专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20100231881A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100231881A1
公开(公告)日：2010-09-16
申请号：US12722902
申请日：2010-03-12
申请人： Arie Jeffrey DEN BOEF , Laurent Khuat Duy , Dimitra Sarri
发明人： Arie Jeffrey DEN BOEF , Laurent Khuat Duy , Dimitra Sarri
IPC分类号： G03B27/54 , G01B11/14 , G01B11/24
CPC分类号： G01B11/0608 , G03F9/7034
摘要： The invention provides a level sensor configured to measure a height level of a substrate comprising: a projection unit to project a measurement beam on the substrate, a detection unit to receive the measurement beam after reflection on the substrate, a processing unit to calculate a height level on the basis of the reflected measurement beam received by the detection unit, wherein the level sensor further comprises a tilt measuring device, wherein the tilt measuring device is arranged to receive at least partially the reflected measurement beam, and configured to provide a tilt signal representative for a tilt of the substrate with respect to a nominal plane.
摘要翻译：本发明提供一种水平传感器，其被配置为测量基板的高度水平，包括：投影单元，用于将测量光束投影在基板上;检测单元，用于在基板上反射之后接收测量光束;处理单元，用于计算高度基于由所述检测单元接收的所述反射的测量光束的水平面，其中所述液位传感器还包括倾斜测量装置，其中所述倾斜测量装置被布置成至少部分地接收所述反射的测量光束，并且被配置为提供倾斜信号代表衬底相对于标称平面的倾斜。

2. 发明申请

US20130077079A1 LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD 有权
标题翻译：水平传感器，光刻设备和基板表面定位方法
公开(公告)号：US20130077079A1
公开(公告)日：2013-03-28
申请号：US13603168
申请日：2012-09-04
申请人： Arie Jeffrey DEN BOEF , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Willem Jurrianus Venema , Lukasz Jerzy Macht , Laurent Khuat Duy , Dimitra Sarri
发明人： Arie Jeffrey DEN BOEF , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Willem Jurrianus Venema , Lukasz Jerzy Macht , Laurent Khuat Duy , Dimitra Sarri
IPC分类号： G03F9/00 , G01B11/06
CPC分类号： G03F9/7034 , G01B11/0625 , G03F9/7088
摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.
摘要翻译：用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束被分为测量辐射束和捕获辐射束。液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

3. 发明申请

US20120075601A1 Inspection Apparatus and Method, Lithographic Apparatus and Lithographic Processing Cell 有权
标题翻译：检验设备和方法，平版印刷设备和平版印刷加工单元
公开(公告)号：US20120075601A1
公开(公告)日：2012-03-29
申请号：US13228810
申请日：2011-09-09
申请人： Arie Jeffrey DEN BOEF , Laurent Khuat Duy
发明人： Arie Jeffrey DEN BOEF , Laurent Khuat Duy
IPC分类号： G03B27/54 , G01J3/28
CPC分类号： G03F7/70616 , G01N21/47 , G01N21/55
摘要： An “angle-resolved” version of FD-OCT is used to measure reflectance properties. An inspection apparatus comprises an illumination source configured to provide an illumination beam, an interferometer configured to use the illumination beam to illuminate a target on a substrate at an incidence angle and to use radiation reflected from the substrate with a reference beam derived from the illumination beam to produce an output beam, a sampling device arranged to select a portion of the output beam, a spectrometer configured to receive the selected portion of the output beam and to measure a spectrum of the received selected portion of the output beam, and a processor configured to determine from the measured spectrum reflectance properties of the target such as raw spectrometer spectral data, the Fourier transformed data, the extracted intensity components or carrier phase or the calculated complex reflectance.
摘要翻译： FD-OCT的“角度分辨”版本用于测量反射特性。检查装置包括被配置为提供照明光束的照明源，配置成使用照明光束以入射角照射基板上的目标的干涉仪，并且使用从照明光束导出的参考光束来使用从基板反射的辐射以产生输出光束，被配置为选择所述输出光束的一部分的采样装置，被配置为接收所述输出光束的选定部分并且测量所述接收的所述输出光束的所选部分的光谱的光谱仪，以及配置根据原始光谱仪光谱数据，傅立叶变换数据，提取的强度分量或载波相位或计算的复反射率，测量目标的光谱反射率特性。

