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1. 发明申请

WO2009061188A2 METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRESSION SYSTEM AND A LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：用于确定抑制系统的抑制因子的方法和系统和光刻设备
公开(公告)号：WO2009061188A2
公开(公告)日：2009-05-14
申请号：PCT/NL2008050700
申请日：2008-11-06
申请人： ASML NETHERLANDS BV , SCHIMMEL HENDRIKUS GIJSBERTUS , VAN EMPEL TJARKO ADRIAAN RUDOL , SWINKELS GERARDUS HUBERTUS PET , HAAST MARC ANTONIUS MARIA , LABETSKI DZMITRY , FRERIKS JOHANNES MARIA , VAN DE VIJVER YURI JOHANNES GA , VERSTEEG WENDELIN JOHANNA MARI , JONKERS PETER GERARDUS
发明人： SCHIMMEL HENDRIKUS GIJSBERTUS , VAN EMPEL TJARKO ADRIAAN RUDOLF , SWINKELS GERARDUS HUBERTUS PET , HAAST MARC ANTONIUS MARIA , LABETSKI DZMITRY , FRERIKS JOHANNES MARIA , VAN DE VIJVER YURI JOHANNES GA , VERSTEEG WENDELIN JOHANNA MARI , JONKERS PETER GERARDUS
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , G03F7/70841 , G03F7/70908
摘要： The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.
摘要翻译：本发明涉及一种确定抑制系统抑制因子的方法。抑制系统被布置成抑制污染气体从第一系统中的迁移。抑制因子表示抑制系统的性能。该方法包括在子系统中引入示踪气体，提供检测系统，其被配置为检测已经从第一系统迁出的示踪气体的量，确定示踪气体的抑制系统的第一抑制因子。该方法还包括基于第一抑制因子确定用于污染气体的抑制系统的第二抑制因子。

