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1. 发明授权

US06950596B2 Variable optical attenuator 失效
标题翻译：可变光衰减器
公开(公告)号：US06950596B2
公开(公告)日：2005-09-27
申请号：US10716904
申请日：2003-11-19
申请人： Akira Yahagi , Shigeru Kasai , Tatsumi Ide , Michikazu Kondo
发明人： Akira Yahagi , Shigeru Kasai , Tatsumi Ide , Michikazu Kondo
IPC分类号： G02B26/02 , B81B3/00 , B81B7/04 , G02B6/26 , G20B6/26
CPC分类号： G02B6/266
摘要： A variable optical attenuator comprises an incoming fiber for propagating an incoming light beam, a mirror for reflecting the incoming light beam as a reflected light beam and an outgoing fiber for propagating as an outgoing light beam at least one part of the reflected light beam. The light intensity of the outgoing light beam is determined by the angle of reflection at the mirror. The angle of reflection at the mirror is adjusted by an actuator for rotating the mirror. The actuator comprises a plate, a coil, a housing and permanents magnets. The mirror and the coil are fixed on the plate. The housing supports the plate so that the plate is able to rotate around a rotation axis, which is included on a predetermined plane. The permanent magnets are fixed on the housing and generate predetermined magnetic flux density along the predetermined plane. When a driving current is supplied to the coil under the predetermined magnetic flux density, a Lorentz force occurs at the coil so as to rotate the coil. Together with the coil, the mirror rotates so that the light intensity of the outgoing light beam can be adjusted.
摘要翻译：可变光衰减器包括用于传播入射光束的入射光纤，用于反射作为反射光束的入射光束的反射镜和用于作为输出光束传播至少一部分反射光束的输出光纤。出射光束的光强度由反射镜的反射角决定。通过用于旋转镜子的致动器来调节镜子处的反射角度。致动器包括板，线圈，壳体和永磁体。镜子和线圈固定在板上。壳体支撑板，使得板能够绕包含在预定平面上的旋转轴线旋转。永久磁铁被固定在壳体上并沿预定平面产生预定的磁通密度。当以预定的磁通密度向线圈提供驱动电流时，在线圈处产生洛仑兹力以使线圈旋转。与线圈一起，镜子旋转，从而可以调节出射光束的光强度。

2. 发明申请

US20050264386A1 Electromagnetic relay 有权
标题翻译：电磁继电器
公开(公告)号：US20050264386A1
公开(公告)日：2005-12-01
申请号：US11137453
申请日：2005-05-26
申请人： Yoshifumi Chida , Kei Chiba , Tatsumi Ide , Shigeru Kasai
发明人： Yoshifumi Chida , Kei Chiba , Tatsumi Ide , Shigeru Kasai
IPC分类号： H01H50/56 , H01H50/04 , H01H50/26 , H01H50/54 , H01H50/64 , H01H67/02
CPC分类号： H01H50/546
摘要： An electromagnetic relay is provided which is small in size and is capable of controlling two circuits of an ordinarily-open contact, which has a large current-carrying capacity and high interrupting capability, and which is excellent in resistance against shock and vibration. Movable contactors are held, through bow-shaped movable contactor springs, to two -shaped holding frames each being electrically separated and being mechanically connected via a card made of a highly heat-resistant resin in a card block. Thick-plate shaped movable contacts, which are attached to the movable contactors in a fixed manner, are electrically connected or disconnected to fixed contacts in a base block, in synchronization with operations of an armature of an electro-magnet block. In order to improve a current-carrying capability and interrupting capability, there are provided two pieces of ordinarily-open contacts which are connected in series to each other, and between which an interval is doubled, in each of two circuits.
摘要翻译：提供了一种电磁继电器，其尺寸小，并且能够控制具有大的载流能力和高中断能力的通常开路触点的两个电路，并且具有优异的抗冲击和振动性。可移动接触器通过弓形活动接触器弹簧固定到两个形状的保持框架各自电气分离，并通过卡片块中由高耐热树脂制成的卡片机械连接。与电磁块的电枢的操作同步地，以固定的方式附接到活动接触器的厚板形可动触头与基座中的固定触点电连接或断开。为了提高载流能力和中断能力，在两个电路中的每一个中提供两个彼此串联连接的通常开路的触点，并且间隔被加倍。

