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1. 发明申请

US20100038535A1 Sample dimension measuring method and scanning electron microscope 有权
标题翻译：样品尺寸测量方法和扫描电子显微镜
公开(公告)号：US20100038535A1
公开(公告)日：2010-02-18
申请号：US12560091
申请日：2009-09-15
申请人： Osamu Nasu , Tadashi Otaka , Hiroki Kawada , Ritsuo Fukaya , Makoto Ezumi
发明人： Osamu Nasu , Tadashi Otaka , Hiroki Kawada , Ritsuo Fukaya , Makoto Ezumi
IPC分类号： G01Q20/00 , G01N23/00
CPC分类号： H01J37/28 , G01B15/00 , G01N23/225 , H01J2237/2814
摘要： The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ray apparatus by which the line widths and other length data of the patterns formed on samples are to be measured by scanning the surface of each sample with electrically charged particle rays and detecting the secondary electrons released from the sample, the scanning line interval of said electrically charged particle rays is set so as not to exceed the irradiation density dictated by the physical characteristics of the sample. Or measured length data is calculated from prestored approximation functions.
摘要翻译：本发明抑制在半导体样品的表面上形成的图案的体积减少，或者执行精确的长度测量，而不管这种减少。在带电粒子射线装置中，通过用带电粒子射线扫描每个样品的表面并检测从样品释放的二次电子，测量在样品上形成的图案的线宽和其它长度数据，扫描所述带电粒子束的线间隔被设定为不超过由样品的物理特性决定的照射密度。或者测量的长度数据由预先存储的近似函数计算。

2. 发明授权

US07659508B2 Method for measuring dimensions of sample and scanning electron microscope 有权
标题翻译：测量样品和扫描电子显微镜尺寸的方法
公开(公告)号：US07659508B2
公开(公告)日：2010-02-09
申请号：US10450852
申请日：2002-03-27
申请人： Osamu Nasu , Tadashi Otaka , Hiroki Kawada , Ritsuo Fukaya , Makoto Ezumi
发明人： Osamu Nasu , Tadashi Otaka , Hiroki Kawada , Ritsuo Fukaya , Makoto Ezumi
IPC分类号： H01J37/28 , G01N23/225
CPC分类号： H01J37/28 , G01B15/00 , G01N23/225 , H01J2237/2814
摘要： The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ray apparatus by which the line widths and other length data of the patterns formed on samples are to be measured by scanning the surface of each sample with electrically charged particle rays and detecting the secondary electrons released from the sample, the scanning line interval of said electrically charged particle rays is set so as not to exceed the irradiation density dictated by the physical characteristics of the sample. Or measured length data is calculated from prestored approximation functions.
摘要翻译：本发明抑制在半导体样品的表面上形成的图案的体积减少，或者执行精确的长度测量，而不管这种减少。在带电粒子射线装置中，通过用带电粒子射线扫描每个样品的表面并检测从样品释放的二次电子，测量在样品上形成的图案的线宽和其它长度数据，扫描所述带电粒子束的线间隔被设定为不超过由样品的物理特性决定的照射密度。或者测量的长度数据由预先存储的近似函数计算。

3. 发明授权

US08080789B2 Sample dimension measuring method and scanning electron microscope 有权
标题翻译：样品尺寸测量方法和扫描电子显微镜
公开(公告)号：US08080789B2
公开(公告)日：2011-12-20
申请号：US12560091
申请日：2009-09-15
申请人： Osamu Nasu , Tadashi Otaka , Hiroki Kawada , Ritsuo Fukaya , Makoto Ezumi
发明人： Osamu Nasu , Tadashi Otaka , Hiroki Kawada , Ritsuo Fukaya , Makoto Ezumi
IPC分类号： H01J37/28 , G01N23/225
CPC分类号： H01J37/28 , G01B15/00 , G01N23/225 , H01J2237/2814
摘要： The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ray apparatus by which the line widths and other length data of the patterns formed on samples are to be measured by scanning the surface of each sample with electrically charged particle rays and detecting the secondary electrons released from the sample, the scanning line interval of said electrically charged particle rays is set so as not to exceed the irradiation density dictated by the physical characteristics of the sample. Or measured length data is calculated from prestored approximation functions.
摘要翻译：本发明抑制在半导体样品的表面上形成的图案的体积减少，或者执行精确的长度测量，而不管这种减少。在带电粒子射线装置中，通过用带电粒子射线扫描每个样品的表面并检测从样品释放的二次电子，测量在样品上形成的图案的线宽和其它长度数据，扫描所述带电粒子束的线间隔被设定为不超过由样品的物理特性决定的照射密度。或者测量的长度数据由预先存储的近似函数计算。

