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1. 发明专利

JP2007300142A Load lock with temperature regulation, lithography system equipped with load lock, and method for producing substrate using load lock 有权
标题翻译：具有温度调节的加载锁定，装载有锁定的平移系统以及使用负载锁定生产基板的方法
公开(公告)号：JP2007300142A
公开(公告)日：2007-11-15
申请号：JP2007207924
申请日：2007-08-09
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KLOMP ALBERT JAN HENDRIK , HOOGKAMP JAN FREDERIK , VISSER RAIMOND , VUGTS JOSEPHUS CORNELIUS JOHAN , VULLINGS HENRICUS J L M , KUIPERS LEO W M , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： H01L21/027 , G03F7/20 , H01L21/677 , H01L21/68
CPC分类号： G03F7/70975 , G03F7/7075 , G03F7/70858 , G03F7/70991 , Y10S414/135 , Y10S414/139
摘要： PROBLEM TO BE SOLVED: To provide a load lock with temperature regulation, a lithography system equipped with a load lock, and a method for producing a substrate using the load lock. SOLUTION: An object, e.g. a substrate W, is transferred into/from a lithography system. Load lock outer walls 38 and 40 define at least a part of the load lock volume for containing support units 33 and 141 which support the object W when it is in the load lock. Furthermore, the load lock has a structure for temperature regulation to control the temperature of the object at least before it is transferred from the load lock toward the lithography system. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供具有温度调节的负载锁定，配备有负载锁定的光刻系统以及使用该装载锁制造衬底的方法。解决方案：一个对象，例如衬底W被转移到/从光刻系统中。负载锁外壁38和40限定了装载锁定体积的至少一部分，用于容纳在物体W处于装载锁定状态时支撑物体W的支撑单元33和141。此外，负载锁具有用于温度调节的结构，以至少在从负载锁转移到光刻系统之前控制物体的温度。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2009016870A Particle detection device, lithographic apparatus, and device manufacturing method 有权
标题翻译：颗粒检测装置，光刻装置和装置制造方法
公开(公告)号：JP2009016870A
公开(公告)日：2009-01-22
申请号：JP2008257384
申请日：2008-10-02
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ONVLEE JOHANNES , GREVE PETER FERDINAND , FRANSSEN JOHANNES HENDRIKUS GE , VISSER RAYMOND , VERHAGEN ERWIN THEODORUS JACOB
IPC分类号： H01L21/027 , G01N21/956
CPC分类号： G03F7/70916 , G01N21/94 , G01N21/956 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To provide a detector system for resolving radiation from a ghost particle from radiation from an actual particle for discriminating between a particle and a ghost particle. SOLUTION: The detector system outputs a plurality of detector signals corresponding to intensities of radiation being incident on a part of the detector system or the detector system outputs detector signals corresponding to intensities of radiation incident on the detector system. In the plurality of detector signals, radiation received from a ghost particle does not have levels higher than a prescribed threshold level respectively and, when radiation is received from a particle, an approximately same level above the threshold level is displayed. The detector system includes a radiation detector device for generating a first detector signal in response to radiation incident on a prescribed part and a radiation blocking assembly for preventing radiation not originating from a particle from being incident on the prescribed part of the detector device. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于从用于鉴别颗粒和重影颗粒的实际颗粒的辐射中分离来自重影颗粒的辐射的检测器系统。解决方案：检测器系统输出对应于入射在检测器系统的一部分上的辐射强度的多个检测器信号，或者检测器系统输出对应于入射在检测器系统上的辐射强度的检测器信号。在多个检测器信号中，从重影粒子接收的辐射分别不具有高于规定阈值的电平，并且当从粒子接收到辐射时，显示出高于阈值电平的大致相同的电平。检测器系统包括用于响应于入射在规定部分上的辐射而产生第一检测器信号的辐射检测器装置和用于防止不是源自粒子的辐射入射到检测器装置的规定部分上的辐射阻挡组件。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2009124142A Substrate treatment device and device manufacturing method 审中-公开
标题翻译：基板处理装置和装置制造方法
公开(公告)号：JP2009124142A
公开(公告)日：2009-06-04
申请号：JP2008286357
申请日：2008-11-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VISSER RAIMOND , HENNUS PIETER RENAAT MARIA , FRANSSEN JOHANNES HENDRIKUS GE , VERHAGEN ERWIN THEODORUS JACOB
IPC分类号： H01L21/027 , G03F7/20 , H01L21/683
CPC分类号： H01L21/67201 , G03F7/70841
