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1. 发明申请

WO2011057906A1 IMAGING OPTICS 审中-公开
标题翻译：成像光学
公开(公告)号：WO2011057906A1
公开(公告)日：2011-05-19
申请号：PCT/EP2010/066525
申请日：2010-10-29
申请人： CARL ZEISS SMT GMBH , LÖRING, Ulrich , MÜLLER, Ralf , MANN, Hans-Jürgen , BAER, Norman
发明人： LÖRING, Ulrich , MÜLLER, Ralf , MANN, Hans-Jürgen , BAER, Norman
IPC分类号： G02B17/06 , G02B5/00 , G02B27/00 , G03F7/20
CPC分类号： G02B17/0657 , G02B5/005 , G02B27/0018 , G03F7/70233 , G03F7/70275
摘要： An imaging optics (7) has a plurality of mirrors (M3; M5, M6, M8) which reflect imaging light (3) and thus image an object field in an object plane into an image field in an image plane. A mirror body (22) of at least one of the mirrors (M8) has a through-opening (21) for the imaging light (3) to pass through. The through-opening (21) has an internal region (23) of a smallest opening width in the mirror body (22). The through-opening (21) expands from the internal region (23) towards both edge regions (24, 25) of the mirror body (22). As a result, an imaging optics is obtained where a disturbing influence of unused light portions is reduced or eliminated completely.
摘要翻译：成像光学器件（7）具有反射成像光（3）的多个反射镜（M3; M5，M6，M8），从而将物平面中的物场映像成图像平面中的图像场。至少一个反射镜（M8）的镜体（22）具有用于成像光（3）穿过的通孔（21）。通孔（21）在镜体（22）中具有最小开口宽度的内部区域（23）。通孔（21）从内部区域（23）向镜体（22）的两个边缘区域（24,25）扩张。结果，获得了其中完全减少或消除未使用的光部分的干扰影响的成像光学元件。

2. 发明申请

WO2012025365A1 IMAGING OPTICAL SYSTEM 审中-公开
标题翻译：成像光学系统
公开(公告)号：WO2012025365A1
公开(公告)日：2012-03-01
申请号：PCT/EP2011/063663
申请日：2011-08-09
申请人： CARL ZEISS SMT GMBH , MÜLLER, Ralf , MANN, Hans-Jürgen
发明人： MÜLLER, Ralf , MANN, Hans-Jürgen
IPC分类号： G03F7/20 , G02B17/06
CPC分类号： G03F7/702 , G02B17/0657 , G03F7/70233 , G03F7/70275
摘要： An imaging optical system (12) for EUV projection lithography has a plurality of mirrors (M1-M4) for imaging an object field (4) in an object plane (5) in an image field (13) in an image plane (14). An image-side numerical aperture of the imaging optical system is at least 0.3. The imaging optical system has a pupil obscuration, which is greater than 0.40. The imaging optical system has an image filed size of at least 1 mm x 10 mm. An imaging optical system results, with which the imaging of an object is possible with high imaging quality.
摘要翻译：用于EUV投影光刻的成像光学系统（12）具有用于对图像平面（14）中的图像场（13）中的物体平面（5）中的物体场（4）进行成像的多个反射镜（M1-M4）。成像光学系统的图像侧数值孔径至少为0.3。成像光学系统具有大于0.40的瞳孔遮蔽。成像光学系统具有至少1mm×10mm的图像尺寸。结果，成像光学系统可以以高成像质量对物体进行成像。

