专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2006310849A Lithography equipment, position amount controller, and control method 有权
标题翻译：算术设备，位置控制器和控制方法
公开(公告)号：JP2006310849A
公开(公告)日：2006-11-09
申请号：JP2006118781
申请日：2006-04-24
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： BUTLER HANS
IPC分类号： H01L21/027 , G05B11/32 , G05D3/00
CPC分类号： G03F7/70725
摘要： PROBLEM TO BE SOLVED: To provide lithography equipment having reduced a relative position error between a first movable part and a second movable part, a position amount controller, and a control method.
SOLUTION: The lithography equipment comprises a first movable element and a first control system for controlling the position amount of the first movable element. Further, the lithography equipment comprises a second movable element and a second control system for controlling the position amount of the second movable element. In order to reduce a tracking error, that is, a relative error between the first movable part and the second movable part, a feed forward table is provided as comprising feed forward table programming for generating a feed forward signal in synchronization with a set value signal to be provided to the first and second control systems. In order to correct the position amount of the first movable element to reduce the relative error between the position amount of the first movable element and the position amount of the second movable element, a feed forward is provided to the first control system.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供减小第一可移动部件和第二可移动部件之间的相对位置误差的光刻设备，位置量控制器和控制方法。解决方案：光刻设备包括第一可移动元件和用于控制第一可移动元件的位置量的第一控制系统。此外，光刻设备包括用于控制第二可移动元件的位置量的第二可移动元件和第二控制系统。为了减少跟踪误差，即第一可移动部件和第二可移动部件之间的相对误差，提供了前馈台，其包括用于与设定值信号同步产生前馈信号的前馈表编程被提供给第一和第二控制系统。为了校正第一可移动元件的位置量以减小第一可移动元件的位置量与第二可移动元件的位置量之间的相对误差，向第一控制系统提供前馈。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2006303503A Imprint lithography 有权
标题翻译： IMPRINT LITHOGRAPHY
公开(公告)号：JP2006303503A
公开(公告)日：2006-11-02
申请号：JP2006114638
申请日：2006-04-18
申请人： Asml Netherlands Bv , Koninkl Philips Electronics Nv , エイエスエムエルネザランドズベスローテンフエンノートシャップ , コニンクリユケフィリップスエレクトロニクスエヌ.ブイ.
发明人： MEIJER PETER BARTUS L , KOLESNYCHENKO ALEKSEY Y
IPC分类号： H01L21/027 , B81C99/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： PROBLEM TO BE SOLVED: To provide an imprint template configured to make an imprint on an imprintable medium in an imprint lithography process.
SOLUTION: The imprint template has a pattern with a pattern density corresponding to a volume of an imprintable medium used to substantially fill pattern features per unit area of the contact face of the imprint template, wherein contiguous regions in the pattern on the contact face of the imprint template have substantially the same pattern density, have a minimized difference of pattern densities, or have a pattern density difference kept smaller than a maximum limit. Furthermore, the contiguous regions individually exhibit different functions after being imprinted on a substrate.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种压印模板，其被配置为在压印光刻工艺中在可压印介质上进行压印。解决方案：压印模板具有图案密度对应于可压印介质的体积的图案，其用于基本上填充压印模板的接触面的每单位面积的图案特征，其中触点上图案中的连续区域压印模板的表面具有基本上相同的图案密度，具有图案密度的最小化差异，或者具有保持小于最大极限的图案密度差。此外，连续区域在印在基板上之后分别显示不同的功能。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2006301630A Variable lens and exposure system 有权
标题翻译：可变镜头和曝光系统
公开(公告)号：JP2006301630A
公开(公告)日：2006-11-02
申请号：JP2006112018
申请日：2006-04-14
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VENEMA WILLEM JURRIANUS
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70275 , G02B3/0012 , G02B3/0056 , G02B3/14 , G02B26/005 , G03F7/70266
摘要： PROBLEM TO BE SOLVED: To provide a variable lens and an exposure system in a micro lens array exposing device. SOLUTION: The variable lens is equipped with cylindrical electrodes 2 forming capillary tubes, which are sealed with a transparent front element 4 and a transparent rear element 6 so as to form a fluid chamber 5 containing two fluids. The two fluids A and B are immiscible with each other, are separated into two fluid portions, and form a meniscus 14. When a low voltage V1 is applied to the electrode 2, the contact angle is 140°. A shape of the meniscus 14 can be changed with the applied voltage. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：在微透镜阵列曝光装置中提供可变透镜和曝光系统。解决方案：可变透镜配备有形成毛细管的圆柱形电极2，其用透明前元件4和透明后元件6密封，以形成包含两种流体的流体室5。两个流体A和B彼此不混溶，被分离成两个流体部分并形成弯液面14.当将低电压V1施加到电极2时，接触角为140°。弯液面14的形状可以随着施加的电压而改变。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2006270071A Lithography apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHY设备和设备制造方法
公开(公告)号：JP2006270071A
公开(公告)日：2006-10-05
申请号：JP2006043675
申请日：2006-02-21
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： MULKENS JOHANNES CATHARINUS H , JASPER JOHANNES CHRISTIAAN M
IPC分类号： H01L21/027 , G02B5/122
CPC分类号： G03F7/70591 , G03F7/70341 , G03F7/7085 , G03F9/7046
摘要： PROBLEM TO BE SOLVED: To provide a sensor which measures influence at a substrate level by using radiation having a high numerical aperture, particularly in an immersion lithography apparatus.