3. 发明授权

US07372350B2 Electromagnetic relay 有权
标题翻译：电磁继电器
公开(公告)号：US07372350B2
公开(公告)日：2008-05-13
申请号：US11137453
申请日：2005-05-26
申请人： Yoshifumi Chida , Kei Chiba , Tatsumi Ide , Shigeru Kasai
发明人： Yoshifumi Chida , Kei Chiba , Tatsumi Ide , Shigeru Kasai
IPC分类号： H01H67/02
CPC分类号： H01H50/546
摘要： An electromagnetic relay is provided which is small in size and is capable of controlling two circuits of an ordinarily-open contact, which has a large current-carrying capacity and high interrupting capability, and which is excellent in resistance against shock and vibration. Movable contactors are held, through bow-shaped movable contactor springs, to two -shaped holding frames each being electrically separated and being mechanically connected via a card made of a highly heat-resistant resin in a card block. Thick-plate shaped movable contacts, which are attached to the movable contactors in a fixed manner, are electrically connected or disconnected to fixed contacts in a base block, in synchronization with operations of an armature of an electro-magnet block. In order to improve a current-carrying capability and interrupting capability, there are provided two pieces of ordinarily-open contacts which are connected in series to each other, and between which an interval is doubled, in each of two circuits.
摘要翻译：提供了一种电磁继电器，其尺寸小，并且能够控制具有大的载流能力和高中断能力的通常开路触点的两个电路，并且具有优异的抗冲击和振动性。可移动接触器通过弓形活动接触器弹簧固定到两个形状的保持框架各自电气分离，并通过卡片块中由高耐热树脂制成的卡片机械连接。与电磁块的电枢的操作同步地，以固定的方式附接到活动接触器的厚板形可动触头与基座中的固定触点电连接或断开。为了提高载流能力和中断能力，在两个电路中的每一个中提供两个彼此串联连接的通常开路的触点，并且间隔被加倍。

4. 发明授权

US06483395B2 Micro-machine (MEMS) switch with electrical insulator 失效
标题翻译：具有电绝缘子的微机（MEMS）开关
公开(公告)号：US06483395B2
公开(公告)日：2002-11-19
申请号：US09809975
申请日：2001-03-16
申请人： Shigeru Kasai , Kenichirou Suzuki , Yoshinori Ota , Tatsumi Ide
发明人： Shigeru Kasai , Kenichirou Suzuki , Yoshinori Ota , Tatsumi Ide
IPC分类号： H01P110
CPC分类号： H01P1/12 , H01H1/20 , H01H59/0009 , H01H2001/0084
摘要： A micro-machine switch which causes a contact electrode to make contact with or separate away from a signal line formed on a substrate, to thereby turn on or off the signal line, includes (a) first to N-th lower electrodes formed on the substrate, wherein N is an integer equal to or greater than 2, (b) first to N-th upper electrodes supported facing the first to N-th lower electrodes, respectively, and (c) an electrode supporter for vertically raising and lowering the first to N-th upper electrodes between a first position where the contact electrode makes contact with the signal line when electrostatic force is generated between the first to N-th upper electrodes and the first to N-th lower electrodes, respectively, and a second position where the contact electrode is separated away from the signal line when the electrostatic force is not generated.
摘要翻译：使接触电极与形成在基板上的信号线接触或分离的微机开关，从而导通或断开信号线，包括：（a）形成在第一至第N下电极上的第一至第N下电极，衬底，其中N是等于或大于2的整数，（b）分别面向第一至第N下电极被支撑的第一至第N上电极，以及（c）用于垂直升高和降低第一至第N上电极，分别在第一至第N上电极和第一至第N下电极之间产生静电力时，接触电极与信号线接触的第一位置，第二至第N上电极当不产生静电力时接触电极与信号线分离的位置。