2. 发明专利

JP2010045358A Radiation source, lithographic apparatus, and method of manufacturing device 审中-公开
标题翻译：辐射源，光刻设备及其制造方法
公开(公告)号：JP2010045358A
公开(公告)日：2010-02-25
申请号：JP2009183973
申请日：2009-08-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SCHIMMEL HENDRIKUS GIJSBERTUS , BANINE VADIM YEVGENYEVICH , LOOPSTRA ERIK ROELOF , BOSSCHART CAREL HOPE
IPC分类号： H01L21/027
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70891 , G03F7/70916 , G21K1/06 , H05G2/005 , H05G2/008
摘要： PROBLEM TO BE SOLVED: To control fuel droplets by a method reducing potential contamination on other surfaces in a radiation source and other parts of a lithographic apparatus.
SOLUTION: The radiation source is configured to generate extreme ultraviolet rays. The radiation source comprises a laser which is configured to generate a radiation beam to be guided to a plasma generation part for plasma generation when the radiation beam interacts with fuel, an optical component comprising a surface which is configured and positioned to be hit with droplets of the fuel, and a temperature conditioner configured to raise the temperature of the surface. A coating may be so provided on the surface as to change at least one nature of the surface. The energy source may be configured so that the droplets of fuel solidify before they hit the surface or to prevent the droplets of fuel from vaporizing.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：通过减少辐射源和光刻设备的其它部分中的其它表面上的潜在污染的方法来控制燃料液滴。解决方案：辐射源被配置为产生极紫外线。辐射源包括激光器，其被配置为当辐射束与燃料相互作用时，产生要被引导到等离子体产生部件的等离子体产生部件的辐射束;光学部件，其包括被配置并定位成被喷射的液滴所述燃料和配置为升高所述表面的温度的温度调节器。可以在表面上设置涂层以改变表面的至少一种性质。能量源可以被配置为使得燃料液滴在它们撞击表面之前固化或者防止燃料液滴蒸发。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2010153857A Radiation source, lithography apparatus, and device manufacturing method 有权
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：JP2010153857A
公开(公告)日：2010-07-08
申请号：JP2009281085
申请日：2009-12-11
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SCHIMMEL HENDRIKUS GIJSBERTUS , BANINE VADIM YEVGENYEVICH , LOOPSTRA ERIK ROELOF
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70175 , H05G2/003
摘要： PROBLEM TO BE SOLVED: To provide an EUV (extreme ultraviolet) radiation source which has a contamination barrier to reduce a deposition rate of such as ion, atom, molecule or particle debris on a light collecting mirror and to minimize an amount of EUV radiation to be absorbed, scattered, or deflected. SOLUTION: The radiation source for producing EUV or lithography of high resolution includes a plasma forming portion on which a fuel contacts with a radiation beam to produce the EUV radiation. A collector with a mirror collects the EUV radiation produced at a first focus to reflect it toward a second focus. The contamination barrier is positioned so that its surrounding portion does not close more than 50% of a solid angle specified by the mirror at the second focus, thereby, the EUV radiation is not excessively attenuated. The contamination barrier traps a fuel material such as ion from plasma, atom, molecule, or nano-small drops to prevent the deposit on the collecting mirror. A gas extraction port may be located near a plasma forming portion to control the fuel debris toward the collecting mirror and diffusion of contamination. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供具有污染屏障的EUV（极紫外）辐射源，以减少聚光镜上的离子，原子，分子或颗粒碎屑的沉积速率，并使得 EUV辐射被吸收，分散或偏转。解决方案：用于生产高分辨率的EUV或光刻的辐射源包括等离子体形成部分，燃料在其上与辐射束接触以产生EUV辐射。具有镜子的收集器收集在第一焦点产生的EUV辐射，以反映第二焦点。污染屏障定位成使得其周围部分不会闭合在第二焦点处由反射镜规定的立体角的50％以上，从而EUV辐射不会被过度衰减。污染屏障捕获诸如等离子体，原子，分子或纳米小滴的离子的燃料，以防止沉积在聚光镜上。气体提取口可以位于等离子体形成部分附近，以控制朝向收集反射镜的燃料碎屑和污染的扩散。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2013070041A Radiation source 有权
标题翻译：辐射源
公开(公告)号：JP2013070041A
公开(公告)日：2013-04-18
申请号：JP2012190427
申请日：2012-08-30
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SCHIMMEL HENDRIKUS GIJSBERTUS , DIJKSMAN JOHAN FREDERIK , LABETSKI DZMITRY
IPC分类号： H01L21/027 , H05G2/00
CPC分类号： H05G2/005 , G03F7/70033 , G03F7/70883 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： PROBLEM TO BE SOLVED: To provide a radiation source having a nozzle through which a fuel can pass without encountering an unexpected or unintended trouble or limitation.SOLUTION: The radiation source includes a reservoir, a nozzle, a laser and a positive lens. The reservoir is configured to hold the volume of a fuel. The nozzle in fluid connection with the reservoir is configured to guide the flow of fuel toward a plasma formation position along a track. The laser is configured to guide the laser radiation to the flow at the plasma formation position, and to generate radiation-generating plasma during use. The positive lens configuration is configured so as to focus at least the potential spread of the track of fuel flow toward the plasma formation position, and the lens includes an electric field generation element and/or a magnetic field generation element.
摘要翻译：要解决的问题：提供一种具有喷嘴的辐射源，燃料可以通过该喷嘴而不会遇到意外的或非预期的故障或限制。解决方案：辐射源包括储存器，喷嘴，激光器和正透镜。储存器构造成保持燃料的体积。与储存器流体连接的喷嘴构造成沿着轨道将燃料流引向等离子体形成位置。激光器被配置为将激光辐射引导到等离子体形成位置处的流动，并且在使用期间产生产生辐射的等离子体。正透镜构造被配置为至少将燃料流的轨迹的电位扩散聚焦到等离子体形成位置，并且透镜包括电场产生元件和/或磁场产生元件。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2012199582A Radiation source, lithographic device, and device manufacturing method 有权
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：JP2012199582A
公开(公告)日：2012-10-18
申请号：JP2012129640
申请日：2012-06-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SCHIMMEL HENDRIKUS GIJSBERTUS , BANINE VADIM YEVGENYEVICH , LOOPSTRA ERIK ROELOF
IPC分类号： H01L21/027 , H05G2/00
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70175 , H05G2/003
摘要： PROBLEM TO BE SOLVED: To provide a radiation source having a contamination barrier for reducing a deposition rate of ions, atoms, molecules, granular debris and the like on a collector mirror of an EUV radiation source.SOLUTION: A radiation source includes a plasma formation portion, at which fuel comes into contact with a radiation beam to form a plasma. A collector with a mirror collects and reflects EUV radiation generated at a first focal point toward a second focal point. A contamination barrier is positioned so that a peripheral edge of the contamination barrier does not block more than 50% of a solid angle defined by a mirror at the second focal point, and thereby, the EUV radiation reflected by the collector mirror passes through the contamination barrier and is not attenuated excessively. The contamination barrier functions to trap fuel materials such as ions, atoms, molecules or nano droplets from the plasma, so as to prevent them from being accumulated on the collector mirror. A gas extraction port may be provided near the plasma formation portion to restrain diffusion of the fuel debris and contamination toward the collector mirror.
摘要翻译：要解决的问题：提供一种具有污染屏障的辐射源，用于降低EUV辐射源的集光镜上的离子，原子，分子，颗粒状碎屑等的沉积速率。解决方案：辐射源包括等离子体形成部分，燃料与辐射束接触以形成等离子体。具有反射镜的收集器收集并反射在第一焦点处产生的EUV辐射朝向第二焦点。定位污染屏障，使得污染屏障的周边边缘不会阻挡由第二焦点上的反射镜限定的立体角的50％以上，从而由收集镜反射的EUV辐射通过污染物并且不会过度衰减。污染屏障用于从等离子体捕获诸如离子，原子，分子或纳米液滴的燃料材料，以防止它们聚集在收集器反射镜上。可以在等离子体形成部分附近设置气体提取口，以限制燃料碎屑的扩散和污染朝向收集器反射镜。版权所有（C）2013，JPO＆INPIT

