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1. 发明专利

JP2006114888A Method and apparatus for vibration detection and analysis, and lithographic apparatus equipped therewith 有权
标题翻译：用于振动检测和分析的方法和装置，以及其设备的平面设备
公开(公告)号：JP2006114888A
公开(公告)日：2006-04-27
申请号：JP2005266329
申请日：2005-09-14
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KOK HAICO V , KIVITS KOEN , DE LAAK RON VAN , KUIPER JOHANNES MARIA , ZOUW GERBRAND VAN DER , TOLSMA HOITE PIETER THEODOOR
IPC分类号： H01L21/027 , G01B11/00 , G03F7/20
CPC分类号： G03F7/70666 , G03F7/709 , G03F9/7096
摘要： PROBLEM TO BE SOLVED: To provide a system and a method for determining the vibration modes relating to a lithographic apparatus and a measure of respective magnitudes thereof. SOLUTION: In the method, vibration-related information is determined by projecting an aerial image at an image position in a projection plane, by mapping the intensity of the aerial image into an image map wherein the image map includes values of coordinates of sampling locations and of the intensity sampled at the respective sampling locations, and by measuring the intensity of the aerial image received through a slot pattern. The method further comprises a step for determining the detection position of an inclined portion of the image map from the image map, a step for measuring the temporal intensity of the aerial image at the detection position of the inclined portion and measuring the relative position between the slot pattern and the image position, and a step for determining vibration-related information relating to the aerial image from the temporal intensity of the aerial image. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于确定与光刻设备相关的振动模式的系统和方法以及其各自量度的测量。解决方案：在该方法中，通过将空间图像的强度映射到图像映射中，通过将空间图像投影到投影平面中的图像位置来确定振动相关信息，其中图像映射包括采样位置和在各采样位置采样的强度，以及通过测量通过时隙模式接收的空中图像的强度。该方法还包括用于从图像映射确定图像映射的倾斜部分的检测位置的步骤，用于测量倾斜部分的检测位置处的空间图像的时间强度的步骤，并且测量其中的相对位置槽图案和图像位置，以及从空中图像的时间强度确定与空中图像相关的振动相关信息的步骤。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2004282017A Positioning system and method for lithographic apparatus 审中-公开
公开(公告)号：JP2004282017A
公开(公告)日：2004-10-07
申请号：JP2003366657
申请日：2003-09-19
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN BILSEN FRANCISCUS BERNARDU , BURGHOORN JACOBUS , VAN HAREN RICHARD JOHANNES FRA , HINNEN PAUL CHRISTIAAN , VAN HORSSEN HERMANUS GERARDUS , HUIJBREGTSE JEROEN , JUENINK ANDRE BERNARDUS , MEGENS HENRY , NAVARRO Y KOREN RAMON , TOLSMA HOITE PIETER THEODOOR , HUBERTUS JOHANNES GERTRUDUS SI , SCHUURHUIS JOHNY RUTGER , SCHETS SICCO IAN , LEE BRIAN , DUNBAR ALLAN
IPC分类号： G01B11/00 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： PROBLEM TO BE SOLVED: To provide a positioning system for a lithographic projector in which accuracy of alignment and/or hardness is improved. SOLUTION: The positioning system for a lithographic apparatus has a positioning radiation source 1, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination, to determine a position of a positioning mark on a first object relative to a reference position on a second object based on the combined information. COPYRIGHT: (C)2005,JPO&NCIPI

