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1. 发明授权

US07195673B2 Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same 有权
公开(公告)号：US07195673B2
公开(公告)日：2007-03-27
申请号：US10735621
申请日：2003-12-16
申请人： Akira Shimizu , Yuhsuke Fukuoka , Yasushi Fujioka , Katsushi Kishimoto , Katsuhiko Nomoto
发明人： Akira Shimizu , Yuhsuke Fukuoka , Yasushi Fujioka , Katsushi Kishimoto , Katsuhiko Nomoto
IPC分类号： C23C16/00
CPC分类号： H01J37/32532 , C23C16/4583 , C23C16/5096
摘要： A plasma CVD apparatus comprises an anode electrode and a cathode electrode, and is for forming a thin film on a substrate by performing plasma discharge between the anode electrode and the cathode electrode, comprising: a substrate holder disposed between the anode electrode and the cathode electrode; and one conductive member disposed between the substrate holder and one electrode of either the anode electrode or the cathode electrode, wherein the substrate holder supports the substrate, the one conductive member is provided between the one electrode and the substrate holder so as to substantially cover an entire space between the one electrode and the substrate holder, and the one conductive member is electrically connected to the one electrode and the substrate holder.

2. 发明授权

US07565880B2 Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same 失效
标题翻译：等离子体CVD装置，以及用于形成膜的方法以及使用其形成半导体装置的方法
公开(公告)号：US07565880B2
公开(公告)日：2009-07-28
申请号：US11700895
申请日：2007-02-01
申请人： Akira Shimizu , Yuhsuke Fukuoka , Yasushi Fujioka , Katsushi Kishimoto , Katsuhiko Nomoto
发明人： Akira Shimizu , Yuhsuke Fukuoka , Yasushi Fujioka , Katsushi Kishimoto , Katsuhiko Nomoto
IPC分类号： C23C16/00
CPC分类号： H01J37/32532 , C23C16/4583 , C23C16/5096
摘要： A plasma CVD apparatus comprises an anode electrode and a cathode electrode, and is for forming a thin film on a substrate by performing plasma discharge between the anode electrode and the cathode electrode, comprising: a substrate holder disposed between the anode electrode and the cathode electrode; and one conductive member disposed between the substrate holder and one electrode of either the anode electrode or the cathode electrode, wherein the substrate holder supports the substrate, the one conductive member is provided between the one electrode and the substrate holder so as to substantially cover an entire space between the one electrode and the substrate holder, and the one conductive member is electrically connected to the one electrode and the substrate holder.
摘要翻译：等离子体CVD装置包括阳极电极和阴极电极，用于通过在阳极电极和阴极电极之间执行等离子体放电来在衬底上形成薄膜，其包括：设置在阳极电极和阴极之间的衬底保持器 ; 以及设置在所述基板保持件和所述阳极电极或所述阴极电极的一个电极之间的一个导电部件，其中，所述基板保持器支撑所述基板，所述一个导电部件设置在所述一个电极和所述基板保持件之间，一个电极和衬底保持器之间的整个空间，并且一个导电构件电连接到一个电极和衬底保持器。

3. 发明申请

US20070131170A1 Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same 失效
标题翻译：等离子体CVD装置，以及用于形成膜的方法以及使用其形成半导体装置的方法
公开(公告)号：US20070131170A1
公开(公告)日：2007-06-14
申请号：US11700895
申请日：2007-02-01
申请人： Akira Shimizu , Yuhsuke Fukuoka , Yasushi Fujioka , Katsushi Kishimoto , Katsuhiko Nomoto
发明人： Akira Shimizu , Yuhsuke Fukuoka , Yasushi Fujioka , Katsushi Kishimoto , Katsuhiko Nomoto
IPC分类号： C23C16/00
CPC分类号： H01J37/32532 , C23C16/4583 , C23C16/5096
摘要： A plasma CVD apparatus comprises an anode electrode and a cathode electrode, and is for forming a thin film on a substrate by performing plasma discharge between the anode electrode and the cathode electrode, comprising: a substrate holder disposed between the anode electrode and the cathode electrode; and one conductive member disposed between the substrate holder and one electrode of either the anode electrode or the cathode electrode, wherein the substrate holder supports the substrate, the one conductive member is provided between the one electrode and the substrate holder so as to substantially cover an entire space between the one electrode and the substrate holder, and the one conductive member is electrically connected to the one electrode and the substrate holder.
摘要翻译：等离子体CVD装置包括阳极电极和阴极电极，用于通过在阳极电极和阴极电极之间执行等离子体放电来在衬底上形成薄膜，其包括：设置在阳极电极和阴极之间的衬底保持器 ; 以及设置在所述基板保持件和所述阳极电极或所述阴极电极的一个电极之间的一个导电部件，其中，所述基板保持器支撑所述基板，所述一个导电部件设置在所述一个电极和所述基板保持件之间，一个电极和衬底保持器之间的整个空间，并且一个导电构件电连接到一个电极和衬底保持器。