摘要： PROBLEM TO BE SOLVED: To provide a device which can limit a temperature effect when a high working speed is used for a load lock. SOLUTION: This substrate treatment device has a vacuum chamber and the load lock for gas removal. The load lock has a support table in order to support a substrate. A cover plate is provided in the load lock and the cover plate has a lower surface facing an upper surface of the support table. An opening is formed in the lower surface of the cover plate and enables gas removal from an upper part of the substrate in the substantially perpendicular direction to the lower surface. In one embodiment, a gas removal structure with the opening in the upper surface of the support table is provided and gas pressure between the upper surface of the support table and the substrate is reduced through the opening in an early stage to predetermined pressure lower than simultaneous load lock pressure in the remainder of the load lock. When the load lock pressure in the remainder of the load lock is reduced to pressure lower than the predetermined pressure, the gas pressure between the upper surface of the support table and the substrate is reduced together with the load lock pressure in the remainder of the load lock. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种当使用高工作速度进行加载锁定时可以限制温度效应的装置。
解决方案：该基板处理装置具有真空室和用于除气的负载锁。负载锁具有支撑台以支撑基板。盖板设置在装载锁中，盖板具有面向支撑台的上表面的下表面。在盖板的下表面上形成一个开口，使得能够从与基板垂直的方向从基板的上部排出气体。在一个实施例中，提供了在支撑台的上表面中具有开口的气体去除结构，并且支撑台的上表面与基板之间的气体压力通过早期的开口减小到低于同时的预定压力加载锁定的剩余部分中的加载锁定压力。当负载锁定的剩余部分中的负载锁定压力降低到低于预定压力的压力时，支撑台的上表面和基板之间的气体压力与负载的其余部分中的负载锁定压力一起减小锁。版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2006126205A Particle detection device, lithographic apparatus and device manufacturing method 审中-公开
标题翻译：颗粒检测装置，光刻装置和装置制造方法
公开(公告)号：JP2006126205A
公开(公告)日：2006-05-18
申请号：JP2005320099
申请日：2005-10-05
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： ONVLEE JOHANNES , GREVE PETER FERDINAND , FRANSSEN JOHANNES HENDRIKUS GE , VISSER RAYMOND , VERHAGEN ERWIN THEODORUS JACOB
IPC分类号： G01N21/956 , G01B11/02 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70916 , G01N21/94 , G01N21/956 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To provide a detector system for resolving radiation from a ghost particle from radiation from an actual particle for differentiation between a particle and a ghost particle. SOLUTION: The detector system outputs a plurality of detector signals corresponding to intensities of radiation being incident on a part of the detector system or the detector system outputs detector signals corresponding to intensities of radiation incident on the detector system. In the plurality of detector signals, radiation received from a particle does not have levels higher than a predetermined threshold level respectively and, when radiation is received from the ghost particle, an approximately same level above the threshold level is displayed. The detector system includes a radiation detector device for generating a first detector signal in response to radiation incident on a predetermined part and a radiation blocking assembly for preventing radiation not originating from a particle from being incident on the predetermined part of the detector device. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种检测器系统，用于从来自实际颗粒的辐射分解来自重影颗粒的辐射，以在颗粒和重影颗粒之间进行区分。解决方案：检测器系统输出对应于入射在检测器系统的一部分上的辐射强度的多个检测器信号，或者检测器系统输出对应于入射在检测器系统上的辐射强度的检测器信号。在多个检测器信号中，从粒子接收的辐射分别不具有高于预定阈值的电平，并且当从重影粒子接收到辐射时，显示高于阈值电平的大致相同的电平。检测器系统包括用于响应于入射在预定部件上的辐射产生第一检测器信号的辐射检测器装置和用于防止不是源自颗粒的辐射入射在检测器装置的预定部分上的辐射阻挡组件。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2004343065A Load lock with temperature regulation, lithography system equipped with load lock, and method for producing substrate using load lock 有权
公开(公告)号：JP2004343065A
公开(公告)日：2004-12-02
申请号：JP2004067361
申请日：2004-03-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KLOMP ALBERT JAN HENDRIK , HOOGKAMP JAN FREDERIK , VISSER RAIMOND , VUGTS JOSEPHUS CORNELIUS JOHAN , VULLINGS HENRICUS J L M , KUIPERS LEO W M , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
CPC分类号： G03F7/70975 , G03F7/7075 , G03F7/70858 , G03F7/70991 , Y10S414/135 , Y10S414/139
摘要： PROBLEM TO BE SOLVED: To provide a load lock with temperature regulation, a lithography system equipped with a load lock, and a method for producing a substrate using the load lock. SOLUTION: An object, e.g. a substrate W, is transferred into/from a lithography system. Load lock outer walls 38 and 40 define at least a part of the load lock volume for containing support units 33 and 141 which support the object W when it is in the load lock. Furthermore, the load lock has a structure for temperature regulation to control the temperature of the object at least before it is transferred from the load lock toward the lithography system. COPYRIGHT: (C)2005,JPO&NCIPI