5. 发明授权

US09543123B2 Plasma processing apparatus and plasma generation antenna 有权
标题翻译：等离子体处理装置和等离子体生成天线
公开(公告)号：US09543123B2
公开(公告)日：2017-01-10
申请号：US13435552
申请日：2012-03-30
申请人： Taro Ikeda , Tomohito Komatsu , Shigeru Kasai
发明人： Taro Ikeda , Tomohito Komatsu , Shigeru Kasai
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H01J37/32 , C23C16/455 , H05H1/46 , C23C16/511
CPC分类号： H01J37/3222 , C23C16/45565 , C23C16/511 , H01J37/32211 , H01J37/32229 , H01J37/3244 , H01J37/32449 , H05H1/46 , H05H2001/463
摘要： A plasma generation antenna and a plasma processing apparatus can supply a gas and an electromagnetic wave effectively. A plasma processing apparatus 10 includes a processing chamber 100 in which a plasma process is performed; a wavelength shortening plate 480 configured to transmit an electromagnetic wave; and a plasma generation antenna 200 having a shower head 210 provided adjacent to the wavelength shortening plate 480. The shower head 210 is made of a conductor, and has a multiple number of gas holes 215 and a multiple number of slots 220 through which the electromagnetic wave passes. The slots 220 are provided at positions isolated from the gas holes 215.
摘要翻译：等离子体发生天线和等离子体处理装置可以有效地提供气体和电磁波。等离子体处理装置10包括其中执行等离子体处理的处理室100; 构造成透射电磁波的波长缩短板480; 以及等离子体产生天线200，其具有与波长缩短板480相邻设置的淋浴喷头210.喷头210由导体制成，并具有多个气孔215和多个槽220，电磁波通。槽220设置在与气孔215隔开的位置处。

6. 发明申请

US20120328273A1 HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD 审中-公开
标题翻译：热处理设备和热处理方法
公开(公告)号：US20120328273A1
公开(公告)日：2012-12-27
申请号：US13524023
申请日：2012-06-15
申请人： Hisashi KAWANO , Ryouichi Uemura , Kousuke Yoshihara , Shigeru Kasai , Keiji Tanouchi , Makoto Muramatsu , Mitsuaki Iwashita , Masatake Yoneda , Kazuhiro Ooya
发明人： Hisashi KAWANO , Ryouichi Uemura , Kousuke Yoshihara , Shigeru Kasai , Keiji Tanouchi , Makoto Muramatsu , Mitsuaki Iwashita , Masatake Yoneda , Kazuhiro Ooya
IPC分类号： H05B6/00
CPC分类号： H01L21/67115 , H05B3/0033
摘要： Disclosed is a thermal processing apparatus and method that can acquire a high throughput and reduce the occupation area of the thermal processing apparatus. A wafer is heated by an LED module that irradiates infrared light corresponding to the absorption wavelength of the wafer, and therefore, the wafer can be rapidly heated. Since an LED is used as a heat source and a temperature rise of LED is small, a cooling process after the heating process can be performed in the same process area as the heating process area. As a result, an installation area of the thermal processing apparatus can be reduced. Since the time for moving between a heating process area and a cooling process area can be saved, a time required for a series of processes including the heating process and the subsequent cooling process can be shortened, thereby improving a throughput.
摘要翻译：公开了一种可以获得高产量并减少热处理装置的占用面积的热处理装置和方法。通过照射与晶片的吸收波长相对应的红外光的LED模块对晶片进行加热，因此可以快速加热晶片。由于将LED用作热源并且LED的温度升高很小，因此可以在与加热处理区域相同的处理区域中进行加热处理之后的冷却处理。结果，可以减少热处理装置的安装面积。由于可以节省在加热处理区域和冷却处理区域之间移动的时间，因此可以缩短包括加热处理和随后的冷却处理的一系列处理所需的时间，从而提高生产量。