3. 发明申请

WO2014019617A1 IMAGING OPTICAL UNIT FOR A PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：投影曝光装置成像光学装置
公开(公告)号：WO2014019617A1
公开(公告)日：2014-02-06
申请号：PCT/EP2012/065022
申请日：2012-08-01
申请人： CARL ZEISS SMT GMBH , MANN, Hans-Jürgen , MENKE, Christoph
发明人： MANN, Hans-Jürgen , MENKE, Christoph
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G03F7/70233 , G02B17/06 , G02B17/0663 , G03F7/7015
摘要： An imaging optical unit (7) for a projection exposure apparatus serves for imaging an object field (4) in an object plane (5) into an image field (8) in an image plane (9). The image field (8) is arranged at a field distance (FA) from the object plane (5). The optical unit (7) has a plurality of mirrors (M1 to M8) which predefine beam path sections (17 1 to 17 9 ) of an imaging beam path (17). An object region (18) of the optical unit (7) is bounded by the object plane (5) and an object-side intermediate plane (19) parallel thereto. Said object-side intermediate plane is that plane at the smallest distance from the object plane (5) for which it holds true that the used reflection surfaces of all mirrors (M2, M4, M6) which are at a distance from the object plane (5) that is less than half of the field distance (FA) are arranged between the object plane (5) and the object-side intermediate plane (19). An image region (20) of the optical unit (7) is bounded by an image-side intermediate plane (21) parallel to the object plane (5) and an image field reference plane (22). The latter contains a central image field point and runs parallel to the object plane (5). The image-side intermediate plane (21) is that plane at the largest distance from the object plane (5) for which it holds true that, the used reflection surfaces of all mirrors (M1, M3, M5, M7 and M8) which are at a distance from the object plane (5) that is greater than half of the field distance (FA) are arranged beyond the image-side intermediate plane (21). An intermediate region (23) of the optical unit (7) is arranged between the intermediate planes (19, 21). A distance (A) between the intermediate planes (19, 21) is at least 40% of the field distance (FA). At least two beam path sections (17 1 to 17 7 ) pass completely through the intermediate region (23). The result is an imaging optical unit having small angles of incidence or small angle-of-incidence bandwidths.
摘要翻译：用于投影曝光装置的成像光学单元（7）用于将物平面（5）中的物场（4）成像为图像平面（9）中的图像场（8）。图像场（8）被布置在与物平面（5）的场距离（FA）处。光学单元（7）具有预先定义成像光束路径（17）的光束路径部分（171至179）的多个反射镜（M1至M8）。光学单元（7）的物体区域（18）由物平面（5）和与其平行的物体侧中间平面（19）限定。所述物体侧中间平面是距物体平面（5）最小距离处的平面，其中所有反射镜（M2，M4，M6）的被使用的反射面与物平面距离在物平面（5）和物体侧中间平面（19）之间布置小于场距离（FA）的一半的5）。光学单元（7）的图像区域（20）由平行于物平面（5）的图像侧中间平面（21）和图像场参考平面（22）所限定。后者包含中心图像场点并平行于对象平面（5）延伸。图像侧中间平面（21）是距物体平面（5）最远的距离处的平面，其中所有反射镜（M1，M3，M5，M7和M8）的所使用的反射面是与物距平面（5）的距离大于场距离（FA）的一半的距离被布置在图像侧中间平面（21）之外。光学单元（7）的中间区域（23）布置在中间平面（19,21）之间。中间平面（19,21）之间的距离（A）至少为场距（FA）的40％。至少两个光束路径部分（171至177）完全穿过中间区域（23）。结果是具有小的入射角或小的入射角带宽的成像光学单元。