6. 发明专利

JP2005051202A Lithographic apparatus and method for manufacturing device 审中-公开
标题翻译：平面设备和制造设备的方法
公开(公告)号：JP2005051202A
公开(公告)日：2005-02-24
申请号：JP2004147188
申请日：2004-05-18
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： HOOGKAMP JAN FREDERIK , KLOMP ALBERT JAN HENDRIK , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： G03F1/08 , G03F7/20 , H01L21/00 , H01L21/027
CPC分类号： G03F7/70933 , G03F7/70741 , G03F7/7075 , G03F7/70808 , H01L21/67017 , H01L21/67201
摘要： PROBLEM TO BE SOLVED: To prevent a substrate from fouling by suppressing entry of unnecessary particles or molecules at the time of opening and closing a door in a substrate loading device (LL) of an exposure system in which the pressure is lower than an atmospheric pressure. SOLUTION: The loading device (LL) forms a space, or a chamber, and comprises a first door (11) that faces a lithographic pattern forming chamber (PC), a second door (12) that faces a second environment, and a gas entrance (13). The gas entrance (13) is connected to a gas supply (17) so as to provide a gas at least for a portion of a period during which an object moves. This gas is a gas which basically does not include at least one of particles, oxygen, a hydrocarbon and H 2 O. Supplying a gas that does not foul a substrate allows the pressure in the loading device to be higher than an atmospheric pressure, thereby suppressing the entry of unnecessary particles or molecules at the time opening and closing the door between different atmospheres and thus preventing the substrate from fouling. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了防止基板在压力低于其的曝光系统的基板装载装置（LL）中打开和关闭门时抑制不必要的颗粒或分子进入而造成污染大气压力。解决方案：加载装置（LL）形成空间或室，并且包括面向光刻图案形成室（PC）的第一门（11），面向第二环境的第二门（12）和气体入口（13）。气体入口（13）连接到气体供应源（17），以至少在物体移动期间的一部分期间提供气体。该气体是基本上不包括颗粒，氧气，烃和H 2 SB 2 O 2中的至少一种的气体。提供不污染基板的气体允许加载装置中的压力高于大气压，从而在不同气氛之间打开和关闭门时抑制不必要的颗粒或分子的进入，从而防止基板污垢。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2004343068A Lithography projection assembly, load-lock and method for transferring article 有权
公开(公告)号：JP2004343068A
公开(公告)日：2004-12-02
申请号：JP2004067524
申请日：2004-03-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KLOMP ALBERT JAN HENDRIK , HOOGKAMP JAN FREDERIK , VUGTS JOSEPHUS CORNELIUS JOHAN , LIVESEY ROBERT GORDON , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： H01L21/677 , G03F7/20 , H01L21/027 , H01L21/68
CPC分类号： G03F7/70975 , G03F7/7075 , G03F7/70858 , G03F7/70991
摘要： PROBLEM TO BE SOLVED: To increase the throughput of a lithography projection assembly. SOLUTION: The lithography projection assembly comprises at least one load-lock for transferring an article, especially a substrate, between a first environment and a second environment preferably having a pressure lower than that in the first environment, an article handler including a handler chamber which can be reached by the second environment, and a lithography projector including a projection chamber. The handler chamber and the projection chamber can be interconnected in order to transfer an article. The load-lock comprises a load-lock chamber, a means for exhausting the load-lock chamber, and a door means for closing the load-lock chamber during exhaust operation and opening the load-lock chamber in order to feed the article into the load-lock chamber or taking out the article therefrom. The load-lock chamber is provided with at least two positions for supporting different articles. COPYRIGHT: (C)2005,JPO&NCIPI

