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1. 发明专利

JP2006157013A Substrate table, method for measuring position of substrate, and lithography equipment 审中-公开
标题翻译：基板表，测量基板位置的方法和图形设备
公开(公告)号：JP2006157013A
公开(公告)日：2006-06-15
申请号：JP2005342198
申请日：2005-11-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN BUEL HENRICUS WILHELMUS MA , BIJNEN FRANCISCUS GODEFRIDUS C , BURGHOORN JACOBUS , TOLSMA HOITE PIETER THEODOOR , BERGE PETER T
IPC分类号： H01L21/027
CPC分类号： G03F9/7088 , G03F7/70716 , G03F9/7011 , G03F9/7049 , G03F9/7084
摘要： PROBLEM TO BE SOLVED: To provide a substrate table configured so as to support a substrate comprising at least one substrate mark. SOLUTION: The at least one substrate mark has a position that can be measured using an alignment system. The substrate table comprises an optical system having a magnification factor that is not 1 in order to provide the image of the at least one substrate mark to be measured by the alignment system. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种被配置为支撑包括至少一个基板标记的基板的基板台。解决方案：至少一个基板标记具有可以使用对准系统测量的位置。衬底台包括具有不为1的放大系数的光学系统，以便通过对准系统提供待测量的至少一个衬底标记的图像。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2006186370A LITHOGRAPHY DEVICE AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：JP2006186370A
公开(公告)日：2006-07-13
申请号：JP2005372597
申请日：2005-12-26
申请人： ASML NETHERLANDS BV
发明人： BIJNEN FRANCISCUS GODEFRIDUS C , DE SMIT JOANNES T
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a system and a method that can compensate for temperature during manufacture of a substrate by reducing an alignment error due to thermal expansion on the basis of a plurality of standards by a lithography device for manufacturing a large-sized device. SOLUTION: A pattern 2 of array marks 20 widely distributed on a substrate 1, and arrays 21 and 22 of dots, are projected on the substrate 1 by a beam patterning and projection system 3 with a patterning radiation beam. An operation system 4 places in the substrate and projection system in relative motion, and a detection system 5 detects the array marks individually. The operation system 4 positions the substrate 1 relatively to the projection system 3, projects the patterning radiation beam on a target portion of the substrate 1, and adjusts pattern data based upon the detection result to perform temperature compensation. COPYRIGHT: (C)2006,JPO&NCIPI