4. 发明申请

WO2012028303A1 OPTICAL SYSTEM FOR EUV PROJECTION MICROLITHOGRAPHY 审中-公开
标题翻译：用于EUV投影微光学的光学系统
公开(公告)号：WO2012028303A1
公开(公告)日：2012-03-08
申请号：PCT/EP2011/004373
申请日：2011-08-31
申请人： CARL ZEISS SMT GMBH , MANN, Hans-Jürgen , LÖRING, Ulrich , LAYH, Michael , RUOFF, Johannes
发明人： MANN, Hans-Jürgen , LÖRING, Ulrich , LAYH, Michael , RUOFF, Johannes
IPC分类号： G03F7/20
CPC分类号： G03F7/7025 , G03F7/70125 , G03F7/70216
摘要： Optical system for EUV projection microlithography comprising lighting optics (4) for illuminating a lighting field (5) in a reticle plane (6) comprising at least one facet mirror (18) with a plurality of facet elements (24) for producing different light channels, wherein by means of the light channels a specific lighting setting (25) of the lighting field (5) can be produced, and a projection optics (9) for projecting the lighting field (5) along a projection direction (27) into an image field (10) in an image plane (11) with at least one first obscuration (30; 42) wherein the first obscuration is arranged in a first position relative to the projection direction (27), and wherein the first obscuration (30; 42) and the lighting setting (25) are adjusted to one another such that an intensity of at least one predetermined order of diffraction of an image of at least of one light channel of the lighting setting (25) in the region of the first position has a maximum intensity I max and a limit intensity I lim max , and the area in which the intensity of the order of movement is greater than the limit intensity I lim , and the area of the first obscuration (30; 42) are non-overlapping.
摘要翻译：用于EUV投影微光刻的光学系统，包括用于照亮标线板平面（6）中的照明场（5）的照明光学器件（4），其包括具有多个小面元件（24）的至少一个小面反射镜（18），用于产生不同的光通道，其中通过所述光通道可以产生所述照明场（5）的特定照明设置（25），以及用于将所述照明场（5）沿着投影方向（27）投影到投影光学元件（9）中的投影光学元件（9）在具有至少一个第一遮蔽（30; 42）的图像平面（11）中的图像场（10），其中所述第一遮挡被布置在相对于所述投影方向（27）的第一位置，并且其中所述第一遮蔽（30; 42）和照明设置（25）彼此调节，使得在第一位置的区域中至少一个照明设置（25）的一个光通道的图像的至少一个预定的衍射次数的强度具有最大强度Imax和li 最大强度Ilim max，以及运动顺序强度大于极限强度Ilim的面积，以及第一遮蔽面积（30; 42）是不重叠的。

5. 发明申请

WO2011073039A2 IMAGING OPTICS 审中-公开
标题翻译：成像光学
公开(公告)号：WO2011073039A2
公开(公告)日：2011-06-23
申请号：PCT/EP2010/068782
申请日：2010-12-03
申请人： CARL ZEISS SMT GMBH , MANN, Hans-Jürgen , ENDRES, Martin , SHAFER, David , WARM, Berndt , HERKOMMER, Alois
发明人： MANN, Hans-Jürgen , ENDRES, Martin , SHAFER, David , WARM, Berndt , HERKOMMER, Alois
IPC分类号： G02B17/06
CPC分类号： G03F7/70233 , G02B17/0652 , G03F7/702 , G03F7/70275
摘要： An imaging optics (16) for lithographic projection exposure for guiding a bundle of imaging light (3) with a wavelength shorter than 193 nm by means of a plurality of mirrors (M1 to M6) for beam-splitter-free imaging of a reflective object (12) in an object field (4) in an object plane (5) into an image field (17) in an image plane (18), an object field point having a central ray angle (α) which is smaller than 3°. At least one of the mirrors (M1 to M6) is a near-field mirror. The result is an imaging optics which allows for high-quality imaging of a reflective object.
摘要翻译：一种用于光刻投影曝光的成像光学器件（16），用于通过多个反射镜（M1至M6）引导波长短于193nm的成像光束（3），用于反射物体的无光束分配器成像（12）在物平面（5）中的物场（4）中成为图像平面（18）中的图像场（17），具有小于3°的中心射线角（a）的物场点。至少一个反射镜（M1至M6）是近场镜。其结果是允许反射物体的高质量成像的成像光学元件。

