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1. 发明申请

US20090202741A1 Multiple Phase RF Power for Electrode of Plasma Chamber 有权
标题翻译：等离子室电极的多相RF功率
公开(公告)号：US20090202741A1
公开(公告)日：2009-08-13
申请号：US12363760
申请日：2009-01-31
申请人： Bradley O. Stimson , John M. White
发明人： Bradley O. Stimson , John M. White
IPC分类号： C23C4/00 , H02J3/00
CPC分类号： H01J37/32174 , H01J37/32091 , H01J37/32577 , Y10T307/642
摘要： RF power is coupled with different phase offsets to different RF connection points on an electrode of a plasma chamber. Preferably, the number of different RF connection points and corresponding phase offsets is at least four, and the positions of the RF connection points are distributed along two orthogonal dimensions of the electrode. Preferably, power to each respective RF connection point is supplied by a respective RF power supply, wherein each power supply synchronizes its phase to a common reference RF oscillator.
摘要翻译： RF功率与不同的相位偏移耦合到等离子体室的电极上的不同RF连接点。优选地，不同的RF连接点的数量和对应的相位偏移量至少为4，并且RF连接点的位置沿电极的两个正交尺寸分布。优选地，每个相应RF连接点的功率由相应的RF电源提供，其中每个电源将其相位同步到公共参考RF振荡器。

2. 发明授权

US08961756B2 Ganged scanning of multiple magnetrons, especially two level folded magnetrons 有权
标题翻译：组合扫描多个磁控管，特别是两个级别的磁控管
公开(公告)号：US08961756B2
公开(公告)日：2015-02-24
申请号：US11780757
申请日：2007-07-20
申请人： Makoto Inagawa , Hien Minh Huu Le , Akihiro Hosokawa , Bradley O. Stimson , John M. White
发明人： Makoto Inagawa , Hien Minh Huu Le , Akihiro Hosokawa , Bradley O. Stimson , John M. White
IPC分类号： C23C14/35 , H01J37/34
CPC分类号： H01J37/3408 , H01J37/3455
摘要： A magnetron assembly including one or more magnetrons each forming a closed plasma loop on the sputtering face of the target. The target may include multiple strip targets on which respective strip magnetrons roll and are partially supported on a common support plate through a spring mechanism. The strip magnetron may be a two-level folded magnetron in which each magnetron forms a folded plasma loop extending between lateral sides of the strip target and its ends meet in the middle of the target. The magnets forming the magnetron may be arranged in a pattern having generally uniform straight portions joined by curved portion in which extra magnet positions are available near the corners to steer the plasma track. Multiple magnetrons, possibly flexible, may be resiliently supported on a scanned support plate and individually partially supported by rollers on the back of one or more targets.
摘要翻译：磁控管组件包括一个或多个磁控管，每个磁控管在靶的溅射面上形成封闭的等离子体环。目标可以包括多个条带目标，相应的带状磁控管在其上滚动并且通过弹簧机构部分地支撑在公共支撑板上。带状磁控管可以是两级折叠磁控管，其中每个磁控管形成在条带靶的侧面之间延伸的折叠等离子体环，并且其端部在目标的中间相遇。形成磁控管的磁体可以布置成具有通过弯曲部分连接的具有大致均匀的直线部分的图案，其中在角附近提供额外的磁体位置以引导等离子体轨道。多个可能是柔性的磁控管可以弹性地支撑在扫描的支撑板上，并且单独部分地由一个或多个靶的背面上的辊支撑。

