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1. 发明申请

WO2017112060A1 ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES 审中-公开
标题翻译：重复频率相关性能变量的在线标定
公开(公告)号：WO2017112060A1
公开(公告)日：2017-06-29
申请号：PCT/US2016/057552
申请日：2016-10-18
申请人： CYMER, LLC , ASML NETHERLANDS B.V.
发明人： THORNES, Joshua, Jon , AGGARWAL, Tanuj , O'BRIEN, Kevin, Michael , EVERTS, Frank , GODFRIED, Herman, Phillip , BURDT, Russell, Allen
IPC分类号： G01J1/42 , G01J3/28 , G03F7/20 , H01S3/13
CPC分类号： G01J11/00 , G01J1/0228 , G01J1/0448 , G01J1/4257 , G03F7/70041 , G03F7/70516 , G03F7/7055 , G03F7/70558 , G03F7/70575 , H01S3/0014 , H01S3/10046 , H01S3/10069
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
摘要翻译：公开了作为激光器工作重复频率的函数的在线校准激光器性能。校准可以是周期性的，并且在非暴露期间的计划期间进行。可以使用各种标准来自动选择导致可靠规格性能的重复率。重复频率的可靠值然后被提供给扫描仪，因为允许的值和激光/扫描仪系统然后被允许使用那些允许的重复率。

2. 发明申请

WO2018132198A1 REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE 审中-公开
公开(公告)号：WO2018132198A1
公开(公告)日：2018-07-19
申请号：PCT/US2017/064556
申请日：2017-12-04
申请人： CYMER, LLC , ASML NETHERLANDS B.V.
发明人： DUFFEY, Thomas Patrick , EVERTS, Frank , KING, Brian Edward , THORNES, Joshua Jon , OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria , GODFRIED, Herman, Philip
IPC分类号： G03F7/20
摘要： A method includes: producing a light beam made up of pulses having a wavelength in the deep -ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light, beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate with in a lithography exposure apparatus.

3. 发明申请

WO2019174885A1 CONTROL SYSTEM AND METHOD 审中-公开
公开(公告)号：WO2019174885A1
公开(公告)日：2019-09-19
申请号：PCT/EP2019/054340
申请日：2019-02-21
申请人： ASML NETHERLANDS B.V.
发明人： GODFRIED, Herman, Philip , EVERTS, Frank , OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria
IPC分类号： H01S3/13 , H01S3/134 , G03F7/20 , H01S3/097 , H01S3/104
摘要： A control system for controlling a laser, comprising a sensor for sensing a physical value indicative of a characteristic of a laser beam emitted by the laser, a switch, a first controller and a second controller. Each controller is configured, to receive a further sensor value from the sensor, adjust a received setpoint value based on the received further sensor value to give an output value and cause the laser to operate in accordance with the output value. The switch is configured to switch between the controllers such that output values are provided from each controller in a cyclic fashion.

4. 发明申请

WO2014187619A1 METHOD OF CONTROLLING A RADIATION SOURCE AND LITHOGRAPHIC APPARATUS COMPRISING THE RADIATION SOURCE 审中-公开
标题翻译：控制辐射源的方法和包含辐射源的光刻设备
公开(公告)号：WO2014187619A1
公开(公告)日：2014-11-27
申请号：PCT/EP2014/057709
申请日：2014-04-16
申请人： ASML NETHERLANDS B.V.
发明人： OP'T ROOT, Wilhelmus , BOMMER, Adrianus , DE JONG, Robert , EVERTS, Frank , GODFRIED, Herman , STOLK, Roland , VAN DER VEEN, Paul
IPC分类号： G03F7/20 , H01S3/225 , H01S3/104 , H01S3/0975
CPC分类号： G03F7/70558 , G03F7/70025 , G03F7/70516 , H01S3/0975 , H01S3/104 , H01S3/225
摘要： A method of selecting a periodic modulation (401) to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose (403) delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation (402), and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.
摘要翻译：选择要施加到辐射源的变量的周期性调制（401）的方法，其中所述源将辐射传送用于投影到衬底上，并且其中以扫描速度存在所述衬底和所述辐射之间的相对运动，所述方法包括：对于一组系统参数和用于基板上的位置的计算量，所述量是作为对从施加到所述调制的变量产生的位置的能量剂量（403）的贡献的度量的量源，其中对能量剂量的贡献被计算为卷积：辐射轮廓（402）和对源发射的辐射的辐照度的贡献; 并且选择用于所述一组系统参数的量和所述基板上的位置的所述调制频率满足一定的标准。

