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1. 发明申请

WO2012069351A1 METHOD AND ARRANGEMENT FOR DETERMINING THE HEATING CONDITION OF A MIRROR IN AN OPTICAL SYSTEM 审中-公开
标题翻译：用于确定光学系统中的镜子的加热条件的方法和装置
公开(公告)号：WO2012069351A1
公开(公告)日：2012-05-31
申请号：PCT/EP2011/070320
申请日：2011-11-17
申请人： CARL ZEISS SMT GMBH , VOGT, Peter , HERMANN, Martin , DIER, Oliver , MAJOR, András G.
发明人： VOGT, Peter , HERMANN, Martin , DIER, Oliver , MAJOR, András G.
IPC分类号： G03F7/20 , G01M11/00 , G01N21/41 , G01B11/06
CPC分类号： G01K11/00 , G01B9/02024 , G01B9/02081 , G01B2290/70 , G01M11/005 , G02B7/181 , G03F7/708 , G03F7/7085 , G03F7/70891
摘要： The invention concerns a method of and an arrangement for determining the heating condition of a mirror (101, 201, 401, 601, 701, 801) in an optical system, in particular in a microlithographic projection exposure apparatus. In an embodiment the mirror is an EUV mirror and a method according to the invention comprises the following steps: deflecting at least one input measuring beam on to the mirror (101, 201, 401, 601, 701, 801), ascertaining at least one optical parameter of at least one output measuring beam produced from the input measuring beam after interaction with the mirror (101, 201, 401, 601, 701, 801), and determining the heating condition of the mirror (101, 201, 401, 601, 701, 801) on the basis of said parameter.
摘要翻译：本发明涉及用于确定光学系统中的镜（101,201,401,601,701,801）的加热条件的方法和装置，特别是在微光刻投影曝光装置中。在一个实施例中，反射镜是EUV反射镜，根据本发明的方法包括以下步骤：将至少一个输入测量光束偏转到反射镜（101,201,401,601,701,801）上，确定至少一个在与反射镜（101,201,401,601,701,801）相互作用之后，从输入测量光束产生的至少一个输出测量光束的光学参数，以及确定反射镜（101,201,401,601）的加热条件，701,801）。

2. 发明申请

WO2011147658A1 OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION APPARATUS 审中-公开
标题翻译：用于微晶投影装置的光学系统
公开(公告)号：WO2011147658A1
公开(公告)日：2011-12-01
申请号：PCT/EP2011/056830
申请日：2011-04-29
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , SCHARNWEBER, Ralf , DITTMANN, Olaf , GRUNER, Toralf , WEIß, Gundula , MAJOR, András G. , VOGT, Martin , DEGÜNTHER, Markus , WANGLER, Johannes , KORB, Thomas , WALDIS, Severin
发明人： SÄNGER, Ingo , SCHARNWEBER, Ralf , DITTMANN, Olaf , GRUNER, Toralf , WEIß, Gundula , MAJOR, András G. , VOGT, Martin , DEGÜNTHER, Markus , WANGLER, Johannes , KORB, Thomas , WALDIS, Severin
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70566
摘要： The invention concerns an optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement (200, 720, 730, 920) having a plurality of mirror elements (200a, 200b, 200c, 721, 722, 733, 731, 732, 733,...) which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement (200, 720, 730, 920), and at least one manipulator (300, 720, 910) which is arranged downstream of said mirror arrangement (200, 720, 730, 920) in the light propagation direction and has a raster arrangement of manipulator elements (301, 302,..., 600, 721, 722, 723,... ) in such a way that light incident on the manipulator (300, 600, 720, 910) in operation of the optical system is influenced differently in its polarisation state and/or in its intensity in dependence on the incidence location, wherein at least two mutually different illumination settings (420, 520) are adjustable by the variation in an angular distribution of the light reflected by the mirror arrangement (200), wherein said illumination settings (420, 520) differ from each other in that identical regions of a pupil plane of the illumination system (10) are illuminated with light of a different polarisation state.
摘要翻译：本发明涉及一种用于微光刻投影曝光装置和微光刻曝光方法的光学系统。在一个实施例中，用于微光刻投影曝光装置的光学系统包括具有多个反射镜元件（200a，200b，200c，721,722,733,731,732,920）的至少一个反射镜装置（200,720,730,920） 733，...），其可彼此独立地移位，以改变由反射镜装置（200,720,730,920）反射的光的角分布，以及至少一个操纵器（300,720,910），其是在光传播方向上布置在所述反射镜装置（200,720,730,920）的下游，并且具有光栅装置，其中所述操纵元件（301,302，...，600,721,722,723，...）入射在光学系统操作的操纵器（300,600,720,910）上的光的偏振状态和/或其强度根据入射位置受到不同的影响，其中至少两个相互不同照明设置（420,520）可通过角度dist的变化进行调节由反射镜装置（200）反射的光的贡献，其中所述照明设置（420,520）彼此不同，因为照明系统（10）的光瞳平面的相同区域被不同偏振态的光照射。

