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1. 发明授权

US07177059B2 Device and method for manipulation and routing of a metrology beam 有权
标题翻译：测量光束的操作和布线的装置和方法
公开(公告)号：US07177059B2
公开(公告)日：2007-02-13
申请号：US10793420
申请日：2004-03-05
申请人： Engelbertus Antonius Fransiscus Van Der Pasch , Marcel Hendrikus Maria Beems , Emiel Jozef Melanie Eussen , Engelbertus Johannes Jeroen Klijntunte
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Marcel Hendrikus Maria Beems , Emiel Jozef Melanie Eussen , Engelbertus Johannes Jeroen Klijntunte
IPC分类号： G02B26/08
CPC分类号： G03F7/70775
摘要： A lithographic projection apparatus is equipped with a device for manipulation and routing of at least one portion of a metrology beam of radiation. The device includes a first and a second optical wedge, wherein the second optical wedge and the first optical wedge having a relative position with respect to each other. The at least one portion of the metrology beam enters the device along an incoming optical axis at a first major surface of the first optical wedge, passes through the first and second optical wedges, and exits at a second major surface of the second optical wedge. The first and second optical wedges are arranged to at least one of rotate and translate the at least one portion of the metrology beam relative to the incoming optical axis by changing the relative position of the first and the second optical wedges.
摘要翻译：光刻投影装置配备有用于操纵和布置计量辐射束的至少一部分的装置。该装置包括第一和第二光楔，其中第二光楔和第一光楔相对于彼此具有相对位置。计量光束的至少一部分沿第一光楔的第一主表面处的入射光轴进入器件，穿过第一和第二光楔，并在第二光楔的第二主表面处离开。第一和第二光楔布置成通过改变第一和第二光楔的相对位置而相对于入射光轴旋转和平移测量光束的至少一部分中的至少一个。

2. 发明授权

US06853440B1 Position correction in Y of mask object shift due to Z offset and non-perpendicular illumination 有权
标题翻译：由于Z偏移和非垂直照明，屏幕对象偏移的Y位置校正
公开(公告)号：US06853440B1
公开(公告)日：2005-02-08
申请号：US10406602
申请日：2003-04-04
申请人： Engelbertus Antonius Fransiscus Van De Pasch , Marcel Hendrikus Maria Beems , Hendricus J. M. Meijer , Daniel Galburt , Erik Roelof Loopstra
发明人： Engelbertus Antonius Fransiscus Van De Pasch , Marcel Hendrikus Maria Beems , Hendricus J. M. Meijer , Daniel Galburt , Erik Roelof Loopstra
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42 , G03B27/58 , G03B27/62 , G03B27/68
CPC分类号： G03F7/70775 , G03F7/70233 , G03F7/70283 , G03F7/70725 , G03F9/7003 , G03F9/7034
摘要： In a reflective lithographic projection apparatus, shifts in the image of a pattern of a mask in the scanning direction caused by variations in the position of the pattern surface of the mask along the optical axis are corrected by shifting of the relative position of the mask and/or the substrate in the scanning direction. Correction of the image rotation error may also be accomplished by rotation of the relative positions of the mask and/or the substrate about the optical axis. Variations in the position of the pattern surface of the mask along the optical axis may be determined by interferometers upon installation of the mask to the lithographic projection apparatus. The variations may be mapped and stored to provide control of the lithographic projection apparatus.
摘要翻译：在反射式平版印刷投影装置中，通过掩模的相对位置的移动来校正沿着光轴沿掩模的图案表面的位置变化引起的扫描方向上的掩模图案的偏移， /或基板在扫描方向上。图像旋转误差的校正也可以通过围绕光轴旋转掩模和/或基底的相对位置来实现。沿着光轴的掩模的图案表面的位置的变化可以在将掩模安装到光刻投影设备时由干涉仪确定。可以映射和存储变化以提供光刻投影设备的控制。