5. 发明申请

WO2019166173A1 RADIATION SOURCE, LITHOGRAPHIC SYSTEM AND METHOD 审中-公开
公开(公告)号：WO2019166173A1
公开(公告)日：2019-09-06
申请号：PCT/EP2019/052267
申请日：2019-01-30
申请人： ASML NETHERLANDS B.V.
发明人： EVERTS, Frank , OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria , GODFRIED, Herman, Philip
IPC分类号： G03F7/20 , G05B13/02
摘要： A radiation source (33) configured to provide a radiation beam, the radiation source being controlled by a controller (32), the controller comprising a first feedback algorithm configured to process a signal (41) indicative of the radiation beam and control the radiation source in dependence on the received signal, wherein the controller is in communication with a processor (39), the processor being configured to receive an operating parameter (40a - 40e) of the radiation source, generate a second feedback algorithm based on the received operating parameter, and cause the controller to operate in accordance with the second feedback algorithm.

6. 发明申请

WO2017050506A1 LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：WO2017050506A1
公开(公告)日：2017-03-30
申请号：PCT/EP2016/069879
申请日：2016-08-23
申请人： ASML NETHERLANDS B.V. , CYMER INC.
发明人： EVERTS, Frank , OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria , GODFRIED, Herman, Philip , THORNES, Joshua, Jon , O'BRIEN, Kevin, Michael , SAANEN, Leon, Pieter, Paul , AGGARWAL, Tanuj
IPC分类号： G03F7/20
CPC分类号： G03F7/70558 , G03F7/70066 , G03F7/70525
摘要： A method of controlling output of a radiation source, the method including: periodically monitoring an output energy of the radiation source; determining a difference between a reference energy signal and the monitored output energy; determining a feedback value; determining a desired output energy of the radiation source for a subsequent time period; and controlling an input parameter of the radiation source in dependence on the determined desired output energy during the subsequent time period. If the magnitude of the determined difference between the monitored output energy of the radiation source and the reference energy signal exceeds a threshold value: the determined difference does not contribute to the feedback value; and the determined difference is spread over the subsequent time period according to a reference energy signal adjustment profile and the reference energy signal adjustment profile is added to the reference energy signal for the subsequent time period.
摘要翻译：一种控制辐射源输出的方法，所述方法包括：周期性地监测辐射源的输出能量; 确定参考能量信号和所监视的输出能量之间的差异; 确定反馈值; 在随后的时间段内确定辐射源的期望输出能量; 以及根据所确定的期望的输出能量在随后的时间段期间控制辐射源的输入参数。如果所监测的辐射源的输出能量与参考能量信号之间所确定的差值的大小超过阈值：所确定的差值对反馈值无贡献; 并且根据参考能量信号调整曲线将确定的差分扩展到随后的时间段，并且将参考能量信号调整曲线添加到随后时间段的参考能量信号。

7. 发明公开

EP4394503A1 MASKING DEVICE AND CONTROLLING METHOD THEREOF 审中-公开
公开(公告)号：EP4394503A1
公开(公告)日：2024-07-03
申请号：EP22217160.5
申请日：2022-12-29
申请人： ASML Netherlands B.V.
发明人： DE JONG, Edwin , EVERTS, Frank
IPC分类号： G03F7/00
CPC分类号： G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/709 , G03F7/70725 , G03F7/70066
摘要： Disclosed is a method for controlling an exposure dose at a substrate utilizing a masking device, which comprises a first blade and a second blade. The method comprises providing radiation pulses at the masking device for exposing the substrate, exposing an exposure area at the substrate by moving the first blade in a first direction relative to a slit center and by moving the second blade in a second direction, with the second direction being opposite to the first direction, keeping an amount of radiation received at the exposure area constant, and wherein moving the first and second blade is defined by a velocity profile of a substrate support supporting the substrate.

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