3. 发明申请

WO2010094658A1 MONITORING VON KIPPBAREN SPIEGELN 审中-公开
标题翻译：监测TILTING镜子
公开(公告)号：WO2010094658A1
公开(公告)日：2010-08-26
申请号：PCT/EP2010/051876
申请日：2010-02-15
申请人： CARL ZEISS SMT AG , HORN, Jan , MAJOR, András G. , KEMPTER, Christian , BIHR, Ulrich
发明人： HORN, Jan , MAJOR, András G. , KEMPTER, Christian , BIHR, Ulrich
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/7085 , G02B26/0833 , G03F7/70116 , G03F7/70425
摘要： Die vorliegende Erfindung betrifft eine Vorrichtung sowie ein entsprechendes Verfahren zur Überwachung der Orientierung mindestens eines Spiegels (4), insbesondere einer Vielzahl von Spiegeln in einem Spiegelfeld, wie es beispielsweise in einer Projektionsbelichtungsanlage für die Mikrolithografie eingesetzt werden kann. Gemäß der Erfindung wird eine Erfassungseinrichtung (1) zur Erfassung des von dem Spiegel reflektierten Lichts vorgesehen, wobei eine Musterquelle (2) angeordnet ist, die ein Muster (3) mit räumlicher und/oder zeitlich variablen Lichtquellen bereitstellt, welches von dem mindestens einen Spiegel auf die Erfassungseinrichtung gespiegelt wird. Aus dem von der Erfassungseinrichtung erfassten Spiegelbild kann die Orientierung des Spiegels ermittelt werden.
摘要翻译：本发明涉及一种装置和用于监控所述取向至少一个反射镜（4），特别是多个反射镜中的反射镜阵列，如可以例如在用于微光刻的投射曝光设备中使用的相应方法。根据本发明，用于检测光的检测装置（1）从被设置在光的反射镜，其中一个模式源被布置（2），它提供了一个模式（3）与空间和/或时间变化的光源，反射其中至少一个反射镜的被反射到检测装置。反射镜的取向可以从由检测装置镜像所覆盖的区域来确定。

4. 发明申请

WO2012101080A3 OPTICAL ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS AND METHOD FOR COOLING AN OPTICAL COMPONENT 审中-公开
公开(公告)号：WO2012101080A3
公开(公告)日：2012-08-02
申请号：PCT/EP2012/050946
申请日：2012-01-23
申请人： CARL ZEISS LASER OPTICS GMBH , ANDERL, Willi , KIEREY, Holger , BAUER, Markus , WALDIS, Severin , MAJOR, András G.
发明人： ANDERL, Willi , KIEREY, Holger , BAUER, Markus , WALDIS, Severin , MAJOR, András G.
IPC分类号： G03F7/20 , G21K1/06
摘要： An optical arrangement (80) for an EUV projection exposure apparatus comprises an optical component (82), which has a substrate (84) and a surface (86) on a side of the substrate (84) which surface is optically operative in the EUV spectral range, and a cooling device (90) for the optical component (82), said cooling device having a cooling medium (94). The substrate (84) comprises a material having at a temperature T s 50 W -1 K -1 and a coefficient of thermal expansion of -6 K -1 , and the cooling medium (94) has a temperature of s .

5. 发明公开

EP2577399A1 OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION APPARATUS 审中-公开
标题翻译：光学系统的微光刻投影设备
公开(公告)号：EP2577399A1
公开(公告)日：2013-04-10
申请号：EP11720415.6
申请日：2011-04-29
申请人： Carl Zeiss SMT GmbH
发明人： SÄNGER, Ingo , SCHARNWEBER, Ralf , DITTMANN, Olaf , GRUNER, Toralf , WEIß, Gundula , MAJOR, András G. , VOGT, Martin , DEGÜNTHER, Markus , WANGLER, Johannes , KORB, Thomas , WALDIS, Severin
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70566
摘要： An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.

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