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1. 发明授权

US08675210B2 Level sensor, lithographic apparatus, and substrate surface positioning method 有权
标题翻译：液位传感器，光刻设备和基板表面定位方法
公开(公告)号：US08675210B2
公开(公告)日：2014-03-18
申请号：US13603168
申请日：2012-09-04
申请人： Arie Jeffrey Den Boef , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Willem Jurrianus Venema , Lukasz Jerzy Macht , Laurent Khuat Duy , Dimitra Sarri
发明人： Arie Jeffrey Den Boef , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Willem Jurrianus Venema , Lukasz Jerzy Macht , Laurent Khuat Duy , Dimitra Sarri
IPC分类号： G01B11/14
CPC分类号： G03F9/7034 , G01B11/0625 , G03F9/7088
摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.
摘要翻译：用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束被分为测量辐射束和捕获辐射束。液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

2. 发明申请

US20130077079A1 LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD 有权
标题翻译：水平传感器，光刻设备和基板表面定位方法
公开(公告)号：US20130077079A1
公开(公告)日：2013-03-28
申请号：US13603168
申请日：2012-09-04
申请人： Arie Jeffrey DEN BOEF , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Willem Jurrianus Venema , Lukasz Jerzy Macht , Laurent Khuat Duy , Dimitra Sarri
发明人： Arie Jeffrey DEN BOEF , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Willem Jurrianus Venema , Lukasz Jerzy Macht , Laurent Khuat Duy , Dimitra Sarri
IPC分类号： G03F9/00 , G01B11/06
CPC分类号： G03F9/7034 , G01B11/0625 , G03F9/7088
摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.
摘要翻译：用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束被分为测量辐射束和捕获辐射束。液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

3. 发明申请

US20100233600A1 LEVEL SENSOR ARRANGEMENT FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：液晶显示装置的水平传感器装置和装置的制造方法
公开(公告)号：US20100233600A1
公开(公告)日：2010-09-16
申请号：US12722955
申请日：2010-03-12
申请人： Arie Jeffrey DEN BOEF , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Lukasz Jerzy Macht
发明人： Arie Jeffrey DEN BOEF , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Lukasz Jerzy Macht
IPC分类号： G03F7/20 , G01B11/14 , G03B27/54
CPC分类号： G03F9/7034 , G03F9/7065 , G03F9/7088
摘要： A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive.
摘要翻译：液位传感器装置可用于测量光刻设备中的基板表面的高度。液位传感器装置设置有朝向基板发射检测辐射的光源，以及用于在操作中测量从基板反射的辐射的检测器单元。光源布置成在光刻设备中用于处理基板的抗蚀剂敏感的波长范围内发射检测辐射。

4. 发明授权

US08842293B2 Level sensor arrangement for lithographic apparatus and device manufacturing method 有权
标题翻译：用于光刻设备和装置制造方法的液位传感器装置
公开(公告)号：US08842293B2
公开(公告)日：2014-09-23
申请号：US12722955
申请日：2010-03-12
申请人： Arie Jeffrey Den Boef , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Lukasz Jerzy Macht
发明人： Arie Jeffrey Den Boef , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Lukasz Jerzy Macht
IPC分类号： G01B11/14 , G03F9/00
CPC分类号： G03F9/7034 , G03F9/7065 , G03F9/7088
摘要： A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive.
摘要翻译：液位传感器装置可用于测量光刻设备中的基板表面的高度。液位传感器装置设置有朝向基板发射检测辐射的光源，以及用于在操作中测量从基板反射的辐射的检测器单元。光源布置成在光刻设备中用于处理基板的抗蚀剂敏感的波长范围内发射检测辐射。

5. 发明授权

US08654311B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08654311B2
公开(公告)日：2014-02-18
申请号：US12419819
申请日：2009-04-07
申请人： Harry Sewell , Jozef Petrus Henricus Benschop
发明人： Harry Sewell , Jozef Petrus Henricus Benschop
IPC分类号： G03B27/54
CPC分类号： G03F7/70283 , G03F7/70208
摘要： A lithographic apparatus and method for simultaneously exposing two patterning devices onto a substrate is disclosed. In an embodiment, a lithographic apparatus includes a plurality of illumination systems for receiving and conditioning a pulsed radiation beam, a beam director arranged between a source of the pulsed radiation and the illumination systems for alternately directing pulses of the radiation beam to the respective illumination systems, a support table for holding a plurality of patterning devices, each of the patterning devices being capable of imparting a respective conditioned radiation beam with a pattern in its cross-section to form a plurality of patterned radiation beams, and a projection system configured to project each of the plurality of patterned radiation beams coincidentally onto a target portion of a substrate. In an embodiment, the substrate is covered with a phase change material.
摘要翻译：公开了一种用于将两个图案形成装置同时曝光到基板上的光刻设备和方法。在一个实施例中，光刻设备包括用于接收和调理脉冲辐射束的多个照明系统，布置在脉冲辐射源和用于将辐射束的脉冲交替地指向各个照明系统的照明系统之间的光束导向器，用于保持多个图案形成装置的支撑台，每个图案形成装置能够在其横截面中赋予具有图案的各个经调节的辐射束以形成多个图案化的辐射束，以及投影系统，其被配置为投影多个图案化的辐射束中的每一个巧合地放置在基板的目标部分上。在一个实施例中，衬底被相变材料覆盖。

