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1. 发明专利

JP2006128672A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2006128672A
公开(公告)日：2006-05-18
申请号：JP2005305274
申请日：2005-10-20
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KUIT JAN JAAP , HOOGKAMP JAN FREDERIK , SEGERS HUBERT M , VISSER RAYMOND , MAQUINE JOHANNES
IPC分类号： H01L21/027 , B65G49/06 , B65G49/07 , G03F7/20 , H01L21/677
CPC分类号： G03F7/70741
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus including an improved pattering device handling apparatus which gives optimum conditions relative to an expense and a required space more favorable than those given by a conventional patterning device handling apparatus.
SOLUTION: The present invention provides a lithographic apparatus including an illumination system for conditioning a radiation beam; a patterning device support for supporting a patterning device which can impart a pattern to the cross section of the radiation beam; a substrate table for holding a substrate; a projection system for projecting the patterned radiation beam to a target portion of the substrate; and a patterning device handling apparatus which comprises a single robot for exchanging the patterning device between the patterning device support and a loading station. The robot includes a first holding device for holding the patterning device in a first holding position and a second holding device for holding the patterning device in a second holding position. Such a robot allows the rapid and accurate exchange of the patterning device.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种光刻设备，其包括改进的图案装置处理装置，其提供相对于常规图案形成装置处理装置给出的费用和所需空间的最佳条件。解决方案：本发明提供一种包括用于调节辐射束的照明系统的光刻设备; 图案形成装置支撑件，用于支撑图案形成装置，所述图案形成装置可赋予所述辐射束的横截面图案; 用于保持衬底的衬底台; 投影系统，用于将图案化的辐射束投影到基板的目标部分; 以及图案形成装置处理装置，其包括用于在图案形成装置支撑件和装载工位之间更换图案形成装置的单个机器人。机器人包括用于将图案形成装置保持在第一保持位置的第一保持装置和用于将图案形成装置保持在第二保持位置的第二保持装置。这样的机器人能够快速且准确地交换图案形成装置。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2004343065A Load lock with temperature regulation, lithography system equipped with load lock, and method for producing substrate using load lock 有权
公开(公告)号：JP2004343065A
公开(公告)日：2004-12-02
申请号：JP2004067361
申请日：2004-03-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KLOMP ALBERT JAN HENDRIK , HOOGKAMP JAN FREDERIK , VISSER RAIMOND , VUGTS JOSEPHUS CORNELIUS JOHAN , VULLINGS HENRICUS J L M , KUIPERS LEO W M , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
CPC分类号： G03F7/70975 , G03F7/7075 , G03F7/70858 , G03F7/70991 , Y10S414/135 , Y10S414/139
摘要： PROBLEM TO BE SOLVED: To provide a load lock with temperature regulation, a lithography system equipped with a load lock, and a method for producing a substrate using the load lock. SOLUTION: An object, e.g. a substrate W, is transferred into/from a lithography system. Load lock outer walls 38 and 40 define at least a part of the load lock volume for containing support units 33 and 141 which support the object W when it is in the load lock. Furthermore, the load lock has a structure for temperature regulation to control the temperature of the object at least before it is transferred from the load lock toward the lithography system. COPYRIGHT: (C)2005,JPO&NCIPI

