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1. 发明专利

JP2005101607A Manufacturing method for device, method for determining direction and the lithography device 有权
标题翻译：用于装置的制造方法，用于确定方向的方法和图形装置
公开(公告)号：JP2005101607A
公开(公告)日：2005-04-14
申请号：JP2004273444
申请日：2004-09-21
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VISSER RAIMOND , KUIPERS LEO W M
IPC分类号： G01B11/26 , G01B21/22 , G03F7/20 , G03F9/00 , G06K9/00 , H01L21/027 , H01L21/66
CPC分类号： G03F9/7003 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To provide a method for determining direction of a substrate concerning a patterning method, especially a method for determining it with quick rotation without requiring a special mark on the substrate. SOLUTION: At least two structures (S1) and (S2) that are on the substrate (2) and have corresponding formations mutually, for example, previously projected pattern image that is formed on known measured position in measuring coordinates system (u-v axes) of a lithography device and the pattern after the rotation, are used for determining the direction of the substrate. Metrical vector (Tx) between these at least two structures (S1) and (S2) is determined. Rotation angle (Rz) of pattern coordinates system (x-y axes) relating to the substrate from the measuring coordinates system is calculated. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于确定基板方法的方向的方法，特别是用于在不需要基板上的特殊标记的情况下快速旋转的方法。解决方案：在衬底（2）上具有相互形成的至少两个结构（S1）和（S2），例如在测量坐标系（uv）中已知测量位置上形成的预先投影的图案图像轴）和旋转后的图案用于确定基板的方向。确定这些至少两个结构（S1）和（S2）之间的度量矢量（Tx）。计算与测量坐标系相关的基板的图案坐标系（x-y轴）的旋转角（Rz）。版权所有（C）2005，JPO＆NCIPI

2. 发明专利

JP2004343065A Load lock with temperature regulation, lithography system equipped with load lock, and method for producing substrate using load lock 有权
公开(公告)号：JP2004343065A
公开(公告)日：2004-12-02
申请号：JP2004067361
申请日：2004-03-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KLOMP ALBERT JAN HENDRIK , HOOGKAMP JAN FREDERIK , VISSER RAIMOND , VUGTS JOSEPHUS CORNELIUS JOHAN , VULLINGS HENRICUS J L M , KUIPERS LEO W M , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
CPC分类号： G03F7/70975 , G03F7/7075 , G03F7/70858 , G03F7/70991 , Y10S414/135 , Y10S414/139
摘要： PROBLEM TO BE SOLVED: To provide a load lock with temperature regulation, a lithography system equipped with a load lock, and a method for producing a substrate using the load lock. SOLUTION: An object, e.g. a substrate W, is transferred into/from a lithography system. Load lock outer walls 38 and 40 define at least a part of the load lock volume for containing support units 33 and 141 which support the object W when it is in the load lock. Furthermore, the load lock has a structure for temperature regulation to control the temperature of the object at least before it is transferred from the load lock toward the lithography system. COPYRIGHT: (C)2005,JPO&NCIPI