6. 再颁专利

USRE43576E1 Dual stage lithographic apparatus and device manufacturing method 有权
标题翻译：双级光刻设备和器件制造方法
公开(公告)号：USRE43576E1
公开(公告)日：2012-08-14
申请号：US12318821
申请日：2009-01-08
申请人： Marinus Aart Van Den Brink , Jozef Petrus Henricus Benschop , Erik Roelof Loopstra
发明人： Marinus Aart Van Den Brink , Jozef Petrus Henricus Benschop , Erik Roelof Loopstra
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/70733 , G03F7/70341
摘要： The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.
摘要翻译：本发明涉及一种双级光刻设备，其中构造和布置两个基板台以进行相互配合以进行联合扫描运动。联合扫描运动使平版印刷设备从第一配置中获得，其中将浸没液体限制在由第一级保持的第一基板和设备的投影系统之间，其中浸没液体被限制在第二配置之间由两级的第二级保持的第二衬底和投影系统，使得在联合扫描运动期间，液体基本上被限制在相对于投影系统的空间内。

7. 发明授权

US07161659B2 Dual stage lithographic apparatus and device manufacturing method 有权
标题翻译：双级光刻设备和器件制造方法
公开(公告)号：US07161659B2
公开(公告)日：2007-01-09
申请号：US11135655
申请日：2005-05-24
申请人： Marinus Aart Van Den Brink , Jozef Petrus Henricus Benschop , Erik Roelof Loopstra
发明人： Marinus Aart Van Den Brink , Jozef Petrus Henricus Benschop , Erik Roelof Loopstra
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/70725
摘要： The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.
摘要翻译：本发明涉及一种双级光刻设备，其中构造和布置两个基板台以进行相互配合以进行联合扫描运动。联合扫描运动使平版印刷设备从第一配置中获得，其中将浸没液体限制在由第一级保持的第一基板和设备的投影系统之间，其中浸没液体被限制在第二配置之间由两级的第二级保持的第二衬底和投影系统，使得在联合扫描运动期间，液体基本上被限制在相对于投影系统的空间内。

8. 发明授权

US09304401B2 Measurement of the position of a radiation beam spot in lithography 有权
标题翻译：光刻中辐射束斑位置的测量
公开(公告)号：US09304401B2
公开(公告)日：2016-04-05
申请号：US14001478
申请日：2012-02-22
申请人： Felix Godfried Peter Peeters , Jozef Petrus Henricus Benschop , Michael Jozef Mathijs Renkens , Gregor Edward Van Baars , Jeroen Dekkers
发明人： Felix Godfried Peter Peeters , Jozef Petrus Henricus Benschop , Michael Jozef Mathijs Renkens , Gregor Edward Van Baars , Jeroen Dekkers
IPC分类号： G03B27/32 , G03B27/54 , G03B27/58 , G03B27/72 , G03B27/74 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70133 , G03F7/70275 , G03F7/70375 , G03F7/70391 , G03F7/704 , G03F7/70516 , G03F7/708 , G03F7/7085 , G03F9/7019
摘要： A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.
摘要翻译：一种用于光刻设备的辐射点测量系统，该系统具有目标，光刻设备的辐射系统可以在其上投射用于测量过程的辐射点，目标具有测量目标。该系统还包括用于检测来自一个点的辐射的辐射检测器，以及用于从辐射检测器接收信息并确定相对于辐射点的预期位置的辐射点的位置的控制器。

9. 发明申请

US20130335721A1 MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY 有权
标题翻译：辐射光束点位置的测量
公开(公告)号：US20130335721A1
公开(公告)日：2013-12-19
申请号：US14001478
申请日：2012-02-22
申请人： Felix Godfried Peter Peeters , Jozef Petrus Henricus Benschop , Michael Jozef Mathijs Renkens , Gregor Edward Van Baars , Jeroen Dekkers
发明人： Felix Godfried Peter Peeters , Jozef Petrus Henricus Benschop , Michael Jozef Mathijs Renkens , Gregor Edward Van Baars , Jeroen Dekkers
IPC分类号： G03F7/20
CPC分类号： G03F7/70133 , G03F7/70275 , G03F7/70375 , G03F7/70391 , G03F7/704 , G03F7/70516 , G03F7/708 , G03F7/7085 , G03F9/7019
摘要： A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.
摘要翻译：一种用于光刻设备的辐射点测量系统，该系统具有目标，光刻设备的辐射系统可以在其上投射用于测量过程的辐射点，目标具有测量目标。该系统还包括用于检测来自一个点的辐射的辐射检测器，以及用于从辐射检测器接收信息并确定相对于辐射点的预期位置的辐射点的位置的控制器。

10. 发明申请

US20110013169A1 SUBSTRATE TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, METHOD OF USING A SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD 有权
标题翻译：基板设备的基板，平面设备，使用基板的方法和设备制造方法
公开(公告)号：US20110013169A1
公开(公告)日：2011-01-20
申请号：US12821015
申请日：2010-06-22
申请人： Raymond Wilhelmus Louis Lafarre , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Gerardus Adrianus Antonius Maria Kusters , Alexander Nikolov Zdravkov , Hrishikesh Patel , Sander Van Opstal
发明人： Raymond Wilhelmus Louis Lafarre , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Gerardus Adrianus Antonius Maria Kusters , Alexander Nikolov Zdravkov , Hrishikesh Patel , Sander Van Opstal
IPC分类号： G03B27/58
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/707 , G03F7/70808
摘要： A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.
摘要翻译：为浸没式光刻设备中的衬底台设置盖子，该衬底台至少覆盖衬底和接收衬底的衬底台中的凹部之间的间隙。

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