3. 发明申请

US20080023319A1 MAGNETRON ASSEMBLY 审中-公开
标题翻译： MAGNETRON装配
公开(公告)号：US20080023319A1
公开(公告)日：2008-01-31
申请号：US11769924
申请日：2007-06-28
申请人： HIEN MINH HUU LE , Bradley O. Stimson , Makoto Inagawa , John M. White
发明人： HIEN MINH HUU LE , Bradley O. Stimson , Makoto Inagawa , John M. White
IPC分类号： C23C14/35
CPC分类号： H01J37/3408 , H01J37/3455
摘要： The present invention discloses a physical vapor deposition apparatus and a method for sputtering. When sputtering from a plurality of sputtering targets, a plurality of magnetrons may be used. The number of magnetrons may correspond to the number of targets. Each magnetron may be different to control the amount of material deposited from each sputtering target and the specific location on the sputtering target that is sputtered. The magnetrons may be spaced a different distance from the backing plate and hence, the target. The magnetrons may be of different sizes. The magnetrons may have a different magnetic path. The magnetrons may have a different pitch. The magnetrons may have a different magnitude. By tailoring the distance, size, path, pitch, and magnitude, uniform sputtering and target erosion may be achieved.
摘要翻译：本发明公开了一种物理气相沉积装置和溅射方法。当从多个溅射靶溅射时，可以使用多个磁控管。磁控管的数量可以对应于目标的数量。每个磁控管可以不同以控制从每个溅射靶沉积的材料的数量和溅射的溅射靶上的特定位置。磁控管可以与背板间隔开不同的距离，因此与目标物隔开。磁控管可能具有不同的尺寸。磁控管可以具有不同的磁路。磁控管可能具有不同的音调。磁控管可能具有不同的大小。通过调整距离，尺寸，路径，间距和幅度，可以实现均匀的溅射和目标侵蚀。

4. 发明授权

US08298625B2 Multiple phase RF power for electrode of plasma chamber 有权
标题翻译：等离子体室电极的多相RF功率
公开(公告)号：US08298625B2
公开(公告)日：2012-10-30
申请号：US12363760
申请日：2009-01-31
申请人： Bradley O. Stimson , John M. White
发明人： Bradley O. Stimson , John M. White
IPC分类号： H05H1/24 , C23C16/00 , C23F1/00 , H01J7/24
CPC分类号： H01J37/32174 , H01J37/32091 , H01J37/32577 , Y10T307/642
摘要： RF power is coupled with different phase offsets to different RF connection points on an electrode of a plasma chamber. Preferably, the number of different RF connection points and corresponding phase offsets is at least four, and the positions of the RF connection points are distributed along two orthogonal dimensions of the electrode. Preferably, power to each respective RF connection point is supplied by a respective RF power supply, wherein each power supply synchronizes its phase to a common reference RF oscillator.
摘要翻译： RF功率与不同的相位偏移耦合到等离子体室的电极上的不同RF连接点。优选地，不同的RF连接点的数量和对应的相位偏移量至少为4，并且RF连接点的位置沿电极的两个正交尺寸分布。优选地，每个相应RF连接点的功率由相应的RF电源提供，其中每个电源将其相位同步到公共参考RF振荡器。

5. 发明申请

US20090151636A1 RPSC AND RF FEEDTHROUGH 审中-公开
标题翻译： RPSC和RF FEEDTHROUGH
公开(公告)号：US20090151636A1
公开(公告)日：2009-06-18
申请号：US12271613
申请日：2008-11-14
申请人： John M. White , Bradley O. Stimson , Jozef Kudela
发明人： John M. White , Bradley O. Stimson , Jozef Kudela
IPC分类号： C23C16/513 , C23C16/511
CPC分类号： H01J37/32697 , H01J37/32091 , H01J37/32192 , H01J37/32357 , H01J37/32862
摘要： The present invention generally comprises an apparatus having an RF choke and a remote plasma source combined into a single unit. Process gases may be introduced to the chamber via the showerhead assembly which may be driven as an RF electrode. The gas feed tube may provide process gases and the cleaning gases to the process chamber. The inside of the gas feed tube may remain at a zero RF field to avoid premature gas breakdown within the gas feed tube that may lead to parasitic plasma formation between the gas source and the showerhead during processing. Igniting the cleaning gas plasma within the gas feed tube permits the plasma to be ignited closer to the processing chamber. Thus, RF current travels along the outside of the apparatus during deposition and microwave current ignites a plasma within the apparatus before feeding the plasma to the processing chamber.
摘要翻译：本发明通常包括具有组合成单个单元的RF扼流圈和远程等离子体源的装置。工艺气体可以经由可被作为RF电极驱动的喷头组件引入室。气体供给管可以将处理气体和清洁气体提供给处理室。气体供给管的内部可以保持在零RF场，以避免气体进料管内的过早气体击穿，这可能在处理期间导致气体源和喷头之间的寄生等离子体形成。点燃气体供给管内的清洁气体等离子体允许等离子体更靠近处理室被点燃。因此，RF电流在沉积期间沿着设备的外部行进，并且在将等离子体馈送到处理室之前，微波电流点燃设备内的等离子体。