6. 发明申请

WO2011039103A1 OPTICAL ARRANGEMENT IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置中的光学装置
公开(公告)号：WO2011039103A1
公开(公告)日：2011-04-07
申请号：PCT/EP2010/064090
申请日：2010-09-23
申请人： CARL ZEISS SMT GMBH , SCHÖPPACH, Armin , MANN, Hans-Jürgen , EISERT, Frank , KWAN, Yim-Bun-Patrick
发明人： SCHÖPPACH, Armin , MANN, Hans-Jürgen , EISERT, Frank , KWAN, Yim-Bun-Patrick
IPC分类号： G03F7/20 , G03B7/02 , G02B7/182
CPC分类号： G03F7/70825 , G02B17/0657
摘要： The invention concerns inter alia an optical arrangement in a microlithographic projection exposure apparatus comprising at least one optical element (110, 210) and a support element (120, 220) for the optical element (110, 210), wherein the optical element (110, 210) and the support element (120, 220) are connected together by way of at least three decoupling elements (131, 132, 133; 231, 232, 233), and wherein said decoupling elements (131, 132, 133; 231, 232, 233) are formed monolithically with the optical element (110, 210) and with the support element (120, 220).
摘要翻译：本发明尤其涉及一种微光刻投影曝光装置中的光学装置，其包括用于光学元件（110,210）的至少一个光学元件（110,210）和支撑元件（120,220），其中光学元件（110 ，210）和所述支撑元件（120,220）通过至少三个去耦元件（131,132,133; 231,232,233）连接在一起，并且其中所述去耦元件（131,132,133; 231），232,233）与所述光学元件（110,210）和所述支撑元件（120,220）整体形成。

7. 发明申请

WO2012013241A1 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICAL SYSTEM OF THIS TYPE 审中-公开
标题翻译：成像光学系统和投影曝光安装与这种类型的成像光学系统的微型计算
公开(公告)号：WO2012013241A1
公开(公告)日：2012-02-02
申请号：PCT/EP2010/061089
申请日：2010-07-30
申请人： CARL ZEISS SMT GMBH , MANN, Hans-Jürgen , EPPLE, Alexander
发明人： MANN, Hans-Jürgen , EPPLE, Alexander
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G03F7/70191 , G02B17/0663 , G03F7/70233
摘要： An imaging optical system (7) has a plurality of mirrors (M1 to M8), which image an object field (4) in an object plane (5) in an image field (8) in an image plane (9). The imaging optical system (7) has a pupil obscuration. The last mirror (M8) in the beam path of the imaging light (3) between the object field (4) and the image field (8) has a through-opening (18) for the passage of the imaging light (3). A penultimate mirror (M7) of the imaging optical system (7) in the beam path of the imaging light (3) between the object field (4) and the image field (8) has no through-opening for the passage of the imaging light (3). The imaging optical system (7) has precisely eight mirrors (M1 to M8). The result is an imaging optical system with which a handleable combination of small imaging errors, manageable production and a good throughput for the imaging light are achieved.
摘要翻译：成像光学系统（7）具有多个反射镜（M1至M8），其对图像平面（9）中的图像场（8）中的物体平面（5）中的物体场（4）进行成像。成像光学系统（7）具有光瞳遮蔽。在物场（4）和图像场（8）之间的成像光（3）的光束路径中的最后一个镜（M8）具有用于成像光（3）通过的通孔（18）。在物场（4）和图像场（8）之间的成像光（3）的光束路径中的成像光学系统（7）的倒数第二反射镜（M7）没有用于成像通过的通孔光（3）。成像光学系统（7）具有精确的八个反射镜（M1至M8）。结果是成像光学系统，其具有小成像误差，可管理生产和成像光的良好吞吐量的可处理组合。