3. 发明专利

JP2007300099A Substrate alignment for bonding 有权
标题翻译：用于接合的基板对准
公开(公告)号：JP2007300099A
公开(公告)日：2007-11-15
申请号：JP2007111644
申请日：2007-04-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BIJNEN FRANCISCUS GODEFRIDUS C , WERKMAN ROY
IPC分类号： H05K13/04 , B23P19/00
CPC分类号： H01L21/681 , H01L21/67092 , Y10T29/49131
摘要： PROBLEM TO BE SOLVED: To provide an alignment apparatus for a substrate bonding system. SOLUTION: A primary optical arm 12a configured so that radiation from primary alignment marks 6a and 6b on a primary substrate 6 may be guided to a detector, and a secondary optical arm 12b configured so that radiation from secondary alignment marks 8a and 8b on a secondary substrate 8 may be guided to a detector 28a are arranged. The primary alignment mark has a known position against a functional pattern arranged on the opposite side of the primary substrate, while the secondary alignment mark has a known position against a functional pattern arranged on the opposite side of the secondary substrate. In addition, the substrate bonding system has primary and secondary substrate tables 4 that are configured so that the primary and secondary substrates may be held, and at least one of the substrate tables can move in response to a signal output from the detector. The primary and secondary substrates can be aligned against each other for bonding. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于基板接合系统的定位装置。解决方案：主光学臂12a被配置为使得可以将主基板6上的主对准标记6a和6b的辐射引导到检测器，并且辅助光臂12b被配置为使得来自次对准标记8a和8b的辐射可以将第二基板8引导到检测器28a。主对准标记具有相对于布置在主基板的相对侧上的功能图案的已知位置，而第二对准标记具有针对布置在次级基板的相对侧上的功能图案的已知位置。此外，衬底接合系统具有被配置为使得可以保持初级和次级衬底的初级和次级衬底台4，并且至少一个衬底台可以响应于从检测器输出的信号而移动。主基板和次基板可以彼此对准以进行接合。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2007110106A Connection with micro device 审中-公开
标题翻译：与微型设备连接
公开(公告)号：JP2007110106A
公开(公告)日：2007-04-26
申请号：JP2006255274
申请日：2006-09-21
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BIJNEN FRANCISCUS GODEFRIDUS C , WEENINK WILLEM D
IPC分类号： H01L25/065 , H01L25/07 , H01L25/18
CPC分类号： H01L24/13 , G03F7/70375 , G03F7/70425 , G03F9/7003 , G03F9/7084 , G03F9/7088 , H01L21/682 , H01L23/481 , H01L23/544 , H01L24/11 , H01L24/81 , H01L2223/54453 , H01L2224/1147 , H01L2224/13012 , H01L2224/13099 , H01L2224/13144 , H01L2224/16147 , H01L2224/16235 , H01L2224/16237 , H01L2224/2518 , H01L2224/81141 , H01L2224/81191 , H01L2224/81193 , H01L2224/812 , H01L2224/81801 , H01L2225/06513 , H01L2924/01005 , H01L2924/01006 , H01L2924/01015 , H01L2924/01019 , H01L2924/01023 , H01L2924/01027 , H01L2924/01032 , H01L2924/01033 , H01L2924/01049 , H01L2924/01061 , H01L2924/01074 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/10329 , H01L2924/12042 , H01L2924/14 , H01L2924/15311 , H01L2924/15787 , H01L2924/19041 , H01L2924/30105 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To provide an improved method of connecting a micro device including, for example, an integrated circuit having connection bumps and its manufacturing method. SOLUTION: The connection bumps are provided on the two opposite sides of the micro device. A laminated product of micro devices is also provided in which grooves extending to a micro structure of a first side are formed on a second side, the grooves are filled with a metal to form the connection bumps, and a first micro device and a second micro device are stacked via the connection bumps. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种连接包括例如具有连接凸块的集成电路的微型器件及其制造方法的改进方法。
解决方案：连接凸块设置在微器件的两个相对侧上。还提供微型器件的叠层产品，其中延伸到第一侧的微结构的沟槽形成在第二侧上，沟槽用金属填充以形成连接凸块，并且第一微型器件和第二微型器件器件通过连接凸块堆叠。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2009147317A Lithographic apparatus and method 有权
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：JP2009147317A
公开(公告)日：2009-07-02
申请号：JP2008294810
申请日：2008-11-18
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： EDART REMI DANIEL MARIE , BIJNEN FRANCISCUS GODEFRIDUS C , PELLENS RUDY JAN MARIA , MAURY PASCALE ANNE
IPC分类号： H01L21/027
CPC分类号： G03F9/7049 , G03F7/70633 , G03F9/7065 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To accurately measure the position of an alignment mark located at a lower surface of a substrate. SOLUTION: A lithography alignment apparatus includes a radiation source constructed to generate radiation of 1,000 nm or a plurality of wavelengths longer than 1,000 nm; a control system 11 constructed to select one or plural infrared ray wavelengths; and a plurality of non focusing detector 15 constructed such that after the radiation is reflected by an alignment mark, a diffraction grating is provided, at least part of the diffraction grating has different diffraction grating periods to detect the radiation. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：精确测量位于基板下表面的对准标记的位置。解决方案：光刻对准装置包括被构造成产生1000nm或多于1000nm长的波长的辐射的辐射源; 构造成选择一个或多个红外线波长的控制系统11; 以及多个非聚焦检测器15，其被构造成使得在辐射被对准标记反射之后，提供衍射光栅，至少部分衍射光栅具有不同的衍射光栅周期以检测辐射。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2007208240A Substrate table, method for measuring position of substrate, and lithography device 审中-公开
标题翻译：衬底表，测量衬底位置的方法和光刻设备
公开(公告)号：JP2007208240A
公开(公告)日：2007-08-16
申请号：JP2006346089
申请日：2006-12-22
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN BUEL HENRICUS WILHELMUS MA , BIJNEN FRANCISCUS GODEFRIDUS C
IPC分类号： H01L21/027 , G01B11/00 , G03F9/00
CPC分类号： G03F7/70716 , G03F9/7084 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To provide a substrate table capable of achieving an improved alignment and a precision positioning. SOLUTION: An optical system including a first window and a second window disposed so as to allow a radiation to penetrate optical arms 10a, 10b is provided on the substrate table. At least two mirrors 12 are provided inside the optical arms 10a, 10b and are disposed so as to allow the radiation penetrating the windows to be reflected. At least two lenses 16, 18 are positioned so as to receive the radiation reflected from the mirrors 12, a first alignment mark WM1 is provided in the first window, and at least two mirrors 12 and at least two lenses 16, 18 are disposed so as to form an image 20a of the first alignment mark in the second window. The second alignment mark WM1 is provided in the second window or in the substrate table at a position adjacent to the second window. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供能够实现改进的对准和精确定位的基板台。解决方案：包括第一窗口和第二窗口的光学系统设置在允许辐射穿透光学臂10a，10b的基板台上。至少两个反射镜12设置在光学臂10a，10b的内部，并被设置成允许穿透窗户的辐射被反射。至少两个透镜16,18定位成接收从反射镜12反射的辐射，第一对准标记WM1设置在第一窗口中，并且至少两个反射镜12和至少两个透镜16,18被布置成以便在第二窗口中形成第一对准标记的图像20a。第二对准标记WM1设置在与第二窗口相邻的位置的第二窗口或衬底台中。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2006186377A METHOD AND SYSTEM FOR THREE-DIMENSIONAL ALIGNMENT FOR WAFER SCALE INTEGRATION 审中-公开
公开(公告)号：JP2006186377A
公开(公告)日：2006-07-13
申请号：JP2005375546
申请日：2005-12-27
申请人： ASML NETHERLANDS BV
发明人： BEST KEITH FRANK , PHILLIPPS GEOFFREY NORMAN , BIJNEN FRANCISCUS GODEFRIDUS C , VAN DEN BRINK ENNO , VAN BUEL HENRICUS WILHELMUS MA , CONSOLINI JOSEPH J , TEN BERGE PETER
IPC分类号： H01L25/18 , H01L25/065 , H01L25/07
摘要： PROBLEM TO BE SOLVED: To provide a method and a system for three-dimensional alignment for wafer scale integration. SOLUTION: A board bonding system is provided with first and second board tables to hold first and second boards, and a controller. The first board is equipped with a first device having a first contact pad, and the second board is equipped with a second device having a second contact pad. The wafer bonding system is designed to conduct bonding of the first and second devices so that a circuit can be formed by the first and second devices. First and second board tables ST and STb are respectively provided with a position sensor to measure optical signals generating on alignment markers WM1, WM1', WM2, and WM2', and WM1b, WM1b', WM2b and WM2b' of the first and second boards. Furthermore, they are provided with first and second actuators ACT and ACTb to change the position and the orientation of the respective board tables. COPYRIGHT: (C)2006,JPO&NCIPI