3. 发明专利

JP2005328061A Alignment system, method, and device manufactured by same 有权
标题翻译：对准系统，方法和由其制造的装置
公开(公告)号：JP2005328061A
公开(公告)日：2005-11-24
申请号：JP2005140460
申请日：2005-05-13
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： TOLSMA HOITE PIETER THEODOOR , NAVARRO Y KOREN RAMON , SIMONS HUBERTUS JOHANNES GERTR , EDART REMI DANIEL MARIE , LAM PUI LENG , HULSHOF BERNARDUS JOHANNES ANT , BOGERS ROLAND ADRIANUS EMANUEL
IPC分类号： G03F7/20 , G03B27/42 , H01L21/027
CPC分类号： G03B27/42 , G03F9/7046
摘要： PROBLEM TO BE SOLVED: To provide an arrangement and a method that automatically select a substrate alignment mark on a substrate in lithography apparatus or overlay metering target in an overlay meter. SOLUTION: A memory stores at least one set of positions of substrate alignment marks or overlay metering targets can be used for selection, and a selection rule for selecting an appropriate substrate alignment mark or overlay metering target from the at least one set. The selection rule is based on at least one of experimental and theoretical pieces of knowledge for optimizing the position of the substrate alignment mark or the overlay metering target according to at least one selection standard. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种在覆盖计量器中在光刻设备或覆盖计量目标物质中自动选择基板上的基板对准标记的布置和方法。解决方案：存储器存储衬底对准标记或覆盖测量目标的至少一组位置可以用于选择，以及用于从至少一个组中选择适当的衬底对准标记或覆盖计量目标的选择规则。选择规则基于至少一个用于根据至少一个选择标准来优化衬底对准标记或覆盖计量目标的位置的知识的实验和理论。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2004343113A Method of characterising process step and method of manufacturing device 审中-公开
公开(公告)号：JP2004343113A
公开(公告)日：2004-12-02
申请号：JP2004142011
申请日：2004-05-12
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： REUHMAN-HUISKEN MARIA ELISABET , DE MOL CHRISTIANUS GERARDUS MA , TOLSMA HOITE PIETER THEODOOR
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70616 , G03F7/70633 , G03F9/7003
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing a device, by which process steps are characterised and yield is improved, using a lithographic equipment.
SOLUTION: The method is to monitor deformation of a substrate wafer during treatment of a wafer. After each exposure and treatment process, distortion of the substrate wafer is measured by comparing positions of a plurality of reference marks 20 with values of the database.
COPYRIGHT: (C)2005,JPO&NCIPI