7. 发明申请

US20120287526A1 BREAKDOWN PREDICTION DEVICE, BREAKDOWN PREDICTION METHOD, AND BREAKDOWN PREDICTION PROGRAM 有权
标题翻译：预测预测设备，预测预测方法和预测预测程序
公开(公告)号：US20120287526A1
公开(公告)日：2012-11-15
申请号：US13574141
申请日：2011-01-20
申请人： Shigeru Kasai , Yasuhiro Sasaki , Hiroshi Sakai
发明人： Shigeru Kasai , Yasuhiro Sasaki , Hiroshi Sakai
IPC分类号： G11B27/36
CPC分类号： G11B20/10009 , G11B19/048 , G11B20/10027 , G11B20/10314 , G11B20/1816 , G11B27/36 , G11B2220/2516
摘要： A breakdown prediction device of the present invention includes: a vibration measurement unit that measures vibrations generated from a device being monitored; and a signal processing unit that performs breakdown prediction when a specific vibration is measured at the vibration measurement unit, a maximum vibration amplitude value of the vibration exceeding an upper limit vibration amplitude threshold, and a vibration amplitude value thereof being below a lower limit vibration amplitude threshold at a point in time when a specified time is reached from a point in time when the vibration exceeds the upper limit vibration amplitude threshold.
摘要翻译：本发明的故障预测装置包括：振动测量单元，其测量从被监视的设备产生的振动; 以及信号处理单元，其在所述振动测量单元处测量特定振动时执行击穿预测，所述振动的最大振动振幅值超过上限振幅阈值，并且其振动振幅值低于下限振幅在振动超过上限振幅阈值的时间点达到指定时间的时间点的阈值。

8. 发明申请

US20120247390A1 FILM FORMATION APPARATUS 审中-公开
标题翻译：胶片形成装置
公开(公告)号：US20120247390A1
公开(公告)日：2012-10-04
申请号：US13496794
申请日：2010-08-30
申请人： Ikuo Sawada , Song Yun Kang , Masaaki Matsukuma , Shigeru Kasai , Masato Morishima
发明人： Ikuo Sawada , Song Yun Kang , Masaaki Matsukuma , Shigeru Kasai , Masato Morishima
IPC分类号： C23C16/50 , C23C16/505 , C23C16/511
CPC分类号： C23C16/4412 , C23C16/452 , C23C16/45502 , C23C16/45574 , C23C16/509 , H01J37/32082 , H01J37/32431 , H01J37/3244 , H01J37/32568 , H01J37/32633
摘要： Disclosed is a film formation apparatus (1a) that forms a thin film upon a substrate (S), wherein partitions (41) separate the space above the substrate (S) into a plasma generation space (401) and an exhaust space (402) and extend downward from the ceiling of the processing container (10) to form an opening between the substrate (S) and the bottom end of the partitions, in which gas flows from the plasma generation space (401) to the exhaust space (402). An activating mechanism (42, 43) generates plasma by activating a first reactant gas that has been supplied to the plasma generation space (401). A second reactant gas supply section (411, 412) supplies a second reactant gas to the bottom of the plasma generation space (401), and an evacuation opening (23) evacuates the exhaust space (402) from a position that is higher than the bottom end of the partitions (41).
摘要翻译：公开了一种在基板（S）上形成薄膜的成膜装置（1a），其中隔板（41）将基板（S）上方的空间分离成等离子体产生空间（401）和排气空间（402）并且从处理容器（10）的天花板向下延伸，以形成基板（S）和分隔壁的底端之间的开口，其中气体从等离子体产生空间（401）流到排气空间（402）。激活机构（42,43）通过激活已经供应到等离子体产生空间（401）的第一反应气体产生等离子体。第二反应气体供给部（411,412）将第二反应气体供给到等离子体产生空间（401）的底部，排气口（23）将排气空间（402）从高于分区（41）的底端。

