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1. 发明授权

US08253119B1 Well-based dynamic pattern generator 有权
标题翻译：基于良好的动态模式生成器
公开(公告)号：US08253119B1
公开(公告)日：2012-08-28
申请号：US12510049
申请日：2009-07-27
申请人： Alan D. Brodie , Paul Petric , Mark A. McCord
发明人： Alan D. Brodie , Paul Petric , Mark A. McCord
IPC分类号： G01N23/00 , G21K1/02 , G21K1/08
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/31789
摘要： One embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. The apparatus includes a plurality of base electrodes in a two-dimensional array, an insulating border surrounding each base electrode so as to electrically isolate the base electrodes from each other; and a sidewall surrounding each base electrode. The sidewall comprises a plurality of stacked electrodes which are separated by insulating layers. In addition, the base electrodes are advantageously shaped so as to be concave. Furthermore, a conformal coating may be advantageously applied over the base electrodes and sidewalls. Another embodiment relates to an apparatus for reflection electron beam lithography. The apparatus includes a shadow mask configured to form an array of incident electron beamlets. The shadow mask comprises an array of holes which correspond one-to-one with an array of pixel pads of an electron reflective patterned structure. Other embodiments, aspects and features are disclosed.
摘要翻译：一个实施例涉及用于反射电子束光刻的动态图案发生器的装置。该装置包括二维阵列中的多个基极电极，围绕每个基极的绝缘边界，以将基极电极彼此电隔离; 以及围绕每个基极的侧壁。侧壁包括由绝缘层分离的多个堆叠电极。此外，基底电极有利地成形为凹形。此外，可以有利地在基极和侧壁上施加保形涂层。另一实施例涉及一种用于反射电子束光刻的装置。该装置包括配置成形成入射电子束阵列的荫罩。荫罩包括与电子反射图案化结构的像素焊盘的阵列一一对应的孔阵列。公开了其它实施例，方面和特征。

2. 发明授权

US07091486B1 Method and apparatus for beam current fluctuation correction 有权
标题翻译：射束电流波动校正的方法和装置
公开(公告)号：US07091486B1
公开(公告)日：2006-08-15
申请号：US10938841
申请日：2004-09-09
申请人： Mark A. McCord , Alan D. Brodie
发明人： Mark A. McCord , Alan D. Brodie
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： G01N23/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/24 , H01J37/244 , H01J37/28 , H01J37/3174
摘要： One embodiment disclosed relates to an electron beam imaging apparatus. An electron source is configured to generate an electron beam, and a beam-limiting aperture is configured to block a portion of the electron beam and to allow transmission of another portion of the electron beam through the aperture. A first detector is configured to detect scattered electrons emitted by the aperture due to the blocked portion of the electron beam. The imaging apparatus may also include a second detector configured to detect scattered electrons emitted by the sample due to impingement of the transmitted portion of the electron beam. A gain control device may also be included to adjust a gain of a detected signal derived from the second detector using a control signal derived from the first detector. Another embodiment disclosed relates to an electron beam lithography apparatus. The lithography apparatus may adjust a pixel dwell time based on a control signal derived from the scattered electrons emitted by the aperture.
摘要翻译：公开的一个实施例涉及一种电子束成像装置。电子源被配置为产生电子束，并且束限制孔被配置为阻挡电子束的一部分并且允许电子束的另一部分通过孔传播。第一检测器被配置为检测由于电子束的阻挡部分而由孔发射的散射电子。成像装置还可以包括第二检测器，其被配置为检测由于电子束的透射部分的撞击而由样品发射的散射电子。还可以包括增益控制装置，以使用从第一检测器导出的控制信号来调整从第二检测器导出的检测信号的增益。所公开的另一实施例涉及电子束光刻设备。光刻设备可以基于从孔径发射的散射电子得到的控制信号来调整像素驻留时间。

