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1. 发明公开

KR20210009445A 리소그래피 장치를 위한 유체 처리 구조물 审中-公开
公开(公告)号：KR20210009445A
公开(公告)日：2021-01-26
申请号：KR20217001688
申请日：2017-08-28
申请人： ASML NETHERLANDS BV
发明人： VAN DEN EIJNDEN PEPIJN , ROPS CORNELIUS MARIA , POLET THEODORUS WILHELMUS , KEUKENS FLOOR LODEWIJK , TANASA GHEORGHE , CORTIE ROGIER HENDRIKUS MAGDALENA , CUYPERS KOEN , BUDDENBERG HAROLD SEBASTIAAN , GATTOBIGIO GIOVANNI LUCA , VAN VLIET EVERT , TEN KATE NICOLAAS , FRENCKEN MARK JOHANNES HERMANUS , VAN ERVE JANTIEN LAURA , TEUNISSEN MARCEL MARIA CORNELIUS FRANCISCUS
IPC分类号： G03F7/20
摘要： 침지유체를리소그래피장치의일부영역에국한시키도록구성된유체처리구조물(12)은, 침지액체를통해투영비임이통과하도록형성된구멍(15); 제 1 부분(100); 및제 2 부분(200)을포함하고, 제 1 부분과제 2 부분중의적어도하나는영역으로부터침지유체를빼내기위한표면(20)을형성하고, 유체처리구조물은유체처리구조물의표면에출입하는유체유동을제공하고, 제 2 부분에대한제 1 부분의운동은구멍에대한표면에출입하는유체유동의위치를변화시키는데효과적이고, 제 1 부분과제 2 부분중의하나는유체유동이통과하는적어도하나의관통공(51, 61)을포함하고, 제 1 부분과제 2 부분중의다른하나는유체유동이통과하는적어도하나의개구(55, 65)를포함하며, 적어도하나의관통공및 적어도하나의개구는서로정렬되면유체연통하고, 운동에의해적어도하나의개구가적어도하나의관통공중의하나와정렬되어, 구멍에대한표면에출입하는유체유동의위치가변하게된다.

