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1. 发明授权

US06664546B1 In-situ probe for optimizing electron beam inspection and metrology based on surface potential 失效
标题翻译：基于表面电位优化电子束检测和计量的原位探针
公开(公告)号：US06664546B1
公开(公告)日：2003-12-16
申请号：US09502554
申请日：2000-02-10
申请人： Mark A. McCord , Jan Lauber , Jun Pei , Jorge P. Fernandez
发明人： Mark A. McCord , Jan Lauber , Jun Pei , Jorge P. Fernandez
IPC分类号： H01J3721
CPC分类号： H01J37/28 , H01J2237/004 , H01J2237/2594 , H01J2237/2814 , H01J2237/2817
摘要： Disclosed is a method and apparatus for generating an image from a sample. The apparatus includes a charged particle beam generator arranged to generate and control a charged particle beam substantially towards a portion of the sample and a detector arranged to detect charged particles originating from the sample portion to allow generation of an image from the detected charged particles. The apparatus further includes a measurement device arranged to measure a characteristic of the sample portion to obtain a surface voltage value of the sample portion that is exposed to the charged particle beam. For example, the measurement device is an electrostatic voltmeter positioned to obtain a surface voltage value of the exposed sample portion. A charged particle beam is directed substantially towards a portion of the sample under a first set of operating conditions. A surface charge value of the sample portion is obtained under the first set of operating conditions. It is then determined whether an optimum set of operating conditions associated with a predetermined surface charge value have been found. When the optimum conditions have not been found, the operating conditions are adjusted and the charged particle beam is directed substantially towards the sample portion. When the optimum conditions have been found, the charged particle beam is directed substantially towards the sample portion under the found optimum operating conditions.
摘要翻译：公开了一种用于从样本生成图像的方法和装置。该装置包括带电粒子束发生器，其布置成基本上朝向样品的一部分产生并控制带电粒子束;以及检测器，被布置成检测源自样品部分的带电粒子，以允许从检测到的带电粒子产生图像。该装置还包括测量装置，其被配置为测量样品部分的特性以获得暴露于带电粒子束的样品部分的表面电压值。例如，测量装置是定位成获得暴露的样品部分的表面电压值的静电电压表。在第一组操作条件下，带电粒子束基本上指向样品的一部分。在第一组操作条件下获得样品部分的表面电荷值。然后确定是否已经找到与预定表面电荷值相关联的最佳操作条件集合。当没有发现最佳条件时，调节操作条件并且带电粒子束基本上朝向样品部分。当已经找到最佳条件时，在找到的最佳操作条件下，带电粒子束基本上指向样品部分。

2. 发明授权

US06552340B1 Autoadjusting charged-particle probe-forming apparatus 有权
标题翻译：自动调整带电粒子探针形成装置
公开(公告)号：US06552340B1
公开(公告)日：2003-04-22
申请号：US09686805
申请日：2000-10-12
申请人： Ondrej L. Krivanek , Niklas Dellby , Andrew R. Lupini
发明人： Ondrej L. Krivanek , Niklas Dellby , Andrew R. Lupini
IPC分类号： H01J3721
CPC分类号： H01J37/153 , H01J37/21 , H01J37/28
摘要： An autoadjusting charged-particle probe-forming apparatus improving the resolution of probe-forming charged-particle optical systems by minimizing optical aberrations. The apparatus comprises a source of charged particles, a probe-forming system of charged-particle lenses, a plurality of detectors optionally comprising a two-dimensional image detector, power supplies, a computer and appropriate software. Images are recorded by the two-dimensional detector and analyzed to determine the aberration characteristics of the apparatus. Alternately, multiple scanned images are recorded by a scanned image detector and also analyzed to determine the aberration characteristics of the apparatus. The aberration characteristics are used to automatically adjust the apparatus for improved optical performance.
摘要翻译：一种自动调节带电粒子探针形成装置，通过最小化光学像差来提高探针形成带电粒子光学系统的分辨率。该装置包括带电粒子源，带电粒子透镜的探针形成系统，可选地包括二维图像检测器的多个检测器，电源，计算机和适当的软件。图像由二维检测器记录并进行分析，以确定装置的像差特性。或者，多个扫描图像由扫描图像检测器记录，并且还被分析以确定装置的像差特性。像差特性用于自动调整装置以改善光学性能。

3. 发明授权

US06653631B2 Apparatus and method for defect detection using charged particle beam 有权
公开(公告)号：US06653631B2
公开(公告)日：2003-11-25
申请号：US09899018
申请日：2001-07-06
申请人： Hiroshi Nishimura
发明人： Hiroshi Nishimura
IPC分类号： H01J3721
CPC分类号： H01J37/28 , G01N23/225 , H01J2237/2817
摘要： A main control system 34 prepares, in advance, a voltage map showing the amount of focus deviation of a secondary electron beam B2 at a detection surface of an electron beam detector 30 corresponding with the amount of charge-up generated on a sample 4 upon irradiation with a primary electron beam B1, and stores this voltage map in a storage device 43. During an observation, the main control system 34 reads the voltage map stored in the storage device 43 and corrects the focal position of the secondary electron beam B2 by controlling either the voltage applied to the secondary optical system 20 or the voltage applied to the sample 4. As a result, focal position deviations resulting from charge-up generated on the sample being observed can be corrected without causing inconvenience to an operator.

4. 发明授权

US06521891B1 Focusing method and system 有权
标题翻译：聚焦方法和系统
公开(公告)号：US06521891B1
公开(公告)日：2003-02-18
申请号：US09390542
申请日：1999-09-03
申请人： Noam Dotan , Asher Pearl
发明人： Noam Dotan , Asher Pearl
IPC分类号： H01J3721
CPC分类号： H01J37/21 , H01J2237/216
摘要： According to one aspect of the present invention, there is provided a method for controlling of charged particle beam to compensate for a potential being present on a specimen, the method comprising the steps of: moving a charged particle beam over the specimen; measuring at least one secondary product and/or backscattered particles coming from the specimen to produce an image signal; scoring the image signal; changing the beam energy; analyzing the scores achieved with different beam energies; and adjusting the beam energy based on the analysis, to compensate for the potential being present on the specimen.
摘要翻译：根据本发明的一个方面，提供了一种用于控制带电粒子束以补偿存在于试样上的电位的方法，所述方法包括以下步骤：将带电粒子束移动到样本上; 测量来自所述样本的至少一个次要产品和/或背散射粒子以产生图像信号; 评分图像信号; 改变光束能量; 分析用不同光束能量获得的分数; 并根据分析调整光束能量，以补偿样品上存在的电位。

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