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1. 发明授权

US07999240B2 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US07999240B2
公开(公告)日：2011-08-16
申请号：US12168232
申请日：2008-07-07
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J37/20
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A system for analyzing a semiconductor device, including: a first ion beam apparatus including: a sample stage to mount a sample substrate; a vacuum chamber in which the sample stage is placed; an ion beam irradiating optical system to irradiate the sample substrate; a specimen holder that accommodates a plurality of specimens separated from the sample substrate by the irradiation of the ion beam; and a probe to extract the separated specimen from the sample substrate, and to transfer the separated specimen to the specimen holder; a second ion beam apparatus that carries out a finishing process to the specimen; and an analyzer to analyze the finished specimen, wherein the first ion beam apparatus separates the specimen and the probe in a vacuum condition.
摘要翻译：一种用于分析半导体器件的系统，包括：第一离子束装置，包括：样品台，用于安装样品基板; 其中放置样品台的真空室; 离子束照射光学系统照射样品基板; 样本保持器，其容纳通过离子束的照射与样品基板分离的多个样本; 以及从所述样品基材中提取分离出的试样并将分离的试样转移到所述试样保持器的探针。对样品进行精加工的第二离子束装置; 以及用于分析成品样品的分析器，其中所述第一离子束装置在真空条件下分离所述样品和所述探针。

2. 发明申请

US20080210883A1 Liquid metal ion gun 有权
标题翻译：液态金属离子枪
公开(公告)号：US20080210883A1
公开(公告)日：2008-09-04
申请号：US12076481
申请日：2008-03-19
申请人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
发明人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
IPC分类号： G21G5/00
CPC分类号： H01J27/02 , H01J27/22 , H01J37/08 , H01J2237/0805
摘要： An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture.
摘要翻译： Ga液体金属离子源的发射极构成为包括基材的W12和覆盖表面的离子源元素的Ga9作为构造材料。通过使反溅射的颗粒成为Ga液态金属离子源的元素（W和Ga），如果反溅射的颗粒附着到Ga液态金属离子源，则不会发生可能改变Ga9的物理特性的污染物。使用W光圈作为光束限制（GUN）光圈来放置大约的Ga。在束发射区域（Ga储存）中包含的部分的表面上25mg（熔点为30℃））。当将离子发射到光束限制（GUN）孔径时，发射区域中的Ga在W光阑的束发射区域的表面上熔化并扩散。

3. 发明申请

US20070145299A1 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US20070145299A1
公开(公告)日：2007-06-28
申请号：US11701410
申请日：2007-02-02
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J37/08
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A specimen fabrication apparatus including: a sample stage to mount or hold a sample substrate, an ion beam irradiating optical system to irradiate the sample substrate with an ion beam, a specimen holder to mount a specimen obtained from the sample substrate, a transferring means including a probe, and a deposition-gas supplying source to supply a deposition-gas for forming a deposition-film between the specimen and the probe.
摘要翻译：一种试样制造装置，其特征在于，具备：载置试样基板的样品台，离子束照射所述试样基板的离子束照射光学系统，将从所述试样基板得到的试样安装的试样保持体，探针和沉积气体供给源，以在样品和探针之间提供用于形成沉积膜的沉积气体。

4. 发明授权

US07235798B2 Focused ion beam apparatus 有权
标题翻译：聚焦离子束装置
公开(公告)号：US07235798B2
公开(公告)日：2007-06-26
申请号：US11151425
申请日：2005-06-14
申请人： Tohru Ishitani , Hiroyuki Muto , Yuichi Madokoro
发明人： Tohru Ishitani , Hiroyuki Muto , Yuichi Madokoro
IPC分类号： G21K5/10
CPC分类号： H01J37/28 , H01J37/12 , H01J2237/04924 , H01J2237/121 , H01J2237/31749
摘要： In order to implement faster high precision milling and high resolution image observation in the structure analysis and failure analysis of the MEMS and semiconductor devices, a two-lens optical system is mounted on a focused ion beam apparatus, and in the optical system the distance from an emitter apex in an ion source to an earth electrode included in a condenser lens and disposed nearest to the ion source is in the range of 5 to 14 mm.
摘要翻译：为了在MEMS和半导体器件的结构分析和故障分析中实现更快的高精度铣削和高分辨率图像观察，将双透镜光学系统安装在聚焦离子束装置上，并且在光学系统中距离离子源中的发射极顶点包括在聚光透镜中并且最靠近离子源设置的接地电极在5至14mm的范围内。

5. 发明授权

US07211805B2 Liquid metal ion gun 有权
标题翻译：液态金属离子枪
公开(公告)号：US07211805B2
公开(公告)日：2007-05-01
申请号：US11312367
申请日：2005-12-21
申请人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
发明人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
IPC分类号： H01J27/00 , G21G5/00 , G21K7/00
CPC分类号： H01J27/02 , H01J27/22 , H01J37/08 , H01J2237/0805
摘要： An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture.
摘要翻译： Ga液体金属离子源的发射极构成为包括基材的W12和覆盖表面的离子源元素的Ga9作为构造材料。通过使反溅射的颗粒成为Ga液态金属离子源的元素（W和Ga），如果反溅射的颗粒附着到Ga液态金属离子源，则不会发生可能改变Ga9的物理特性的污染物。使用W光圈作为光束限制（GUN）光圈来放置大约的Ga。在束发射区域（Ga储存）中包含的部分的表面上25mg（熔点为30℃））。当将离子发射到光束限制（GUN）孔径时，发射区域中的Ga在W光阑的束发射区域的表面上熔化并扩散。