3. 发明专利

JP2013070038A Lithographic apparatus and substrate handling method 有权
标题翻译：平面设备和基板处理方法
公开(公告)号：JP2013070038A
公开(公告)日：2013-04-18
申请号：JP2012186941
申请日：2012-08-27
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LAFARRE RAYMOND WILHELMUS LOUIS , LAMBERTUS DONDERS SJOERD NICOLAAS , ANTONIUS FRANCISCUS JOHANNES DE GROOT , VERMEULEN JOHANNES PETRUS MARTINUS , YAN-SHAN HUANG , CHRISTIAAN LOUIS VALENTIN , HUBERT MARY SEGELS , JOHANNES CHARLES ADRIANUS VAN DEN BERG , VESTERAKEN JEAN STEVEN CHRISTIAN , VISSER RAIMOND
IPC分类号： H01L21/027 , G03F7/20 , H01L21/677
CPC分类号： G03F7/70708
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus which can position a substrate onto a substrate table with a small stress.SOLUTION: A lithographic apparatus comprises a substrate table to hold a substrate, and a gripper to position the substrate onto the substrate table. The gripper includes an electrostatic clamp to clamp the substrate at a top side thereof. The electrostatic clamp is arranged so as to clamp at least part of a circumferential outer zone of a top surface of the substrate. The invention provides a substrate handling method including positioning for the substrate by means of the gripper onto the substrate table of the lithographic apparatus. The substrate is clamped at the top side thereof by using the electrostatic clamp of the gripper.
摘要翻译：要解决的问题：提供一种能够将基板定位在具有小应力的基板台上的光刻设备。解决方案：光刻设备包括用于保持衬底的衬底台和用于将衬底定位到衬底台上的夹具。夹持器包括用于在其顶侧夹持衬底的静电夹具。静电夹具被布置成夹紧衬底的顶表面的周向外部区域的至少一部分。本发明提供了一种基板处理方法，其包括通过夹持器将基板定位在光刻设备的基板台上。通过使用夹持器的静电夹具将基板夹在其顶侧。版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2007300142A Load lock with temperature regulation, lithography system equipped with load lock, and method for producing substrate using load lock 有权
标题翻译：具有温度调节的加载锁定，装载有锁定的平移系统以及使用负载锁定生产基板的方法
公开(公告)号：JP2007300142A
公开(公告)日：2007-11-15
申请号：JP2007207924
申请日：2007-08-09
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KLOMP ALBERT JAN HENDRIK , HOOGKAMP JAN FREDERIK , VISSER RAIMOND , VUGTS JOSEPHUS CORNELIUS JOHAN , VULLINGS HENRICUS J L M , KUIPERS LEO W M , FRANSSEN JOHANNES HENDRIKUS GE
IPC分类号： H01L21/027 , G03F7/20 , H01L21/677 , H01L21/68
CPC分类号： G03F7/70975 , G03F7/7075 , G03F7/70858 , G03F7/70991 , Y10S414/135 , Y10S414/139
摘要： PROBLEM TO BE SOLVED: To provide a load lock with temperature regulation, a lithography system equipped with a load lock, and a method for producing a substrate using the load lock. SOLUTION: An object, e.g. a substrate W, is transferred into/from a lithography system. Load lock outer walls 38 and 40 define at least a part of the load lock volume for containing support units 33 and 141 which support the object W when it is in the load lock. Furthermore, the load lock has a structure for temperature regulation to control the temperature of the object at least before it is transferred from the load lock toward the lithography system. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供具有温度调节的负载锁定，配备有负载锁定的光刻系统以及使用该装载锁制造衬底的方法。解决方案：一个对象，例如衬底W被转移到/从光刻系统中。负载锁外壁38和40限定了装载锁定体积的至少一部分，用于容纳在物体W处于装载锁定状态时支撑物体W的支撑单元33和141。此外，负载锁具有用于温度调节的结构，以至少在从负载锁转移到光刻系统之前控制物体的温度。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2006100832A Lithography equipment and device-manufacture method 有权
标题翻译： LITHOGRAPHY设备和设备制造方法
公开(公告)号：JP2006100832A
公开(公告)日：2006-04-13
申请号：JP2005282290
