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1. 发明专利

JP2012094915A Positioning system and methods for lithographic apparatus 有权
标题翻译：定位装置的定位系统和方法
公开(公告)号：JP2012094915A
公开(公告)日：2012-05-17
申请号：JP2012022300
申请日：2012-02-03
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN BILSEN FRANCISCUS BERNARDUS MARIA , BURGHOORN JACOBUS , VAN HAREN RICHARD JOHANNES FRANCISCUS , HINNEN PAUL CHRISTIAAN , VAN HORSSEN HERMANUS GERARDUS , HUIJBREGTSE JEROEN , JUENINK ANDRE BERNARDUS , MEGENS HENRY , NAVARRO Y KOREN RAMON , TOLSMA HOITE PIETER THEODOOR , HUBERTUS JOHANNES GERTRUDUS SIMONS , SCHUURHUIS JOHNY RUTGER , SCHETS SICCO IAN , LEE BRIAN , DUNBAR ALLAN
IPC分类号： G01B11/00 , H01L21/027 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： PROBLEM TO BE SOLVED: To provide an alignment system for a lithography projecting apparatus in which accuracy of positioning and/or robust properties is improved.SOLUTION: An alignment system for a lithographic apparatus comprises: a positioning radiation source 1; a detection system having a first detector channel and a second detector channel; and a position determining unit that communicates with the detection system. The position determining unit processes information from the first and second detector channels in combination, and determines a position of a positioning mark on a first object relative to a reference position on a second object, based on the combined information.
摘要翻译：要解决的问题：提供一种提高定位精度和/或鲁棒特性的光刻投影装置的对准系统。解决方案：用于光刻设备的对准系统包括：定位辐射源1; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。位置确定单元组合地处理来自第一和第二检测器通道的信息，并且基于组合的信息确定相对于第二对象上的参考位置的第一对象上的定位标记的位置。版权所有（C）2012，JPO＆INPIT

2. 发明专利

JP2009069163A Alignment system and methods for lithographic systems 有权
标题翻译： LITHOGRAPHIC系统的对准系统和方法
公开(公告)号：JP2009069163A
公开(公告)日：2009-04-02
申请号：JP2008307147
申请日：2008-12-02
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN BILSEN FRANCISCUS BERNARDU , BURGHOORN JACOBUS , VAN HAREN RICHARD JOHANNES FRA , HINNEN PAUL CHRISTIAAN , VAN HORSSEN HERMANUS GERARDUS , HUIJBREGTSE JEROEN , JUENINK ANDRE BERNARDUS , MEGENS HENRY , NAVARRO Y KOREN RAMON , TOLSMA HOITE PIETER THEODOOR , HUBERTUS JOHANNES GERTRUDUS SI , SCHUURHUIS JOHNY RUTGER , SCHETS SICCO IAN , LEE BRIAN , DUNBAR ALLAN
IPC分类号： G01B11/00 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： PROBLEM TO BE SOLVED: To provide an alignment system for a lithography projecting device, with the accuracy of positioning and/or robust properties improved. SOLUTION: An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit that communicates with the detection system. The position-determining unit processes information from the first and second detector channels in combination and determines the position of an alignment mark on a first object relative to a reference position on a second object, based on the combined information. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供用于光刻投影装置的对准系统，其具有改善的定位精度和/或鲁棒特性。解决方案：用于光刻设备的对准系统具有对准辐射源，具有第一检测器通道和第二检测器通道的检测系统以及与检测系统通信的位置确定单元。位置确定单元组合地处理来自第一和第二检测器通道的信息，并且基于组合的信息确定相对于第二对象上的参考位置的第一对象上的对准标记的位置。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2008034878A Alignment system of lithographic equipment, and method 审中-公开
标题翻译：立体设备对准系统及方法
公开(公告)号：JP2008034878A
公开(公告)日：2008-02-14
申请号：JP2007267899
申请日：2007-10-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN BILSEN FRANCISCUS BERNARDU , BURGHOORN JACOBUS , VAN HAREN RICHARD JOHANNES FRA , HINNEN PAUL CHRISTIAAN , VAN HORSSEN HERMANUS GERARDUS , HUIJBREGTSE JEROEN , JUENINK ANDRE BERNARDUS , MEGENS HENRY , NAVARRO Y KOREN RAMON , TOLSMA HOITE PIETER THEODOOR , HUBERTUS JOHANNES GERTRUDUS SI , SCHUURHUIS JOHNY RUTGER , SCHETS SICCO IAN , LEE BRIAN , DUNBAR ALLAN
IPC分类号： G01B11/00 , H01L21/027 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： PROBLEM TO BE SOLVED: To provide an alignment system for lithographic projection equipment in which the accuracy and/or robust property of alignment are improved. SOLUTION: The alignment system of the lithographic equipment includes an aligning radiation source 1, a detection system having a first detector channel and a second detector channel, and an alignment unit communicated with the detection system. The alignment unit determines the position of an alignment mark on a first object for a reference position on a second object based on a combined information that is combined and processed the information from the first and second detection channels. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于光刻投影设备的对准系统，其中对准的精度和/或鲁棒性能得到改善。解决方案：光刻设备的对准系统包括对准辐射源1，具有第一检测器通道和第二检测器通道的检测系统以及与检测系统连通的对准单元。对准单元基于组合和处理来自第一和第二检测通道的信息的组合信息，确定第一对象上的对准标记在第二对象上的参考位置的位置。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2008033329A System and method to compensate for critical dimension non-uniformity in lithography system 审中-公开
标题翻译：用于补偿关系尺度非均匀性的系统和方法
公开(公告)号：JP2008033329A
公开(公告)日：2008-02-14
申请号：JP2007195059
申请日：2007-07-26
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN HORSSEN HERMANUS GERARDUS
IPC分类号： G03F7/20 , G02B5/30 , H01L21/027
CPC分类号： G03F7/70441 , G03F7/70566
摘要： PROBLEM TO BE SOLVED: To provide a system and method to compensate for critical dimension non-uniformity caused by different polarization directions of an illumination beam. SOLUTION: The system comprises an illumination system, a patterning device and a projection system. The illumination system generates an illumination beam of radiation and comprises a source of radiation and an optical system. The source of radiation produces a beam of radiation. The optical system transmits a first portion of the illumination beam having a first polarization direction during a first portion of a cycle and a second portion of the illumination beam having a second polarization direction during a second portion of the cycle. The patterning device includes first and second patterns having respective first and second optical proximity corrections corresponding to the first and second polarization directions. The first and second patterns pattern respective ones of the first and second portions of the illumination beam. The projection system projects the first and second patterned beams onto a target portion of a substrate. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于补偿由照明光束的不同偏振方向引起的临界尺寸不均匀性的系统和方法。解决方案：该系统包括照明系统，图案形成装置和投影系统。照明系统产生照射辐射束并且包括辐射源和光学系统。辐射源产生一束辐射。光学系统在周期的第一部分期间透射具有第一偏振方向的照明光束的第一部分，并且在周期的第二部分期间，照明光束的第二部分具有第二偏振方向。图案形成装置包括具有对应于第一和第二偏振方向的相应的第一和第二光学邻近校正的第一和第二图案。第一和第二图案模拟照明光束的第一和第二部分中的各个。投影系统将第一和第二图案化的光束投射到基板的目标部分上。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2004282017A Positioning system and method for lithographic apparatus 审中-公开
公开(公告)号：JP2004282017A
公开(公告)日：2004-10-07
申请号：JP2003366657
申请日：2003-09-19
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN BILSEN FRANCISCUS BERNARDU , BURGHOORN JACOBUS , VAN HAREN RICHARD JOHANNES FRA , HINNEN PAUL CHRISTIAAN , VAN HORSSEN HERMANUS GERARDUS , HUIJBREGTSE JEROEN , JUENINK ANDRE BERNARDUS , MEGENS HENRY , NAVARRO Y KOREN RAMON , TOLSMA HOITE PIETER THEODOOR , HUBERTUS JOHANNES GERTRUDUS SI , SCHUURHUIS JOHNY RUTGER , SCHETS SICCO IAN , LEE BRIAN , DUNBAR ALLAN
IPC分类号： G01B11/00 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： PROBLEM TO BE SOLVED: To provide a positioning system for a lithographic projector in which accuracy of alignment and/or hardness is improved. SOLUTION: The positioning system for a lithographic apparatus has a positioning radiation source 1, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination, to determine a position of a positioning mark on a first object relative to a reference position on a second object based on the combined information. COPYRIGHT: (C)2005,JPO&NCIPI

