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    • 1. 发明授权
    • High strength silicon nitride sintered body and process for producing
same
    • 高强度氮化硅烧结体及其制造方法
    • US5328876A
    • 1994-07-12
    • US995703
    • 1992-12-23
    • Takao NishiokaAkira KuibiraKenji MatsunumaYoshishige TakanoMatsuo HiguchiMasaaki HondaMasaya Miyake
    • Takao NishiokaAkira KuibiraKenji MatsunumaYoshishige TakanoMatsuo HiguchiMasaaki HondaMasaya Miyake
    • C04B35/597C04B35/58
    • C04B35/597
    • A high-strength silicon nitride sintered body having a flexural strength of 100 kg/mm.sup.2 or higher and a process for producing the same are disclosed, the sintered body comprising not less than 90% by weight of a single crystalline phase of silicon aluminum oxynitride (Si.sub.6-z Al.sub.2 O.sub.z N.sub.8-z, wherein z is a number of from 0 to 4.2) having an average longer diameter of not more than 5 .mu.m and an aspect ratio of not less than 5, the crystal phase constituting a network structure in the sintered body, the balance being a crystalline or amorphous (glassy) phase comprising one or more of oxides or oxynitrides of a rare earth metal, a group 3A metal, a group 2A metal or Si, and the process comprising mixing silicon nitride powder, an organic metal salt as a first sintering aid, and at least one of a metal oxide, a metal nitride, and a metal oxynitride as a second sintering aid, either separately or as a mixture of two or more thereof, with a solvent and a surface active agent, subjecting the mixture or mixtures to ultrasonic dispersion, mixing the mixtures together followed by drying to obtain a mixed powder, molding the mixed powder, and sintering the molded article at a temperature of from 1,600.degree. C. to 2,200.degree. C. in a non-oxidative atmosphere.
    • 公开了一种弯曲强度为100kg / mm 2以上的高强度氮化硅烧结体及其制造方法,所述烧结体包含不小于90重量%的氮化硅铝的单晶相( Si6-zAl2OzN8-z,其中z为0-4.2的数),平均长度不大于5μm,纵横比不小于5,构成烧结体网状结构的晶相 余量为包含稀土金属,3A族金属,2A族金属或Si族的氧化物或氮氧化物中的一种或多种的结晶或无定形(玻璃质)相,并且该方法包括将氮化硅粉末,有机金属 盐作为第一烧结助剂,以及作为第二烧结助剂的金属氧化物,金属氮化物和金属氮氧化物中的至少一种,分别地或作为其两种或多种的混合物与溶剂和表面活性剂 对混合物进行处理 或与超声分散体的混合物,将混合物混合在一起,然后干燥以获得混合粉末,模塑混合粉末,并在非氧化性气氛中在1600℃至2200℃的温度下烧结该模制品。
    • 4. 发明授权
    • Silicon nitride sintered body and process for producing the same
    • 氮化硅烧结体及其制造方法
    • US5275772A
    • 1994-01-04
    • US957506
    • 1992-10-05
    • Takehisa YamamotoTakao NishiokaKenji MatsunumaAkira YamakawaMasaya Miyake
    • Takehisa YamamotoTakao NishiokaKenji MatsunumaAkira YamakawaMasaya Miyake
    • C04B35/593C04B35/597C04B35/58
    • C04B35/5935C04B35/597
    • The present invention relates to a silicon nitride sintered body [wherein the composition of Si.sub.3 N.sub.4 -first aid (Y.sub.2 O.sub.3 +MgO)-second aid (at least one of Al.sub.2 O.sub.3 and AlN)] falls within a range defined by lines joining points A, B, C and D in FIG. 1, the crystal phase of the sintered body contains both .alpha.-Si.sub.3 N.sub.4 and .beta.'-sialon, and the relative density is 98% or more. This sintered body is produced by subjecting a green compact of the above-described source to primary sintering in a nitrogen gas atmosphere at 1300 to 1700.degree. C. so that the relative density reaches 96% or more, and the precipitation ratio of the .alpha.-Si.sub.3 N.sub.4 crystal phases to the .beta.'-sialon crystal phase in the sintered body is in the range of from 40:60 to 80:20; and then subjecting the primary sintered body to secondary sintering in a nitrogen gas atmosphere at 1300 to 1700.degree. C. so that the relative density reaches 98% or more. The sintered body has superior strength properties, especially at ordinary temperatures, and can be produced with a high productivity in a high yield at a low cost.