9. 发明申请

US20120211486A1 MICROWAVE IRRADIATION APPARATUS 有权
标题翻译：微波辐射装置
公开(公告)号：US20120211486A1
公开(公告)日：2012-08-23
申请号：US13399163
申请日：2012-02-17
申请人： Shigeru Kasai , Ryoji Yamazaki , Mitsutoshi Ashida , Yuji Obata , Sumi Tanaka
发明人： Shigeru Kasai , Ryoji Yamazaki , Mitsutoshi Ashida , Yuji Obata , Sumi Tanaka
IPC分类号： H05B6/66 , H05B6/64
CPC分类号： H01L21/67017 , H01L21/67109 , H01L21/67115 , H01L21/67248 , H05B6/806
摘要： There is provided a microwave irradiation apparatus capable of independently controlling a temperature of a target object while irradiating microwave to the target object. The microwave irradiation apparatus 2 includes a processing chamber 4 configured to be vacuum-evacuated; a supporting table 6 configured to support the target object; a processing gas introduction unit 106 configured to introduce a processing gas into the processing chamber; a microwave introduction unit 72 configured to introduce the microwave into the processing chamber; a heating unit 16 configured to heat the target object; a gas cooling unit 104 configured to cool the target object by a cooling gas; a radiation thermometer 64 configured to measure a temperature of the target object; and a temperature control unit 70 configured to adjust the temperature of the target object by controlling the heating unit and the gas cooling unit based on the temperature measured by the radiation thermometer.
摘要翻译：提供了一种能够在向目标物体照射微波的同时独立地控制目标物体的温度的微波照射装置。微波照射装置2包括被真空抽真空的处理室4。配置为支撑目标物体的支撑台6; 处理气体导入单元106，被配置为将处理气体引入到处理室中; 微波引入单元72，被配置为将微波引入处理室; 配置为加热目标物体的加热单元16; 构造成通过冷却气体对目标物体进行冷却的气体冷却单元104; 被配置为测量目标物体的温度的辐射温度计64; 以及温度控制单元70，其被配置为基于由辐射温度计测量的温度来控制加热单元和气体冷却单元来调节目标物体的温度。

10. 发明授权

US08246900B2 Annealing apparatus 有权
标题翻译：退火设备
公开(公告)号：US08246900B2
公开(公告)日：2012-08-21
申请号：US12440034
申请日：2007-08-31
申请人： Shigeru Kasai , Hiroyuki Miyashita , Masatake Yoneda , Tomohiro Suzuki , Sumi Tanaka , Masamichi Nomura , Miwa Shimizu
发明人： Shigeru Kasai , Hiroyuki Miyashita , Masatake Yoneda , Tomohiro Suzuki , Sumi Tanaka , Masamichi Nomura , Miwa Shimizu
IPC分类号： H01L21/26 , C21D1/74
CPC分类号： H01L21/67115 , H01L21/67109 , H01L31/1864 , Y02E10/50 , Y02P70/521
摘要： Provided is an annealing apparatus, which is free from a problem of reduced light energy efficiency resulted by the reduction of light emission amount due to a heat generation and capable of maintaining stable performance. The apparatus includes: a processing chamber 1 for accommodating a wafer W; heating sources 17a and 17b including LEDs 33 and facing the surface of the wafer W to irradiate light on the wafer W; light-transmitting members 18a and 18b arranged in alignment with the heating sources 17a and 17b to transmit the light emitted from the LEDs 33; cooling members 4a and 4b supporting the light-transmitting members 18a and 18b at opposite side to the processing chamber 1 to make direct contact with the heating sources 17a and 17b and made of a material of high thermal conductivity; and a cooling mechanism for cooling the cooling members 4a and 4b with a coolant.
摘要翻译：提供一种退火装置，其不会由于发热而导致的发光量的降低而导致光能效率降低的问题，并且能够保持稳定的性能。该装置包括：用于容纳晶片W的处理室1; 加热源17a和17b包括LED33并面向晶片W的表面以将光照射在晶片W上; 与发热源17a和17b对准布置的透光部件18a和18b，以透射从LED33发出的光; 在与处理室1相反的一侧支撑透光部件18a和18b的冷却部件4a和4b与加热源17a和17b直接接触并由导热性高的材料制成; 以及用冷却剂冷却冷却部件4a，4b的冷却机构。

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