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1. 发明专利

NL2005392A SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. 未知
公开(公告)号：NL2005392A
公开(公告)日：2011-03-28
申请号：NL2005392
申请日：2010-09-24
申请人： ASML NETHERLANDS BV , CYMER
发明人： LOOPSTRA ERIK , BANINE VADIM , SWINKELS GERARDUS , PEKELDER SVEN , LABETSKI DZMITRY , STAMM UWE , PARTLO WILLIAM N
IPC分类号： G03F7/20 , H05G2/00

2. 发明专利

JP2012222356A Lithographic apparatus and method 有权
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：JP2012222356A
公开(公告)日：2012-11-12
申请号：JP2012085380
申请日：2012-04-04
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LOOPSTRA ERIK ROELOF , PEKELDER SVEN , HAN-KWANG NIENHUYS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70916 , G03F7/70808 , G03F7/70933
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus and method which can prevent or restrict passage of contamination into a projection system of a lithographic apparatus.SOLUTION: A lithographic apparatus includes a projection system that includes a plurality of reflective optics. One of the reflective optics is provided with an opening which passes through the reflective optic. The opening is closed by a covering layer that is substantially transparent to EUV radiation. The covering layer prevents contamination from entering the projection system, while allowing patterned EUV radiation to pass from the projection system onto a substrate.
摘要翻译：要解决的问题：提供可以防止或限制污染物进入光刻设备的投影系统的光刻设备和方法。解决方案：光刻设备包括包括多个反射光学器件的投影系统。反射光学器件中的一个设置有穿过反射光学器件的开口。开口由对EUV辐射基本透明的覆盖层封闭。覆盖层防止污染物进入投影系统，同时允许图案化的EUV辐射从投影系统传递到基底上。版权所有（C）2013，JPO＆INPIT

3. 发明专利

JP2010103529A Lithography equipment having line carrier assembly including low friction cable, hose, and the like, and such general assembly 审中-公开
标题翻译：具有包括低摩擦电缆，软管和类似这样的总体装配的线路载波组件的电路设备
公开(公告)号：JP2010103529A
公开(公告)日：2010-05-06
申请号：JP2009236754
申请日：2009-10-14
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BRINKHUIS MARCEL HENRI , PEKELDER SVEN
IPC分类号： H01L21/027
CPC分类号： G03B27/42 , F16L3/015 , G03F7/70991
摘要： PROBLEM TO BE SOLVED: To provide lithographic equipment having a line carrier assembly for smoothly guiding a plurality of lines.
SOLUTION: Lithography equipment includes a plurality of flexible medium transfer lines and an assembly of a line carrier. The line carrier is constituted so that a plurality of flexible medium transfer lines are movably guided from one connection point of the equipment to another connection point. At least one of the two connection points is movable. At least one of the flexible medium transfer lines includes a base layer on the inner side on which a low friction outer layer is provided. The low friction outer layer has a friction smaller than that of the base layer on the inner side so that at least one of the flexible medium transfer lines is smoothly guided to the carrier and an adjacent flexible medium transfer line during the movement of at least one connection point.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供具有用于平滑地引导多条线的线载体组件的平版印刷设备。解决方案：光刻设备包括多个柔性介质传输线和线载体的组件。线载体被构造成使得多个柔性介质传输线从设备的一个连接点可移动地引导到另一个连接点。两个连接点中的至少一个可移动。柔性介质传送线中的至少一个包括在其上设置有低摩擦外层的内侧的基底层。低摩擦外层的摩擦力小于内侧的基层的摩擦力，使得柔性介质输送管线中的至少一个在至少一个运动过程中平滑地被引导到载体和相邻的柔性介质输送管线连接点。版权所有（C）2010，JPO＆INPIT

4. 发明专利

NL2008845A LITHOGRAPHIC APPARATUS AND COMPONENT. 未知
公开(公告)号：NL2008845A
公开(公告)日：2012-11-27
申请号：NL2008845
申请日：2012-05-21
申请人： ASML NETHERLANDS BV
发明人： NIENHUYS HAN-KWANG , JANSSEN FRANCISCUS , PEKELDER SVEN , HUIJBERTS ALEXANDER MARINUS ARNOLDUS , GASSELING PAULUS ALBERTUS MARIA , SCHMITZ ROGER
IPC分类号： G03F7/20

5. 发明专利

NL2007628A LITHOGRAPHIC APPARATUS AND METHOD. 未知
公开(公告)号：NL2007628A
公开(公告)日：2011-11-23
申请号：NL2007628
申请日：2011-10-20
申请人： ASML NETHERLANDS BV
发明人： LOOPSTRA ERIK , PEKELDER SVEN , NIENHUYS HAN-KWANG
IPC分类号： G03F7/20

6. 发明专利

NL2003546A LITHOGRAPHIC APPARATUS COMPRISING AN ASSEMBLY OF A LINE CARRIER WITH LOW-FRICTION CABLES, HOSES OR THE LIKE AND SUCH AN ASSEMBLY IN GENERAL. 未知
公开(公告)号：NL2003546A
公开(公告)日：2010-04-22
申请号：NL2003546
申请日：2009-09-25
申请人： ASML NETHERLANDS BV
发明人： BRINKHUIS MARCEL HENRI , PEKELDER SVEN
IPC分类号： H01L21/68 , G03F7/20
摘要： A lithographic apparatus includes an assembly of a plurality of flexible medium transfer lines and a line carrier, the liner carrier configured to moveably guide the plurality of flexible medium transfer lines from one connection point of the apparatus to another connection point, wherein at least one of the two connection points is movable. At least one of the flexible medium transfer lines includes an inner base layer having an outer low-friction layer provided thereon, the outer low-friction layer having lower friction capacities than the inner base layer so as to provide a smooth guiding of the at least one of the flexible medium transfer lines relative to the carrier and a neighbouring flexible medium transfer line during a movement of the at least one connection point.

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