    • 本发明涉及一种氮化硅烧结体[其中,Si 3 N 4 - 急救(Y 2 O 3 + MgO) - 辅助剂(Al 2 O 3和AlN中的至少一种)的组成]落在由连接点A,B, C和D。 如图1所示,烧结体的结晶相含有α-Si 3 N 4和β'-Sialon,相对密度为98%以上。 该烧结体是通过使上述源的生坯在1300〜1700℃的氮气气氛中进行一次烧结而制成的,使得相对密度达到96%以上, Si3N4晶相与烧结体中的β' - 赛隆结晶相的比例范围为40:60至80:20; 然后在1300〜1700℃的氮气气氛中使一次烧结体进行二次烧结,使得相对密度达到98%以上。 该烧结体具有优异的强度特性,特别是在普通温度下,可以低成本高产率地以高生产率生产。
    • 9. 发明授权
    • Electromagnetic actuator and valve-open-close mechanism
    • 电磁执行器和开阀机构
    • US06367433B2
    • 2002-04-09
    • US09731027
    • 2000-12-07
    • Hitoshi OyamaTakao NishiokaKenji MatsunumaHisanori Ohara
    • Hitoshi OyamaTakao NishiokaKenji MatsunumaHisanori Ohara
    • F01L904
    • F01L3/04F01L1/462F01L3/02F01L3/10F01L9/04Y10S977/725Y10S977/777
    • A valve-open-close mechanism is proposed which has parts designed to reduce friction during sliding. The electromagnetic actuator comprises a pair of electromagnets each having a stator and a coil opposed to each other with a gap therebetween, an armature disposed in the gap, and a first stem for transmitting to external the movement of said armature. A retainer and a first return spring are provided on the valve. A second stem is provided at other side of the armature and another retainer and a second return spring are provided for the second stem. A coating film is formed on at least one of the surface or end face of the stem portion of the valve, end faces of the first return spring or second return spring, spring bearing end faces of the retainers, surface or end face of the second stem, and the surface of the armature.
    • 提出了一种阀门开闭机构,其具有旨在减少滑动期间的摩擦的部件。 电磁致动器包括一对电磁体,每个电磁体具有彼此相对的定子和线圈,间隔开的电枢,设置在间隙中的电枢和用于向外部传递所述电枢的运动的第一杆。 在阀上设有保持器和第一复位弹簧。 第二杆设置在电枢的另一侧,为第二杆提供另一保持器和第二复位弹簧。 在阀的杆部的表面或端面中的至少一个上形成涂膜,第一复位弹簧或第二复位弹簧的端面,保持器的弹簧支承端面,第二复位弹簧的表面或端面 杆和电枢的表面。
    • 10. 发明授权
    • Method of machining silicon nitride ceramics and silicon nitride
ceramics products
    • 氮化硅陶瓷和氮化硅陶瓷制品的加工方法
    • US5297365A
    • 1994-03-29
    • US921255
    • 1992-07-29
    • Takao NishiokaKenji MatsunumaAkira Yamakawa
    • Takao NishiokaKenji MatsunumaAkira Yamakawa
    • B24B1/00B24B7/22B24B19/22B24D3/00C04B35/584
    • B24B19/22B24B1/00
    • An industrially feasible method of grinding silicon nitride ceramics, is disclosed and provides a sufficiently smooth surface. Namely, the surface has a maximum height-roughness Rmax of 0.1 microns or less and a ten-point mean roughness Rz of 0.05 microns. Further, with this method, surface damage can be repaired while grinding. The vertical cutting feed rate of a grinding wheel into a workpiece should be within the range of 0.005-0.1 micron for each rotation of the working surface of the wheel and change linearly or stepwise. The cutting speed of the grinding wheel in a horizontal (rotational) direction should be within the range of 25 to 75 m/sec. With this arrangement, the contact pressure and grinding heat that is generated between the workpiece and the hard abrasive grains during grinding are combined. In other words, mechanical and thermal actions are combined.
    • 公开了一种工业上可行的研磨氮化硅陶瓷的方法,并提供了足够光滑的表面。 即,表面的最大高度粗糙度Rmax为0.1微米以下,十点平均粗糙度Rz为0.05微米。 此外,通过该方法,可以在磨削时修复表面损伤。 砂轮进入工件的垂直切削进给速率应在车轮工作表面的每次旋转时在0.005-0.1微米的范围内,并且线性或逐步改变。 砂轮在水平(旋转)方向上的切割速度应在25至75米/秒的范围内。 通过这种布置,在磨削期间在工件和硬磨粒之间产生的接触压力和磨削热被组合。 换句话说,组合了机械和热动作。