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1. 发明授权

US5614713A Scanning electron microscope 失效
标题翻译：扫描电子显微镜
公开(公告)号：US5614713A
公开(公告)日：1997-03-25
申请号：US617030
申请日：1996-03-18
申请人： Atsushi Kobaru , Tadashi Otaka , Tatsuya Maeda , Katsuhiro Sasada
发明人： Atsushi Kobaru , Tadashi Otaka , Tatsuya Maeda , Katsuhiro Sasada
IPC分类号： H01J37/20 , H01J37/21 , H01J37/22 , H01J37/244 , H01J37/26
CPC分类号： H01J37/22 , H01J2237/216 , H01J2237/2482
摘要： An electron beam is focused on a specimen by a focusing lens. A light beam is incident on the position of irradiation of the specimen with the electron beam and the reflected light beam is detected by a linear light detector. The output of the detector is used to measure the height of the specimen at the position of irradiation of the electron beam. The specimen is moved in a plane perpendicular to an optical axis of the focusing lens. A specimen height measuring device carries out the height measurement of the specimen at a position to be observed on the specimen and at positions thereon which are in the vicinity of the position to be observed, when those positions are located at the position of irradiation of the electron beam. The specimen height measuring device averages the measured values so as to produce a focusing correction signal on the basis thereof and controls the focusing lens on the basis of the focusing correction signal.
摘要翻译：电子束通过聚焦透镜聚焦在样本上。光束入射到具有电子束的样本的照射位置，并且通过线性光检测器检测反射光束。检测器的输出用于测量样品在电子束照射位置的高度。样本在垂直于聚焦透镜的光轴的平面内移动。样本高度测量装置在样本上观察的位置和在待观察位置附近的位置上执行样本的高度测量，当这些位置位于待观察位置的位置时电子束。样本高度测量装置对测量值进行平均，以便基于此产生聚焦校正信号，并且基于聚焦校正信号控制聚焦透镜。

2. 发明授权

US5598002A Electron beam apparatus 失效
标题翻译：电子束装置
公开(公告)号：US5598002A
公开(公告)日：1997-01-28
申请号：US632664
申请日：1996-03-28
申请人： Hideo Todokoro , Tadashi Otaka , Tatsuya Maeda , Katsuhiro Sasada
发明人： Hideo Todokoro , Tadashi Otaka , Tatsuya Maeda , Katsuhiro Sasada
IPC分类号： H01J37/141 , H01J37/20 , H01J37/21 , H01L21/027 , G02B21/18
CPC分类号： H01J37/21 , H01J2237/216 , H01J2237/2482
摘要： An electron beam apparatus focusses an electron beam onto a specimen by means of an objective magnetic lens. In order to detect changes in the height of the specimen, a laser light beam from a laser source is incident on the specimen and the reflected laser beam is detected by a light detector. Any change in the height of the specimen changes the path of the laser beam to the detector. Therefore, by monitoring the detector, the focussing of the electron beam on the specimen can be controlled by varying the current to an excitation coil of the objective magnetic lens or by moving the specimen via a mounting stage. At least one of the pole pieces of the objective lens is on the opposite side of the path of the laser beam to the source of the electron beam, so that the objective magnetic lens may be close to the specimen, permitting a short focal length. Thus, the laser beam may pass between the pole pieces. An optical microscope may also be provided to permit the specimen to be viewed. The viewing path of the optical microscope extends through an opening in one or both of the pole pieces of the objective magnetic lens.
摘要翻译：电子束装置通过物镜磁性透镜将电子束聚焦在样本上。为了检测样品的高度变化，来自激光源的激光束入射到样品上，并且通过光检测器检测反射的激光束。样品高度的任何变化会改变激光束到检测器的路径。因此，通过监视检测器，可以通过改变到物镜磁性透镜的激励线圈的电流或通过安装级移动样本来控制电子束在样本上的聚焦。物镜的极片中的至少一个位于激光束到电子束源的路径的相对侧，使得物镜磁性透镜可能靠近样本，允许短焦距。因此，激光束可以在极片之间通过。还可以提供光学显微镜以允许观察样品。光学显微镜的观察路径延伸穿过物镜磁性透镜的一个或两个极片中的开口。

