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1. 发明授权

US08334520B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US08334520B2
公开(公告)日：2012-12-18
申请号：US13124599
申请日：2009-10-22
申请人： Tadashi Otaka , Hiroyuki Ito , Ryoichi Ishii , Manabu Yano , Hajime Kawano
发明人： Tadashi Otaka , Hiroyuki Ito , Ryoichi Ishii , Manabu Yano , Hajime Kawano
IPC分类号： H01J37/26
CPC分类号： H01J37/20 , H01J37/28 , H01J2237/20214 , H01J2237/2811 , H01J2237/2817
摘要： An exemplary a charged particle beam apparatus converts an inspection position on a test sample (wafer coordinate system) to a setting position of an inspection mechanism (stage coordinate system (polar coordinate system)), a rotating arm and a rotating stage being rotated to be moved for the inspection position on the test sample. In this case, inspection devices are arranged over a locus that is drawn by the center of the rotating stage according to the rotation of the rotating arm. A function for calculating errors (e.g., center shift of the rotating stage) and compensating for the errors is provided, by which the precision of inspection is improved in a charged particle beam apparatus equipped with a biaxial rotating stage mechanism.
摘要翻译：一种带电粒子束装置的示例将测试样品（晶片坐标系）上的检查位置转换成检查机构（载台坐标系（极坐标系））的设置位置，旋转臂和旋转台旋转为移动到测试样品上的检查位置。在这种情况下，检查装置设置在由旋转台的旋转中心旋转的轨迹上。提供了一种用于计算误差（例如，旋转台的中心偏移）和补偿误差的功能，通过该功能，在装备有双轴旋转平台机构的带电粒子束装置中提高了检查精度。

2. 发明申请

US20110260057A1 CHARGED PARTICLE BEAM APPARATUS 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20110260057A1
公开(公告)日：2011-10-27
申请号：US13124599
申请日：2009-10-22
申请人： Tadashi Otaka , Hiroyuki Ito , Ryoichi Ishii , Manabu Yano , Hajime Kawano
发明人： Tadashi Otaka , Hiroyuki Ito , Ryoichi Ishii , Manabu Yano , Hajime Kawano
IPC分类号： H01J37/26
CPC分类号： H01J37/20 , H01J37/28 , H01J2237/20214 , H01J2237/2811 , H01J2237/2817
摘要： According to a charged particle beam apparatus of this invention, an inspection position on a test sample (wafer coordinate system) is converted to a setting position of an inspection mechanism (stage coordinate system (polar coordinate system)), a rotating arm (102,1012) and a rotating stage (103,1011) being rotated to be moved for the inspection position on the test sample.In this case, a plurality of inspection devices are arranged over a locus that is drawn by the center of the rotating stage according to the rotation of the rotating arm. A function for calculating errors (e.g., center shift of the rotating stage) and compensating for the errors is provided, by which the precision of inspection is improved in a charged particle beam apparatus equipped with a biaxial rotating stage mechanism. With this configuration, a charged particle beam apparatus which is small-sized and capable of easy stage control can be realized.
摘要翻译：根据本发明的带电粒子束装置，将测试样品（晶片坐标系）上的检查位置转换为检查机构（载台坐标系（极坐标系））的设定位置，旋转臂（102， 1012）和旋转台（103,1011）旋转以移动以用于测试样品上的检查位置。在这种情况下，根据旋转臂的旋转，将多个检查装置布置在由旋转台的中心拉伸的轨迹上。提供了一种用于计算误差（例如，旋转台的中心偏移）和补偿误差的功能，通过该功能，在装备有双轴旋转平台机构的带电粒子束装置中提高了检查精度。利用这种结构，可以实现小型化并且能够容易地进行阶段控制的带电粒子束装置。

