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    • 1. 发明授权
    • Surface flaw detection method
    • 表面探伤法
    • US4647196A
    • 1987-03-03
    • US695231
    • 1985-01-28
    • Asahiro KuniKazuo YamaguchiNobuyuki AkiyamaJuro Endo
    • Asahiro KuniKazuo YamaguchiNobuyuki AkiyamaJuro Endo
    • G01B9/02G01N21/88
    • G01N21/88G01B9/02021G01B9/02032
    • A flaw detection method for detecting flaw existing in the surface of a substantially plate-shaped examination object by making use of an interference of light. A coherent light is applied to the surface of the examination object and also to a reference mirror surface. The light reflected by the surface of the examination object and the light reflected by the reference mirror surface are made to interfere with each other to form an interference image from which the flaw is detected. The reference mirror surface is disposed at an optical inclination to the surface of the examination object. The reference mirror surface may be the reverse surface of the examination object while the obserse side of the same is being examined. Infrared coherent ray is preferably used as the coherent light.
    • 一种用于通过利用光的干涉来检测存在于基本上板状的检查对象的表面中的缺陷的探伤方法。 相干光被施加到检查对象的表面,并且也被施加到参考镜表面。 由检查对象的表面反射的光和由参考镜面反射的光被相互干涉,形成检测出缺陷的干涉图像。 参考镜面设置在与检查对象表面成光学倾斜度。 参考镜面可以是检查对象的反面,同时正在检查异物侧。 红外相干光线优选用作相干光。
    • 4. 发明授权
    • Substrate surface deflecting device
    • 基板表面偏转装置
    • US4788577A
    • 1988-11-29
    • US142698
    • 1988-01-11
    • Nobuyuki AkiyamaAsahiro KuniYukio KemboToshihiko Nakata
    • Nobuyuki AkiyamaAsahiro KuniYukio KemboToshihiko Nakata
    • G02F1/13G03B27/32G03F7/20H01L21/027H01L21/68H05K3/00G03B27/42
    • G03F7/70691
    • An exposure apparatus comprises a stage; a base plate provided on the stage; a flexible chuck plate which is capable of sucking under vacuum a substantially entire surface of a substrate to a surface thereof; a plurality of vertical displacement generating mechanism including a plurality of feedscrews provided at the base plate with predetermined intervals therebetween, a plurality of rotational actuators for rotatively driving each of the feedscrews, and a plurality of spring members interposed between the chuck plate and the base plate so as to allow a tip of each of the feedscrews to be engaged with a rear surface of the chuck plate; restricting mechanism for restricting the chuck plate in such a manner as not to be displaced horizontally relative to the base plate; a mask holder for holding a mask; a mechanism for measuring a level of the mask held by the mask holder; and a mechanism for measuring a level of the substrate sucked onto the chuck plate, whereby each of the rotational actuators of the vertical displacement generating mechanism is driven on the basis of gaps between the mask and the substrated measured by the mechanism for measuring the level of the mask and the mechanism for measuring the level of the substrate so as to subject the substrate to deflection via the flexible chuck plate, thereby producing a uniform gap between the mask and the substrate.
    • 曝光装置包括: 设置在舞台上的底板; 柔性卡盘板,其能够在真空下将基板的大致整个表面吸附到其表面; 多个垂直位移产生机构,包括设置在基板处的预定间隔的多个进给螺杆,用于旋转地驱动每个进给螺杆的多个旋转致动器,以及插入在卡盘板和基板之间的多个弹簧构件 以允许每个所述进给螺杆的末端与所述卡盘板的后表面接合; 限制机构,用于以不相对于基板水平位移的方式限制卡盘板; 用于保持面罩的面罩座; 用于测量由所述面罩支架保持的面罩的高度的机构; 以及用于测量吸附到卡盘板上的基板的高度的机构,由此垂直位移产生机构的旋转致动器中的每个旋转致动器基于掩模和由用于测量液面的机构测量的底板之间的间隙而被驱动 掩模和用于测量基板的水平的机构,以便使基板经由柔性卡盘板偏转,从而在掩模和基板之间产生均匀的间隙。
    • 6. 发明授权
    • Apparatus for automatically checking external appearance of object
    • 用于自动检查物体外观的装置
    • US4242702A
    • 1980-12-30
    • US856097
    • 1977-11-30
    • Asahiro KuniNobuyuki AkiyamaYoshimasa Oshima
    • Asahiro KuniNobuyuki AkiyamaYoshimasa Oshima
    • G01B11/02G01B11/24H04N7/18
    • G01B11/24G01B11/024
    • An apparatus for examining an object such as a contact welded on a leaf spring in respect of geometrical and qualitative factors comprises an image pick-up device such as TV camera for detecting an optical image of the contact and the leaf spring having a dark portion along the contour of the contact and converting the optical image into corresponding video signals which are then compared with a predetermined threshold level to be converted into a binary encoded signal having two logic levels corresponding, respectively, to bright and dark portions of the optical image. Frequency distributions of the binary signal representing the dark portion are determined along two orthogonal directions thereby to define a coordinate of a region in which the contact is located. A first checking device is provided to determine if the above coordinate is located in a preset allowable tolerance range. A second checking device is additionally provided which serves to define a frame of a size differed from that of the contact in dependence on the coordinate thereby dividing the area within the frame into a predetermined number of picture elements in a matrix array, whereby faults of the contact such as injury, welding dust or deformation are detected in dependence upon a predetermined combination of the picture element signals representing the dark portions of the optical image.