3. 发明授权

US06667483B2 Apparatus using charged particle beam 有权
标题翻译：使用带电粒子束的装置
公开(公告)号：US06667483B2
公开(公告)日：2003-12-23
申请号：US09842789
申请日：2001-04-27
申请人： Atsushi Kobaru , Tadashi Otaka
发明人： Atsushi Kobaru , Tadashi Otaka
IPC分类号： H01J3726
CPC分类号： G01N23/04 , H01J37/20 , H01J37/28 , H01J37/3045 , H01J2237/20292
摘要： An apparatus using charged particle beam is provided with means for detecting positional difference between a target position on a chip pattern within an observation visual field of a microscope after displacing a sample stage thereof and a predetermined position within the visual field, means for storing the detection result and means for determining a new displacement target position for displacement to the predetermined position in subsequent observation while taking into account of the positional difference stored previously and the displacement target position used at the time of storage. When observing another wafer on which the same patterns with the same alignment as the previous one are printed or another pattern on the same wafer, the previous sample stage displacement target designation position is also modified while taking into account of the previous observation visual field position deviation which is registered to the corresponding observation position, and the stage is displaced according to the designation position. Thereby, quick and correct displacement of the observation position within an observation visual field can be realized.
摘要翻译：使用带电粒子束的装置设置有用于检测显微镜的观察视野内的切片图案上的目标位置与移动其取样台之后的位置差异的装置和视野内的预定位置之间的位置差异的装置，结果和装置，用于在考虑到先前存储的位置差异和在存储时使用的位移目标位置的同时，确定用于随后观察中位移到预定位置的新位移目标位置。当观察其上印刷与之前相同的相同图案的另一个晶片或在同一晶片上的另一图案时，先前的样品台位移目标指定位置也被修改，同时考虑到先前的观察视野位置偏差其被登记到相应的观察位置，并且台根据指定位置而移位。因此，可以实现观察视野内的观察位置的快速且正确的位移。

4. 发明授权

US08334520B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US08334520B2
公开(公告)日：2012-12-18
申请号：US13124599
申请日：2009-10-22
申请人： Tadashi Otaka , Hiroyuki Ito , Ryoichi Ishii , Manabu Yano , Hajime Kawano
发明人： Tadashi Otaka , Hiroyuki Ito , Ryoichi Ishii , Manabu Yano , Hajime Kawano
IPC分类号： H01J37/26
CPC分类号： H01J37/20 , H01J37/28 , H01J2237/20214 , H01J2237/2811 , H01J2237/2817
摘要： An exemplary a charged particle beam apparatus converts an inspection position on a test sample (wafer coordinate system) to a setting position of an inspection mechanism (stage coordinate system (polar coordinate system)), a rotating arm and a rotating stage being rotated to be moved for the inspection position on the test sample. In this case, inspection devices are arranged over a locus that is drawn by the center of the rotating stage according to the rotation of the rotating arm. A function for calculating errors (e.g., center shift of the rotating stage) and compensating for the errors is provided, by which the precision of inspection is improved in a charged particle beam apparatus equipped with a biaxial rotating stage mechanism.
摘要翻译：一种带电粒子束装置的示例将测试样品（晶片坐标系）上的检查位置转换成检查机构（载台坐标系（极坐标系））的设置位置，旋转臂和旋转台旋转为移动到测试样品上的检查位置。在这种情况下，检查装置设置在由旋转台的旋转中心旋转的轨迹上。提供了一种用于计算误差（例如，旋转台的中心偏移）和补偿误差的功能，通过该功能，在装备有双轴旋转平台机构的带电粒子束装置中提高了检查精度。