3. 发明授权

US08324594B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US08324594B2
公开(公告)日：2012-12-04
申请号：US12370242
申请日：2009-02-12
申请人： Hiroyuki Ito , Yuko Sasaki , Tadashi Otaka
发明人： Hiroyuki Ito , Yuko Sasaki , Tadashi Otaka
IPC分类号： G01F23/00 , G21K5/08 , G21K5/10
CPC分类号： H01J37/28 , H01J37/20 , H01J37/30 , H01J2237/0216 , H01J2237/20214 , H01J2237/20221
摘要： A charged particle beam apparatus can be constructed with a smaller size (resulting in a small installation space) and a lower cost, suppress vibration, operate at higher speed, and be reliable in inspection. The charged particle beam apparatus is largely effective when a wafer having a large diameter is used. The charged particle beam apparatus includes: a plurality of inspection mechanisms, each of which is mounted on a vacuum chamber and has a charged particle beam mechanism for performing at least an inspection on the sample; a single-shaft transfer mechanism that moves the sample between the inspection mechanisms in the direction of an axis of the single-shaft transfer mechanism; and a rotary stage that mounts the sample thereon and has a rotational axis on the single-shaft transfer mechanism. The single-shaft transfer mechanism moves the sample between the inspection mechanisms in order that the sample is placed under any of the inspection mechanisms. The rotary stage positions the sample such that a target portion of the sample can be inspected by the inspection mechanism under which the sample is placed, and the inspection mechanisms inspect the sample.
摘要翻译：带电粒子束装置可以以较小的尺寸（导致小的安装空间）和较低的成本，抑制振动，更高的速度运行并且可靠地进行检查。当使用具有大直径的晶片时，带电粒子束装置很有效。带电粒子束装置包括：多个检查机构，每个检查机构安装在真空室上，并具有至少对样品进行检查的带电粒子束机构; 单轴传送机构，其在所述检查机构之间沿所述单轴传送机构的轴线的方向移动所述样本; 以及将样品安装在其上并在单轴传送机构上具有旋转轴的旋转台。单轴传送机构将样品移动到检查机构之间，以便将样品放置在任何检查机构下。旋转台定位样品，使得样品的目标部分可以通过放置样品的检查机构进行检查，检查机构检查样品。

4. 发明申请

US20090218509A1 CHARGED PARTICLE BEAM APPARATUS 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20090218509A1
公开(公告)日：2009-09-03
申请号：US12370242
申请日：2009-02-12
申请人： Hiroyuki Ito , Yuko Sasaki , Tadashi Otaka
发明人： Hiroyuki Ito , Yuko Sasaki , Tadashi Otaka
IPC分类号： G21K5/10
CPC分类号： H01J37/28 , H01J37/20 , H01J37/30 , H01J2237/0216 , H01J2237/20214 , H01J2237/20221
摘要： A charged particle beam apparatus can be constructed with a smaller size (resulting in a small installation space) and a lower cost, suppress vibration, operate at higher speed, and be reliable in inspection. The charged particle beam apparatus is largely effective when a wafer having a large diameter is used. The charged particle beam apparatus includes: a plurality of inspection mechanisms, each of which is mounted on a vacuum chamber and has a charged particle beam mechanism for performing at least an inspection on the sample; a single-shaft transfer mechanism that moves the sample between the inspection mechanisms in the direction of an axis of the single-shaft transfer mechanism; and a rotary stage that mounts the sample thereon and has a rotational axis on the single-shaft transfer mechanism. The single-shaft transfer mechanism moves the sample between the inspection mechanisms in order that the sample is placed under any of the inspection mechanisms. The rotary stage positions the sample such that a target portion of the sample can be inspected by the inspection mechanism under which the sample is placed, and the inspection mechanisms inspect the sample.
摘要翻译：带电粒子束装置可以以较小的尺寸（导致小的安装空间）和较低的成本，抑制振动，更高的速度运行并且可靠地进行检查。当使用具有大直径的晶片时，带电粒子束装置很有效。带电粒子束装置包括：多个检查机构，每个检查机构安装在真空室上，并具有至少对样品进行检查的带电粒子束机构; 单轴传送机构，其在所述检查机构之间沿所述单轴传送机构的轴线的方向移动所述样本; 以及将样品安装在其上并在单轴传送机构上具有旋转轴的旋转台。单轴传送机构将样品移动到检查机构之间，以便将样品放置在任何检查机构下。旋转台定位样品，使得样品的目标部分可以通过放置样品的检查机构进行检查，检查机构检查样品。