8. 发明专利

JP2005354086A Insertion apparatus, lithography equipment comprising insertion apparatus, and method of manufacturing device 有权
标题翻译：插入装置，包含插入装置的平版印刷装置和制造装置的方法
公开(公告)号：JP2005354086A
公开(公告)日：2005-12-22
申请号：JP2005178509
申请日：2005-05-23
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KUIPERS LEO WILHELMUS MARIA , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： B65G1/00 , B65G49/07 , G03F7/20 , H01L21/027 , H01L21/677 , H01L21/68
CPC分类号： G03F7/7075 , H01L21/67742 , Y10S414/136 , Y10S414/139
摘要： PROBLEM TO BE SOLVED: To provide a robot arm provided in a container such that a locus is not be blocked even if condition in the container is changed.
SOLUTION: There is provided a robot arm for inserting and eliminating an object into/from environment in which condition is adjusted using a connected carrier. The robot arm is positioned in the container in which the condition can be adjusted. The wall of the container can be changed when the condition of the interior of the container is adjusted. Since the locus of the robot arm needs to be exact, the robot arm is flexibly combined with the wall of the container such that the direction of the robot arm is independent from the direction of the wall of the container. Further, there is disclosed a docking system for use in an apparatus comprising the robot arm having the connected carrier.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种设置在容器中的机器人臂，使得即使在容器内的状况改变的情况下也不会阻塞轨迹。
解决方案：提供了一种机器人臂，用于将物体插入/取出环境中，其中使用连接的载体调节状况。机器人臂位于可以调节状态的容器中。当调节容器内部的状态时，容器的壁可以改变。由于机器人手臂的轨迹需要精确，所以机器人手臂能够与容器的壁柔性地组合，使得机器人臂的方向与容器壁的方向无关。此外，公开了一种用于包括具有连接载体的机器人手臂的装置的对接系统。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

SG115630A1 TEMPERATURE CONDITIONED LOAD LOCK, LITHOGRAPHIC APPARATUS COMPRISING SUCH A LOAD LOCK AND METHOD OF MANUFACTURING A SUBSTRATE WITH SUCH A LOAD LOCK 未知
公开(公告)号：SG115630A1
公开(公告)日：2005-10-28
申请号：SG200401152
申请日：2004-03-09
申请人： ASML NETHERLANDS BV
发明人： KLOMP ALBERT JAN HENDRIK , HOOGKAMP JAN FREDERIK , VISSER RAIMOND , VUGTS JOSEPHUS CORNELIUS JOHAN , VULLINGS HENRICUS JOHANNES LOU , KUIPERS LEO WILHELMUS MARIA , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： G03F7/20 , H01L21/68 , H01L21/027
摘要： A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.

10. 发明专利

SG115629A1 METHOD AND APPARATUS FOR MAINTAINING A MACHINE PART 未知
公开(公告)号：SG115629A1
公开(公告)日：2005-10-28
申请号：SG200401151
申请日：2004-03-09
申请人： ASML NETHERLANDS BV
发明人： VAN GROOS PIETER JOHANNES MARI , HOOGKAMP JAN FREDERIK , KLOMP ALBERT JAN HENDRIK , LOOPSTRA ERIK ROELOF , VERMEULEN JOHANNES PETRUS MART , VUGTS JOSEPHUS CORNELIUS JOHAN , LIVESEY ROBERT GORDON , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： H01L21/677 , G03F7/20 , H01L21/027 , H01L21/683
摘要： A method of and apparatus for maintaining a machine part arranged in an interior space of a machine, where the interior space is kept at a first pressure and is separated from an environment having a second pressure via a load lock. The method includes transporting a machine part via the load lock out of the interior space and transporting via the load lock into the interior space one of the maintained machine part and a separate replacement machine part.

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