3. 发明申请

US20080297744A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20080297744A1
公开(公告)日：2008-12-04
申请号：US11806662
申请日：2007-06-01
申请人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
发明人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
摘要翻译：浸没式光刻设备被描述为具有排出构造以从衬底的边缘和其上支撑衬底的衬底台之间的间隙去除液体的漏液。排水管设置有向衬底提供液体的装置，而与衬底台的位置无关，和/或在排水管内使气体饱和的装置。这些措施减少了由于排水管中的液体蒸发导致的热负荷变化。

4. 发明授权

US07443511B2 Integrated plane mirror and differential plane mirror interferometer system 有权
标题翻译：集成平面镜和差分平面镜干涉仪系统
公开(公告)号：US07443511B2
公开(公告)日：2008-10-28
申请号：US10720752
申请日：2003-11-25
申请人： Emiel Jozef Melanie Eussen , Marcel Hendrikus Maria Beems , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Emiel Jozef Melanie Eussen , Marcel Hendrikus Maria Beems , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G01B11/02
CPC分类号： G03F7/70775 , G01B9/02018 , G01B9/02019 , G01B9/02021 , G01B9/02027 , G01B2290/70
摘要： A lithographic interferometer system includes a beam generating mechanism, mirrors which reflect those beams, and detection devices configured to detect an interference pattern of overlapping reflected beams. The beam generating mechanism includes a beam-splitter, which splits the beams into reference beams and measuring beams, a reference mirror that provides a plane mirror interferometer, and a reflective surface that emits at least one reference beam used in a differential plane mirror interferometer.
摘要翻译：光刻干涉仪系统包括光束产生机构，反射这些光束的反射镜和被配置为检测重叠的反射光束的干涉图案的检测装置。光束产生机构包括分束器，其将光束分成参考光束和测量光束，提供平面镜干涉仪的参考镜，以及发射在差分平面镜干涉仪中使用的至少一个参考光束的反射表面。

5. 发明授权

US07405811B2 Lithographic apparatus and positioning apparatus 失效
标题翻译：平版印刷设备和定位设备
公开(公告)号：US07405811B2
公开(公告)日：2008-07-29
申请号：US11135637
申请日：2005-05-24
申请人： Marcel Hendrikus Maria Beems , Joe Sakai
发明人： Marcel Hendrikus Maria Beems , Joe Sakai
IPC分类号： G03B27/62 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70775
摘要： A lithographic apparatus comprises a substrate table to hold a substrate, a reference structure and a measurement system to measure a position of the substrate table with respect to the reference structure. The measurement system comprises a first measurement system to measure a position of the substrate table with respect to an intermediate structure and a second measurement system to measure a position of the intermediate structure with respect to the reference structure. The intermediate structure may be connected or connectable to a drive mechanism to drive the substrate table. A distance between the substrate table and the intermediate structure, and a distance between the intermediate structure and the reference structure may be small which results in a highly accurate position measurement.
摘要翻译：光刻设备包括用于保持衬底的衬底台，参考结构和测量系统，以测量衬底台相对于参考结构的位置。测量系统包括测量衬底台相对于中间结构的位置的第一测量系统和用于测量中间结构相对于参考结构的位置的第二测量系统。中间结构可以连接或连接到驱动机构以驱动衬底台。衬底台和中间结构之间的距离以及中间结构与参考结构之间的距离可能较小，这导致高度准确的位置测量。