3. 发明专利

JP2007300142A Load lock with temperature regulation, lithography system equipped with load lock, and method for producing substrate using load lock 有权
标题翻译：具有温度调节的加载锁定，装载有锁定的平移系统以及使用负载锁定生产基板的方法
公开(公告)号：JP2007300142A
公开(公告)日：2007-11-15
申请号：JP2007207924
申请日：2007-08-09
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KLOMP ALBERT JAN HENDRIK , HOOGKAMP JAN FREDERIK , VISSER RAIMOND , VUGTS JOSEPHUS CORNELIUS JOHAN , VULLINGS HENRICUS J L M , KUIPERS LEO W M , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： H01L21/027 , G03F7/20 , H01L21/677 , H01L21/68
CPC分类号： G03F7/70975 , G03F7/7075 , G03F7/70858 , G03F7/70991 , Y10S414/135 , Y10S414/139
摘要： PROBLEM TO BE SOLVED: To provide a load lock with temperature regulation, a lithography system equipped with a load lock, and a method for producing a substrate using the load lock. SOLUTION: An object, e.g. a substrate W, is transferred into/from a lithography system. Load lock outer walls 38 and 40 define at least a part of the load lock volume for containing support units 33 and 141 which support the object W when it is in the load lock. Furthermore, the load lock has a structure for temperature regulation to control the temperature of the object at least before it is transferred from the load lock toward the lithography system. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供具有温度调节的负载锁定，配备有负载锁定的光刻系统以及使用该装载锁制造衬底的方法。解决方案：一个对象，例如衬底W被转移到/从光刻系统中。负载锁外壁38和40限定了装载锁定体积的至少一部分，用于容纳在物体W处于装载锁定状态时支撑物体W的支撑单元33和141。此外，负载锁具有用于温度调节的结构，以至少在从负载锁转移到光刻系统之前控制物体的温度。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2006100832A Lithography equipment and device-manufacture method 有权
标题翻译： LITHOGRAPHY设备和设备制造方法
公开(公告)号：JP2006100832A
公开(公告)日：2006-04-13
申请号：JP2005282290
申请日：2005-09-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KUIT JAN JAAP , BIJVOET DIRK J , HOOGKAMP JAN FREDERIK , SEGERS HUBERT M , VISSER RAIMOND , MAQUINE JOHANNES
IPC分类号： H01L21/027 , H01L21/677
CPC分类号： G03F7/70733
摘要： PROBLEM TO BE SOLVED: To provide lithography equipment for reducing replacement time required for arranging another substrate on a substrate support.
SOLUTION: The lithography equipment comprises a replaceable object handling device, capable of replacing a replaceable object using replaceable object station and support. The replaceable object is one substrate W. Pattern forming device and support are one of a substrate support WT and the pattern forming device support. The replaceable object handling device 1 comprises an intermediate holding device 3 for holding the replaceable object. The intermediate holding device 3 can act mutually with the support WT such that the substrate W is arranged on the support WT or the substrate W is taken out from the support WT. A robot 2 can replace the replaceable object, using the support WT, the intermediate holding device 3 and the replaceable object station.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供光刻设备，以减少在基板支撑件上布置另一基板所需的更换时间。解决方案：光刻设备包括可更换的物体处理装置，能够使用可替换的对象站和支撑来替换可更换物体。替换对象是一个基板W.图案形成装置和支撑件是基板支撑件WT和图案形成装置支撑件之一。可替换物体处理装置1包括用于保持可更换物体的中间保持装置3。中间保持装置3可以与支撑件WT相互作用，使得基板W布置在支撑件WT上，或者基板W从支撑件WT取出。机器人2可以使用支撑件WT，中间保持装置3和可更换对象工位来代替可更换物体。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2007329506A Supporting structure, lithographic projection apparatus, and method of manufacturing device 有权
标题翻译：支撑结构，光刻投影装置和制造装置的方法
公开(公告)号：JP2007329506A
公开(公告)日：2007-12-20
申请号：JP2007218716
申请日：2007-08-24
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： TINNEMANS PATRICIUS ALOYSIUS J , BUIS EDWIN JOHAN , DONDERS SJOERD NICOLAAS LAMBER , VAN ELP JAN , HOOGKAMP JAN FREDERIK , VAN MEER ASCHWIN LODEWIJK HEND , SMULDERS PATRICK JOHANNES CORN , SPANJERS FRANCISCUS ANDREAS CO , VERMEULEN JOHANNES PETRUS MART , VISSER RAIMOND , TEGENBOSCH HENRICUS GERARDUS , VAN DEN BERG JOHANNES CHARLES , VAN DE SANDE HENRICUS JOHANNES , VERVOORT THIJS
IPC分类号： B08B1/00 , H01L21/677 , B25J13/08 , B65G49/07 , G03F7/20 , H01L21/027 , H01L21/304 , H01L21/683 , H02N13/00
CPC分类号： G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
摘要： PROBLEM TO BE SOLVED: To provide a method of effectively compensating for a positional shift including a tilt between a substrate and a supporting structure and a vertical displacement when moving the substrate in a lithographic projection apparatus using the supporting structure.