2. 发明专利

JP2010109395A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2010109395A
公开(公告)日：2010-05-13
申请号：JP2010032113
申请日：2010-02-17
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KEMPER NICOLAAS RUDOLF , DONDERS SJOERD NICOLAAS LAMBERTUS , CHRISTIAAN ALEXANDER HOOGENDAM , TEN KATE NICOLAAS , VAN DER MEULEN FRITS
IPC分类号： H01L21/027
CPC分类号： G03F7/70866 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus improved from a liquid supply system configured to supply immersion liquid into interspace between a terminal element of a projection system and a substrate, so as to efficiently remove the liquid from the vicinity of the substrate. SOLUTION: The liquid supply system includes a sealing member for forming a seal between its own undersurface and the substrate to substantially store the liquid in the space. A recess is formed in the undersurface and connected to a first pressure source and a second pressure source for extracting the liquid and/or gas. The first pressure source has lower pressure than the second pressure source, gas flow generated from the second pressure source to the first pressure source, and the liquid and/or gas extracted by the flow. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种从液体供应系统改进的光刻设备，其配置为将浸没液体供应到投影系统的端子元件和基板之间的间隙中，以便有效地从液体供应系统基质。解决方案：液体供应系统包括用于在其自身的下表面和基底之间形成密封的密封构件，以将液体基本上储存在空间中。凹槽形成在下表面中并连接到第一压力源和用于抽出液体和/或气体的第二压力源。第一压力源具有比第二压力源低的压力，从第二压力源产生的气流到第一压力源，以及由流提取的液体和/或气体。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2006196905A Lithography apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHY设备和设备制造方法
公开(公告)号：JP2006196905A
公开(公告)日：2006-07-27
申请号：JP2006005636
申请日：2006-01-13
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KEMPER NICOLAAS RUDOLF , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , TEN KATE NICOLAAS , VAN DER MEULEN FRITS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus, having a liquid feed system configured to supply immersion liquid to spacing between the final element and substrate of the projection system, for which the improvement is made so that the liquid from the near-by area of the substrate can be removed efficiently. SOLUTION: This liquid feed system comprises a seal component for forming a sealing between the lower surface of the system and the substrate that virtually accommodates the liquid in the spacing. A concave section is formed on the lower surface, and the concave section is connected with a first pressure source and a second pressure source for extracting the liquid and/or gas. The first pressure source is set to be at a lower pressure level than that of the second pressure source so that the gas flow is produced, from the second pressure source to the first pressure source. The liquid and/or gas can be extracted due to this flow. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种光刻设备，其具有液体供给系统，该液体供给系统构造成将浸没液体供应到投影系统的最终元件和基板之间的间隔，其中进行改进使得来自近处的液体可以有效地去除衬底的面积。解决方案：该液体供给系统包括用于在系统的下表面和基本上容纳间隔的液体的基底之间形成密封的密封部件。在下表面上形成凹部，凹部与用于取出液体和/或气体的第一压力源和第二压力源连接。第一压力源设定在比第二压力源低的压力水平，从而从第二压力源到第一压力源产生气体流。由于这种流动，液体和/或气体可以被提取。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2007013151A Method of manufacturing lithographic apparatus and device 有权
标题翻译：制造光刻设备和器件的方法
公开(公告)号：JP2007013151A
公开(公告)日：2007-01-18
申请号：JP2006176038
申请日：2006-06-27
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KEMPER NICOLAAS R , LAMBERTUS DONDERS SJOERD NICOL , HOOGENDAM CHRISTIAAN ALEXANDER , TEN KATE NICOLAAS , SERGEI SHULEPOV
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , H01L21/67034
摘要： PROBLEM TO BE SOLVED: To provide an immersion apparatus having an effective means of removing an immersion liquid from a surface. SOLUTION: A gas knife formed to dry the surface in an immersion type lithographic apparatus is optimized to remove a liquid by establishing a pressure gradient in a liquid film on the dried surface. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有从表面去除浸液的有效手段的浸没装置。解决方案：在浸没型光刻设备中形成干燥表面的气刀被优化以通过在干燥的表面上的液膜中建立压力梯度来除去液体。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2007005795A Lithography equipment and method of manufacturing device 有权
标题翻译： LITHOGRAPHY EQUIPMENT AND METHODS MANUFACTURING DEVICE
公开(公告)号：JP2007005795A
公开(公告)日：2007-01-11
申请号：JP2006168236
申请日：2006-06-19
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JACOBS JOHANNES HENRICUS WILHE , TEN KATE NICOLAAS , LEENDERS MARTINUS HENDRIKUS AN , LOOPSTRA ERIK ROELOF , VERHAGEN MARTINUS CORNELIS MAR , BOOM HERMAN , JANSSEN FRANCISCUS JOHANNES JO , BOUCHOMS IGOR PETRUS MARIA , KEMPER NICOLAAS R , OTTENS JOOST JEROEN , KOEK YUECEL , VAN ES JOHANNES
IPC分类号： H01L21/027
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875