4. 发明申请

US20120212749A1 Measuring Method, Measuring Apparatus, Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：测量方法，测量仪器，平版印刷设备和器件制造方法
公开(公告)号：US20120212749A1
公开(公告)日：2012-08-23
申请号：US13369614
申请日：2012-02-09
申请人： Arie Jeffrey DEN BOEF , Marcel Hendrikus Maria Beems , Theodorus Petrus Maria , Rymond Wilhelmus Louis Lafarre
发明人： Arie Jeffrey DEN BOEF , Marcel Hendrikus Maria Beems , Theodorus Petrus Maria , Rymond Wilhelmus Louis Lafarre
IPC分类号： G01B11/14
CPC分类号： G01B11/14 , G01B11/00 , G02B21/0048 , G02B26/105 , G03F7/70625 , G03F9/7088
摘要： An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). A measurement optical system comprises illumination subsystem (504) for illuminating the mark with a spot of radiation (206) and as detecting subsystem (580) for detecting radiation diffracted by the mark. The substrate and measurement optical system move relative to one another at a first velocity (vW) so as to scan the mark while synchronously moving the spot of radiation relative to the reference frame (RF) of the measurement optical system at a second velocity (vSPOT). The spot scans the mark at a third velocity (vEFF) which is lower than the first velocity to allow more time for accurate position measurements to be acquired. In one embodiment, an objective lens (524) remains fixed in relation to the reference frame while a moving optical element (562) imparts the movement of the radiation spot relative to the reference frame.
摘要翻译：装置（AS）测量光刻基板（W）上的标记（202）的位置。测量光学系统包括用于利用辐射点（206）照亮标记的照明子系统（504）和用于检测由标记衍射的辐射的检测子系统（580）。基板和测量光学系统以第一速度（vW）相对于彼此移动，以便以第二速度（vSPOT）同步地相对于测量光学系统的参考系（RF）移动辐射点来扫描标记）。该点以低于第一速度的第三速度（vEFF）扫描标记，以允许更多时间获取准确的位置测量。在一个实施例中，物镜（524）相对于参考框架保持固定，而移动光学元件（562）相对于参考框架赋予辐射点的移动。

5. 发明申请

US20090294635A1 Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method 有权
标题翻译：检验方法和装置，平版印刷设备，平版印刷加工单元和器件制造方法
公开(公告)号：US20090294635A1
公开(公告)日：2009-12-03
申请号：US12536580
申请日：2009-08-06
申请人： Arie Jeffrey DEN BOEF , Yevgeniy Konstantinovich Shmarev
发明人： Arie Jeffrey DEN BOEF , Yevgeniy Konstantinovich Shmarev
IPC分类号： H01L27/00 , G03B27/42
CPC分类号： G02B27/58 , G01N21/4788 , G03F7/70633
摘要： In a scatterometry apparatus having an illumination aperture stop, a field stop is provided at an intermediate image to control a spot size on a substrate. The field stop may be apodized, e.g., having a transmissivity in the form of a trapezium or a Gaussian shape.
摘要翻译：在具有照明孔径光阑的散射测量装置中，在中间图像处设置场停止件，以控制衬底上的斑点尺寸。场挡板可以被变迹，例如具有呈梯形或高斯形状的透射率。

6. 发明申请

US20090273783A1 Angularly Resolved Scatterometer and Inspection Method 有权
标题翻译：角度分辨率和检测方法
公开(公告)号：US20090273783A1
公开(公告)日：2009-11-05
申请号：US12504855
申请日：2009-07-17
申请人： Arie Jeffrey DEN BOEF
发明人： Arie Jeffrey DEN BOEF
IPC分类号： G01J3/28 , G01J3/44
CPC分类号： G01N21/47 , G01N21/956 , G01N2021/95615
摘要： An inspection method is provided to determine a value related to a parameter of a target pattern printed on a substrate by a lithographic process used to manufacture a device layer on a substrate. The inspection method can include using an optical system with a high-NA objective lens, where the high-NA objective lens includes an object plane and a pupil plane. The inspection method can also include providing an aperture member to define at least one obscuration, determining a radial distance between a radially innermost point of each dark area and a nominal center of an image in a pupil plane, and determining an axial distance between the target and an object plane from the determined radial distance.
摘要翻译：提供了一种检查方法，用于通过用于制造衬底上的器件层的光刻工艺来确定与印刷在衬底上的目标图案的参数相关的值。检查方法可以包括使用具有高NA物镜的光学系统，其中高NA物镜包括物平面和瞳面。检查方法还可以包括提供孔径构件以限定至少一个遮蔽，确定每个暗区域的径向最内点与瞳孔平面中的图像的标称中心之间的径向距离，以及确定目标之间的轴向距离和从所确定的径向距离的物平面。

7. 发明申请

US20120206703A1 Inspection Apparatus and Method, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method 有权
标题翻译：检验仪器和方法，平版印刷设备，平版印刷加工单元和器件制造方法
公开(公告)号：US20120206703A1
公开(公告)日：2012-08-16
申请号：US13361349
申请日：2012-01-30
申请人： Kaustuve BHATTACHARYYA , Arie Jeffrey DEN BOEF , Stefan Carolus Jacobus Antonius KEIJ , Peter Clement Paul VANOPPEN
发明人： Kaustuve BHATTACHARYYA , Arie Jeffrey DEN BOEF , Stefan Carolus Jacobus Antonius KEIJ , Peter Clement Paul VANOPPEN
IPC分类号： G01B11/24 , G03B27/32 , G03B27/54
CPC分类号： G03F7/70625 , G01B2210/56 , G01N21/956 , G03F7/705 , G03F7/70633
摘要： Asymmetry properties of a periodic target on a substrate, such as a grating on a wafer, are determined. An inspection apparatus has a broadband illumination source with illumination beams point mirrored in the pupil plane of a high numerical aperture objective lens. The substrate and target are illuminated via the objective lens from a first direction and a second direction mirror reflected with respect to the plane of the substrate. A quad wedge optical device separately redirects diffraction orders of radiation scattered from the substrate and separates diffraction orders from illumination along each of the first and second directions. For example the zeroth and first orders are separated for each incident direction. After capture in multimode fibers, spectrometers are used to measure the intensity of the separately redirected diffraction orders as a function of wavelength.
摘要翻译：确定基板（例如晶片上的光栅）上的周期性靶的不对称性质。检查装置具有宽带照明源，其具有在高数值孔径物镜的光瞳平面中镜像的照明光束点。从第一方向通过物镜照射衬底和靶，并且相对于衬底的平面反射的第二方向镜。四楔形光学器件分别重新引导从衬底散射的辐射的衍射级，并沿着第一和第二方向沿着照射分离衍射级。例如，为每个事件方向分离第零个和第一个命令。在多模光纤捕获之后，使用光谱仪测量单独重定向的衍射级的强度作为波长的函数。