申请日：2005-09-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KUIT JAN JAAP , BIJVOET DIRK J , HOOGKAMP JAN FREDERIK , SEGERS HUBERT M , VISSER RAIMOND , MAQUINE JOHANNES
IPC分类号： H01L21/027 , H01L21/677
CPC分类号： G03F7/70733
摘要： PROBLEM TO BE SOLVED: To provide lithography equipment for reducing replacement time required for arranging another substrate on a substrate support.
SOLUTION: The lithography equipment comprises a replaceable object handling device, capable of replacing a replaceable object using replaceable object station and support. The replaceable object is one substrate W. Pattern forming device and support are one of a substrate support WT and the pattern forming device support. The replaceable object handling device 1 comprises an intermediate holding device 3 for holding the replaceable object. The intermediate holding device 3 can act mutually with the support WT such that the substrate W is arranged on the support WT or the substrate W is taken out from the support WT. A robot 2 can replace the replaceable object, using the support WT, the intermediate holding device 3 and the replaceable object station.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供光刻设备，以减少在基板支撑件上布置另一基板所需的更换时间。解决方案：光刻设备包括可更换的物体处理装置，能够使用可替换的对象站和支撑来替换可更换物体。替换对象是一个基板W.图案形成装置和支撑件是基板支撑件WT和图案形成装置支撑件之一。可替换物体处理装置1包括用于保持可更换物体的中间保持装置3。中间保持装置3可以与支撑件WT相互作用，使得基板W布置在支撑件WT上，或者基板W从支撑件WT取出。机器人2可以使用支撑件WT，中间保持装置3和可更换对象工位来代替可更换物体。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2012009883A Substrate processing apparatus and device manufacturing method 审中-公开
标题翻译：基板加工设备和设备制造方法
公开(公告)号：JP2012009883A
公开(公告)日：2012-01-12
申请号：JP2011177939
申请日：2011-08-16
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VISSER RAIMOND , HENNUS PIETER RENAAT MARIA , FRANCEN JOHANNES HENDRIKS GERTRUDIS , VERHAGEN IRWIN THEODOROS JACOBS
IPC分类号： H01L21/027 , G03F7/20 , H01L21/683
CPC分类号： H01L21/67201 , G03F7/70841
摘要： PROBLEM TO BE SOLVED: To provide an apparatus that can limit temperature effect when a high operation speed is used for a load lock.SOLUTION: A substrate processing apparatus has a vacuum chamber and the load lock for gas removal. The load lock has a support table for supporting a substrate. A cover plate is provided in the load lock and has a lower surface facing an upper surface of the support table. An opening is provided to the lower surface of the cover plate so as to remove gas from above the substrate in a direction substantially perpendicular to the lower surface. As an embodiment, gas removal constitution which has an opening in the upper surface of the support table is provided to initially reduce gas pressure between the upper surface of the support table and the substrate to predetermined pressure lower than simultaneous load lock pressure in the rest of the load lock through the opening. When the load lock pressure in the rest of the load lock is made lower than predetermined, the gas pressure between the upper surface of the support table and the substrate is reduced together with the load lock pressure in the rest of the load lock.
摘要翻译：要解决的问题：提供一种当将高操作速度用于负载锁定时可以限制温度效应的装置。解决方案：基板处理装置具有真空室和用于除气的装载锁。负载锁具有用于支撑基板的支撑台。盖板设置在装载锁中，并且具有面向支撑台的上表面的下表面。在盖板的下表面设置有开口，从而在基板的大致垂直于下表面的方向从基板的上方除去气体。作为一个实施例，提供了在支撑台的上表面具有开口的气体去除构造，以便最初将支撑台的上表面和基板之间的气体压力降低到低于其余部分中的同时的负载锁定压力的预定压力负载通过开口锁定。当负载锁的其余部分的负载锁定压力低于预定值时，支撑台的上表面和基板之间的气体压力与负载锁的其余部分中的负载锁定压力一起减小。版权所有（C）2012，JPO＆INPIT