5. 发明授权

US07659508B2 Method for measuring dimensions of sample and scanning electron microscope 有权
标题翻译：测量样品和扫描电子显微镜尺寸的方法
公开(公告)号：US07659508B2
公开(公告)日：2010-02-09
申请号：US10450852
申请日：2002-03-27
申请人： Osamu Nasu , Tadashi Otaka , Hiroki Kawada , Ritsuo Fukaya , Makoto Ezumi
发明人： Osamu Nasu , Tadashi Otaka , Hiroki Kawada , Ritsuo Fukaya , Makoto Ezumi
IPC分类号： H01J37/28 , G01N23/225
CPC分类号： H01J37/28 , G01B15/00 , G01N23/225 , H01J2237/2814
摘要： The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ray apparatus by which the line widths and other length data of the patterns formed on samples are to be measured by scanning the surface of each sample with electrically charged particle rays and detecting the secondary electrons released from the sample, the scanning line interval of said electrically charged particle rays is set so as not to exceed the irradiation density dictated by the physical characteristics of the sample. Or measured length data is calculated from prestored approximation functions.
摘要翻译：本发明抑制在半导体样品的表面上形成的图案的体积减少，或者执行精确的长度测量，而不管这种减少。在带电粒子射线装置中，通过用带电粒子射线扫描每个样品的表面并检测从样品释放的二次电子，测量在样品上形成的图案的线宽和其它长度数据，扫描所述带电粒子束的线间隔被设定为不超过由样品的物理特性决定的照射密度。或者测量的长度数据由预先存储的近似函数计算。

6. 发明授权

US07022983B2 Monochromator and scanning electron microscope using the same 失效
公开(公告)号：US07022983B2
公开(公告)日：2006-04-04
申请号：US10751907
申请日：2004-01-07
申请人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
发明人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
IPC分类号： H01J37/05
CPC分类号： H01J37/05 , H01J37/153 , H01J37/28
摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

7. 发明申请

US20050006581A1 Method and scanning electron microscope for measuring width of material on sample 有权
标题翻译：用于测量样品材料宽度的方法和扫描电子显微镜
公开(公告)号：US20050006581A1
公开(公告)日：2005-01-13
申请号：US10911480
申请日：2004-08-05
申请人： Goroku Shimoma , Tadashi Otaka , Mitsugu Sato , Hideo Todokoro , Shunichi Watanabe , Tadanori Takahashi , Masahiro Kawawa , Masanori Gunji , Terumichi Nishino
发明人： Goroku Shimoma , Tadashi Otaka , Mitsugu Sato , Hideo Todokoro , Shunichi Watanabe , Tadanori Takahashi , Masahiro Kawawa , Masanori Gunji , Terumichi Nishino
IPC分类号： G01B15/00 , H01J37/22 , H01J37/28 , H01L21/66 , G01N23/00
CPC分类号： H01J37/28 , H01J2237/2814
摘要： A width-measurement method of reducing or eliminating an error in measurement of a width of an object on a sample resulting from the dimension of the beam diameter, wherein a width-measured value of the object to be width-measured which has been obtained on the basis of a secondary signal obtained from secondary particles emitted from the sample having thereon the object to be width-measured is corrected with a value with respect to a dimension value of a beam diameter.
摘要翻译：一种宽度测量方法，用于减少或消除由光束直径尺寸导致的样品宽度测量误差，其中宽度测量对象的宽度测量值已经在从其上具有待宽度测量对象的样品发射的二次粒子获得的二次信号的基础用相对于束直径的尺寸值的值进行校正。

8. 发明授权

US6114695A Scanning electron microscope and method for dimension measuring by using the same 失效
标题翻译：扫描电子显微镜及其使用的尺寸测量方法
公开(公告)号：US6114695A
公开(公告)日：2000-09-05
申请号：US307789
申请日：1999-05-10
申请人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Sadao Terakado , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
发明人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Sadao Terakado , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
IPC分类号： G01Q30/02 , G01B15/00 , G01B15/04 , G01Q30/04 , H01J37/26
CPC分类号： G01B15/00 , G01B15/04 , H01J2237/2448 , H01J2237/24495 , H01J2237/281
摘要： An electron beam which can transmit through part of a specimen and can reach a portion not exposing to the electron beam is irradiated and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron beam. Dimension-measuring start and end points are set on the scanning image and a dimension therebetween is measured. A cubic model is assumed, the cubic model is modified so as to match the scanning image, and dimension measurement is carried out on the basis of a modified cubic model.
摘要翻译：照射可以透过部分试样并且可以到达不暴露于电子束的部分的电子束，并且基于从照射电子束的部分二次产生的信号获得扫描图像。在扫描图像上设置尺寸测量开始点和终点，并测量它们之间的尺寸。假设立方模型，修改立方体模型以匹配扫描图像，并且基于修改的立方体模型进行尺寸测量。