5. 发明专利

JP2006157013A Substrate table, method for measuring position of substrate, and lithography equipment 审中-公开
标题翻译：基板表，测量基板位置的方法和图形设备
公开(公告)号：JP2006157013A
公开(公告)日：2006-06-15
申请号：JP2005342198
申请日：2005-11-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN BUEL HENRICUS WILHELMUS MA , BIJNEN FRANCISCUS GODEFRIDUS C , BURGHOORN JACOBUS , TOLSMA HOITE PIETER THEODOOR , BERGE PETER T
IPC分类号： H01L21/027
CPC分类号： G03F9/7088 , G03F7/70716 , G03F9/7011 , G03F9/7049 , G03F9/7084
摘要： PROBLEM TO BE SOLVED: To provide a substrate table configured so as to support a substrate comprising at least one substrate mark. SOLUTION: The at least one substrate mark has a position that can be measured using an alignment system. The substrate table comprises an optical system having a magnification factor that is not 1 in order to provide the image of the at least one substrate mark to be measured by the alignment system. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种被配置为支撑包括至少一个基板标记的基板的基板台。解决方案：至少一个基板标记具有可以使用对准系统测量的位置。衬底台包括具有不为1的放大系数的光学系统，以便通过对准系统提供待测量的至少一个衬底标记的图像。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2005216872A Lithography system with alignment subsystem, fabrication process of device using alignment, and alignment structure 有权
标题翻译：具有对准子系统的图像系统，使用对准的设备的制造过程和对齐结构
公开(公告)号：JP2005216872A
公开(公告)日：2005-08-11
申请号：JP2003417887
申请日：2003-12-16
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： LEVASIER LEON M , DEN BOEF ARIE JEFFREY , DIRNSTORFER INGO , JEUNINK ANDRE BERNARDUS , KRUIJSWIJK STEFAN G , PELLEMANS HENRICUS PETRUS MARI , SETIJA IRWAN DANI , TOLSMA HOITE PIETER THEODOOR
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F9/7003 , G03F9/7049 , G03F9/7076
摘要： PROBLEM TO BE SOLVED: To provide a lithography projection system performing alignment using a small size alignment structure and/or a reference structure while sustaining the capturing range or the error strength. SOLUTION: The lithography system comprises an alignment subsystem (21) for aligning substrates (W) for a mask (MA), the alignment structure (10) includes an acyclic formulation (15) detectable as a capturing position or a check position between phase grating parts (11) and (12) of the same periodicity using a reference grating (26) in the alignment subsystem (21). It causes phase effect or amplitude effect in a detected signal of the alignment subsystem (21). The alignment structure can be made thin enough to enter a scribe lane and effective area of the substrate is not reduced. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种在保持捕获范围或误差强度的同时使用小尺寸对准结构和/或参考结构进行对准的光刻投影系统。解决方案：光刻系统包括用于对准用于掩模（MA）的衬底（W）的对准子系统（21），对准结构（10）包括可检测为捕获位置的无环制剂（15）或检查位置在对准子系统（21）中使用参考光栅（26）在相位光栅部分（11）和（12）之间相同的周期。它在对准子系统（21）的检测信号中引起相位效应或幅度效应。可以使对准结构足够薄以进入划线，并且不减少基板的有效面积。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2009117870A Alignment system and method and device manufactured thereby 审中-公开
标题翻译：对准系统及其制造方法及装置
公开(公告)号：JP2009117870A
公开(公告)日：2009-05-28
申请号：JP2009039327
申请日：2009-02-23
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： TOLSMA HOITE PIETER THEODOOR , NAVARRO Y KOREN RAMON , SIMONS HUBERTUS JOHANNES GERTR , EDART REMI DANIEL MARIE , LAM PUI LENG , HULSHOF BERNARDUS JOHANNES ANT , BOGERS ROLAND ADRIANUS EMANUEL
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03F9/00
CPC分类号： G03B27/42 , G03F9/7046
摘要： PROBLEM TO BE SOLVED: To provide an arrangement configuration and a method for automatically selecting a substrate alignment mark on a substrate in lithography equipment and an overlay metering target in an overlay metering device. SOLUTION: A memory stores locations of one or a plurality of sets of substrate alignment marks or overlay metering targets available for selection and selection rules to select suitable substrate alignment marks or overlay metering targets from this at least one set. The selection rules are based on experimental or theoretical knowledge about which substrate alignment mark or overlay metering targets locations are optimal based on one or a plurality of selection criteria. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种在覆盖计量装置中在光刻设备和覆盖计量目标物中自动选择基板上的基板对准标记的布置配置和方法。解决方案：存储器存储可用于选择和选择规则的一组或多组衬底对准标记或覆盖测量目标的位置，以从该至少一组中选择合适的衬底对准标记或覆盖测量目标。选择规则基于关于基于一个或多个选择标准的哪些衬底对准标记或覆盖测量目标位置是最佳的实验或理论知识。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2012094915A Positioning system and methods for lithographic apparatus 有权
标题翻译：定位装置的定位系统和方法
公开(公告)号：JP2012094915A
公开(公告)日：2012-05-17
申请号：JP2012022300
申请日：2012-02-03
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN BILSEN FRANCISCUS BERNARDUS MARIA , BURGHOORN JACOBUS , VAN HAREN RICHARD JOHANNES FRANCISCUS , HINNEN PAUL CHRISTIAAN , VAN HORSSEN HERMANUS GERARDUS , HUIJBREGTSE JEROEN , JUENINK ANDRE BERNARDUS , MEGENS HENRY , NAVARRO Y KOREN RAMON , TOLSMA HOITE PIETER THEODOOR , HUBERTUS JOHANNES GERTRUDUS SIMONS , SCHUURHUIS JOHNY RUTGER , SCHETS SICCO IAN , LEE BRIAN , DUNBAR ALLAN
IPC分类号： G01B11/00 , H01L21/027 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： PROBLEM TO BE SOLVED: To provide an alignment system for a lithography projecting apparatus in which accuracy of positioning and/or robust properties is improved.SOLUTION: An alignment system for a lithographic apparatus comprises: a positioning radiation source 1; a detection system having a first detector channel and a second detector channel; and a position determining unit that communicates with the detection system. The position determining unit processes information from the first and second detector channels in combination, and determines a position of a positioning mark on a first object relative to a reference position on a second object, based on the combined information.
摘要翻译：要解决的问题：提供一种提高定位精度和/或鲁棒特性的光刻投影装置的对准系统。解决方案：用于光刻设备的对准系统包括：定位辐射源1; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。位置确定单元组合地处理来自第一和第二检测器通道的信息，并且基于组合的信息确定相对于第二对象上的参考位置的第一对象上的定位标记的位置。版权所有（C）2012，JPO＆INPIT