    • 用于检查诸如接触焊接在板簧上的物体的几何和定性因素的装置包括用于检测接触的光学图像的电视摄像机等图像拾取装置和具有暗部分的板簧 接触的轮廓并将光学图像转换成相应的视频信号,然后将其与预定的阈值电平进行比较,以转换成具有两个逻辑电平的二进制编码信号,该逻辑电平分别对应于光学图像的明暗部分。 根据两个正交方向确定表示暗部分的二进制信号的频率分布,从而定义接触位置的区域的坐标。 提供第一检查装置以确定上述坐标是否位于预设的允许公差范围内。 另外提供另外提供的第二检查装置,其用于根据坐标定义与触点的尺寸不同的尺寸的框架,从而将框架内的区域划分成矩阵阵列中的预定数量的图像元素,由此, 根据表示光学图像的暗部的像素信号的预定组合来检测诸如伤害,焊接灰尘或变形的接触。
    • 7. 发明授权
    • Method and apparatus for reduction-projection type mask alignment
    • 用于还原投影型掩模对准的方法和装置
    • US4153371A
    • 1979-05-08
    • US771201
    • 1977-02-23
    • Mituyoshi KoizumiNobuyuki AkiyamaAsahiro Kuni
    • Mituyoshi KoizumiNobuyuki AkiyamaAsahiro Kuni
    • H01L21/30G03F9/00H01L21/027G01B11/27H05K13/00
    • G03F9/70
    • A mask alignment method of the reduction-projection type comprising the steps of illuminating only regions of alignment patterns formed on a mask and a wafer, before a circuit pattern formed on the mask is projected onto the chips of the wafer through a reduction-projection lens, and aligning the mask and the wafer with each other by detecting the reflected images of both the alignment patterns. The alignment pattern region is illuminated by the light having the same wavelength as the exposure light. In addition, a mask alignment apparatus of the reduction-projection type comprising an illumination device for illuminating the mask. The mask is disposed at a distance from the wafer. The illumination light includes g-line or h-line or a combination of g-line and h-line. The projection lens is interposed between the mask and the wafer so that the circuit pattern formed on the mask is projected on the chips of the wafer on a reduced scale thereby to give the optical printing of the circuit pattern to the wafer. A field diaphragm device is disposed in the vicinity of the mask in order to prevent the exposure of the circuit pattern during the alignment operation. The field diaphragm device is provided with an opaque base plate of the size corresponding to the circuit pattern region and a transparent window of the size corresponding to the alignment pattern. The mirror or the semi-transparent mirror is disposed for reflecting optical images of the alignment patterns of the mask and the wafer in a direction toward a detecting system for displacement. The relative displacement between the mask and the wafer is detected by the detecting system thereby to align the mask and the wafer with each other by moving one of them.