7. 发明专利

JP2007329506A Supporting structure, lithographic projection apparatus, and method of manufacturing device 有权
标题翻译：支撑结构，光刻投影装置和制造装置的方法
公开(公告)号：JP2007329506A
公开(公告)日：2007-12-20
申请号：JP2007218716
申请日：2007-08-24
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： TINNEMANS PATRICIUS ALOYSIUS J , BUIS EDWIN JOHAN , DONDERS SJOERD NICOLAAS LAMBER , VAN ELP JAN , HOOGKAMP JAN FREDERIK , VAN MEER ASCHWIN LODEWIJK HEND , SMULDERS PATRICK JOHANNES CORN , SPANJERS FRANCISCUS ANDREAS CO , VERMEULEN JOHANNES PETRUS MART , VISSER RAIMOND , TEGENBOSCH HENRICUS GERARDUS , VAN DEN BERG JOHANNES CHARLES , VAN DE SANDE HENRICUS JOHANNES , VERVOORT THIJS
IPC分类号： B08B1/00 , H01L21/677 , B25J13/08 , B65G49/07 , G03F7/20 , H01L21/027 , H01L21/304 , H01L21/683 , H02N13/00
CPC分类号： G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
摘要： PROBLEM TO BE SOLVED: To provide a method of effectively compensating for a positional shift including a tilt between a substrate and a supporting structure and a vertical displacement when moving the substrate in a lithographic projection apparatus using the supporting structure.
SOLUTION: By providing compliant parts (14, 26) in the supporting structure for holding and moving a substrate (W), for example, a supporting frame (18) of a robot arm (10) adaptable to the tilt and/or the vertical displacement. Clamps (20, 22, 24) that the supporting frame (18) comprises may be a Johnson-Raybeck effect type clamp that requires a stringent positional precision, and the cleaning of the inside of the projection apparatus is carried out by using only one substrate.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种有效地补偿包括基板和支撑结构之间的倾斜的位置偏移以及在使用支撑结构在光刻投影装置中移动基板时的垂直位移的方法。解决方案：通过在用于保持和移动衬底（W）的支撑结构中提供柔性部件（14,26），例如适用于倾斜和/或倾斜的机器人臂（10）的支撑框架（18）或垂直位移。支撑框架（18）包括的夹具（20,22,24）可以是要求严格的位置精度的Johnson-Raybeck效果型夹具，并且通过仅使用一个基板来执行投影装置的内部的清洁。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2004343076A Support structure for use in lithographic apparatus 审中-公开
公开(公告)号：JP2004343076A
公开(公告)日：2004-12-02
申请号：JP2004102395
申请日：2004-03-31
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： TINNEMANS PATRICIUS ALOYSIUS J , BUIS EDWIN JOHAN , DONDERS SJOERD NICOLAAS LAMBER , VAN ELP JAN , HOOGKAMP JAN FREDERIK , VAN MEER ASCHWIN LODEWIJK HEND , SMULDERS PATRICK JOHANNES CORN , SPANJERS FRANCISCUS ANDREAS CO , VERMEULEN JOHANNES PETRUS MART , VISSER RAIMOND , TEGENBOSCH HENRICUS GERARDUS , VAN DEN BERG JOHANNES CHARLES , VAN DE SANDE HENRICUS JOHANNES , VERVOORT THIJS
IPC分类号： B08B1/00 , B25J13/08 , B65G49/07 , G03F7/20 , H01L21/027 , H01L21/304 , H01L21/677 , H01L21/683 , H02N13/00 , H01L21/68
CPC分类号： G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
摘要： PROBLEM TO BE SOLVED: To provide a method capable of effectively compensating an inclination between a substrate and a support structure or a misregistration including a displacement in the vertical direction when the substrate is moved by the support structure in a lithographic projection apparatus. SOLUTION: By providing a support structure for holding and moving a substrate (W), for example, flexible sections (14, 26) in a support frame (18) of a robot arm (10), it can be adapted to the tilt and/or a displacement in the vertical direction. Clamps (20, 22, 24) provided on the support frame (18) may be a Johnson-Raybeck effect type clamp, which requires the severe position accuracy, and can perform a cleaning treatment in a projection apparatus by only one substrate. COPYRIGHT: (C)2005,JPO&NCIPI