8. 发明专利

JP2009231837A Method for coarse wafer alignment in lithographic apparatus 审中-公开
标题翻译：方法在平面设备中进行粗波对齐
公开(公告)号：JP2009231837A
公开(公告)日：2009-10-08
申请号：JP2009064811
申请日：2009-03-17
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： WARNAAR PATRICK , BIJNEN FRANCISCUS GODEFRIDUS C
IPC分类号： H01L21/027
CPC分类号： G03F9/7069 , G03F9/7076 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To improve coarse alignment accuracy of a substrate.
SOLUTION: In a method for alignment of a substrate, the substrate includes a mark in a scribe lane, and the scribe lane extends along a longitudinal direction as a first direction. The mark has a periodic structure in the first direction. The method includes: providing an illumination beam for scanning the mark in a direction perpendicular to a direction of the mark's periodic structure along a first scan path across the mark; and scanning the spot of the illumination beam along a second scan path across the mark, wherein the second scan path is parallel to the first scan path, and the second scan path is shifted relative to the first scan path over a first shift that corresponds to a fraction of the repeating distance of the periodic structure.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提高基板的粗略对准精度。解决方案：在衬底对准的方法中，衬底包括划线中的标记，并且划线通道沿着纵向方向作为第一方向延伸。标记在第一方向上具有周期性结构。该方法包括：提供照射光束，用于沿着与标记的周期结构的方向垂直的方向沿着标记的第一扫描路径扫描标记; 并且沿着所述标记沿着第二扫描路径扫描所述照明光束的光点，其中所述第二扫描路径平行于所述第一扫描路径，并且所述第二扫描路径相对于所述第一扫描路径在对应于所述第一扫描路径的第一移位周期性结构重复距离的一部分。版权所有（C）2010，JPO＆INPIT

9. 发明专利

JP2009188404A Alignment mark and aligning method of substrate with alignment mark 有权
标题翻译：具有对准标记的基板的对准标记和对准方法
公开(公告)号：JP2009188404A
公开(公告)日：2009-08-20
申请号：JP2009019370
申请日：2009-01-30
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BIJNEN FRANCISCUS GODEFRIDUS C , TENNER MANFRED GAWEIN , WARNAAR PATRICK , VAN KEMENADE MARC
IPC分类号： H01L21/027
CPC分类号： G03B27/32 , G03F9/7076
摘要： PROBLEM TO BE SOLVED: To provide an alignment mark including a periodic structure formed by mark lines. SOLUTION: The alignment mark is formed in a scribe line on a substrate and the scribe line extends in the scribe line direction. The alignment mark has a first region including a first periodic structure formed by a first mark line extending in the first direction having a first angle α(0° COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供包括由标记线形成的周期性结构的对准标记。解决方案：对准标记形成在基板上的划线中，划线沿划线方向延伸。对准标记具有包括第一周期性结构的第一区域，所述第一周期性结构由相对于划线方向具有第一角度α（0°<α<90°）的沿第一方向延伸的第一标记线形成，第二区域包括由相对于划线方向具有第二角度β（-90°≤β<0°）的第二方向延伸的第二标记线形成的第二周期性结构。版权所有（C）2009，JPO＆INPIT

10. 发明专利

JP2009177159A Alignment system and alignment marks for use therewith 有权
标题翻译：对准系统及其对准标志
公开(公告)号：JP2009177159A
公开(公告)日：2009-08-06
申请号：JP2008326729
申请日：2008-12-24
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： HULSEBOS EDO MARIA , BIJNEN FRANCISCUS GODEFRIDUS C , WARNAAR PATRICK
IPC分类号： H01L21/027 , G01B11/00 , G03F9/00
CPC分类号： G03B27/42 , G03F9/7003 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To provide an alignment system employed in lithography equipment. SOLUTION: The lithographic equipment includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal. COPYRIGHT: (C)2009,JPO&INPIT

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