6. 发明申请

US20080000768A1 Electrically Coupled Target Panels 审中-公开
标题翻译：电耦合目标板
公开(公告)号：US20080000768A1
公开(公告)日：2008-01-03
申请号：US11428226
申请日：2006-06-30
申请人： Bradley O. Stimson , Makoto Inagawa , Hienminh Huu Le , John M. White
发明人： Bradley O. Stimson , Makoto Inagawa , Hienminh Huu Le , John M. White
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/3407 , H01J37/3408 , H01J37/3423 , H01J37/3429 , H01J37/3435 , H01J37/3444
摘要： A method and apparatus for electrically coupling a plurality of target together is disclosed. Individually powered targets allow greater control over depositing during a sputtering process. By individually powering the targets, different power levels may be applied to different targets. The targets may additionally be coupled together with a resistor. The resistor allows the targets to have a more controlled power level.
摘要翻译：公开了一种用于将多个目标物电耦合在一起的方法和装置。单独供电的目标允许在溅射过程中更好地控制沉积。通过单独为目标供电，不同的功率水平可能适用于不同的目标。靶可以另外与电阻器耦合在一起。电阻允许目标具有更多的受控功率水平。

7. 发明授权

US10676817B2 Flip edge shadow frame 有权
公开(公告)号：US10676817B2
公开(公告)日：2020-06-09
申请号：US13569064
申请日：2012-08-07
申请人： Qunhua Wang , Soo Young Choi , Robin L. Tiner , John M. White , Gaku Furuta , Beom Soo Park
发明人： Qunhua Wang , Soo Young Choi , Robin L. Tiner , John M. White , Gaku Furuta , Beom Soo Park
IPC分类号： C23C16/04 , C23C16/458 , C23C14/04
摘要： Device for processing a substrate are described herein. An apparatus for controlling deposition on a substrate can include a chamber comprising a shadow frame support, a substrate support comprising a substrate supporting surface, a shadow frame with a shadow frame body including a first support surface, a second support surface opposite the first surface, and a detachable lip connected with the shadow frame body. The detachable lip can include a support connection, a first lip surface facing the substrate, a second lip surface opposite the first lip surface, a first edge positioned over the first support surface, and a second edge opposite the first edge to contact the substrate.