8. 发明申请

WO2012101269A1 MAGNIFYING IMAGING OPTICAL UNIT AND METROLOGY SYSTEM COMPRISING SUCH AN IMAGING OPTICAL UNIT 审中-公开
标题翻译：放大成像光学单元和包含这种成像光学单元的计量系统
公开(公告)号：WO2012101269A1
公开(公告)日：2012-08-02
申请号：PCT/EP2012/051379
申请日：2012-01-27
申请人： CARL ZEISS SMT GMBH , MANN, Hans-Jürgen
发明人： MANN, Hans-Jürgen
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G02B27/14 , G02B17/0657 , G02B17/0663 , G03F1/84 , G03F7/70233
摘要： A magnifying imaging optical unit (7) has at most four mirrors (Ml to M4), which, via an imaging beam path (8) having imaging partial rays (25, 19, 20) between the mirrors (Ml to M4) that are adjacent in the imaging beam path (8), image an object field (6) in an object plane (11) into an image field (9) in an image plane (12). The optical unit (7) is designed a first imaging partial ray (19) such that between a second mirror (M2) in the imaging beam path (8) and a third mirror (M3) in the imaging beam path (8) and a second imaging partial ray (20) between the third mirror (M3) in the imaging beam path (8) and a fourth mirror (M4) in the imaging beam path (8) respectively pass through at least one passage opening (21) in a mirror body (22) of a first mirror (Ml) in the imaging beam path (8). According to a further aspect, the optical unit has a structural length T that is at most 1300 mm, and a ratio Τ/β of the structural length T and an imaging scale β that is less than 1.5. This results in an imaging optical unit that takes account of increased requirements made of the compactness and the transmission of the imaging optical unit, particularly for a given imaging scale.
摘要翻译：放大成像光学单元（7）具有至多四个反射镜（M1至M4），其经由在镜子（M1至M4）之间具有成像部分光线（25,19,20）的成像光束路径（8）在成像光束路径（8）中相邻，将物平面（11）中的对象场（6）成像到图像平面（12）中的图像场（9）。光学单元（7）被设计成第一成像部分光线（19），使得在成像光束路径（8）中的第二反射镜（M2）和成像光束路径（8）中的第三反射镜（M3）和在成像光束路径（8）中的第三反射镜（M3）与成像光束路径（8）中的第四反射镜（M4）之间的第二成像部分光线（20）分别穿过至少一个通道开口（21）成像光路（8）中第一镜（M1）的镜体（22）。根据另一方面，光学单元具有至多1300mm的结构长度T，以及结构长度T和小于1.5的成像比例ß的比率。这导致成像光学单元，其考虑到对于成像光学单元的紧凑性和透射的需求增加，特别是对于给定的成像尺度。

9. 发明申请

WO2011144389A1 ILLUMINATION OPTICS FOR A METROLOGY SYSTEM FOR EXAMINING AN OBJECT USING EUV ILLUMINATION LIGHT AND METROLOGY SYSTEM COMPRISING AN ILLUMINATION OPTICS OF THIS TYPE 审中-公开
标题翻译：用于使用EUV照明灯检查对象的计量系统的照明光学和包含该类型的照明光学的计量系统
公开(公告)号：WO2011144389A1
公开(公告)日：2011-11-24
申请号：PCT/EP2011/055679
申请日：2011-04-12
申请人： CARL ZEISS SMT GMBH , MANN, Hans-Jürgen , HERKOMMER, Alois
发明人： MANN, Hans-Jürgen , HERKOMMER, Alois
IPC分类号： G02B5/10 , G02B17/06 , G02B5/08 , G03F7/20
CPC分类号： G02B5/10 , G02B5/0891 , G02B17/0626 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F1/24 , G03F1/84
摘要： A metrology system (2) serves to examine an object (5) arranged in an object field (3) using EUV illumination light (1). An illumination optics (9) of the metrology system (2) has a collector mirror (B1) which is arranged in the beam path directly downstream of an EUV light source (6). Downstream of the collector mirror (B1), less than three additional illumination mirrors (B2, B3) are arranged in the beam path between the collector mirror (B1) and the object field (3). An intermediate focus (11) is arranged in the beam path between the collector mirror (B1) and the additional illumination mirror (B2). The metrology system (2) further includes a magnifying imaging optics (15) for imaging the object field (3) into an image field (13) in an image plane (14). As a result a metrology system is obtained which comprises an illumination optics that ensures an efficient illumination of the object field by means of illumination parameters which are well adapted to the illumination situation of current EUV projection exposure apparatuses.
摘要翻译：计量系统（2）用于检查使用EUV照明光（1）布置在物场（3）中的物体（5）。计量系统（2）的照明光学器件（9）具有收集器反射镜（B1），其被布置在EUV光源（6）的直接下游的光束路径中。在集电镜（B1）的下游，在集光镜（B1）和物场（3）之间的光束路径中布置少于三个附加照明镜（B2，B3）。在聚光镜（B1）和附加照明镜（B2）之间的光束路径中布置有中间焦点（11）。计量系统（2）还包括用于将物场（3）成像成像面（14）中的图像场（13）的放大成像光学器件（15）。结果，获得了一种计量系统，其包括照明光学器件，其通过适合于当前EUV投影曝光设备的照明情况的照明参数来确保对物场的有效照明。