4. 发明申请

US20050022864A1 Manufacturing method of silicon thin film solar cell 审中-公开
标题翻译：硅薄膜太阳能电池的制造方法
公开(公告)号：US20050022864A1
公开(公告)日：2005-02-03
申请号：US10874365
申请日：2004-06-24
申请人： Yasushi Fujioka , Akira Shimizu , Hiroyuki Fukuda , Katsuhiko Nomoto
发明人： Yasushi Fujioka , Akira Shimizu , Hiroyuki Fukuda , Katsuhiko Nomoto
IPC分类号： C23C16/24 , C23C16/515 , H01L31/04 , H01L31/075 , H01L31/076 , H01L31/18 , H01L31/00
CPC分类号： H01L31/076 , C23C16/24 , C23C16/515 , H01L31/1824 , Y02E10/545 , Y02E10/548 , Y02P70/521
摘要： To uniformly form a silicon thin film for a solar cell, having an i layer formed with crystalline silicon, on a substrate of a large area to provide a high power solar cell, in a manufacturing method of a silicon thin film solar cell, a silicon thin film, having a structure such that an i layer is sandwiched between a p layer and an n layer, is formed on a substrate with a high frequency plasma CVD method, wherein i layer is formed with crystalline silicon using plasma with pulse-modulated high frequency power, one cycle of pulse modulation includes an ON state for outputting high frequency power and an OFF state for not outputting, an output waveform is modulated to be rectangular, a time of the ON state is 1-100 microseconds, and a time of the OFF state is 5 microseconds or longer.
摘要翻译：为了在硅薄膜太阳能电池的制造方法中均匀地形成具有由晶体硅形成的i层的太阳能电池用硅薄膜，在大面积的基板上提供高功率太阳能电池，硅在具有高频等离子体CVD法的基板上形成具有使i层夹在p层和n层之间的结构的薄膜，其中i层使用具有脉冲调制高频的等离子体形成晶体硅电源中，脉冲调制的一个周期包括用于输出高频电源的ON状态和不输出的OFF状态，输出波形被调制为矩形，ON状态的时间为1-100微秒，时间为 OFF状态为5微秒以上。

5. 发明授权

US09109276B2 Cylindrical internal surface processing method 有权
标题翻译：圆柱内表面处理方法
公开(公告)号：US09109276B2
公开(公告)日：2015-08-18
申请号：US12885026
申请日：2010-09-17
申请人： Koichi Kanai , Kiyokazu Sugiyama , Eiji Shiotani , Kimio Nishimura , Junichi Uchiyama , Kiyohisa Suzuki , Jun Inomata , Daisuke Terada , Akira Shimizu , Hidenobu Matsuyama , Kiyoshi Hasegawa , Takashi Iiya
发明人： Koichi Kanai , Kiyokazu Sugiyama , Eiji Shiotani , Kimio Nishimura , Junichi Uchiyama , Kiyohisa Suzuki , Jun Inomata , Daisuke Terada , Akira Shimizu , Hidenobu Matsuyama , Kiyoshi Hasegawa , Takashi Iiya
IPC分类号： C23C4/18 , C23C4/12 , C23C4/16 , F02F1/00 , B05B7/22 , B05B13/06
CPC分类号： C23C4/124 , B05B7/224 , B05B13/0636 , C23C4/12 , C23C4/129 , C23C4/16 , C23C4/18 , F02F1/00 , F05C2253/12 , Y10T29/49272 , Y10T428/13
摘要： A cylindrical internal surface processing method comprises forming a cylinder bore, roughening an upper section of the bore, depositing coating onto the bore, and machining a lower section of the bore and the coating. The forming of the cylinder bore includes forming the upper and lower sections with the lower section being axially spaced from the upper section and having an axial length greater than zero. The roughening creates a roughened surface such that a radially innermost edge of the roughened surface has an internal diameter smaller than an internal diameter of the lower section. The coating is deposited to cover the upper section and at least a portion of the lower section. The machining forms a tapered portion and a cylindrical portion, a radially outermost edge of the cylindrical portion having an internal diameter larger than that of a radially outermost edge of the roughened surface.
摘要翻译：圆柱形内表面处理方法包括形成气缸孔，使孔的上部部分粗糙化，在孔上沉积涂层，以及加工孔的下部和涂层。缸孔的形成包括形成上部和下部，其中下部与上部轴向间隔开并具有大于零的轴向长度。粗糙化产生粗糙表面，使得粗糙表面的径向最内边缘具有小于下部内径的内径。沉积涂层以覆盖上部和下部的至少一部分。加工形成锥形部分和圆柱形部分，圆柱形部分的径向最外边缘的内径大于粗糙表面的径向最外边缘的内径。