    • 还原投影类型的掩模对准方法包括以下步骤:在形成在掩模上的电路图案之前只照射形成在掩模和晶片上的取向图案的区域通过还原投影透镜投影到晶片的芯片上 并且通过检测两个对准图案的反射图像将掩模和晶片彼此对准。 对准图案区域被与曝光光波长相同的光照射。 此外,还有投影型的掩模对准装置,其包括用于照亮掩模的照明装置。 掩模设置在离晶片一定距离处。 照明灯包括g线或h线或g线和h线的组合。 将投影透镜插入在掩模和晶片之间,使得形成在掩模上的电路图案以缩小的尺度投影在晶片的芯片上,从而将电路图案的光学打印提供给晶片。 为了防止在对准操作期间电路图案的曝光,场隔膜装置设置在掩模附近。 场隔膜装置设置有与电路图案区域对应的尺寸的不透明基板和与对准图案对应的尺寸的透明窗口。 反射镜或半透明反射镜被设置为反射掩模和晶片的对准图案的光学图像朝向用于位移的检测系统的方向。 通过检测系统检测掩模和晶片之间的相对位移,从而通过移动其中的一个来使掩模和晶片彼此对准。
    • 8. 发明授权
    • Surface-defect detecting device
    • 表面缺陷检测装置
    • US4095905A
    • 1978-06-20
    • US715218
    • 1976-08-17
    • Asahiro KuniNobuyuki Akiyama
    • Asahiro KuniNobuyuki Akiyama
    • G01B11/30G01N21/32
    • G01B11/303
    • A surface-defect detecting device including: illuminating means for illuminating a minute peripheral or annular zone on the surface of a material to be inspected, such as the circumferential surface of a cylindrical body; at least a pair of reflecting mirrors having ellipsoidal or spheroidal surfaces and first focal points positioned at the minute annular zone so as to focus the light reflecting from the aforesaid minute annular zone on the circumferential surface of the body; and photoelectric elements positioned at second the other focal points of the reflecting mirrors, respectively; whereby when a defect is not present in the minute annular zone on the circumferential surface of the body, the light is regularly reflected on the surface of the body to be inspected, so as not to be received by the photoelectric elements, and on the other hand, when a defect is present on the minute annular zone on the circumferential surface of the body, the light is irregularly reflected on the minute annular zone to be received by photoelectric elements, so that the body may be inspected for a defect on its surface according to signals obtained from the photoelectric elements, and the defect thus detected may be determined for its size.
    • 一种表面缺陷检测装置,包括:照明装置,用于照射待检查材料的表面上的微小周边或环形区域,例如圆柱体的圆周表面; 至少一对具有椭圆形或球形表面的反射镜和位于微小环形区域处的第一焦点,以将从上述微小环形区域反射的光聚焦在本体的圆周表面上; 光电元件分别位于反射镜的其他焦点的第二位置; 由此当身体的圆周表面上的微小环形区域中不存在缺陷时,光被规则地反射到待检查的身体的表面上,以便不被光电元件接收,并且在另一个 当身体圆周表面上的微小环形区域上存在缺陷时,光在微小环形区域上不规则地反射以被光电元件接收,从而可以检查身体在其表面上的缺陷 根据从光电元件获得的信号,并且可以根据其尺寸确定如此检测到的缺陷。
    • 10. 发明申请
    • Flame Detector
    • 火焰探测器
    • US20100073926A1
    • 2010-03-25
    • US12561185
    • 2009-09-16
    • Akihisa KudohKazuyoshi SakuraiHiroshi KanekoNobuyuki AkiyamaMasahiro Katagiri
    • Akihisa KudohKazuyoshi SakuraiHiroshi KanekoNobuyuki AkiyamaMasahiro Katagiri
    • F21V1/00G01J5/02
    • G08B17/12G08B29/08
    • A flame detector is provided. A circuit board is disposed in a housing. A first light source emits first light. A light guide member comprised of translucent material guides the first light from the first light source to a light emission portion of the light guide member. A first light receiving element detects second light having a predetermined wavelength unique to the flames. A second light source emits third light to a translucent cover which is disposed between an opening of the housing and the first light receiving element. A second light receiving element detects the third light passed through the translucent cover to test the translucency. The first light source, the second light source and the second light receiving element are mounted on the circuit board. The light emission portion is formed into a substantially annular shape which encloses the first light receiving element at a front side of the housing to limit a field of view of the first light receiving element to a predetermined range. And the light guide member has a light entrance portion and a light exit portion for the third light to form a light path from the second light source to the second light receiving element through the translucent cover and the light guide member.
    • 提供火焰探测器。 电路板设置在壳体中。 第一光源发射第一光。 由半透明材料构成的导光构件将来自第一光源的第一光引导到导光构件的发光部分。 第一光接收元件检测具有特定于火焰的预定波长的第二光。 第二光源将第三光发射到设置在壳体的开口和第一光接收元件之间的半透明盖。 第二光接收元件检测通过半透明盖的第三光以测试半透明度。 第一光源,第二光源和第二光接收元件安装在电路板上。 光发射部分形成为大致环形的形状,其将第一光接收元件封装在壳体的前侧,以将第一光接收元件的视野限制在预定范围内。 并且导光部件具有用于第三光的光入射部分和光出射部分,以通过半透明盖和导光部件形成从第二光源到第二光接收元件的光路。