摘要： PROBLEM TO BE SOLVED: To provide a system efficiently and effectively eliminating an energy loss in lithography equipment when a relevant component is locally cooled by the evaporation of a supplied liquid, and defocus and lens aberration are caused by transformation and alteration in immersion lithography for filling a gap between a projection system and a substrate with an immersion liquid in order to increase the number of holes. SOLUTION: A timetable 34 is prepared having information on time at which the evaporation of a supplied liquid 11 is the most likely caused, the position of a substrate W, a speed, an acceleration speed and the like. The evaporation of a local area is prevented by heating at least a portion of the substrate W by using a heater according to the timetable 34 by using a liquid evaporation control device 30 or sending humidified air. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：当通过供应液体的蒸发局部冷却相关部件时，为了提供高效且有效地消除光刻设备中的能量损失的系统，并且散焦和透镜像差是由浸渍的变换和变化引起的用于通过浸没液体填充投影系统和基板之间的间隙以增加孔的数量的光刻。解决方案：制备时间表34，其具有关于供应的液体11的蒸发最可能引起的时间的信息，基板W的位置，速度，加速度等。通过使用液体蒸发控制装置30或发送加湿空气根据时间表34的加热器加热基板W的至少一部分来防止局部区域的蒸发。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2010010707A Lithographic apparatus 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2010010707A
公开(公告)日：2010-01-14
申请号：JP2009234094
申请日：2009-10-08
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JACOBS JOHANNES HENRICUS WILHELMUS , TEN KATE NICOLAAS , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LOOPSTRA ERIK ROELOF , VERHAGEN MARTINUS CORNELIS MARIA , BOOM HERMAN , JANSSEN FRANCISCUS JOHANNES JOSEPH , BOUCHOMS IGOR PETRUS MARIA , KEMPER NICOLAAS R , OTTENS JOOST JEROEN , KOEK YUECEL , VAN ES JOHANNES
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875
摘要： PROBLEM TO BE SOLVED: To provide a system that efficiently and effectively eliminate energy loss in a lithographic apparatus where a related component is locally cooled by evaporation of a supplied liquid and may be deformed and change in quality to possibly cause defocusing and lens aberrations during immersion lithography in which the part between a projection system and a substrate is filled with an immersion liquid so as to increase a numerical aperture. SOLUTION: A schedule table 34 is prepared which contains information regarding time when the supplied liquid 11 is most apt to evaporate, the position, speed, acceleration, etc. of the substrate, and a liquid evaporation controller 30 heats at least part of the substrate W by a heater or sends humidifying air according to the schedule table 34 to prevent local evaporation. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种系统，其有效地和有效地消除光刻设备中的能量损失，其中相关部件通过供应液体的蒸发局部冷却，并且可能变形并且质量变化以可能引起散焦和透镜浸渍光刻期间的像差，其中投影系统和衬底之间的部分被浸没液体填充以增加数值孔径。解决方案：准备一个计划表34，其中包含关于所供应的液体11最易蒸发的时间的信息，基板的位置，速度，加速度等，并且液体蒸发控制器30加热至少部分或者根据附表表34发送加湿空气以防止局部蒸发。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2009094532A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2009094532A
公开(公告)日：2009-04-30
申请号：JP2008311424
申请日：2008-12-05
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： HOOGENDAM CHRISTIAAN A , JACOBS JOHANNES HENRICUS WILHE , TEN KATE NICOLAAS , VAN DER MEULEN FRITS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a liquid supply system that can be operated continuously, irrespective of changes in scan direction of a substrate relative to a projection system, while ensuring thorough refreshment of a liquid reservoir. SOLUTION: In a scanning immersion lithographic apparatus, immersion liquid is supplied on one side of the space between the projection system and the substrate and drained on the other side so that the flow of liquid is substantially perpendicular to the scan direction. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种可以连续操作的液体供应系统，而不管基板相对于投影系统的扫描方向如何变化，同时确保液体储存器的充分刷新。解决方案：在扫描浸没式光刻设备中，浸没液体被供应在投影系统和基板之间的空间的一侧，并在另一侧被排出，使得液体的流动基本上垂直于扫描方向。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2012124539A Lithographic apparatus 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2012124539A
公开(公告)日：2012-06-28
申请号：JP2012071249
申请日：2012-03-27
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JACOBS JOHANNES HENRICUS WILHELMUS , TEN KATE NICOLAAS , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LOOPSTRA ERIK ROELOF , VERHAGEN MARTINUS CORNELIS MARIA , BOOM HERMAN , JANSSEN FRANCISCUS JOHANNES JOSEPH , BOUCHOMS IGOR PETRUS MARIA , KEMPER NICOLAAS R , OTTENS JOOST JEROEN , KOEK YUECEL , VAN ES JOHANNES
IPC分类号： H01L21/027
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875
摘要： PROBLEM TO BE SOLVED: To provide a system that efficiently and effectively eliminates such energy loss in a lithographic apparatus as occurs by evaporation of a provided liquid which locally cools associated components leading to deformations and deterioration that may cause defocus and lens aberration in immersion lithography where a space between a projection system and a substrate is filled with an immersion liquid to increase the numerical aperture.SOLUTION: A timetable 34 is prepared which comprises information regarding the time and the position, the speed, the acceleration etc. of the substrate W at which evaporation of a provided liquid 11 is most likely to occur. A liquid evaporation controller 30 heats at least a part of the substrate W by a heater or sends humidified air to prevent local evaporation, according to the timetable 34.
摘要翻译：要解决的问题：提供一种系统，其有效地和有效地消除光刻设备中的这种能量损失，如通过蒸发局部冷却相关部件的所提供的液体而发生的，导致变形和劣化，这可能导致散焦和透镜像差浸没光刻，其中投影系统和衬底之间的空间被浸没液体填充以增加数值孔径。解决方案：制备时间表34，其包括关于最可能发生所提供的液体11的蒸发的基板W的时间和位置，速度，加速度等的信息。液体蒸发控制器30根据时间表34通过加热器加热至少一部分基板W或者发送加湿空气以防止局部蒸发。版权所有（C）2012，JPO＆INPIT