6. 发明授权

US08593646B2 Measuring method, measuring apparatus, lithographic apparatus and device manufacturing method 有权
标题翻译：测量方法，测量仪器，光刻设备和器件制造方法
公开(公告)号：US08593646B2
公开(公告)日：2013-11-26
申请号：US13369614
申请日：2012-02-09
申请人： Arie Jeffrey Den Boef , Marcel Hendrikus Maria Beems , Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
发明人： Arie Jeffrey Den Boef , Marcel Hendrikus Maria Beems , Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
IPC分类号： G01B11/14 , G01B11/00
CPC分类号： G01B11/14 , G01B11/00 , G02B21/0048 , G02B26/105 , G03F7/70625 , G03F9/7088
摘要： An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). A measurement optical system comprises illumination subsystem (504) for illuminating the mark with a spot of radiation (206) and as detecting subsystem (580) for detecting radiation diffracted by the mark. The substrate and measurement optical system move relative to one another at a first velocity (vW) so as to scan the mark while synchronously moving the spot of radiation relative to the reference frame (RF) of the measurement optical system at a second velocity (vSPOT). The spot scans the mark at a third velocity (vEFF) which is lower than the first velocity to allow more time for accurate position measurements to be acquired. In one embodiment, an objective lens (524) remains fixed in relation to the reference frame while a moving optical element (562) imparts the movement of the radiation spot relative to the reference frame.
摘要翻译：设备（AS）测量光刻基板（W）上的标记（202）的位置。测量光学系统包括用于利用辐射点（206）照亮标记的照明子系统（504）和用于检测由标记衍射的辐射的检测子系统（580）。基板和测量光学系统以第一速度（vW）相对于彼此移动，以便以第二速度（vSPOT）同步地相对于测量光学系统的参考系（RF）移动辐射点来扫描标记）。该点以低于第一速度的第三速度（vEFF）扫描标记，以允许更多时间获取准确的位置测量。在一个实施例中，物镜（524）相对于参考框架保持固定，而移动的光学元件（562）相对于参考框架赋予辐射点的移动。

7. 发明授权

US07349072B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07349072B2
公开(公告)日：2008-03-25
申请号：US10960788
申请日：2004-10-08
申请人： Marcel Hendrikus Maria Beems , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Marcel Hendrikus Maria Beems , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G03B27/54 , G03B27/42 , G01B11/02
CPC分类号： G03F7/70941 , G03F7/70775
摘要： Embodiments of the invention include an interferometer measurement system in which at least one reflective surface is arranged such that, in use, the beam path of interferometer radiation of the interferometer measurement system incident on the at least one reflective surface has an offset angle in the range of from 0.1 to 10 milliradians with respect to the normal to the at least one reflective surface. In that way, the effect of spurious radiation on the interferometer measurement system produced within the interferometer measurement system may be suppressed. In another embodiment, a parallel-sided plate is used in an interferometer measurement system to obtain a signal dependent on the angle of a beam of radiation reflected from a mirror. In that way, the flatness of the mirror can be mapped. One surface of the plate is a beam-splitter and the opposite surface of the plate is a reflector.
摘要翻译：本发明的实施例包括干涉仪测量系统，其中布置至少一个反射表面，使得在使用中，入射在至少一个反射表面上的干涉仪测量系统的干涉仪辐射的光束路径具有在该范围内的偏移角相对于至少一个反射表面的法线为0.1至10毫弧度。以这种方式，可以抑制杂散辐射对干涉仪测量系统内产生的干涉仪测量系统的影响。在另一个实施例中，在干涉仪测量系统中使用平行侧板以获得取决于从反射镜反射的辐射束的角度的信号。以这种方式，可以映射镜的平面度。板的一个表面是分束器，并且板的相对表面是反射器。

8. 发明授权

US07349069B2 Lithographic apparatus and positioning apparatus 失效
标题翻译：平版印刷设备和定位设备
公开(公告)号：US07349069B2
公开(公告)日：2008-03-25
申请号：US11109860
申请日：2005-04-20
申请人： Marcel Hendrikus Maria Beems , Joe Sakai
发明人： Marcel Hendrikus Maria Beems , Joe Sakai
IPC分类号： G03B27/42 , G03B27/62
CPC分类号： G03F7/70775
摘要： A lithographic apparatus comprises a substrate table to hold a substrate, a reference structure and a measurement system to measure a position of the substrate table with respect to the reference structure. The measurement system comprises a first measurement system to measure a position of the substrate table with respect to an intermediate structure and a second measurement system to measure a position of the intermediate structure with respect to the reference structure. The intermediate structure may be connected or connectable to a drive mechanism to drive the substrate table. A distance between the substrate table and the intermediate structure, resp. a distance between the intermediate structure and the reference structure may be small which results in a highly accurate position measurement.
摘要翻译：光刻设备包括用于保持衬底的衬底台，参考结构和测量系统，以测量衬底台相对于参考结构的位置。测量系统包括测量衬底台相对于中间结构的位置的第一测量系统和用于测量中间结构相对于参考结构的位置的第二测量系统。中间结构可以连接或连接到驱动机构以驱动衬底台。衬底台与中间结构之间的距离，中间结构和参考结构之间的距离可能较小，这导致高度精确的位置测量。