8. 发明申请

US20110076352A1 IMPRINT LITHOGRAPHY 有权
公开(公告)号：US20110076352A1
公开(公告)日：2011-03-31
申请号：US12891422
申请日：2010-09-27
申请人： Arie Jeffrey DEN BOEF , Vadim Yevgenyevich BANINE , Andre Bernardus JEUNINK , Sander Frederik WUISTER , Yvonne Wendela KRUIJT-STEGEMAN
发明人： Arie Jeffrey DEN BOEF , Vadim Yevgenyevich BANINE , Andre Bernardus JEUNINK , Sander Frederik WUISTER , Yvonne Wendela KRUIJT-STEGEMAN
IPC分类号： B29C59/02 , G01B11/14
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7049 , G03F9/7076
摘要： A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.
摘要翻译：公开了一种使用压印模板上的对准光栅和衬底上的对准光栅来确定压印模板和衬底之间的偏移的方法。该方法包括使压印模板对准光栅和衬底对准光栅足够靠近在一起，使得它们形成复合光栅，在调制压印模板和衬底的相对位置的同时调整复合光栅处的对准辐射束，检测强度从复合光栅反射的对准辐射，并通过分析检测强度的调制来确定偏移。

9. 发明申请

US20100265506A1 Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method 有权
标题翻译：检验方法和装置，平版印刷设备，平版印刷加工单元和器件制造方法
公开(公告)号：US20100265506A1
公开(公告)日：2010-10-21
申请号：US12727389
申请日：2010-03-19
申请人： Arie Jeffrey DEN BOEF
发明人： Arie Jeffrey DEN BOEF
IPC分类号： G01B11/14
CPC分类号： G03F7/70633
摘要： An overlay error between two successive layers produced by a lithographic process on a substrate is determined by using the lithographic process to form at least one periodic structure of a same pitch on each of the layers. One or more overlaid pairs of the periodic structures are formed in parallel, but offset relative to each other. A spectrum, produced by directing a beam of radiation onto the one or more pairs of periodic structures is measured. One or more portions of the spectrum are determined in which the relationship between the offset between the one or more pairs of periodic structures and the resultant variation in measured intensity of the spectrum at the one or more portions is more linear than the relationship outside the one or more portions. The offset between the one or more pairs of periodic structures on the basis of intensity measurements of the spectrum in the one or more portions of the spectrum is determined and used to determine the overlay error.
摘要翻译：通过使用光刻工艺在每个层上形成相同间距的至少一个周期性结构来确定由基板上的光刻工艺产生的两个连续层之间的重叠误差。一个或多个重叠的周期结构对平行地形成，但是相对于彼此偏移。测量通过将辐射束引导到一对或多对周期性结构上而产生的光谱。确定光谱的一个或多个部分，其中在一个或多个部分之间的一个或多个周期性结构对之间的偏移与所测量的光谱强度的变化之间的关系比一个或多个部分之外的关系更线性或更多部分。基于频谱的一个或多个部分中的频谱的强度测量，确定一对或多对周期性结构之间的偏移，并用于确定覆盖误差。

10. 发明申请

US20090262366A1 Angularly Resolved Scatterometer 有权
标题翻译：角度分辨散射计
公开(公告)号：US20090262366A1
公开(公告)日：2009-10-22
申请号：US12493606
申请日：2009-06-29
申请人： Arie Jeffrey DEN BOEF
发明人： Arie Jeffrey DEN BOEF
IPC分类号： G01B11/24
CPC分类号： G01N21/956 , G01N21/47 , G03F7/70625 , G03F7/70633 , G03F9/7065
摘要： An angularly resolved scatterometer uses a broadband radiation source and an acousto-optical tunable filter to select one or more narrowband components from the broadband beam emitted by the source for use in measurements. A feedback loop can be used to control the intensity of the selected narrowband components to reduce noise.
摘要翻译：角度分辨的散射仪使用宽带辐射源和声光可调谐滤波器从源发射的宽带光束中选择一个或多个窄带分量用于测量。可以使用反馈回路来控制所选窄带分量的强度以降低噪声。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式