3. 发明授权

US06828571B1 Apparatus and methods of controlling surface charge and focus 有权
标题翻译：控制表面电荷和聚焦的装置和方法
公开(公告)号：US06828571B1
公开(公告)日：2004-12-07
申请号：US10699708
申请日：2003-11-03
申请人： Mark A. McCord , Jan A. Lauber , Paul Petric , Ross W. Thompson , Jason Lim , Frank Y. H. Fan , Gabor D. Toth
发明人： Mark A. McCord , Jan A. Lauber , Paul Petric , Ross W. Thompson , Jason Lim , Frank Y. H. Fan , Gabor D. Toth
IPC分类号： H01L2100
CPC分类号： G01R31/307 , G01R31/2653 , H01J37/026 , H01J37/21 , H01J2237/0048 , H01J2237/20 , H01J2237/216 , H01J2237/2817
摘要： One embodiment disclosed relates to a method of setting a surface charge of an area on a substrate to a desired level. The substrate is held on a stage, and a stage bias voltage applied to the stage is controlled. A flood of electrons is directed to the area. The stage bias voltage is controlled such that the surface charge of the area reaches an equilibrium at the desired level. Another embodiment disclosed relates to a method of auto-focusing a main electron beam incident upon an imaging area of a substrate. A monitor electron beam is generated and directed towards a monitoring area of the substrate at a non-perpendicular incidence angle. An in-focus band in data collected from the monitor beam is detected. The focal length of an objective lens focusing the main beam is adjusted based upon a position of the in-focus band.
摘要翻译：公开的一个实施例涉及一种将衬底上的区域的表面电荷设置到期望水平的方法。将基板保持在平台上，并且控制施加到载物台的载物台偏置电压。大量的电子被引导到该地区。阶段偏置电压被控制使得该区域的表面电荷达到期望水平的平衡。公开的另一实施例涉及一种自动聚焦入射到基板的成像区域上的主电子束的方法。产生监视电子束并以非垂直入射角朝向基板的监视区域。检测从监视器束收集的数据中的对焦带。聚焦主光束的物镜的焦距基于对焦带的位置进行调整。

4. 发明授权

US08089051B2 Electron reflector with multiple reflective modes 有权
标题翻译：具有多种反射模式的电子反射镜
公开(公告)号：US08089051B2
公开(公告)日：2012-01-03
申请号：US12711966
申请日：2010-02-24
申请人： Luca Grella , Regina Freed , Mark A. McCord
发明人： Luca Grella , Regina Freed , Mark A. McCord
IPC分类号： G21K1/08
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01J2237/31789
摘要： One embodiment relates to a method of controllably reflecting electrons from an array of electron reflectors. An incident electron beam is formed from an electron source, and the incident beam is directed to the array of electron reflectors. A first plurality of the reflectors is configured to reflect electrons in a first reflective mode such that the reflected electrons exiting the reflector form a focused beam. A second plurality of the reflectors is configured to reflect electrons in a second reflective mode such that the reflected electrons exiting the reflector are defocused. Another embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. Other embodiments, aspects and features are also disclosed.
摘要翻译：一个实施例涉及从电子反射器阵列可控地反射电子的方法。入射电子束由电子源形成，入射光束被引导到电子反射体阵列。第一多个反射器被配置为以第一反射模式反射电子，使得离开反射器的反射电子形成聚焦光束。第二多个反射器被配置为以第二反射模式反射电子，使得离开反射器的反射电子散焦。另一个实施例涉及用于反射电子束光刻的动态图案发生器的装置。还公开了其它实施例，方面和特征。

5. 发明授权

US07710556B1 Inspection system 失效
标题翻译：检验系统
公开(公告)号：US07710556B1
公开(公告)日：2010-05-04
申请号：US11752958
申请日：2007-05-24
申请人： Mark A. McCord
发明人： Mark A. McCord
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N2021/8822 , G01N2021/8825 , G01N2201/101
摘要： A substrate inspection system of a type that receives substrates disposed within a cassette and inspects a planar surface of the substrates with a read head, where the substrates are inspected while they are disposed within the cassette, and the read head is of a size to fit between adjacent substrates within the cassette. In this manner, the substrates do not need to be removed from the cassette, and no robotic arm is required to do so.
摘要翻译：一种衬底检查系统，其接收设置在盒内的衬底并用读头检查衬底的平坦表面，其中衬底被布置在盒内时被检查，读头的尺寸适合在盒内的相邻基板之间。以这种方式，不需要从盒中取出基板，并且不需要机器人手臂。