9. 发明专利

JP2010021568A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2010021568A
公开(公告)日：2010-01-28
申请号：JP2009230362
申请日：2009-10-02
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KEMPER NICOLAAS R , LAMBERTUS DONDERS SJOERD NICOLAAS , HOOGENDAM CHRISTIAAN ALEXANDER , TEN KATE NICOLAAS , SERGEI SHULEPOV
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , H01L21/67034
摘要： PROBLEM TO BE SOLVED: To provide an immersion apparatus having an effective means for removing an immersion liquid from a surface. SOLUTION: A gas knife configured to dry the surface in an immersion lithographic apparatus is optimized to remove the liquid by ensuring that a pressure gradient is built up in a liquid film on the surface being dried. COPYRIGHT: (C)2010,JPO&INPIT

10. 发明专利

JP2009158976A Lithographic apparatus, and device manufacturing method 有权
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2009158976A
公开(公告)日：2009-07-16
申请号：JP2009094993
申请日：2009-04-09
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KEMPER NICOLAAS RUDOLF , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , TEN KATE NICOLAAS , VAN DER MEULEN FRITS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus, having a liquid feed system configured to supply immersion liquid to spacing between a final element of a projection system and a substrate, for which the improvement is made so that the liquid from the near-by area of the substrate can be removed efficiently. SOLUTION: This liquid feed system comprises a seal member for forming a seal between the undersurface of itself and the substrate to virtually store the liquid in the spacing. A recessed section is formed on the undersurface, and the recessed section of the undersurface is connected with a first pressure source and a second pressure source for extracting the liquid and/or gas. The first pressure source is set at a lower pressure level than that of the second pressure source so that the gas flow is produced, from the second pressure source to the first pressure source, and the liquid and/or gas can be extracted by this flow. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种光刻设备，其具有配置成将浸没液体供应到投影系统的最终元件与基板之间的间隔的液体供给系统，其中进行改进，使得来自可以有效地除去基板的近区域。解决方案：该液体供给系统包括用于在其本身的下表面和基底之间形成密封件的密封构件，以在间隔中虚拟存储液体。在下表面上形成凹部，下表面的凹部与第一压力源和用于抽出液体和/或气体的第二压力源连接。第一压力源被设定在比第二压力源低的压力水平，使得从第二压力源到第一压力源产生气流，并且可以通过该流来提取液体和/或气体。版权所有（C）2009，JPO＆INPIT

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