6. 发明专利

SG139682A1 SYSTEM AND METHOD TO COMPENSATE FOR CRITICAL DIMENSION NON-UNIFORMITY IN A LITHOGRAPHY SYSTEM 未知
公开(公告)号：SG139682A1
公开(公告)日：2008-02-29
申请号：SG2007053481
申请日：2007-07-18
申请人： ASML NETHERLANDS BV
发明人： VAN HORSSEN HERMANUS GERARDUS
摘要： SYSTEM AND METHOD TO COMPENSATE FOR CRITICAL DIMENSION NON-UNIFORMITY IN A LITHOGRAPHY SYSTEM A system and method compensate for critical dimension non uniformity caused by different polarization directions in an illumination beam. The system comprises an illumination system, a patterning device, and a projection system. The illumination system generates an illumination beam of radiation and comprises a source of radiation and an optical system. The source of radiation produces a beam of radiation. The optical system transmits a first portion of the illumination beam having a first polarization direction during a first portion of a cycle and a second portion of the illumination beam having a second polarization direction during a second portion of the cycle. The patterning device includes first and second patterns having respective first and second optical proximity corrections corresponding to the first and second polarization directions. The first and second patterns pattern respective ones of the first and second portions of the illumination beam. The projection system projects the first and second patterned beams onto a target portion of a substrate.

7. 发明专利

SG152898A1 ALIGNMENT SYSTEMS AND METHODS FOR LITHOGRAPHIC SYSTEMS 未知
公开(公告)号：SG152898A1
公开(公告)日：2009-06-29
申请号：SG2003056066
申请日：2003-09-19
申请人： ASML NETHERLANDS BV
发明人： VAN BILSEN FRANCISCUS BERNARDUS MARIA , BURGHOORN JACOBUS , VAN HAREN RICHARD JOHANNES FRANCISCUS , HINNEN PAUL CHRISTIAAN , VAN HORSSEN HERMANUS GERARDUS , HUIJBREGTSE JEROEN , JEUNINK ANDRE BERNARDUS , MEGENS HENRY , KOREN NAVARRO Y , TOLSMA HOITE PIETER THEODOOR , SIMONS HUBERTUS JOHANNES GERTRUDUS , SCHUURHUIS JOHNY RUTGER , SCHETS SICCO IAN , BOK LEE YOUNG , DUNBAR ALLAN REUBEN
IPC分类号： G01B11/00 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00 , G01D5/26 , G03F7/207
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination to determine a position of an alignment mark on a first object relative to a reference position on a second object based on the combined information.

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