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1. 发明授权

US08089051B2 Electron reflector with multiple reflective modes 有权
标题翻译：具有多种反射模式的电子反射镜
公开(公告)号：US08089051B2
公开(公告)日：2012-01-03
申请号：US12711966
申请日：2010-02-24
申请人： Luca Grella , Regina Freed , Mark A. McCord
发明人： Luca Grella , Regina Freed , Mark A. McCord
IPC分类号： G21K1/08
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01J2237/31789
摘要： One embodiment relates to a method of controllably reflecting electrons from an array of electron reflectors. An incident electron beam is formed from an electron source, and the incident beam is directed to the array of electron reflectors. A first plurality of the reflectors is configured to reflect electrons in a first reflective mode such that the reflected electrons exiting the reflector form a focused beam. A second plurality of the reflectors is configured to reflect electrons in a second reflective mode such that the reflected electrons exiting the reflector are defocused. Another embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. Other embodiments, aspects and features are also disclosed.
摘要翻译：一个实施例涉及从电子反射器阵列可控地反射电子的方法。入射电子束由电子源形成，入射光束被引导到电子反射体阵列。第一多个反射器被配置为以第一反射模式反射电子，使得离开反射器的反射电子形成聚焦光束。第二多个反射器被配置为以第二反射模式反射电子，使得离开反射器的反射电子散焦。另一个实施例涉及用于反射电子束光刻的动态图案发生器的装置。还公开了其它实施例，方面和特征。

2. 发明授权

US07755061B2 Dynamic pattern generator with cup-shaped structure 有权
标题翻译：具有杯形结构的动态图案发生器
公开(公告)号：US07755061B2
公开(公告)日：2010-07-13
申请号：US11983069
申请日：2007-11-07
申请人： Luca Grella , Leonid Baranov , Yehiel Gotkis
发明人： Luca Grella , Leonid Baranov , Yehiel Gotkis
IPC分类号： G21K1/02
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/0435 , H01J2237/0453
摘要： One embodiment relates to a dynamic pattern generator for reflection electron beam lithography which includes conductive pixel pads, an insulative border surrounding each conductive pixel pad so as to electrically isolate the conductive pixel pads from each other, and conductive elements coupled to the conductive pixel pads for controllably applying voltages to the conductive pixel pads. The conductive pixel pads are advantageously cup shaped with a bottom portion, a sidewall portion, and an open cavity. Another embodiment relates to a pattern generating apparatus which includes a well structure with sidewalls and a cavity configured above each conductive pixel pad. The sidewalls may include alternating layers of conductive and insulative materials. Other embodiments, aspects and feature are also disclosed.
摘要翻译：一个实施例涉及用于反射电子束光刻的动态图案发生器，其包括导电像素焊盘，围绕每个导电像素焊盘的绝缘，以将导电像素焊盘彼此电隔离，以及耦合到导电像素焊盘的导电元件，可控地向导电像素焊盘施加电压。导电像素焊盘有利地为杯形，其具有底部，侧壁部分和开放空腔。另一个实施例涉及一种图案生成装置，其包括具有侧壁的阱结构和在每个导电像素垫之上配置的空腔。侧壁可以包括交替的导电和绝缘材料层。还公开了其它实施例，方面和特征。

3. 发明授权

US07009177B1 Apparatus and method for tilted particle-beam illumination 有权
标题翻译：倾斜粒子束照明的装置和方法
公开(公告)号：US07009177B1
公开(公告)日：2006-03-07
申请号：US11040281
申请日：2005-01-20
申请人： Marian Mankos , Luca Grella , David L. Adler
发明人： Marian Mankos , Luca Grella , David L. Adler
IPC分类号： H01J37/26
CPC分类号： H01J37/1478 , H01J37/29 , H01J2237/2538
摘要： One embodiment disclosed relates to an apparatus for inspecting a substrate using charged particles. The apparatus includes an illumination subsystem, an objective subsystem, a projection subsystem, and a beam separator interconnecting those subsystems. Advantageously, the illumination subsystem includes a tilt deflector configured to controllably tilt the incident beam. The tilt of the incident beam caused by the tilt deflector is magnified prior to the incident beam impinging onto the substrate. This technique allows for achieving large beam tilts at the substrate without lens aberrations caused by introducing tilt at the objective lens and without complications due to using a tiltable stage. Other embodiments are also disclosed.
摘要翻译：公开的一个实施例涉及一种使用带电粒子检查基板的装置。该装置包括照明子系统，客观子系统，投影子系统和互连这些子系统的分束分离器。有利地，照明子系统包括被配置为可控地倾斜入射光束的倾斜偏转器。在入射光束撞击到基板上之前，由倾斜偏转器引起的入射光束的倾斜被放大。该技术允许在基板处实现大的光束倾斜，而不会由于在物镜处引入倾斜而导致的透镜像差，并且由于使用可倾斜的台而不会产生并发症。还公开了其他实施例。