SOLUTION: By providing compliant parts (14, 26) in the supporting structure for holding and moving a substrate (W), for example, a supporting frame (18) of a robot arm (10) adaptable to the tilt and/or the vertical displacement. Clamps (20, 22, 24) that the supporting frame (18) comprises may be a Johnson-Raybeck effect type clamp that requires a stringent positional precision, and the cleaning of the inside of the projection apparatus is carried out by using only one substrate.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种有效地补偿包括基板和支撑结构之间的倾斜的位置偏移以及在使用支撑结构在光刻投影装置中移动基板时的垂直位移的方法。解决方案：通过在用于保持和移动衬底（W）的支撑结构中提供柔性部件（14,26），例如适用于倾斜和/或倾斜的机器人臂（10）的支撑框架（18）或垂直位移。支撑框架（18）包括的夹具（20,22,24）可以是要求严格的位置精度的Johnson-Raybeck效果型夹具，并且通过仅使用一个基板来执行投影装置的内部的清洁。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2005051202A Lithographic apparatus and method for manufacturing device 审中-公开
标题翻译：平面设备和制造设备的方法
公开(公告)号：JP2005051202A
公开(公告)日：2005-02-24
申请号：JP2004147188
申请日：2004-05-18
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： HOOGKAMP JAN FREDERIK , KLOMP ALBERT JAN HENDRIK , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： G03F1/08 , G03F7/20 , H01L21/00 , H01L21/027
CPC分类号： G03F7/70933 , G03F7/70741 , G03F7/7075 , G03F7/70808 , H01L21/67017 , H01L21/67201
摘要： PROBLEM TO BE SOLVED: To prevent a substrate from fouling by suppressing entry of unnecessary particles or molecules at the time of opening and closing a door in a substrate loading device (LL) of an exposure system in which the pressure is lower than an atmospheric pressure. SOLUTION: The loading device (LL) forms a space, or a chamber, and comprises a first door (11) that faces a lithographic pattern forming chamber (PC), a second door (12) that faces a second environment, and a gas entrance (13). The gas entrance (13) is connected to a gas supply (17) so as to provide a gas at least for a portion of a period during which an object moves. This gas is a gas which basically does not include at least one of particles, oxygen, a hydrocarbon and H 2 O. Supplying a gas that does not foul a substrate allows the pressure in the loading device to be higher than an atmospheric pressure, thereby suppressing the entry of unnecessary particles or molecules at the time opening and closing the door between different atmospheres and thus preventing the substrate from fouling. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了防止基板在压力低于其的曝光系统的基板装载装置（LL）中打开和关闭门时抑制不必要的颗粒或分子进入而造成污染大气压力。解决方案：加载装置（LL）形成空间或室，并且包括面向光刻图案形成室（PC）的第一门（11），面向第二环境的第二门（12）和气体入口（13）。气体入口（13）连接到气体供应源（17），以至少在物体移动期间的一部分期间提供气体。该气体是基本上不包括颗粒，氧气，烃和H 2 SB 2 O 2中的至少一种的气体。提供不污染基板的气体允许加载装置中的压力高于大气压，从而在不同气氛之间打开和关闭门时抑制不必要的颗粒或分子的进入，从而防止基板污垢。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2004343076A Support structure for use in lithographic apparatus 审中-公开
公开(公告)号：JP2004343076A
公开(公告)日：2004-12-02
申请号：JP2004102395
申请日：2004-03-31
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： TINNEMANS PATRICIUS ALOYSIUS J , BUIS EDWIN JOHAN , DONDERS SJOERD NICOLAAS LAMBER , VAN ELP JAN , HOOGKAMP JAN FREDERIK , VAN MEER ASCHWIN LODEWIJK HEND , SMULDERS PATRICK JOHANNES CORN , SPANJERS FRANCISCUS ANDREAS CO , VERMEULEN JOHANNES PETRUS MART , VISSER RAIMOND , TEGENBOSCH HENRICUS GERARDUS , VAN DEN BERG JOHANNES CHARLES , VAN DE SANDE HENRICUS JOHANNES , VERVOORT THIJS
IPC分类号： B08B1/00 , B25J13/08 , B65G49/07 , G03F7/20 , H01L21/027 , H01L21/304 , H01L21/677 , H01L21/683 , H02N13/00 , H01L21/68
CPC分类号： G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
摘要： PROBLEM TO BE SOLVED: To provide a method capable of effectively compensating an inclination between a substrate and a support structure or a misregistration including a displacement in the vertical direction when the substrate is moved by the support structure in a lithographic projection apparatus. SOLUTION: By providing a support structure for holding and moving a substrate (W), for example, flexible sections (14, 26) in a support frame (18) of a robot arm (10), it can be adapted to the tilt and/or a displacement in the vertical direction. Clamps (20, 22, 24) provided on the support frame (18) may be a Johnson-Raybeck effect type clamp, which requires the severe position accuracy, and can perform a cleaning treatment in a projection apparatus by only one substrate. COPYRIGHT: (C)2005,JPO&NCIPI