6. 发明申请

US20150169591A1 DATABASE MANAGEMENT SYSTEM, COMPUTER, AND DATABASE MANAGEMENT METHOD 审中-公开
标题翻译：数据库管理系统，计算机和数据库管理方法
公开(公告)号：US20150169591A1
公开(公告)日：2015-06-18
申请号：US14402878
申请日：2012-05-24
申请人： Michiko Yoshida , Akira Shimizu , Seisuke Tokuda , Kazuhiko Mogi , Shinji Fujiwara , Nobuo Kawamura , Masaru Kitsuregawa , Kazuo Goda
发明人： Michiko Yoshida , Akira Shimizu , Seisuke Tokuda , Kazuhiko Mogi , Shinji Fujiwara , Nobuo Kawamura , Masaru Kitsuregawa , Kazuo Goda
IPC分类号： G06F17/30
CPC分类号： G06F16/252 , G06F16/24532 , G06F16/2455 , G06F16/24569
摘要： A database management system (DBMS) manages a database existing in a second storage device with an access speed lower than that of a first storage device. In an execution of a query, the DBMS dynamically generates tasks two or more executable tasks in parallel. The DBMS generates task start information which is information representing a content of the execution of the task, manages the task start information, and executes a content represented by the task start information by the task. The task start information includes a data address set existing in the second storage device. The DBMS controls movement of the data address sets between the first storage device and the second storage device based on a management state of the task start information. In addition, the DBMS selects the task start information based on whether or not the data address set exists in the first storage device.
摘要翻译：数据库管理系统（DBMS）以比第一存储设备低的访问速度来管理第二存储设备中存在的数据库。在执行查询时，DBMS并行动态生成任务两个或多个可执行任务。 DBMS生成作为任务执行内容的信息的任务开始信息，管理该任务开始信息，并执行任务开始信息所表示的内容。任务开始信息包括存在于第二存储装置中的数据地址集。 DBMS基于任务开始信息的管理状态，控制第一存储装置与第二存储装置之间的数据地址集的移动。另外，DBMS根据第一存储装置中是否存在数据地址组来选择任务开始信息。

7. 发明申请

US20130159303A1 COMPUTER SYSTEM, DATA RETRIEVAL METHOD AND DATABASE MANAGEMENT COMPUTER 有权
标题翻译：计算机系统，数据检索方法和数据库管理计算机
公开(公告)号：US20130159303A1
公开(公告)日：2013-06-20
申请号：US13814989
申请日：2011-02-24
申请人： Kazutomo Ushijima , Akira Shimizu , Seisuke Tokuda , Michiko Tanaka , Nobuo Kawamura , Norihiro Hara
发明人： Kazutomo Ushijima , Akira Shimizu , Seisuke Tokuda , Michiko Tanaka , Nobuo Kawamura , Norihiro Hara
IPC分类号： G06F17/30
CPC分类号： G06F17/30283 , G06F17/30339
摘要： A computer system, comprising: a computer for outputting a result in response to a request; and a storage system for storing data output based on the request, the computer including: a request reception module for receiving the request; a processing procedure generation module for generating a plurality of processing procedures including an order of access to the data stored in the plurality of storage devices; a data division module for dividing the data; an information obtaining module for obtaining load information indicating a load condition of the storage system; an allotment determination module for determining, based on the obtained load information, allotments for allocating the divided data to be processed by the generated plurality of processing procedures; and a processing execution module for executing, based on the determined allotments, the generated plurality of processing procedures in parallel.
摘要翻译：一种计算机系统，包括：用于响应于请求输出结果的计算机; 以及存储系统，用于存储基于所述请求输出的数据，所述计算机包括：用于接收所述请求的请求接收模块; 处理过程生成模块，用于生成包括访问存储在所述多个存储装置中的数据的顺序的多个处理过程; 数据分割模块，用于分割数据; 信息获取模块，用于获取指示所述存储系统的负载状况的负载信息; 分配确定模块，用于基于所获得的负载信息，确定用于分配由所生成的多个处理过程来处理的划分数据的分配; 以及处理执行模块，用于基于所确定的分配，并行地执行生成的多个处理过程。