4. 发明授权

US07276690B1 Method and system for e-beam scanning 有权
标题翻译：电子束扫描的方法和系统
公开(公告)号：US07276690B1
公开(公告)日：2007-10-02
申请号：US10911216
申请日：2004-08-04
申请人： Gian Francesco Lorusso , Luca Grella , Douglas K. Masnaghetti , Amir Azordegan
发明人： Gian Francesco Lorusso , Luca Grella , Douglas K. Masnaghetti , Amir Azordegan
IPC分类号： G01N23/00
CPC分类号： G01N23/2251 , H01J2237/004 , H01J2237/28
摘要： The disclosure relates to a method and system of electron beam scanning for measurement, inspection or review. In accordance with one embodiment, the method includes a first scan on a region to collect first image data. The first image data is processed to determine information about a feature in the region. A scanning method is selected for imaging the feature. A second scan using the selected scanning method on the feature is then applied to collect second image data.
摘要翻译：本公开涉及用于测量，检查或审查的电子束扫描的方法和系统。根据一个实施例，该方法包括在收集第一图像数据的区域上的第一扫描。处理第一图像数据以确定关于该区域中的特征的信息。选择扫描方法来成像该特征。然后应用使用所选择的扫描方法对特征进行的第二次扫描来收集第二图像数据。

5. 发明授权

US07098456B1 Method and apparatus for accurate e-beam metrology 有权
标题翻译：用于精确电子束计量的方法和装置
公开(公告)号：US07098456B1
公开(公告)日：2006-08-29
申请号：US10918088
申请日：2004-08-13
申请人： Gian Francesco Lorusso , Paola De Cecco , Luca Grella , David L. Adler , David Goodstein , Chris Bevis
发明人： Gian Francesco Lorusso , Paola De Cecco , Luca Grella , David L. Adler , David Goodstein , Chris Bevis
IPC分类号： H01J37/28 , G01N23/225
CPC分类号： G01N23/2251 , H01J37/265 , H01J37/28 , H01J2237/2817 , H01J2237/2826
摘要： One embodiment disclosed relates to a method for accurate electron beam metrology. A substrate with a target feature is loaded into a scanning electron microscope. An electron beam is scanned over the target feature, and scattered electrons are detected therefrom. A characteristic of the target feature is measured by finding optimal values for parameters of a mathematical model which accounts for substrate charging effects. Principal component analysis may be used to advantageously result in reduced requirements for processing time and/or computational speed.
摘要翻译：所公开的一个实施例涉及一种精确电子束计量的方法。将具有目标特征的基板装载到扫描电子显微镜中。在目标特征上扫描电子束，并从中检测散射的电子。通过找到考虑到基板充电效应的数学模型的参数的最佳值来测量目标特征的特征。主成分分析可用于有利地减少对处理时间和/或计算速度的要求。

6. 发明授权

US07019292B1 E-beam detection of defective contacts/vias with flooding and energy filter 有权
标题翻译：通过淹没和能量过滤器对缺陷接触/过孔进行电子束检测
公开(公告)号：US07019292B1
公开(公告)日：2006-03-28
申请号：US10869588
申请日：2004-06-15
申请人： Frank Y. H. Fan , David L. Adler , Kirk J. Bertsche , Luca Grella
发明人： Frank Y. H. Fan , David L. Adler , Kirk J. Bertsche , Luca Grella
IPC分类号： H01J37/256
CPC分类号： H01J37/05 , H01J37/28 , H01J2237/057 , H01J2237/281 , H01J2237/2817 , H01L22/14
摘要： One embodiment disclosed relates to a method for robustly detecting a defective high aspect ratio (HAR) feature. A surface area of a semiconductor specimen with HAR features thereon is charged up, and a primary beam is impinged onto the surface area. Scattered electrons that are generated due to the impingement of the primary beam are extracted from the surface area. An energy filter is applied to remove the scattered electrons with lower energies, and the filtered electrons are detected. Image data is generated from the detected electrons, and an intensity threshold is applied to the image data.
摘要翻译：公开的一个实施例涉及用于鲁棒地检测有缺陷的高纵横比（HAR）特征的方法。其上具有HAR特征的半导体样品的表面积被充电，并且主光束撞击到表面区域。从表面区域提取由于主光束的撞击而产生的分散电子。应用能量滤波器去除具有较低能量的散射电子，并且检测滤波电子。从检测到的电子生成图像数据，并且将强度阈值应用于图像数据。