SOLUTION: For example, in the lithography apparatus, a sensor that would normally placed on a substrate table is replaced with a retroreflector on the substrate table and, for example, a sensor at the level of a device provided with a pattern. This eliminates the need for adjusting the sensor to an immersion liquid and, for example, reduces the numerical aperture at the level of the device provided with the pattern, thereby facilitating incoupling of radiation.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过使用具有高数值孔径的辐射来测量衬底水平的影响的传感器，特别是在浸没式光刻设备中。解决方案：例如，在光刻设备中，通常放置在衬底台上的传感器被替换为衬底台上的回射器，例如在设置有图案的器件的水平面上的传感器。这消除了将传感器调节到浸没液体的需要，并且例如降低了设置有图案的装置的水平面上的数值孔径，从而便于辐射的耦合。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2006261667A Lithography equipment and device, namely, integrated circuit, manufacturing method of flat panel display, and compensation method of cupping 审中-公开
标题翻译：平板电脑显示器的制造设备和装置，综合电路，平板显示器的制造方法及其补偿方法
公开(公告)号：JP2006261667A
公开(公告)日：2006-09-28
申请号：JP2006067063
申请日：2006-03-13
申请人： Asml Holdings Nv , Asml Netherlands Bv , Lsi Logic Corp , エイエスエムエルネザランドズベスローテンフエンノートシャップ , エイエスエムエルホールディングナムローゼフエンノートシャップ , エルエスアイロジックコーポレイション
发明人： TROOST KARS Z , BASELMANS JOHANNES JACOBUS MAT , BLEEKER ARNO JAN , MARKOYA LOUIS J , CALLAN NEAL , EIB NICHOLAS K
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a system which can change a pattern more quickly and at less cost compared with a mask base system.
SOLUTION: Wide range contrast can be attained in such a way that an inclination and location of individually controllable element are adjusted simultaneously. This can be used to compensate a cupping of the individually controllable element. Simultaneous adjustment of location and inclination of the individually controllable element can be attained by two electrodes capable of operating over a range of values.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种与掩模基础系统相比可以更快更便利地改变图案的系统。
解决方案：可以以同时调节独立可控元件的倾斜度和位置的方式获得宽范围的对比度。这可以用于补偿单独可控元件的拔罐。可以通过能够在一定范围内操作的两个电极来实现单独可控元件的位置和倾斜的同时调节。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2006237626A Lithographic measuring using scatter meter 审中-公开
标题翻译：使用散射仪的光刻测量
公开(公告)号：JP2006237626A
公开(公告)日：2006-09-07
申请号：JP2006086490
申请日：2006-02-27
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： SCHENAU KOEN VAN INGEN , JANSSEN MAURICE HENRICUS F , KIERS ANTOINE GASTON MARIE , VAN DER LAAN HANS , VANOPPEN PETER CLEMENT PAUL
IPC分类号： H01L21/027 , G01B11/02 , G03F7/20
CPC分类号： G03F7/705 , G03F7/70625 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a method for predicting the minimum dimension of a feature imaged by the lithographic apparatus.
SOLUTION: The lithographic apparatus includes an illuminator configured to condition a beam of radiation and a support configured to hold a patterning device. The patterning device is configured to pattern the beam of radiation according to a desired pattern. The lithographic apparatus also includes a substrate table configured to hold a substrate and a projection system configured to project the patterned beam onto a target portion of the substrate to form a patterned image on the substrate. The apparatus further includes a sensor configured and arranged to intercept a portion of the beam and to measure a transmission of the beam through at least a portion of the patterning device.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种光刻设备和用于预测由光刻设备成像的特征的最小尺寸的方法。解决方案：光刻设备包括被配置为调节辐射束的照明器和被构造成保持图案形成装置的支撑件。图案形成装置被配置成根据期望的图案对辐射束进行图案化。光刻设备还包括被配置为保持衬底的衬底台和被配置为将图案化的光束投影到衬底的目标部分上以在衬底上形成图案化图像的投影系统。所述装置还包括被配置和布置成拦截所述光束的一部分并且测量所述光束通过所述图案形成装置的至少一部分的透射的传感器。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2006237617A Lithography equipment and method of determining polarization property 有权
标题翻译：地质设备和确定极化性质的方法
公开(公告)号：JP2006237617A
公开(公告)日：2006-09-07
申请号：JP2006048306
申请日：2006-02-24
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VEN DE KERKHOF MARCUS ADRIANUS , BOEIJ WILHELMUS PETRUS DE , GREEVENBROEK HENDRIKUS ROBERTU , KLAASSEN MICHEL FRANSOIS HUBER , KOK HAICO VICTOR , WEHRENS MARTIJN GERARD DOMINIQ , UITTERDIJK TAMMO , ROOIJAKKERS WILHELMUS JACOBUS
IPC分类号： H01L21/027
CPC分类号： G03F7/70133 , G03F7/70566 , G03F7/70591 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To provide the method of looking for the polarization property of lithography equipment.