10. 发明申请

WO2011138259A1 EUV COLLECTOR 审中-公开
标题翻译： EUV收藏家
公开(公告)号：WO2011138259A1
公开(公告)日：2011-11-10
申请号：PCT/EP2011/056922
申请日：2011-05-02
申请人： CARL ZEISS SMT GMBH , MANN, Hans-Jürgen , SINGER, Wolfgang
发明人： MANN, Hans-Jürgen , SINGER, Wolfgang
IPC分类号： G03F7/20 , G21K1/06 , H05G2/00
CPC分类号： G03F7/70175 , G03F7/7005 , G03F7/70166 , G21K1/067 , G21K2201/067
摘要： A collector (15) serves to transfer an emission of an EUV radiation source (3) to a main intensity spot (23). The collector (15) has at least one collector subunit (24) comprising at least one grazing incidence mirror (251 to 254). This grazing incidence mirror (251 to 254) transfers EUV radiation (14) from the radiation source (3) to an intensity spot (23). At least one ellipsoid mirror (28) of the collector (15), the ellipsoid mirror (28) having an ellipsoidal mirror surface (29), is impinged by an angle of incidence above a critical grazing incidence angle. No more than one collector sub-unit (24) is arranged in the beam path of an EUV radiation source (3) between a position of the EUV radiation source (3) and the intensity spot (23). At least some of the EUV rays (14) are only reflected in a grazing manner. In another embodiment of the EUV collector, one of the collector subunits has at least one grazing incidence mirror shell whose outer wall serves to reflect the EUV radiation. Another one of the collector subunits has at least one grazing incidence mirror shell whose inner wall serves to reflect the EUV radiation. The result is an EUV collector in which an optimized collectable solid angle of the EUV radiation source is obtained with a given amount of constructional effort.
摘要翻译：收集器（15）用于将EUV辐射源（3）的发射转移到主强度点（23）。收集器（15）具有至少一个收集器子单元（24），其包括至少一个掠入射镜（251至254）。该掠入射镜（251至254）将EUV辐射（14）从辐射源（3）传送到强度点（23）。收集器（15）的至少一个椭圆面镜（28），具有椭圆面镜面（29）的椭圆面镜（28）通过高于临界掠入射角的入射角撞击。在EUV辐射源（3）的位置和强度点（23）的EUV辐射源（3）的光束路径中不超过一个收集器子单元（24）。至少一些EUV射线（14）只能以放牧的方式反映出来。在EUV收集器的另一实施例中，收集器子单元之一具有至少一个掠入射镜壳，其外壁用于反射EUV辐射。收集器子单元中的另一个具有至少一个掠入射镜壳，其内壁用于反射EUV辐射。其结果是EUV收集器，其中以给定的施工量获得EUV辐射源的优化的可收集立体角。

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