6. 发明申请

US20060192099A1 Method and apparatus for specimen fabrication 有权
公开(公告)号：US20060192099A1
公开(公告)日：2006-08-31
申请号：US11390201
申请日：2006-03-28
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J49/00
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A specimen fabrication apparatus including: a specimen chamber, a sample stage in the specimen chamber, to mount a specimen substrate, a transfer unit to extract a micro-specimen from the specimen substrate, and to transfer the micro-specimen, within the specimen chamber; a specimen holder in the specimen chamber, to receive the micro-specimen from the transfer unit, and to have the micro-specimen affixed thereto, and an irradiating optical system to irradiate an ion beam to the specimen substrate or to the micro-specimen affixed to the specimen holder, wherein the transfer unit effects transfer of the micro-specimen from the specimen substrate to the specimen holder, and the irradiating optical system irradiates the ion beam onto the micro-specimen affixed to the specimen holder, while the specimen chamber remains substantially sealed.

7. 发明申请

US20110140006A1 METHOD AND APPARATUS FOR SPECIMEN FABRICATION 有权
标题翻译：方法和装置用于样本制造
公开(公告)号：US20110140006A1
公开(公告)日：2011-06-16
申请号：US13026568
申请日：2011-02-14
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： G21K5/04
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A focused ion beam apparatus, including: a specimen transferring unit having a probe to which a micro-specimen extracted from a specimen, can be joined through a joining deposition film, for transferring the micro-specimen to a sample holder; and wherein, the specimen transferring unit holds the probe which is joined through the joining deposition film to the micro-specimen extracted from the specimen, and the sample stage moves so that the sample holder mounted on the holder clasp is provided into an irradiated range of the focused ion beam, and the specimen transferring unit approaches the probe to the sample holder, and the gas nozzle supplies the deposition gas so that the micro-specimen is fixed to the sample holder through a fixing deposition film, and the ion beam irradiating optical system irradiates the focused ion beam to the micro-specimen fixed to the sample holder for various procedures.
摘要翻译：一种聚焦离子束装置，其特征在于，包括：具有从样本中提取微量试样的探针的检体转印单元，能够通过接合沉积膜接合，将所述微观样品转印到样品保持体上; 并且其中，所述检体转印单元将通过所述接合沉积膜接合的所述探针保持在从所述检体提取的所述微量试样上，并且所述样品台移动，使得安装在所述保持器扣上的样品保持器被设置在聚焦离子束和样品转印单元接近探针到样品保持器，并且气体喷嘴提供沉积气体，使得微量样品通过定影沉积膜固定到样品保持器，并且离子束照射光学系统将聚焦的离子束照射到固定到样品保持器上的微量样品用于各种程序。

8. 发明授权

US07397052B2 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US07397052B2
公开(公告)日：2008-07-08
申请号：US11701415
申请日：2007-02-02
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J37/20
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A system for analyzing a semiconductor device, including: a first specimen fabricating apparatus including: a vacuum chamber in which a sample substrate is placed, an ion beam irradiating optical system for forming a specimen on the sample substrate, a specimen holder to mount the specimen, and a probe for removing the specimen from the sample substrate; a second specimen fabricating apparatus, and an analyzer to analyze the specimen, wherein said first specimen fabrication apparatus has a function to separate the specimen mounted on the specimen holder and the probe in a vacuum condition.
摘要翻译：一种用于分析半导体器件的系统，包括：第一试样制造装置，包括：放置样品基板的真空室，用于在样品基板上形成试样的离子束照射光学系统，用于安装试样的试样保持器以及用于从样品基板除去试样的探针; 第二试样制造装置和分析器，其中所述第一试样制造装置具有在真空条件下分离安装在试样架上的试样和探针的功能。

9. 发明授权

US07397051B2 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US07397051B2
公开(公告)日：2008-07-08
申请号：US11701414
申请日：2007-02-02
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J37/20
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A specimen fabrication apparatus including: a vacuum chamber that accommodates a sample stage to mount a sample, an irradiating optical system that irradiates a focused ion beam to the sample to form a specimen, and a specimen holder placed in the vacuum chamber, to which said formed specimen is transferred by transferring means while the specimen chamber remains substantially sealed.
摘要翻译：一种标本制造装置，包括：容纳样品台以安装样品的真空室，将聚焦离子束照射到样品以形成样品的照射光学系统和放置在所述真空室中的试样保持器，形成的样品通过转移装置转移，同时样品室保持基本上密封。

10. 发明授权

US07397050B2 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US07397050B2
公开(公告)日：2008-07-08
申请号：US11701413
申请日：2007-02-02
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J37/20
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A specimen fabrication apparatus, including: an ion beam irradiating optical system to irradiate a sample placed in a chamber, with an ion beam, a specimen holder to mount a specimen separated by the irradiation of the ion beam, a holder cassette to hold the specimen holder, and a sample stage to hold the sample and the holder cassette, wherein said holder cassette is transferred to outside of the chamber in a condition of holding said specimen holder with the specimen mounted.
摘要翻译：一种试样制造装置，包括：离子束照射光学系统，用于照射放置在室中的样品，离子束，试样保持器，以安装通过离子束照射分离的试样;保持器盒，用于保持试样保持器和样品台以保持样品和保持器盒，其中所述保持器盒在保持所述样本保持器的状态下被转移到所述室的外部。

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