7. 发明授权

US06815675B1 Method and system for e-beam scanning 失效
标题翻译：电子束扫描的方法和系统
公开(公告)号：US06815675B1
公开(公告)日：2004-11-09
申请号：US10426665
申请日：2003-04-30
申请人： Gian Francesco Lorusso , Luca Grella , Douglas K. Masnaghetti , Amir Azordegan
发明人： Gian Francesco Lorusso , Luca Grella , Douglas K. Masnaghetti , Amir Azordegan
IPC分类号： G01N2300
CPC分类号： G01N23/2251 , H01J2237/004 , H01J2237/28
摘要： The disclosure relates to a method and system of electron beam scanning for measurement, inspection or review. In accordance with one embodiment, the method includes a first scan on a region to collect first image data. The first image data is processed to determine information about a feature in the region. A scanning method is selected for imaging the feature. A second scan using the selected scanning method on the feature is then applied to collect second image data.
摘要翻译：本公开涉及用于测量，检查或审查的电子束扫描的方法和系统。根据一个实施例，该方法包括在收集第一图像数据的区域上的第一扫描。处理第一图像数据以确定关于该区域中的特征的信息。选择扫描方法来成像该特征。然后应用使用所选择的扫描方法对该特征进行的第二次扫描来收集第二图像数据。

8. 发明授权

US07958464B1 Electron beam patterning 有权
标题翻译：电子束图案化
公开(公告)号：US07958464B1
公开(公告)日：2011-06-07
申请号：US12199922
申请日：2008-08-28
申请人： Luca Grella , Allen M. Carroll
发明人： Luca Grella , Allen M. Carroll
IPC分类号： G06F17/50
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： A method for creating an electron beam pattern exposure, where a pattern of shapes is generated, including at least one of lines and vias. To each shape there is assigned a set of exposure pixels and edge placement constraints. An intensity at each exposure pixel is calculated by using a simplex method, and a latent resist image location is calculated by convolving a proximity function with the pixel intensities. A shape critical dimension and a shape edge slope is statistically evaluated by applying linear regression on the locations of the calculated latent image. The electron beam pattern exposures are produced using dosages linearly optimized on a rotated pixel grid to produce the shape critical dimension and the shape edge slope.
摘要翻译：一种用于产生电子束图案曝光的方法，其中产生形状图案，其包括线和通孔中的至少一个。对于每个形状，分配一组曝光像素和边缘放置约束。通过使用单纯形法计算每个曝光像素的强度，并且通过将接近函数与像素强度进行卷积来计算潜像抗蚀剂图像位置。通过对所计算的潜像的位置应用线性回归来统计评估形状临界尺寸和形状边缘斜率。使用在旋转的像素网格上线性优化的剂量产生电子束图案曝光以产生形状临界尺寸和形状边缘斜率。

9. 发明授权

US07361941B1 Calibration standards and methods 有权
标题翻译：校准标准和方法
公开(公告)号：US07361941B1
公开(公告)日：2008-04-22
申请号：US11022481
申请日：2004-12-21
申请人： Gian F. Lorusso , Christopher F. Bevis , Luca Grella , David L. Adler , Ian Smith
发明人： Gian F. Lorusso , Christopher F. Bevis , Luca Grella , David L. Adler , Ian Smith
IPC分类号： H01J33/00 , G01J1/10
CPC分类号： G03F7/70625 , G01B11/24 , G01B15/00 , G01B21/042 , G03F7/70516 , H01J37/222 , H01J37/263 , H01J37/3045 , H01J2237/223 , H01J2237/226 , H01J2237/24578 , H01J2237/2826
摘要： Parameters of a metrology tool may be determined by measuring a dimension of a feature on a calibration standard with the tool and using the measured dimension and a known traceable value of the dimension to determine a value for the parameter. If the dimension of the feature on the standard has a known traceable value, different standards may be used to calibrate different tools.
摘要翻译：可以通过使用工具测量校准标准上的特征的尺寸并使用测量的尺寸和尺寸的已知可追踪值来确定参数的值来确定计量工具的参数。如果标准中的特征尺寸具有已知的可追溯值，则可能会使用不同的标准来校准不同的工具。

10. 发明授权

US06979824B1 Filtered e-beam inspection and review 有权
标题翻译：过滤电子束检查和审查
公开(公告)号：US06979824B1
公开(公告)日：2005-12-27
申请号：US10886519
申请日：2004-07-07
申请人： David L. Adler , Luca Grella
发明人： David L. Adler , Luca Grella
IPC分类号： G01Q30/02 , G01Q30/04 , H01J37/14 , H01J37/244 , H01J37/28
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24485 , H01J2237/24592 , H01J2237/281 , H01J2237/2815
摘要： The disclosure relates to filtered e-beam inspection and review. One embodiment pertains to the filtered inspection or review of a specimen with a high aspect ratio feature. Advantageously, the energy and/or angular filtering improves the information retrievable relating to the high aspect ratio feature on the specimen. Another embodiment pertains to a method for energy-filtered electron beam inspection where a band-pass energy filtered image data is generated by determining the difference between a first high-pass energy-filtered image data set and a second high-pass energy-filtered image data set.
摘要翻译：本公开涉及过滤的电子束检查和审查。一个实施例涉及具有高纵横比特征的样本的过滤检查或检查。有利地，能量和/或角度滤波改善了与样本上的高纵横比特征有关的信息。另一个实施例涉及一种用于能量过滤的电子束检查的方法，其中通过确定第一高通能量滤波图像数据集和第二高通能量滤波图像之间的差异来生成带通能量滤波图像数据数据集。

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