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1. 发明专利

JP2013070041A Radiation source 有权
标题翻译：辐射源
公开(公告)号：JP2013070041A
公开(公告)日：2013-04-18
申请号：JP2012190427
申请日：2012-08-30
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SCHIMMEL HENDRIKUS GIJSBERTUS , DIJKSMAN JOHAN FREDERIK , LABETSKI DZMITRY
IPC分类号： H01L21/027 , H05G2/00
CPC分类号： H05G2/005 , G03F7/70033 , G03F7/70883 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： PROBLEM TO BE SOLVED: To provide a radiation source having a nozzle through which a fuel can pass without encountering an unexpected or unintended trouble or limitation.SOLUTION: The radiation source includes a reservoir, a nozzle, a laser and a positive lens. The reservoir is configured to hold the volume of a fuel. The nozzle in fluid connection with the reservoir is configured to guide the flow of fuel toward a plasma formation position along a track. The laser is configured to guide the laser radiation to the flow at the plasma formation position, and to generate radiation-generating plasma during use. The positive lens configuration is configured so as to focus at least the potential spread of the track of fuel flow toward the plasma formation position, and the lens includes an electric field generation element and/or a magnetic field generation element.
摘要翻译：要解决的问题：提供一种具有喷嘴的辐射源，燃料可以通过该喷嘴而不会遇到意外的或非预期的故障或限制。解决方案：辐射源包括储存器，喷嘴，激光器和正透镜。储存器构造成保持燃料的体积。与储存器流体连接的喷嘴构造成沿着轨道将燃料流引向等离子体形成位置。激光器被配置为将激光辐射引导到等离子体形成位置处的流动，并且在使用期间产生产生辐射的等离子体。正透镜构造被配置为至少将燃料流的轨迹的电位扩散聚焦到等离子体形成位置，并且透镜包括电场产生元件和/或磁场产生元件。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2010114445A Gas gauge, lithographic device and method for manufacturing device 有权
标题翻译：气体测量仪，光刻设备和制造设备的方法
公开(公告)号：JP2010114445A
公开(公告)日：2010-05-20
申请号：JP2009251601
申请日：2009-11-02
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LABETSKI DZMITRY , VAN DE VIJVER YURI JOHANNES GABRIEL
IPC分类号： H01L21/027 , G01B13/12 , G03F7/20
CPC分类号： G03B27/52 , G01B13/12 , G03F9/7057
摘要： PROBLEM TO BE SOLVED: To provide a gas gage improving sensibility measuring partial differences of profiles for wafers for usage in a lithographic device. SOLUTION: The gas gauge includes a gas delivery pipe arranged so as to divide a distance up to an object. The gas delivery pipe includes a gas conduit, and supplies a proper measuring gas through the gas conduit. The measuring gas is discharged from the gas delivery pipe through an outlet under a pressure to collide with the object in an interaction region and the pressure of a rebounded gas is measured by a pressure detector. The gas having a small atomic number is used. A pressure sensor includes a thin film arranged in the gas delivery pipe at least partially surrounding the gas conduit in a gas outlet or a vicinity of the gas outlet. The pressure sensor includes a thin-film disk arranged around the gas conduit. The pressure sensor is disposed substantially on a common surface, and isolated from the gas conduit but includes a plurality of proper pressure elements for surrounding the gas conduit. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供气量计，其提高测量用于光刻设备的晶片的轮廓的偏差的灵敏度。解决方案：气量计包括气体输送管，该气体输送管被布置为将一段距离分隔成物体。气体输送管包括气体导管，并通过气体管道供应适当的测量气体。测量气体从气体输送管通过出口压力与相互作用区域中的物体碰撞，并且通过压力检测器测量回弹气体的压力。使用原子序数小的气体。压力传感器包括布置在气体输送管中的薄膜，至少部分地围绕气体出口或气体出口附近的气体导管。压力传感器包括布置在气体导管周围的薄膜盘。压力传感器基本上设置在公共表面上，并且与气体导管隔离，但包括用于包围气体导管的多个适当的压力元件。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2010212685A Radiation source, lithographic apparatus, and method of manufacturing device 审中-公开
标题翻译：辐射源，光刻设备及其制造方法
公开(公告)号：JP2010212685A
公开(公告)日：2010-09-24
申请号：JP2010047217
申请日：2010-03-04
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LABETSKI DZMITRY , LOOPSTRA ERIK ROELOF , SWINKELS GERARDUS HUBERTUS PETRUS MARIA , VAN ZUTPHEN TOM
IPC分类号： H01L21/027 , G01N23/02
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005
摘要： PROBLEM TO BE SOLVED: To provide a radiation source and a lithographic apparatus for suppressing generation of particles. SOLUTION: An extreme ultraviolet radiation source includes a radiation source material delivery system configured to transmit a radiation source material to a plasma starting site along a predetermined orbit. The radiation source also includes: a laser system configured to direct a laser beam to the radiation source material in the plasma starting site for generating plasma releasing extreme ultraviolet; and a catch configured to catch the radiation source material to be transmitted from the radiation source material target delivery system. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于抑制颗粒产生的辐射源和光刻设备。解决方案：极紫外辐射源包括被配置为沿着预定轨道将辐射源材料传输到等离子体起始位置的辐射源材料输送系统。辐射源还包括：激光系统，被配置为将激光束引导到等离子体起始位置中的辐射源材料，用于产生等离子体释放极紫外光; 以及构造成捕获要从辐射源材料目标传送系统传送的辐射源材料的捕捉器。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2010093249A Source module, radiation source and lithographic apparatus 有权
标题翻译：源模块，辐射源和平面设备
公开(公告)号：JP2010093249A
公开(公告)日：2010-04-22
申请号：JP2009216391
申请日：2009-09-18
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LABETSKI DZMITRY , BANINE VADIM YEVGENYEVICH , LOOPSTRA ERIK ROELOF , MOORS JOHANNES HUBERTUS JOSEPHINA , SWINKELS GERARDUS HUBERTUS PETRUS MARIA
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： H05G2/001 , H05G2/003
摘要： PROBLEM TO BE SOLVED: To remove fuel debris before arriving at a radiation collector. SOLUTION: A radiation source is configured so as to generate extreme ultraviolet radiation. A radiation source includes a chamber, a fuel supply configured to supply a fuel to a plasma formation region in the chamber, and a laser configured to emit a radiation beam to the plasma formation region so that plasma for emitting extreme ultraviolet radiation is generated when the radiation beam impacts the fuel. A fuel particulate interceptor is arranged in the chamber and includes a material having affinity with the fuel so that when the fuel particulates impact a surface of the fuel particulate interceptor, the fuel particulates are stuck to the surface. The fuel particulate interceptor is configured against a reflective element so as to prevent all fuel particulates from falling onto the reflective element due to the influence of gravity. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：在到达辐射收集器之前去除燃料碎屑。解决方案：辐射源被配置为产生极紫外辐射。辐射源包括腔室，被配置为向腔室中的等离子体形成区域供应燃料的燃料供给器和被配置为向等离子体形成区域发射辐射束的激光器，使得当发射极紫外线辐射的等离子体辐射束影响燃料。燃料颗粒拦截器被布置在室中并且包括与燃料具有亲和性的材料，使得当燃料颗粒撞击燃料颗粒拦截器的表面时，燃料颗粒被粘附到表面。燃料颗粒拦截器被构造成抵抗反射元件，以便防止所有燃料微粒由于重力的影响而落在反射元件上。版权所有（C）2010，JPO＆INPIT