4. 发明授权

US07022983B2 Monochromator and scanning electron microscope using the same 失效
公开(公告)号：US07022983B2
公开(公告)日：2006-04-04
申请号：US10751907
申请日：2004-01-07
申请人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
发明人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
IPC分类号： H01J37/05
CPC分类号： H01J37/05 , H01J37/153 , H01J37/28
摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

5. 发明申请

US20060219910A1 Monochromator and scanning electron microscope using the same 有权
标题翻译：单色器和扫描电子显微镜使用相同
公开(公告)号：US20060219910A1
公开(公告)日：2006-10-05
申请号：US11344529
申请日：2006-02-01
申请人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
发明人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
IPC分类号： G21K7/00 , G01N23/00
CPC分类号： H01J37/05 , H01J37/153 , H01J37/28
摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.
摘要翻译：本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场在与包含狭缝的表面形成对称镜的位置处。该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。

6. 发明授权

US07838827B2 Monochromator and scanning electron microscope using the same 有权
标题翻译：单色器和扫描电子显微镜使用相同
公开(公告)号：US07838827B2
公开(公告)日：2010-11-23
申请号：US11987018
申请日：2007-11-26
申请人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
发明人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
IPC分类号： H01J37/05
CPC分类号： H01J37/05 , H01J37/153 , H01J37/28
摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.
摘要翻译：本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场在与包含狭缝的表面形成对称镜的位置处。该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。

7. 发明申请

US20100006755A1 CHARGED PARTICLE BEAM ALIGNMENT METHOD AND CHARGED PARTICLE BEAM APPARATUS 审中-公开
标题翻译：充电颗粒光束对准方法和充电颗粒光束装置
公开(公告)号：US20100006755A1
公开(公告)日：2010-01-14
申请号：US12564511
申请日：2009-09-22
申请人： Mitsugo Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
发明人： Mitsugo Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
IPC分类号： G01N23/22
CPC分类号： H01J37/1471 , H01J37/28 , H01J2237/1501 , H01J2237/153
摘要： An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.
摘要翻译：本发明的目的是提供一种带电粒子束装置和带电粒子束装置的对准方法，即使当带电粒子束的状态发生变化时，也能够容易地使带电粒子束的光轴对准。本发明包括用于计算对物镜执行轴对准的对准偏转器的偏转量的计算装置，用于计算偏转量的多种计算方法被存储在计算装置中，以及选择装置，用于至少选择提供了一种计算方法。

8. 发明授权

US07315024B2 Monochromator and scanning electron microscope using the same 有权
标题翻译：单色器和扫描电子显微镜使用相同
公开(公告)号：US07315024B2
公开(公告)日：2008-01-01
申请号：US11344529
申请日：2006-02-01
申请人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
发明人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
IPC分类号： G21K7/00 , G01N23/00
CPC分类号： H01J37/05 , H01J37/153 , H01J37/28
摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.
摘要翻译：本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场在与包含狭缝的表面形成对称镜的位置处。该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。

9. 发明授权

US07605381B2 Charged particle beam alignment method and charged particle beam apparatus 有权
公开(公告)号：US07605381B2
公开(公告)日：2009-10-20
申请号：US10734261
申请日：2003-12-15
申请人： Mitsugu Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
发明人： Mitsugu Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
IPC分类号： H01L21/027
CPC分类号： H01J37/1471 , H01J37/28 , H01J2237/1501 , H01J2237/153
摘要： An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.

10. 发明申请

US20080237463A1 Monochromator and scanning electron microscope using the same 有权
公开(公告)号：US20080237463A1
公开(公告)日：2008-10-02
申请号：US11987018
申请日：2007-11-26
申请人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
发明人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
IPC分类号： G01N23/00 , G21K1/08
CPC分类号： H01J37/05 , H01J37/153 , H01J37/28
摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

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