9. 发明专利

JP2008211233A Method for characterizing process step and device manufacturing method 有权
标题翻译：用于表征工艺步骤和装置制造方法的方法
公开(公告)号：JP2008211233A
公开(公告)日：2008-09-11
申请号：JP2008104954
申请日：2008-04-14
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： REUHMAN-HUISKEN MARIA ELISABET , DE MOL CHRISTIANUS GERARDUS MA , TOLSMA HOITE PIETER THEODOOR
IPC分类号： G03F9/00 , H01L21/027 , G03F7/20
CPC分类号： G03F7/70616 , G03F7/70633 , G03F9/7003
摘要： PROBLEM TO BE SOLVED: To provide a device manufacturing method that improves the yield.
SOLUTION: Deformation of a substrate wafer is measured by comparing positions of a plurality of reference marks with values of a data base after their exposure and process step. For taking into consideration the measured deformation and the compared results in step S1, the development step of an exposure and development step S2 is controlled using the feedforward loop. Then, a position alignment measurement step S3 is performed, in which the alignment relationship between the continuing two layers deposited on the substrate W during consecutive cycles is measured. If the positional control of a latest layer with respect to its preceding layer is insufficient, the latest layer is removed and a new layer is deposited.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供提高产量的装置制造方法。解决方案：通过将多个参考标记的位置与其曝光和处理步骤之后的数据库的值相比较来测量衬底晶片的变形。为了在步骤S1中考虑测量的变形和比较结果，使用前馈回路来控制曝光和显影步骤S2的显影步骤。然后，进行位置对准测量步骤S3，其中测量在连续循环期间沉积在基板W上的连续两层之间的对准关系。如果相对于其前一层的最新层的位置控制不足，则移除最新层并且存储新层。版权所有（C）2008，JPO＆INPIT

10. 发明专利

JP2010123949A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2010123949A
公开(公告)日：2010-06-03
申请号：JP2009257618
申请日：2009-11-11
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BIJNEN FRANCISCUS GODEFRIDUS CASPER , ROIJERS JOZEF CORNELIS ANTONIUS , WARNAAR PATRICK , VAN KEMENADE MARC , TOLSMA HOITE PIETER THEODOOR
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F9/7049 , G03F9/7003 , G03F9/7076 , G03F9/7084
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus having excellent alignment reproducibility. SOLUTION: A method for manufacturing the device includes providing a substrate, the substrate including a plurality of exposure fields, each exposure field including one or more target portions and at least one mark structure, the mark structure being arranged as positional mark for the exposure field; scanning and measuring the mark of each exposure field to obtain alignment information for the respective corresponding exposure fields; determining an absolute position of each exposure field from the alignment information for the respective corresponding exposure fields; determining a relative position of each exposure field with respect to at least one other exposure field by use of additional information on the relative parameters of the exposure field and the at least one other exposure field relative to each other; and combining the absolute positions and the determined relative positions into improved absolute positions for each of the plurality of exposure fields. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供具有优异的取向再现性的光刻设备。解决方案：一种制造该器件的方法，包括提供衬底，所述衬底包括多个曝光场，每个曝光场包括一个或多个目标部分和至少一个标记结构，所述标记结构被布置为位置标记曝光场; 扫描和测量每个曝光场的标记以获得各个相应的曝光场的对准信息; 从各个对应的曝光场的对准信息确定每个曝光场的绝对位置; 通过使用关于相对于彼此的曝光场和至少一个其他曝光场的相对参数的附加信息来确定每个曝光场相对于至少一个其它曝光场的相对位置; 以及将所述绝对位置和所确定的相对位置组合为所述多个曝光场中的每一个的改进的绝对位置。版权所有（C）2010，JPO＆INPIT

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