5. 发明申请

WO2009061188A2 METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRESSION SYSTEM AND A LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：用于确定抑制系统的抑制因子的方法和系统和光刻设备
公开(公告)号：WO2009061188A2
公开(公告)日：2009-05-14
申请号：PCT/NL2008050700
申请日：2008-11-06
申请人： ASML NETHERLANDS BV , SCHIMMEL HENDRIKUS GIJSBERTUS , VAN EMPEL TJARKO ADRIAAN RUDOL , SWINKELS GERARDUS HUBERTUS PET , HAAST MARC ANTONIUS MARIA , LABETSKI DZMITRY , FRERIKS JOHANNES MARIA , VAN DE VIJVER YURI JOHANNES GA , VERSTEEG WENDELIN JOHANNA MARI , JONKERS PETER GERARDUS
发明人： SCHIMMEL HENDRIKUS GIJSBERTUS , VAN EMPEL TJARKO ADRIAAN RUDOLF , SWINKELS GERARDUS HUBERTUS PET , HAAST MARC ANTONIUS MARIA , LABETSKI DZMITRY , FRERIKS JOHANNES MARIA , VAN DE VIJVER YURI JOHANNES GA , VERSTEEG WENDELIN JOHANNA MARI , JONKERS PETER GERARDUS
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , G03F7/70841 , G03F7/70908
摘要： The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.
摘要翻译：本发明涉及一种确定抑制系统抑制因子的方法。抑制系统被布置成抑制污染气体从第一系统中的迁移。抑制因子表示抑制系统的性能。该方法包括在子系统中引入示踪气体，提供检测系统，其被配置为检测已经从第一系统迁出的示踪气体的量，确定示踪气体的抑制系统的第一抑制因子。该方法还包括基于第一抑制因子确定用于污染气体的抑制系统的第二抑制因子。

