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1. 发明申请

WO2016209669A1 PULSED LIGHT BEAM SPECTRAL FEATURE CONTROL 审中-公开
标题翻译：脉冲光束光谱特征控制
公开(公告)号：WO2016209669A1
公开(公告)日：2016-12-29
申请号：PCT/US2016/037435
申请日：2016-06-14
申请人： CYMER, LLC (A NEVADA COMPANY)
发明人： O'BRIEN, Kevin, Michael , AHLAWAT, Rahul
IPC分类号： H01S3/10 , H01S3/104 , H01S3/125 , H01S3/134
CPC分类号： G03F7/2006 , G01B11/02 , G01J3/12 , G02B26/007 , G03F7/70 , G03F7/70141 , G03F7/70575 , H01S3/10 , H01S3/104 , H01S3/11
摘要： A system includes a first actuation module coupled to a first actuatable apparatus of m optical source, she first actuatable apparatus being altered by the first actuation module to adjust the spectral feature of the pulsed light beam a second actuation module coupled to a second actuatable apparatus of the optical source, the second actuatable apparatus being altered by the second actuation module to adjust the spectral feature of the pulsed light beam; arid a control system configured to receive an indication regarding the operating state of the first actuatab!e apparatus; and send a signal to the second actuation module to adjust the spectral feature of the pulsed light beam to either: prevent the first actuatable apparatus from saturating based on the operating state of the first actuatable apparatus, or the first actuatable apparatus if the first actuatable apparatus is saturated.
摘要翻译：系统包括耦合到m个光源的第一可致动装置的第一致动模块，第一可致动装置被第一致动模块改变以调节脉冲光束的光谱特征，第二致动模块耦合到第二可致动装置光源，第二致动装置被第二致动模块改变以调节脉冲光束的光谱特征; 以及配置为接收关于所述第一致动器装置的操作状态的指示的控制系统; 并且向第二致动模块发送信号以将脉冲光束的光谱特征调整为：基于第一可致动装置或第一致动装置的操作状态来防止第一致动装置饱和，如果第一致动装置饱和。

2. 发明申请

WO2016191114A1 SPECTRAL FEATURE METROLOGY OF A PULSED LIGHT BEAM 审中-公开
标题翻译：脉冲光束的光谱特征量纲
公开(公告)号：WO2016191114A1
公开(公告)日：2016-12-01
申请号：PCT/US2016/032214
申请日：2016-05-12
申请人： CYMER, LLC (A NEVADA COMPANY)
发明人： THORNES, Joshua, Jon
IPC分类号： G01J1/42 , G01J3/28 , G01J11/00 , G03F7/20
CPC分类号： G01J3/26 , G01J3/027 , G01J3/18 , G01J3/2803 , G01J9/00
摘要： A metrology system includes an optical frequency separation apparatus in the path of the pulsed light beam and configured to interact with the pulsed light beam and output a plurality of spatial components that correspond to the spectral components of the pulsed light beam; a plurality of sensing regions that receive and sense the output spatial components; and a control system connected to an output of each sensing region. The control system is configured to: measure, for each sensing region output; a property of the output spatial components from the optical frequency separation apparatus for one or more poises; analyze the measured properties including averaging the measured properties to calculate an estimate of the spectral feature of the pulsed light beam; and determine whether tire estimated spectral feature of the pulsed light beam is within an acceptable range of values of spectral features.
摘要翻译：计量系统包括在脉冲光束的路径中的光学频率分离装置，并被配置为与脉冲光束相互作用并输出与脉冲光束的光谱分量相对应的多个空间分量; 多个感测区域，其接收和感测输出空间分量; 以及连接到每个感测区域的输出的控制系统。控制系统被配置为：对于每个感测区域输出进行测量; 来自光频分离装置的输出空间分量的性质用于一个或多个泊; 分析测量的性质，包括对测量的性质进行平均，以计算脉冲光束的光谱特征的估计; 并且确定脉冲光束的轮胎估计光谱特征是否在光谱特征值的可接受范围内。