SOLUTION: Lithography equipment comprises a lighting system IL, a support, a substrate table, a projection system PS, and a detector 14. The equipment further comprises an adjustable polarization transformation element 10 such as a quadrant wavelength plate and a polarization analyzer 12 such as a straight line polarizer. The polarization transformation element and the polarization analyzer are aligned and arranged on a position in which a pattern forming apparatus is held by the support in a beam path. Information on a radial polarization state of the position of the pattern forming apparatus can be acquired by carrying out the measurement of strength toward the mutually different rotation direction of the polarization transformation element 10 using the detector 14. Since the polarization analyzer 12 is located before the projection system PS, the fact that the detector 14 is located after the projection system PS such as substrate height does not affect measurement.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供寻找光刻设备的偏振特性的方法。解决方案：光刻设备包括照明系统IL，支撑件，衬底台，投影系统PS和检测器14.该设备还包括可调偏振变换元件10，例如象限波长板和偏振分析器 12，如直线偏振器。偏振变换元件和偏振分析器对准并布置在图案形成装置由支撑件在光束路径中保持的位置。关于图案形成装置的位置的径向极化状态的信息可以通过使用检测器14对偏振变换元件10的相互不同的旋转方向进行强度测量而获得。由于偏振分析器12位于投影系统PS，检测器14位于诸如基板高度的投影系统PS之后的事实不影响测量。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2006237608A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2006237608A
公开(公告)日：2006-09-07
申请号：JP2006043899
申请日：2006-02-21
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： STAVENGA MARCO KOERT , JACOBS JOHANNES HENRICUS WILHE , JANSEN HANS , VERHAGEN MARTINUS CORNELIS MAR
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/709
摘要： PROBLEM TO BE SOLVED: To provide various pressure adjusting means for reducing pressure gradient in a liquid supply system of a lithographic apparatus. SOLUTION: The liquid supply system has a liquid confinement structure constituted to at least partially confine a liquid between a projection system of the lithography apparatus and a substrate table. High pressure gradient may cause particulate contamination within the liquid supply system and/or the liquid confinement structure. The pressure gradient, for example, can be reduced by the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor for preventing shock waves, and a buffer volume/damper for compensating pressure fluctuation. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供用于减小光刻设备的液体供应系统中的压力梯度的各种压力调节装置。解决方案：液体供应系统具有液体限制结构，其构造成至少部分地限制光刻设备的投影系统和基板台之间的液体。高压梯度可能导致液体供应系统和/或液体限制结构内的颗粒污染。例如，压力梯度可以通过在一个或多个阀中使用缓慢的切换，或者通过一个或多个阀周围的排出流或通过一个或多个阀的流出而被减少，而不是或者除了切断阀之外，用于防止冲击波的压力调节器或限流器以及用于补偿压力波动的缓冲容积/阻尼器。版权所有（C）2006，JPO＆NCIPI

10. 发明专利

JP2006235595A Optical element, lithographic system including such an optical element, device manufacturing method and device manufactured by the method 有权
标题翻译：光学元件，包括这样的光学元件的光刻系统，器件制造方法和由该方法制造的器件
公开(公告)号：JP2006235595A
公开(公告)日：2006-09-07
申请号：JP2005378882
申请日：2005-12-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN HERPEN MAARTEN MARINUS JOH , BAKKER LEVINUS PIETER , KLUNDER DERK JAN WILFRED
IPC分类号： G02B5/08 , G02B1/11 , G02B5/26 , G03F7/20 , G21K1/06 , H01L21/027
CPC分类号： G03F7/70958 , G02B1/113 , G02B5/0891 , G03F7/70575 , G21K1/06 , G21K2201/067
摘要： PROBLEM TO BE SOLVED: To provide a spectrum-purifying filter, designed to reflect EUV radiation but not to reflect undesired radiation. SOLUTION: The optical element including an antireflection (AR) film is built to reflect only the extra-ultraviolet (EUV) radiation. By covering the surface of the substrate with a film of approximately. 1/4λ thickness or 1/4λ thickness or thinner, the light reflected on the top surface makes a 180° phase shift from the one reflected at the lower surface, producing attenuation interference, and the reflection of the radiation is eliminated in a specified λ range. Thus, losses of light can be reduced over a larger spectrum range, by using multi-layers films. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种频谱净化滤波器，设计用于反射EUV辐射，但不反射不需要的辐射。解决方案：包括抗反射（AR）膜的光学元件被构建为仅反射超紫外（EUV）辐射。通过用大约的膜覆盖基板的表面。 1 /4λ厚度或1 /4λ厚度或更薄，在顶表面上反射的光与从下表面反射的光线相移180°，产生衰减干扰，并且辐射的反射在指定的λ 范围。因此，通过使用多层膜，可以在更大的光谱范围内减少光的损失。版权所有（C）2006，JPO＆NCIPI

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式