6. 发明申请

WO2013189827A2 RADIATION SOURCE AND LITHOGRAPHIC APPARATUS. 审中-公开
标题翻译：辐射源和光刻设备。
公开(公告)号：WO2013189827A2
公开(公告)日：2013-12-27
申请号：PCT/EP2013062259
申请日：2013-06-13
申请人： ASML NETHERLANDS BV
发明人： RIEPEN MICHEL , LABETSKI DZMITRY , MESTROM WILBERT , KAMPINGA WIM RONALD , NIEUWENKAMP JAN OKKE , BRINKERT JACOB , CASTELIJNS HENRICUS , TEN KATE NICOLAAS , SCHIMMEL HENDRIKUS , JANSEN HANS , PAULUSSEN DENNIS , VIRGO BRIAN , JILISEN REINIER , BADIE RAMIN , RIJPMA ALBERT , FRANKEN JOHANNES , VAN PUTTEN PETER , VAN DER STRAATEN GERRIT
IPC分类号： G03F7/20
CPC分类号： G03F7/70983 , F15D1/0065 , G03F7/70033 , G03F7/70916 , G21K1/06 , G21K5/08 , H05G2/005 , H05G2/008 , Y10T137/206
摘要： A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
摘要翻译：一种辐射源，包括燃料源，其构造成将燃料输送到燃料发射EUV辐射的位置。辐射源还包括设置有多个凹槽的不动的燃料碎屑接收表面。凹槽具有定向，其布置成在一个或多个所需方向上在重力的影响下引导液体燃料的流动。

7. 发明申请

WO2013124101A3 FUEL STREAM GENERATOR, SOURCE COLLECTOR APPARATUS AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：燃料流发生器，源收集装置和光刻装置
公开(公告)号：WO2013124101A3
公开(公告)日：2013-10-17
申请号：PCT/EP2013051093
申请日：2013-01-22
申请人： ASML NETHERLANDS BV
发明人： SCHIMMEL HENDRIKUS GIJSBERTUS , LABETSKI DZMITRY
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70033 , B05B1/02 , H05G2/005 , H05G2/006 , H05G2/008 , Y10T137/0391 , Y10T137/218
摘要： A fuel stream generator comprising a nozzle connected to a fuel reservoir, wherein the nozzle is provided with a gas inlet configured to provide a sheath of gas around fuel flowing along the nozzle is disclosed. Also disclosed are a method of generating fuel droplets and a lithography apparatus incorporating the fuel stream generator.
摘要翻译：本发明公开了一种燃料流发生器，其包括连接到燃料储存器的喷嘴，其中该喷嘴设有气体入口，该气体入口构造成在沿着喷嘴流动的燃料周围提供气体鞘。还公开了一种产生燃料液滴的方法和包含燃料流发生器的光刻设备。

8. 发明专利

NL2011741A DROPLET GENERATOR, EUV RADIATION SOURCE, LITHOGRAPHIC APPARATUS, METHOD FOR GENERATING DROPLETS AND DEVICE MANUFACTURING METHOD. 未知
公开(公告)号：NL2011741A
公开(公告)日：2014-06-04
申请号：NL2011741
申请日：2013-11-06
申请人： ASML NETHERLANDS BV
发明人： DIJKSMAN JOHAN , BADIE RAMIN , HULTERMANS RONALD , LABETSKI DZMITRY
IPC分类号： G03F7/20 , H05G2/00

9. 发明专利

NL2005392A SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. 未知
公开(公告)号：NL2005392A
公开(公告)日：2011-03-28
申请号：NL2005392
申请日：2010-09-24
申请人： ASML NETHERLANDS BV , CYMER
发明人： LOOPSTRA ERIK , BANINE VADIM , SWINKELS GERARDUS , PEKELDER SVEN , LABETSKI DZMITRY , STAMM UWE , PARTLO WILLIAM N
IPC分类号： G03F7/20 , H05G2/00

10. 发明专利

NL2011742A POWER SOURCE FOR A LITHOGRAPHIC APPARATUS, AND LITHOGRAPHIC APPARATUS COMPRISING SUCH A POWER SOURCE. 未知
公开(公告)号：NL2011742A
公开(公告)日：2014-06-16
申请号：NL2011742
申请日：2013-11-06
申请人： ASML NETHERLANDS BV
发明人： MESTROM WILBERT , LABETSKI DZMITRY , SWINKELS GERARDUS
IPC分类号： G03F7/20 , H05G2/00

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