6. 发明专利

JP2010045357A Radiation source and method for generating radiation 有权
标题翻译：辐射源和产生辐射的方法
公开(公告)号：JP2010045357A
公开(公告)日：2010-02-25
申请号：JP2009183972
申请日：2009-08-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LOOPSTRA ERIK ROELOF , SCHIMMEL HENDRIKUS GIJSBERTUS
IPC分类号： H01L21/027 , H05G2/00
CPC分类号： G03F7/70175 , G03F7/70033 , G21K1/06 , G21K2201/064 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： PROBLEM TO BE SOLVED: To provide a method and/or apparatus for increasing the time taken to allow fuel droplets to pass through a laser beam pulse.
SOLUTION: A radiation source is configured so as to generate radiation. The radiation source includes: a fuel droplet generator, configured so as to generate the flow of fuel droplets to be guided to a plasma generating portion; a laser which is a laser configured to generate a laser beam to be guided to the plasma generating portion and in which an angle between a direction of movement of the flow of droplets and a direction of the laser beam is smaller than 90°C; and a collector configured so as to condense the radiation generated by plasma formed by the plasma forming portion, when the radiation beam collides with the droplets. The collector is configured so as to substantially reflect the radiation along an optical axis of the radiation source. The laser beam is guided to the plasma generating portion through an aperture provided on the collector.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于增加允许燃料液滴通过激光束脉冲所花费的时间的方法和/或装置。解决方案：辐射源被配置为产生辐射。辐射源包括：燃料液滴发生器，其被配置为产生要被引导到等离子体产生部分的燃料液滴流; 激光器，其被配置为产生要被引导到等离子体产生部分的激光束，并且其中液滴流动方向与激光束的方向之间的角度小于90℃; 以及收集器，其被配置为当辐射束与液滴碰撞时，冷凝由等离子体形成部分形成的等离子体产生的辐射。收集器被配置为基本上沿辐射源的光轴反射辐射。激光束通过设置在收集器上的孔被引导到等离子体产生部分。版权所有（C）2010，JPO＆INPIT

7. 发明申请

WO2013124101A3 FUEL STREAM GENERATOR, SOURCE COLLECTOR APPARATUS AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：燃料流发生器，源收集装置和光刻装置
公开(公告)号：WO2013124101A3
公开(公告)日：2013-10-17
申请号：PCT/EP2013051093
申请日：2013-01-22
申请人： ASML NETHERLANDS BV
发明人： SCHIMMEL HENDRIKUS GIJSBERTUS , LABETSKI DZMITRY
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70033 , B05B1/02 , H05G2/005 , H05G2/006 , H05G2/008 , Y10T137/0391 , Y10T137/218
摘要： A fuel stream generator comprising a nozzle connected to a fuel reservoir, wherein the nozzle is provided with a gas inlet configured to provide a sheath of gas around fuel flowing along the nozzle is disclosed. Also disclosed are a method of generating fuel droplets and a lithography apparatus incorporating the fuel stream generator.
摘要翻译：本发明公开了一种燃料流发生器，其包括连接到燃料储存器的喷嘴，其中该喷嘴设有气体入口，该气体入口构造成在沿着喷嘴流动的燃料周围提供气体鞘。还公开了一种产生燃料液滴的方法和包含燃料流发生器的光刻设备。

9. 发明专利

NL1035943A1 Lithographic Apparatus and Device Manufacturing Method. 未知
公开(公告)号：NL1035943A1
公开(公告)日：2009-03-18
申请号：NL1035943
申请日：2008-09-16
申请人： ASML NETHERLANDS BV
发明人： VAN DE VIJVER YURI JOHANNES GABRIEL , EMPEL TJARKO ADRIAAN RUDOLF VAN , SCHOOT JAN BERNARD PLECHELMUS , SWINKELS GERARDUS HUBERTUS PETRUS MARIA , SCHIMMEL HENDRIKUS GIJSBERTUS , LABETSKI DZMITRY
IPC分类号： G03F7/20 , G21K1/00 , H01L21/027

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