5. 发明授权

US07875858B2 Charged particle beam trajectory corrector and charged particle beam apparatus 有权
标题翻译：带电粒子束轨迹校正器和带电粒子束装置
公开(公告)号：US07875858B2
公开(公告)日：2011-01-25
申请号：US12349708
申请日：2009-01-07
申请人： Hiroyuki Ito , Yuko Sasaki , Ryoichi Ishii , Takashi Doi
发明人： Hiroyuki Ito , Yuko Sasaki , Ryoichi Ishii , Takashi Doi
IPC分类号： H01J1/50 , G21K1/08 , G21K1/093
CPC分类号： H01J37/153 , H01J37/145 , H01J37/28 , H01J2237/1534
摘要： The invention relates to a trajectory correction method for a charged particle beam, and provides a low-cost, high accuracy and high-resolution converging optical system for use with a charged particle beam to solve problems with conventional aberration correction systems. To this end, the present invention uses a configuration which forms electromagnetic field which is concentrated towards a center of a beam trajectory axis, causes oblique of the beam to make use of lens effects and bend the trajectory, and consequently, cancels out large external side non-linear effects such a spherical aberration of the electron lens. Specifically, the configuration generates an electric field concentration in a simple manner by providing electrodes above the axis and applying voltages to the electrodes. Further, the above configuration can be realized trough operations using lenses and deflectors with incident axes and image formation positions that are normal.
摘要翻译：本发明涉及一种用于带电粒子束的轨迹校正方法，并且提供了一种用于带电粒子束的低成本，高精度和高分辨率会聚光学系统，以解决常规像差校正系统的问题。为此，本发明使用形成朝向光束轨迹轴的中心集中的电磁场的结构，使得光束的倾斜利用透镜效果并弯曲轨迹，因此抵消了大的外侧电子透镜的非线性效应如球面像差。具体地说，该配置通过在轴上方设置电极并向电极施加电压，以简单的方式产生电场浓度。此外，可以通过使用具有入射轴和成像位置的透镜和偏转器的槽操作来实现上述配置。

6. 发明授权

US11211082B1 Magnetic head including spin torque oscillator 有权
公开(公告)号：US11211082B1
公开(公告)日：2021-12-28
申请号：US17169995
申请日：2021-02-08
申请人： Yoshitaka Sasaki , Hiroyuki Ito , Tetsuhito Shinohara , Shigeki Tanemura , Kazuki Sato , Yoji Nomura , Hironori Araki , Tetsuya Roppongi
发明人： Yoshitaka Sasaki , Hiroyuki Ito , Tetsuhito Shinohara , Shigeki Tanemura , Kazuki Sato , Yoji Nomura , Hironori Araki , Tetsuya Roppongi
IPC分类号： G11B5/187 , G11B5/115
摘要： A magnetic head includes a medium facing surface, a main pole, a trailing shield, a spin torque oscillator, and a first insulating layer. The first insulating layer is interposed between a portion of the main pole and a portion of the spin torque oscillator. The first insulating layer has a first end closest to the medium facing surface. The spin torque oscillator has a rear end farthest from the medium facing surface. The first end of the first insulating layer is located closer to the medium facing surface than the rear end of the spin torque oscillator is.

7. 发明授权

US09958769B1 Method of manufacturing a plasmon generator 有权
公开(公告)号：US09958769B1
公开(公告)日：2018-05-01
申请号：US15387066
申请日：2016-12-21
申请人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Seiichiro Tomita , Shigeki Tanemura , Yukinori Ikegawa
发明人： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Seiichiro Tomita , Shigeki Tanemura , Yukinori Ikegawa
IPC分类号： G03F1/38 , G03F7/09 , G11B5/31 , G11B5/00
CPC分类号： G03F1/38 , G03F7/094 , G11B5/3169 , G11B2005/0021
摘要： A plasmon generator including a wide portion and a narrow portion is manufactured by etching an initial plasmon generator using an etching mask. The etching mask includes a first mask layer for defining the shape of one of the narrow portion and the wide portion, and a second mask layer for defining the shape of the other of the narrow portion and the wide portion. The etching mask is formed by forming a first hard mask, a second initial mask layer and a second hard mask in this order on a first initial mask layer, and etching the first and second initial mask layers by using the first and second hard masks.

8. 发明授权

US09659588B2 Thermally-assisted magnetic recording head including a main pole and a plasmon generator 有权
公开(公告)号：US09659588B2
公开(公告)日：2017-05-23
申请号：US14825020
申请日：2015-08-12
申请人： Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Hironori Araki , Seiichiro Tomita , Hideo Mamiya
发明人： Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Hironori Araki , Seiichiro Tomita , Hideo Mamiya
IPC分类号： G11B5/127 , G11B5/48 , G11B5/31 , G11B5/187 , G11B5/11 , G11B5/00 , G11B5/60 , G11B5/012
CPC分类号： G11B5/4866 , G11B5/012 , G11B5/11 , G11B5/127 , G11B5/1278 , G11B5/187 , G11B5/313 , G11B5/3133 , G11B5/314 , G11B5/3163 , G11B5/60 , G11B5/6088 , G11B2005/0021
摘要： A main pole has a front end face including a first end face portion and a second end face portion. A plasmon generator has a near-field light generating surface. A surrounding layer has a first surrounding layer end face and a second surrounding layer end face located on opposite sides of the first end face portion in the track width direction. A gap film has a first gap film end face and a second gap film end face located on opposite sides of the near-field light generating surface in the track width direction. Each of the first and second gap film end faces includes a portion located between the first and second surrounding layer end faces, but does not include any portion interposed between the first surrounding layer end face and the first end face portion or between the second surrounding layer end face and the first end face portion.