8. 发明授权

US09068262B2 Tightly fitted ceramic insulator on large area electrode 有权
标题翻译：在大面积电极上紧密配合陶瓷绝缘子
公开(公告)号：US09068262B2
公开(公告)日：2015-06-30
申请号：US13110184
申请日：2011-05-18
申请人： Jozef Kudela , Jonghoon Baek , John M. White , Robin Tiner , Suhail Anwar , Gaku Furuta
发明人： Jozef Kudela , Jonghoon Baek , John M. White , Robin Tiner , Suhail Anwar , Gaku Furuta
IPC分类号： C23C16/455 , C23C16/509 , H01J37/32
CPC分类号： B05B1/185 , C23C16/45565 , C23C16/509 , C23C16/5096 , H01J37/3244 , H01J37/32532 , H01J37/32623 , H01J37/32651 , Y10T137/6851
摘要： Embodiments of the invention generally include shield frame assembly for use with a showerhead assembly, and a showerhead assembly having a shield frame assembly that includes an insulator that tightly fits around the perimeter of a showerhead in a vacuum processing chamber. In one embodiment, a showerhead assembly includes a gas distribution plate and a multi-piece frame assembly that circumscribes a perimeter edge of the gas distribution plate. The multi-piece frame assembly allows for expansion of the gas distribution plate without creating gaps which may lead to arcing. In other embodiments, the insulator is positioned to be have the electric fields concentrated at the perimeter of the gas distribution plate located therein, thereby reducing arcing potential.
摘要翻译：本发明的实施例通常包括用于喷头组件的屏蔽框架组件和具有屏蔽框架组件的喷头组件，所述屏蔽框架组件包括紧密配合在真空处理室中的喷头周边周围的绝缘体。在一个实施例中，喷头组件包括气体分配板和环绕气体分布板的周边边缘的多片框架组件。多件式框架组件允许气体分配板的膨胀而不产生可能导致电弧的间隙。在其它实施例中，绝缘体被定位成具有集中在位于其中的气体分配板的周边的电场，从而减少电弧电势。

9. 发明授权

US08674844B2 Detecting plasma chamber malfunction 有权
标题翻译：检测等离子体室故障
公开(公告)号：US08674844B2
公开(公告)日：2014-03-18
申请号：US12661699
申请日：2010-03-19
申请人： Beom Soo Park , Hong Soon Kim , Soo Young Choi , James Hoffman , Suhail Anwar , John M. White
发明人： Beom Soo Park , Hong Soon Kim , Soo Young Choi , James Hoffman , Suhail Anwar , John M. White
IPC分类号： G08B21/00
CPC分类号： H01J37/32183 , H01J37/32935 , H01J37/3299
摘要： Malfunction of a component within an RF-powered plasma chamber is detected by observing an operating condition of the plasma chamber and detecting when the operating condition deviates from a previously observed range bounded by lower and upper limits. The lower and upper limits are determined by observing the minimum and maximum values of that operating condition during the processing of workpieces throughout one or more plasma chamber cleaning cycles immediately preceding the most recent cleaning of the plasma chamber.
摘要翻译：通过观察等离子体室的操作状态并检测何时操作条件偏离由下限和上限限定的先前观察范围，来检测RF供电的等离子体室内部件的故障。通过在紧邻等离子体室的最近清洁之前的一个或多个等离子体室清洁循环期间观察工件处理期间该操作条件的最小值和最大值来确定下限和上限。

10. 发明申请

US20130140009A1 ROBUST OUTLET PLUMBING FOR HIGH POWER FLOW REMOTE PLASMA SOURCE 审中-公开
公开(公告)号：US20130140009A1
公开(公告)日：2013-06-06
申请号：US13722637
申请日：2012-12-20
申请人： John M. White , Soo Young Choi , Beom Soo Park , Gaku Furuta , Young Jin Choi , Robin L. Tiner
发明人： John M. White , Soo Young Choi , Beom Soo Park , Gaku Furuta , Young Jin Choi , Robin L. Tiner
IPC分类号： F28D7/00
CPC分类号： F28D7/00 , C23C16/4405 , F28D2021/0078 , F28F9/26
摘要： The present invention generally includes a coupling between components. When igniting a plasma remote from a processing chamber, the reactive gas ions may travel to the processing chamber through numerous components. The reactive gas ions may be quite hot and cause the various components to become very hot and thus, the seals between apparatus components may fail. Therefore, it may be beneficial to cool any metallic components through which the reactive gas ions may travel. However, at the interface between the cooled metallic component and a ceramic component, the ceramic component may experience a temperature gradient sufficient to crack the ceramic material due to the heat of the reactive gas ions and the coolness of the metallic component. Therefore, extending a flange of the metallic component into the ceramic component may lessen the temperature gradient at the interface and reduce cracking of the ceramic component.

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