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    • 6. 发明授权
    • Silicon nitride sintered body and process for producing the same
    • 氮化硅烧结体及其制造方法
    • US5275772A
    • 1994-01-04
    • US957506
    • 1992-10-05
    • Takehisa YamamotoTakao NishiokaKenji MatsunumaAkira YamakawaMasaya Miyake
    • Takehisa YamamotoTakao NishiokaKenji MatsunumaAkira YamakawaMasaya Miyake
    • C04B35/593C04B35/597C04B35/58
    • C04B35/5935C04B35/597
    • The present invention relates to a silicon nitride sintered body [wherein the composition of Si.sub.3 N.sub.4 -first aid (Y.sub.2 O.sub.3 +MgO)-second aid (at least one of Al.sub.2 O.sub.3 and AlN)] falls within a range defined by lines joining points A, B, C and D in FIG. 1, the crystal phase of the sintered body contains both .alpha.-Si.sub.3 N.sub.4 and .beta.'-sialon, and the relative density is 98% or more. This sintered body is produced by subjecting a green compact of the above-described source to primary sintering in a nitrogen gas atmosphere at 1300 to 1700.degree. C. so that the relative density reaches 96% or more, and the precipitation ratio of the .alpha.-Si.sub.3 N.sub.4 crystal phases to the .beta.'-sialon crystal phase in the sintered body is in the range of from 40:60 to 80:20; and then subjecting the primary sintered body to secondary sintering in a nitrogen gas atmosphere at 1300 to 1700.degree. C. so that the relative density reaches 98% or more. The sintered body has superior strength properties, especially at ordinary temperatures, and can be produced with a high productivity in a high yield at a low cost.
    • 本发明涉及一种氮化硅烧结体[其中,Si 3 N 4 - 急救(Y 2 O 3 + MgO) - 辅助剂(Al 2 O 3和AlN中的至少一种)的组成]落在由连接点A,B, C和D。 如图1所示,烧结体的结晶相含有α-Si 3 N 4和β'-Sialon,相对密度为98%以上。 该烧结体是通过使上述源的生坯在1300〜1700℃的氮气气氛中进行一次烧结而制成的,使得相对密度达到96%以上, Si3N4晶相与烧结体中的β' - 赛隆结晶相的比例范围为40:60至80:20; 然后在1300〜1700℃的氮气气氛中使一次烧结体进行二次烧结,使得相对密度达到98%以上。 该烧结体具有优异的强度特性,特别是在普通温度下,可以低成本高产率地以高生产率生产。
    • 9. 发明授权
    • High strength silicon nitride sintered body and process for producing
same
    • 高强度氮化硅烧结体及其制造方法
    • US5328876A
    • 1994-07-12
    • US995703
    • 1992-12-23
    • Takao NishiokaAkira KuibiraKenji MatsunumaYoshishige TakanoMatsuo HiguchiMasaaki HondaMasaya Miyake
    • Takao NishiokaAkira KuibiraKenji MatsunumaYoshishige TakanoMatsuo HiguchiMasaaki HondaMasaya Miyake
    • C04B35/597C04B35/58
    • C04B35/597
    • A high-strength silicon nitride sintered body having a flexural strength of 100 kg/mm.sup.2 or higher and a process for producing the same are disclosed, the sintered body comprising not less than 90% by weight of a single crystalline phase of silicon aluminum oxynitride (Si.sub.6-z Al.sub.2 O.sub.z N.sub.8-z, wherein z is a number of from 0 to 4.2) having an average longer diameter of not more than 5 .mu.m and an aspect ratio of not less than 5, the crystal phase constituting a network structure in the sintered body, the balance being a crystalline or amorphous (glassy) phase comprising one or more of oxides or oxynitrides of a rare earth metal, a group 3A metal, a group 2A metal or Si, and the process comprising mixing silicon nitride powder, an organic metal salt as a first sintering aid, and at least one of a metal oxide, a metal nitride, and a metal oxynitride as a second sintering aid, either separately or as a mixture of two or more thereof, with a solvent and a surface active agent, subjecting the mixture or mixtures to ultrasonic dispersion, mixing the mixtures together followed by drying to obtain a mixed powder, molding the mixed powder, and sintering the molded article at a temperature of from 1,600.degree. C. to 2,200.degree. C. in a non-oxidative atmosphere.
    • 公开了一种弯曲强度为100kg / mm 2以上的高强度氮化硅烧结体及其制造方法,所述烧结体包含不小于90重量%的氮化硅铝的单晶相( Si6-zAl2OzN8-z,其中z为0-4.2的数),平均长度不大于5μm,纵横比不小于5,构成烧结体网状结构的晶相 余量为包含稀土金属,3A族金属,2A族金属或Si族的氧化物或氮氧化物中的一种或多种的结晶或无定形(玻璃质)相,并且该方法包括将氮化硅粉末,有机金属 盐作为第一烧结助剂,以及作为第二烧结助剂的金属氧化物,金属氮化物和金属氮氧化物中的至少一种,分别地或作为其两种或多种的混合物与溶剂和表面活性剂 对混合物进行处理 或与超声分散体的混合物,将混合物混合在一起,然后干燥以获得混合粉末,模塑混合粉末,并在非氧化性气氛中在1600℃至2200℃的温度下烧结该模制品。