3. 发明申请

WO2016164157A1 WAVELENGTH STABILIZATION FOR AN OPTICAL SOURCE 审中-公开
标题翻译：光源的波长稳定
公开(公告)号：WO2016164157A1
公开(公告)日：2016-10-13
申请号：PCT/US2016/023281
申请日：2016-03-18
申请人： CYMER, LLC (A NEVADA COMPANY)
发明人： AHLAWAT, Rahul
IPC分类号： H01S3/13 , H01S3/10
CPC分类号： G03F7/70575 , G03F7/70041 , H01S3/0971 , H01S3/1305 , H01S3/137
摘要： A wavelength error for each pulse in a first subset of pulses emitted from an optical source is determined, the wavelength error being the difference between a wavelength for a particular pulse and a target wavelength; a pulse-by-pulse correction signal is determined based on the determined wavelength error, the pulse-by-pulse correction signal including a correction signal associated with each pulse In the first subset of pulses; and a correction based on the determined pulse-by-pulse correction signal is applied to each pulse in a second subset of pulses emitted from the optica! source, where applying a correction to a pulse in the second subset of pulses reduces the wavelength error of the pulse in the second subset of pulses.
摘要翻译：确定从光源发射的脉冲的第一子集中的每个脉冲的波长误差，波长误差是特定脉冲的波长与目标波长之间的差; 基于所确定的波长误差来确定逐脉冲校正信号，所述脉冲逐脉冲校正信号包括与所述第一脉冲子集中的每个脉冲相关联的校正信号; 并且基于确定的逐脉冲校正信号的校正被应用于从光学器件发射的脉冲的第二子集中的每个脉冲。源，其中对第二脉冲子集中的脉冲应用校正减少了脉冲的第二子集中的脉冲的波长误差。

4. 发明申请

WO2015187854A1 ESTIMATION OF SPECTRAL FEATURE OF PULSED LIGHT BEAM 审中-公开
标题翻译：脉冲光束的光谱特征估计
公开(公告)号：WO2015187854A1
公开(公告)日：2015-12-10
申请号：PCT/US2015/034025
申请日：2015-06-03
申请人： CYMER, LLC (A NEVADA COMPANY) , ASML NETHERLANDS B.V.
发明人： DUFFEY, Thomas Patrick , GODFRIED, Herman Philip
IPC分类号： G03F7/20
CPC分类号： G01J3/28 , G01J3/027 , G01J3/14 , G01J3/26 , G01J9/00 , G01J11/00 , G01J2003/2853 , G03F7/70041 , G03F7/70058 , G03F7/70575
摘要： A method is described for estimating a spectral feature of a pulsed light beam produced by an optical source and directed toward a wafer of a lithography apparatus, The method includes receiving a set of N optical spectra of pulses of the light beam; saving the received N optical spectra to a saved set; transforming the optical spectra in the saved set to form a set of transformed optical spectra; averaging the transformed optical spectra to form an averaged spectrum; and estimating a spectral feature of the pulsed light beam based on the averaged spectrum.
摘要翻译：描述了一种用于估计由光源产生并指向光刻设备的晶片的脉冲光束的光谱特征的方法。该方法包括接收光束的脉冲的一组N个光谱; 将接收到的N光谱保存到保存的集合; 转换保存集中的光谱，形成一组变换光谱; 对变换的光谱进行平均以形成平均光谱; 以及基于所述平均光谱估计所述脉冲光束的光谱特征。

5. 发明申请

WO2017074794A1 CONTROLLER FOR AN OPTICAL SYSTEM 审中-公开
标题翻译：控制器用于光学系统
公开(公告)号：WO2017074794A1
公开(公告)日：2017-05-04
申请号：PCT/US2016/057981
申请日：2016-10-20
申请人： CYMER, LLC (A NEVADA COMPANY)
发明人： AGGARWAL, Tanuj
IPC分类号： F16L35/00 , G02B21/00 , G02F1/35 , G03B27/54 , G03F7/20 , G05F1/40 , G06F17/10
CPC分类号： G03F7/70191 , G03F7/70041 , G03F7/70558
摘要： A lithography system includes an optical source configured to emit a pulsed light beam; a lithography apparatus including an optical system, the optical system being positioned to receive the pulsed light beam from the optical source at a first side of the optical system and to emit the pulsed light beam at a second side of the optical system; and a control system coupled to the optical source and the optical lithography apparatus, the control system configured to: receive an indication of an amount of energy in the pulsed light beam at the second side of the optical system, determine an energy error, access art initial control sequence, the initial control sequence being associated with the optical source, determine a second control sequence based on the determined energy error and the initial control sequence, and apply the second control sequence to the optical source.
摘要翻译：光刻系统包括被配置为发射脉冲光束的光源; 光刻设备，其包括光学系统，所述光学系统被定位成在所述光学系统的第一侧接收来自所述光源的所述脉冲光束并且在所述光学系统的第二侧处发射所述脉冲光束; 以及耦合到所述光源和所述光刻设备的控制系统，所述控制系统被配置为：接收所述光学系统的所述第二侧处的所述脉冲光束中的能量的量的指示，确定能量误差，存取艺术初始控制序列，初始控制序列与光源相关联，基于所确定的能量误差和初始控制序列确定第二控制序列，并将第二控制序列应用于光源。

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