9. 发明授权

US5412210A Scanning electron microscope and method for production of semiconductor device by using the same 失效
标题翻译：扫描电子显微镜及其制造方法
公开(公告)号：US5412210A
公开(公告)日：1995-05-02
申请号：US160336
申请日：1993-12-02
申请人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
发明人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
IPC分类号： G01B15/04 , G01Q30/02 , G01Q30/04 , G01Q30/12 , G01Q30/16 , G01Q30/18 , G01Q70/00 , H01J37/28 , H01J37/30 , H01J37/26
CPC分类号： G01B15/04 , H01J37/28 , H01J37/3005 , H01J2237/226 , H01J2237/2448 , H01J2237/24495 , H01J2237/281
摘要： A technique for displaying a scanned specimen image permits non-destructive observation of a surface structure having large or precipitous unevenness, an internal structure of a specimen or a specific structure of a defect or foreign matter, which non-destructive observation has hitherto been considered to be difficult to achieve. The technique can be applied to inspection and measurement so as to economically provide devices and parts of high quality and high reliability. Thus, secondary information such as secondary electrons resulting from interaction of primary information with a specimen, the primary information being generated as a result of interaction of a scanning electron beam with the specimen, is utilized as an image signal to form an image.
摘要翻译：用于显示扫描的样本图像的技术允许对具有大的或陡峭的不均匀性，样本的内部结构或缺陷或异物的特定结构的表面结构进行非破坏性观察，迄今为止已经认为非破坏性观察难以实现。该技术可以应用于检测和测量，从而经济地提供高质量和高可靠性的设备和部件。因此，作为图像信号利用作为扫描电子束与样本的相互作用的结果而生成的主要信息的次要信息，例如由主要信息与样本的相互作用产生的二次电子。

10. 发明授权

US5276325A Scanning microscope and a method of operating such a scanning microscope 失效
标题翻译：扫描显微镜和操作这种扫描显微镜的方法
公开(公告)号：US5276325A
公开(公告)日：1994-01-04
申请号：US945926
申请日：1992-09-17
申请人： Hideo Todokoro , Tadashi Otaka , Osamu Yamada
发明人： Hideo Todokoro , Tadashi Otaka , Osamu Yamada
IPC分类号： H01J37/147 , G02B21/00 , H01J37/22 , H01J37/26 , H01J37/28
CPC分类号： G02B21/002 , H01J37/265 , H01J37/28
摘要： A scanning microscope, such as a scanning electron microscope, has an energy beam which is caused to scan on a sample. A detector detects the interaction of the beam with the sample and generates sample image signals which are used to generate a display image of the scanned part of the sample. The sample image signals may be stored in an image memory, and a part of those sample image signals are read to generate the display image. This permits an effective magnification to be achieved without scanning the sample with scanning lines which are too close. Alternatively, or in addition, the beam may be cut intermittently during the scanning, at least for magnification above a predetermined limit. Where scanning is in a series of frames, each formed of a series of scanning lines, such cutting may change the interval between frames, the interval between lines, or may cause intermittent cutting within a line. All these changes reduce the duration of the beam on the sample, thereby reducing the risk of excessive charge build-up.
摘要翻译：诸如扫描电子显微镜的扫描显微镜具有能够在样品上扫描的能量束。检测器检测光束与样本的相互作用并产生用于产生样本的扫描部分的显示图像的样本图像信号。样本图像信号可以存储在图像存储器中，并且读取这些采样图像信号的一部分以生成显示图像。这样可以实现有效放大倍数，而不用太近的扫描线扫描样品。或者或另外，可以在扫描期间间歇地切割光束，至少放大超过预定极限。在扫描是一系列帧的情况下，每一帧由一系列扫描线形成，这种切割可以改变帧之间的间隔，线之间的间隔，或者可能导致线内的间歇切割。所有这些变化都会降低样品上光束的持续时间，从而降低过度电荷积聚的风险。

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