING CONTROL OF A PULSED LIGHT BEAM 审中-公开
公开(公告)号：WO2019190700A1
公开(公告)日：2019-10-03
申请号：PCT/US2019/020415
申请日：2019-03-01
申请人： CYMER, LLC
发明人： O'BRIEN, Kevin, Michael , DUFFEY, Thomas, Patrick , THORNES, Joshua, Jon
IPC分类号： H01S3/10
摘要： A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.

8. 发明申请

WO2018217313A1 MONITORING SYSTEM FOR AN OPTICAL LITHOGRAPHY SYSTEM 审中-公开
公开(公告)号：WO2018217313A1
公开(公告)日：2018-11-29
申请号：PCT/US2018/025751
申请日：2018-04-02
申请人： CYMER, LLC
发明人： DOROBANTU, Andrei , GRAHAM, Matthew, Ryan , THORNES, Joshua, Jon , O'BRIEN, Kevin, Michael
IPC分类号： G03F7/20 , G03B27/54 , G03C5/00
摘要： An optical lithography system is monitored. information is. received from the optical lithography system; a rule is accessed, the rule feeing associated with one or more of an. event in the optical lithography system and an amount of time; a module stored in a library of modules is identified based on the accessed rule; whether a particular condition exists in. the optical lithography system is determined using the identified module and the information received from the optical lithography system; and if the particular condition exists, a command signal is generated based on one or more characteristics of the particular condition and pro vided to an optical source of the optical lithography system. The command signal is based on the determined particular condition, and the command signal is sufficient to change one or more operating parameters of the optical source.

9. 发明申请

WO2022225647A1 FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS 审中-公开
公开(公告)号：WO2022225647A1
公开(公告)日：2022-10-27
申请号：PCT/US2022/022022
申请日：2022-03-25
申请人： CYMER, LLC
发明人： ZHAO, Yingbo , THORNES, Joshua, Jon
IPC分类号： G03F7/20
摘要： A method for controlling an energy of a pulsed light beam is described. The method includes: producing a plurality of intermingled sets of pulses of the light beam from an optical source, each set of light beam pulses associated with a distinct primary wavelength and a distinct target energy; receiving a measurement of an energy of a prior pulse of the light beam; determining an energy error including: comparing the measured energy of the prior light beam pulse to a particular target energy associated with a particular set of light beam pulses if the prior light beam pulse is in the particular set of light beam pulses; and adjusting at least one component of the optical source to thereby adjust, based on the determined energy error, the energy of a subsequent pulse in the particular set of light beam pulses.

10. 发明申请

WO2018044583A1 ADJUSTING AN AMOUNT OF COHERENCE OF A LIGHT BEAM 审中-公开
标题翻译：调整一束光束的连贯性
公开(公告)号：WO2018044583A1
公开(公告)日：2018-03-08
申请号：PCT/US2017/047449
申请日：2017-08-17
申请人： CYMER, LLC
发明人： BIBBY, Thomas, Frederick, Allen , THORNES, Joshua, Jon , ROKITSKI, Rostislav , DUFFEY, Thomas, Patrick
IPC分类号： G01J3/02 , G01J3/10 , G01J3/12 , H01S3/00
摘要： Techniques for controlling an optical system include accessing a measured value of a property of a particular pulse of a pulsed light beam emitted from the optical system, the property being related to an amount of coherence of the light beam; comparing the measured value of the property of the light beam to a target value of the property; determining whether to generate a control signal based on the comparison; and if a control signal is generated based on the comparison, adjusting the amount of coherence in the light beam by modifying an aspect of the optical system based on the control signal to reduce an amount of coherence of a pulse that is subsequent to the particular pulse.
摘要翻译：用于控制光学系统的技术包括访问从光学系统发射的脉冲光束的特定脉冲的特性的测量值，该特性与光束的相干量有关; 将光束性质的测量值与性质的目标值进行比较; 基于比较来确定是否产生控制信号; 并且如果基于该比较生成控制信号，则通过基于控制信号修改光学系统的方面来调整光束中的相干性量，以减小在特定脉冲之后的脉冲的相干性量。

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