9. 发明授权

US07474409B2 Lithographic interferometer system with an absolute measurement subsystem and differential measurement subsystem and method thereof 有权
标题翻译：具有绝对测量子系统和差分测量子系统的平版干涉仪系统及其方法
公开(公告)号：US07474409B2
公开(公告)日：2009-01-06
申请号：US10995545
申请日：2004-11-24
申请人： Emiel Jozef Melanie Eussen , Marcel Hendrikus Maria Beems , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Emiel Jozef Melanie Eussen , Marcel Hendrikus Maria Beems , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G01B11/02
CPC分类号： G03F7/70775 , G01B9/02018 , G01B9/02019 , G01B9/02021 , G01B9/02027 , G01B2290/70
摘要： An improved lithographic interferometer system, is presented herein. The lithographic interferometer system comprises a beam generating mechanism, mirrors which reflect those beams, and detection devices for detecting an interference pattern of overlapping reflected beams. The beam generating mechanism comprises a beam-splitter, which splits the beams into reference beams and measuring beams, a reference mirror that provides a plane mirror interferometer, and a reflective surface that emits at least one reference beam used in a differential plane mirror interferometer.
摘要翻译：本文提出了一种改进的光刻干涉仪系统。光刻干涉仪系统包括光束产生机构，反射这些光束的反射镜和用于检测重叠反射光束的干涉图案的检测装置。光束产生机构包括分束器，其将光束分成参考光束和测量光束，提供平面镜干涉仪的参考镜和发射在差分平面镜干涉仪中使用的至少一个参考光束的反射表面。

10. 发明授权

US07265366B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07265366B2
公开(公告)日：2007-09-04
申请号：US10813682
申请日：2004-03-31
申请人： Engelbertus Antonius Fransiscus Van Der Pasch , Marcel Hendrikus Maria Beems , Martinus Hendrikus Antonius Leenders
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Marcel Hendrikus Maria Beems , Martinus Hendrikus Antonius Leenders
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： G03F7/70575 , G03F7/7005
摘要： A lithographic apparatus includes a radiation source configured to provide radiation to an illumination system, the radiation source configured to provide radiation in a first wavelength range and in a second wavelength range, the second wavelength range being different from the first wavelength range. A support is configured to support a patterning device, the patterning device is configured to impart the radiation with a pattern in its cross-section. A substrate table is configured to hold a substrate, and a projection system is configured to project the patterned radiation onto a target portion of a substrate. The first wavelength range is the primary wavelength of the lithographic apparatus. The second wavelength range is used for setup of the lithographic apparatus, the setup including one or more of calibration, qualification, performance test, and alignment. The second wavelength range may also be used for exposure of a further substrate.
摘要翻译：光刻设备包括被配置为向照明系统提供辐射的辐射源，所述辐射源被配置为提供在第一波长范围内且在第二波长范围内的第二波长范围与第一波长范围不同的辐射。支撑件被构造成支撑图案形成装置，图案形成装置被配置成在其横截面中赋予辐射图案。衬底台被配置为保持衬底，并且投影系统被配置为将图案化的辐射投影到衬底的目标部分上。第一波长范围是光刻设备的主要波长。第二波长范围用于设置光刻设备，该设置包括校准，鉴定，性能测试和对准中的一个或多个。第二波长范围也可以用于另外的基底的曝光。

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