6. 发明授权

US07176468B2 Method for charging substrate to a potential 有权
标题翻译：将基板充电到电位的方法
公开(公告)号：US07176468B2
公开(公告)日：2007-02-13
申请号：US10942184
申请日：2004-09-16
申请人： Kirk J. Bertsche , Mark A. McCord
发明人： Kirk J. Bertsche , Mark A. McCord
IPC分类号： H01J37/244
CPC分类号： G21K7/00 , H01J37/026 , H01J2237/0045 , H01J2237/0048
摘要： A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron beam such that the electron yield is less than one. In another embodiment, the substrate is provided with the surface in a state at an approximate initial potential above the target potential. The surface is then flooded with charged particle such that the charge yield of scattered particles is less than one, such that a steady state is reached at which the target potential is achieved. Another embodiment pertains to an apparatus for charging a surface of an insulating is substrate to a target potential.
摘要翻译：将绝缘基板的表面充电至目标电位。在一个实施方案中，表面充满了较高能量的电子束，使得电子产率大于1。随后，表面被低能电子束淹没，使得电子产率小于1。在另一个实施例中，衬底被提供有处于大于目标电位的初始电位的状态的表面。然后用带电粒子充满表面，使得散射颗粒的电荷产率小于1，使得达到达到目标电势的稳定状态。另一个实施例涉及一种用于将绝缘体的表面充电至靶电位的装置。

7. 发明授权

US4992728A Electrical probe incorporating scanning proximity microscope 失效
标题翻译：电探头结合扫描接近显微镜
公开(公告)号：US4992728A
公开(公告)日：1991-02-12
申请号：US454677
申请日：1989-12-21
申请人： Mark A. McCord , Leonard Berenbaum
发明人： Mark A. McCord , Leonard Berenbaum
IPC分类号： G01B7/34 , G01B21/30 , G01N37/00 , G01Q10/04 , G01Q20/00 , G01Q30/02 , G01Q60/04 , G01Q60/24 , G01Q60/30 , G01R1/06 , G01R31/308 , H01J37/28
CPC分类号： G01Q60/30 , B82Y35/00 , G01Q10/04 , G01Q30/025 , G01R31/308
摘要： An electrical probe which incorporates a scanning proximity microscope for probing the sub-micron features of an integrated circuit. An optical microscope is provided to find the general region of interest, and a piezoelectric tube scanner which controls the position of the probe is disposed at an acute angle to the substrate, so as not to obscure the view of the optical microscope. A number of such probes may be located around the integrated circuit.

8. 发明授权

US08614427B1 Suspended membrane calibration sample 有权
标题翻译：悬浮膜校准样品
公开(公告)号：US08614427B1
公开(公告)日：2013-12-24
申请号：US10195638
申请日：2002-07-15
申请人： Mark A. McCord , Liqun Han
发明人： Mark A. McCord , Liqun Han
IPC分类号： G01N23/00
CPC分类号： G01N23/225 , G01N2223/303 , G01N2223/611
摘要： One embodiment disclosed relates to a method for fabricating a calibration sample. The method includes lithographically patterning a first side of a wafer with a pattern of a self-supporting membrane, etching the first side of the wafer to form the self-supporting membrane in a layer on the first side, and etching a second side of the wafer to reach the layer so as to suspend the membrane over an empty space. Another embodiment disclosed relates to a charged particle beam system. The system includes a charged particle source, a focusing column and lens assembly, a detector, and a suspended membrane calibration sample. Another embodiment disclosed relates a suspended membrane calibration sample for a charged particle beam system. The calibration sample includes a plurality of calibration patterns in an array, a suspended membrane that is self-supporting and includes the plurality of calibration patterns, and an empty space underneath the membrane.
摘要翻译：公开的一个实施例涉及一种用于制造校准样品的方法。该方法包括利用自支撑膜的图案将晶片的第一侧光刻图案化，蚀刻晶片的第一侧以在第一侧上的层中形成自支撑膜，并且蚀刻第二面晶片到达该层，以便将膜悬挂在空的空间上。所公开的另一实施例涉及带电粒子束系统。该系统包括带电粒子源，聚焦柱和透镜组件，检测器和悬浮膜校准样品。所公开的另一实施例涉及用于带电粒子束系统的悬浮膜校准样品。校准样品包括阵列中的多个校准图案，自支撑并包括多个校准图案的悬浮膜和膜下方的空白空间。