9. 发明专利

JP2009124142A Substrate treatment device and device manufacturing method 审中-公开
标题翻译：基板处理装置和装置制造方法
公开(公告)号：JP2009124142A
公开(公告)日：2009-06-04
申请号：JP2008286357
申请日：2008-11-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VISSER RAIMOND , HENNUS PIETER RENAAT MARIA , FRANSSEN JOHANNES HENDRIKUS GE , VERHAGEN ERWIN THEODORUS JACOB
IPC分类号： H01L21/027 , G03F7/20 , H01L21/683
CPC分类号： H01L21/67201 , G03F7/70841
摘要： PROBLEM TO BE SOLVED: To provide a device which can limit a temperature effect when a high working speed is used for a load lock. SOLUTION: This substrate treatment device has a vacuum chamber and the load lock for gas removal. The load lock has a support table in order to support a substrate. A cover plate is provided in the load lock and the cover plate has a lower surface facing an upper surface of the support table. An opening is formed in the lower surface of the cover plate and enables gas removal from an upper part of the substrate in the substantially perpendicular direction to the lower surface. In one embodiment, a gas removal structure with the opening in the upper surface of the support table is provided and gas pressure between the upper surface of the support table and the substrate is reduced through the opening in an early stage to predetermined pressure lower than simultaneous load lock pressure in the remainder of the load lock. When the load lock pressure in the remainder of the load lock is reduced to pressure lower than the predetermined pressure, the gas pressure between the upper surface of the support table and the substrate is reduced together with the load lock pressure in the remainder of the load lock. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种当使用高工作速度进行加载锁定时可以限制温度效应的装置。
解决方案：该基板处理装置具有真空室和用于除气的负载锁。负载锁具有支撑台以支撑基板。盖板设置在装载锁中，盖板具有面向支撑台的上表面的下表面。在盖板的下表面上形成一个开口，使得能够从与基板垂直的方向从基板的上部排出气体。在一个实施例中，提供了在支撑台的上表面中具有开口的气体去除结构，并且支撑台的上表面与基板之间的气体压力通过早期的开口减小到低于同时的预定压力加载锁定的剩余部分中的加载锁定压力。当负载锁定的剩余部分中的负载锁定压力降低到低于预定压力的压力时，支撑台的上表面和基板之间的气体压力与负载的其余部分中的负载锁定压力一起减小锁。版权所有（C）2009，JPO＆INPIT

10. 发明专利

JP2006100829A Lithography apparatus and device-manufacturing method 有权
标题翻译： LITHOGRAPHY装置和装置制造方法
公开(公告)号：JP2006100829A
公开(公告)日：2006-04-13
申请号：JP2005279999
申请日：2005-09-27
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： HOOGKAMP JAN FREDERIK , KUIT JAN JAAP , VISSER RAIMOND
IPC分类号： H01L21/027 , B65G49/07 , G03F7/20 , H01L21/677
CPC分类号： G03F7/70741 , H01L21/68707
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus capable of arranging and removing objects, such as a quickly and effectively patterning device and substrate. SOLUTION: The lithography apparatus is provided with a lighting system that adjusts radiation beams, support that gives patterns to the cross-section of radiation beams and supports patterning devices to form patterning radiation beams, substrate table that holds a substrate, projection system that projects patterning radiation beams on the targeted part of the substrate, and robot that is configured to transmit replaceable objects, to and from a support region. The robot is provided with an arm and end-effecter equipped with first and second carriers that are configured to transmit each replaceable object. The end-effecter is connected with the arm of the robot so that it can be rotated about the axis of rotation that extends substantially in parallel with the support region. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供能够布置和移除诸如快速有效地构图装置和基板的物体的光刻设备。解决方案：光刻设备设置有调节辐射束的照明系统，支撑件，其形成辐射束横截面的图案并且支撑图案形成装置以形成图案化辐射束，保持衬底的衬底台，投影系统这些工程将衬底的目标部分上的辐射束图案化，以及被配置为向支撑区域传送可替换物体的机器人。机器人设置有臂和端部执行器，其配备有被配置为传送每个可替换对象的第一和第二托架。端部执行器与机器人的臂连接，使得其可以围绕基本上平行于支撑区域延伸的旋转轴线旋转。版权所有（C）2006，JPO＆NCIPI

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