9. 发明授权

US09478241B1 Thermally-assisted magnetic recording head having inclined main magnetic pole and core 有权
标题翻译：具有倾斜主磁极和磁芯的热辅助磁记录头
公开(公告)号：US09478241B1
公开(公告)日：2016-10-25
申请号：US15019428
申请日：2016-02-09
申请人： Shigeki Tanemura , Yoshitaka Sasaki , Hiroyuki Ito , Xuhui Jin , Hideo Mamiya , Yukinori Ikegawa
发明人： Shigeki Tanemura , Yoshitaka Sasaki , Hiroyuki Ito , Xuhui Jin , Hideo Mamiya , Yukinori Ikegawa
IPC分类号： G11B11/00 , G11B5/48 , G11B5/31 , G11B5/60 , G11B5/00 , G11B11/105
CPC分类号： G11B5/6088 , G11B5/314 , G11B11/10543 , G11B11/10554 , G11B11/1058 , G11B2005/0021
摘要： A thermally-assisted magnetic recording head includes a main pole, a waveguide, and a plasmon generator. The waveguide includes a core and a cladding. The main pole and the core are located on the same side in the direction of travel of a recording medium relative to the plasmon generator. The main pole has a first end face located in the medium facing surface, and a second end face opposite to the first end face. The core has a front end face opposed to the second end face of the main pole. The cladding includes an interposition section interposed between the front end face of the core and the second end face of the main pole. The front end face of the core and the second end face of the main pole are inclined with respect to the medium facing surface.
摘要翻译：热辅助磁记录头包括主极，波导和等离子体发生器。波导包括芯和包层。主磁极和磁芯位于记录介质相对于等离子体发生器的行进方向的同一侧。主极具有位于介质面对表面中的第一端面和与第一端面相对的第二端面。芯具有与主极的第二端面相对的前端面。包层包括插入在芯的前端面和主极的第二端面之间的插入部分。芯的前端面和主极的第二端面相对于介质面向表面倾斜。

10. 发明授权

US09336798B1 Magnetic head for perpendicular magnetic recording including a main pole with a lower protrusion 有权
标题翻译：用于垂直磁记录的磁头，包括具有下凸起的主极
公开(公告)号：US09336798B1
公开(公告)日：2016-05-10
申请号：US14567590
申请日：2014-12-11
申请人： Yoshitaka Sasaki , Kazuki Sato , Hiroyuki Ito , Shigeki Tanemura , Hironori Araki , Yukinori Ikegawa
发明人： Yoshitaka Sasaki , Kazuki Sato , Hiroyuki Ito , Shigeki Tanemura , Hironori Araki , Yukinori Ikegawa
IPC分类号： G11B5/187 , G11B5/127 , G11B5/17 , G11B5/31
CPC分类号： G11B5/1278 , G11B5/02 , G11B5/17 , G11B5/187 , G11B5/3116 , G11B5/315 , G11B5/3163 , G11B5/3169
摘要： A main pole includes a main body and a lower protrusion. The lower protrusion is located at a distance from a medium facing surface. The main body includes a front portion and a rear portion. The front portion has a first side surface and a second side surface. The lower protrusion has a third side surface and a fourth side surface. A first side shield has a first sidewall opposed to the first side surface. A second side shield has a second sidewall opposed to the second side surface. A bottom shield includes a receiving section. The receiving section has a third sidewall opposed to the third side surface, and a fourth sidewall opposed to the fourth side surface. The receiving section and the lower protrusion are formed in a self-aligned manner by using the first and second side shields.
摘要翻译：主杆包括主体和下突起。下突出部位于与面向介质的表面相距一定距离处。主体包括前部和后部。前部具有第一侧表面和第二侧表面。下突起具有第三侧表面和第四侧表面。第一侧屏蔽具有与第一侧表面相对的第一侧壁。第二侧屏蔽具有与第二侧表面相对的第二侧壁。底部屏蔽包括接收部分。接收部分具有与第三侧表面相对的第三侧壁和与第四侧表面相对的第四侧壁。通过使用第一和第二侧面屏蔽件以自对准的方式形成接收部分和下部突出部。

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