9. 发明授权

US07714300B1 High-speed high-efficiency solid-state electron detector 有权
标题翻译：高速高效固态电子探测器
公开(公告)号：US07714300B1
公开(公告)日：2010-05-11
申请号：US11711552
申请日：2007-02-26
申请人： Mark A. McCord , Tom G. Miller , David L. Brown
发明人： Mark A. McCord , Tom G. Miller , David L. Brown
IPC分类号： G01T1/00
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2441 , H01J2237/2444
摘要： One embodiment relates to a solid-state charged-particle detector. The detector includes a PIN diode and a conductive coating on the front-side of the PIN diode, wherein the front-side receives incident charged particles to be detected. In addition, the detector includes a metal layer on the backside of the PIN diode and electrical connections to the metal layer and to the conductive coating. Other embodiment are also disclosed.
摘要翻译：一个实施方案涉及固态带电粒子检测器。检测器包括PIN二极管和PIN二极管前侧的导电涂层，其中前侧接收待检测的入射带电粒子。此外，检测器包括在PIN二极管背面的金属层和与金属层和导电涂层的电连接。还公开了其他实施例。

10. 发明授权

US06664546B1 In-situ probe for optimizing electron beam inspection and metrology based on surface potential 失效
标题翻译：基于表面电位优化电子束检测和计量的原位探针
公开(公告)号：US06664546B1
公开(公告)日：2003-12-16
申请号：US09502554
申请日：2000-02-10
申请人： Mark A. McCord , Jan Lauber , Jun Pei , Jorge P. Fernandez
发明人： Mark A. McCord , Jan Lauber , Jun Pei , Jorge P. Fernandez
IPC分类号： H01J3721
CPC分类号： H01J37/28 , H01J2237/004 , H01J2237/2594 , H01J2237/2814 , H01J2237/2817
摘要： Disclosed is a method and apparatus for generating an image from a sample. The apparatus includes a charged particle beam generator arranged to generate and control a charged particle beam substantially towards a portion of the sample and a detector arranged to detect charged particles originating from the sample portion to allow generation of an image from the detected charged particles. The apparatus further includes a measurement device arranged to measure a characteristic of the sample portion to obtain a surface voltage value of the sample portion that is exposed to the charged particle beam. For example, the measurement device is an electrostatic voltmeter positioned to obtain a surface voltage value of the exposed sample portion. A charged particle beam is directed substantially towards a portion of the sample under a first set of operating conditions. A surface charge value of the sample portion is obtained under the first set of operating conditions. It is then determined whether an optimum set of operating conditions associated with a predetermined surface charge value have been found. When the optimum conditions have not been found, the operating conditions are adjusted and the charged particle beam is directed substantially towards the sample portion. When the optimum conditions have been found, the charged particle beam is directed substantially towards the sample portion under the found optimum operating conditions.
摘要翻译：公开了一种用于从样本生成图像的方法和装置。该装置包括带电粒子束发生器，其布置成基本上朝向样品的一部分产生并控制带电粒子束;以及检测器，被布置成检测源自样品部分的带电粒子，以允许从检测到的带电粒子产生图像。该装置还包括测量装置，其被配置为测量样品部分的特性以获得暴露于带电粒子束的样品部分的表面电压值。例如，测量装置是定位成获得暴露的样品部分的表面电压值的静电电压表。在第一组操作条件下，带电粒子束基本上指向样品的一部分。在第一组操作条件下获得样品部分的表面电荷值。然后确定是否已经找到与预定表面电荷值相关联的最佳操作条件集合。当没有发现最佳条件时，调节操作条件并且带电粒子束基本上朝向样品部分。当已经找到最佳条件时，在找到的最佳操作条件下，带电粒子束基本上指向样品部分。

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