8. 发明专利

JP2004343068A Lithography projection assembly, load-lock and method for transferring article 有权
公开(公告)号：JP2004343068A
公开(公告)日：2004-12-02
申请号：JP2004067524
申请日：2004-03-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KLOMP ALBERT JAN HENDRIK , HOOGKAMP JAN FREDERIK , VUGTS JOSEPHUS CORNELIUS JOHAN , LIVESEY ROBERT GORDON , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： H01L21/677 , G03F7/20 , H01L21/027 , H01L21/68
CPC分类号： G03F7/70975 , G03F7/7075 , G03F7/70858 , G03F7/70991
摘要： PROBLEM TO BE SOLVED: To increase the throughput of a lithography projection assembly. SOLUTION: The lithography projection assembly comprises at least one load-lock for transferring an article, especially a substrate, between a first environment and a second environment preferably having a pressure lower than that in the first environment, an article handler including a handler chamber which can be reached by the second environment, and a lithography projector including a projection chamber. The handler chamber and the projection chamber can be interconnected in order to transfer an article. The load-lock comprises a load-lock chamber, a means for exhausting the load-lock chamber, and a door means for closing the load-lock chamber during exhaust operation and opening the load-lock chamber in order to feed the article into the load-lock chamber or taking out the article therefrom. The load-lock chamber is provided with at least two positions for supporting different articles. COPYRIGHT: (C)2005,JPO&NCIPI

9. 发明专利

JP2007088465A Photolithography apparatus, particle inspection system, particle inspection method, and device manufacturing method 有权
标题翻译：光刻设备，颗粒检查系统，颗粒检查方法和设备制造方法
公开(公告)号：JP2007088465A
公开(公告)日：2007-04-05
申请号：JP2006252549
申请日：2006-09-19
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BRUINSMA ANASTASIUS JACOBUS AN , VAN GROOS PIETER JOHANNES MARI , HOOGKAMP JAN FREDERIK , MODDEMEIJER KEES , DRAAISMA FOLKERT
IPC分类号： H01L21/66 , G01N21/956 , G03F7/20 , H01L21/027
CPC分类号： G01N21/956 , G03F7/70791 , G03F7/70983
摘要： PROBLEM TO BE SOLVED: To provide a particle inspection system and a particle inspection method for inspecting particles present on the top surface of a substrate. SOLUTION: A photolithography apparatus transfers a pattern from a patterning device to a substrate, and includes the particle inspection system for inspecting the particles present on the top surface of the substrate. The particle inspection system incorporates a radiation source for the radiation generation, illumination optical system guiding the radiation generated by the radiation source to a detection area at the top surface of the substrate, detection optical system receiving the radiation from the inspection area at the top surface of the substrate, and a detector coupled to the inspection optical system for generating at least one measurement signal. This apparatus further incorporates a processing unit to determine the height of a particle based on at least one measurement signal and generate a height excess signal if the height exceeds a threshold value. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于检查存在于基板的顶表面上的颗粒的颗粒检查系统和颗粒检查方法。解决方案：光刻装置将图案从图案形成装置传送到基板，并且包括用于检查存在于基板顶表面上的颗粒的颗粒检查系统。颗粒检查系统包括用于辐射生成的辐射源，将由辐射源产生的辐射引导到基板顶表面处的检测区域的照明光学系统，接收来自顶表面上的检查区域的辐射的检测光学系统以及耦合到检查光学系统的检测器，用于产生至少一个测量信号。该装置还包括处理单元，用于基于至少一个测量信号确定颗粒的高度，并且如果高度超过阈值则产生高度过剩信号。版权所有（C）2007，JPO＆INPIT

10. 发明专利

JP2006352115A STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：JP2006352115A
公开(公告)日：2006-12-28
申请号：JP2006157945
申请日：2006-06-07
申请人： ASML NETHERLANDS BV
发明人： BAGGEN MARCEL KOENRAAD MARIE , BIJVOET DIRK-JAN , LAMBERTUS DONDERS SJOERD NICOL , HOOGKAMP JAN FREDERIK , JANSEN ALBERT JOHANNES MARIA , KUIT JAN JAAP , SCHAAP PETER , JANSSEN JOEP , JASPERSE HUBRECHT BASTIAAN , VAN DER WEL ARJAN M
IPC分类号： H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To solve such problems that: degraded dynamic behaviors may prolong a stable time (i.e. the desired time for bringing the position of an object table into a desired error bandwidth); larger forces are desirably provided in order to obtain the desired acceleration of a patterning device or a substrate; and the positioning accuracy of the object is affected as a result of that. SOLUTION: There is described a stage apparatus for displacing an object having a substantially flat surface. The stage apparatus is provided with an object table for supporting the object and a positioning device for displacing the object table in a first direction. The stage apparatus is further provided with a clamping device for clamping the object to the object table by a first clamping force that is controlled by an electronic control unit on the basis of the condition of the object. COPYRIGHT: (C)2007,JPO&INPIT

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