8. 发明申请

US20130084714A1 Method for Forming Single-Phase Multi-Element Film by PEALD 有权
标题翻译： PEALD形成单相多元膜的方法
公开(公告)号：US20130084714A1
公开(公告)日：2013-04-04
申请号：US13250721
申请日：2011-09-30
申请人： Takahiro Oka , Akira Shimizu
发明人： Takahiro Oka , Akira Shimizu
IPC分类号： H01L21/31
CPC分类号： C23C16/401 , C23C16/30 , C23C16/45536 , H01L21/02126 , H01L21/02164 , H01L21/02167 , H01L21/02274 , H01L21/0228
摘要： A method for forming a single-phase multi-element film on a substrate in a reaction zone by PEALD repeating a single deposition cycle. The single deposition cycle includes: adsorbing a precursor on the substrate in the absence of reactant and plasma; decomposing the precursor adsorbed on the substrate by an inert gas plasma; and reacting the decomposed precursor with a reactant gas plasma in the presence of the inert gas plasma. The multi-element film contains silicon and at least two non-metal elements constituting a matrix of the film, the precursor contains silicon and optionally at least one non-metal element to be incorporated in the matrix, and the reactant gas contains at least one non-metal element to be incorporated in the matrix.
摘要翻译：一种通过重复单个沉积循环的PEALD在反应区中在衬底上形成单相多元素膜的方法。单个沉积循环包括：在不存在反应物和等离子体的情况下在基底上吸附前体; 通过惰性气体等离子体分解吸附在基板上的前体; 并在惰性气体等离子体存在下使分解的前体与反应气体等离子体反应。多元素膜含有硅和构成膜的基质的至少两种非金属元素，前体含有硅和任选的至少一种待掺入基质的非金属元素，并且反应物气体含有至少一种非金属元素加入基质中。

9. 发明授权

US08283822B2 Small-sized motor 失效
标题翻译：小型电机
公开(公告)号：US08283822B2
公开(公告)日：2012-10-09
申请号：US12703372
申请日：2010-02-10
申请人： Daigo Kuraishi , Akira Shimizu
发明人： Daigo Kuraishi , Akira Shimizu
IPC分类号： H02K5/00 , H02K11/00
CPC分类号： H02K5/225 , H02K3/522 , H02K2203/03
摘要： A connection circuit board includes a main portion and a lead wire connecting portion. The main portion is positioned between an end portion of a motor case body and an end bracket. The lead wire connecting portion projects outwardly from the motor case body. A protective cap including a connecting portion receiving chamber for receiving the lead wire connecting portion of the connection circuit board is attached to the lead wire connecting portion through an engaging structure. An adhesive is filled in the connecting portion receiving chamber of the protective cap. In a small-sized motor of the above configuration, the protective cap can securely be fixed to the motor case.
摘要翻译：连接电路板包括主要部分和引线连接部分。主要部分位于马达壳体的端部和端托架之间。引线连接部从电动机壳体向外突出。包括用于接纳连接电路板的引线连接部分的连接部分接收室的保护盖通过接合结构附接到引线连接部分。粘合剂填充在保护盖的连接部分接收室中。在上述结构的小型电动机中，保护盖可以牢固地固定在电动机壳上。

10. 发明申请

US20120200951A1 CONTENT DUPLICATION DEVICE AND CONTENT DUPLICATION SYSTEM 审中-公开
标题翻译：内容复用设备和内容重用系统
公开(公告)号：US20120200951A1
公开(公告)日：2012-08-09
申请号：US13502019
申请日：2009-10-21
申请人： Takeshi Koda , Katsutoshi Inagaki , Akira Shimizu , Hirokazu Oishi , Masayoshi Yoshida , Tsuyoshi Hasebe , Tsuyoshi Namiki
发明人： Takeshi Koda , Katsutoshi Inagaki , Akira Shimizu , Hirokazu Oishi , Masayoshi Yoshida , Tsuyoshi Hasebe , Tsuyoshi Namiki
IPC分类号： G11B5/86
CPC分类号： G11B20/10 , G11B2020/10768 , G11B2020/10833 , G11B2220/2516 , G11B2220/2537
摘要： A duplication device is provided. When content is duplicated by recording, in a recording medium of a recording destination, the same content as content recorded in a recording medium of a duplication source, even if a reading speed is slower than a writing speed, the duplication device can reduce a duplication time as much as possible. The duplication device 100 reads a reading portion of content from an optical disc D in which content is recorded, and in parallel to this reading, downloads a transmission portion which includes a portion of content other than the reading portion, from a distribution server 200, and records the read reading portion and the downloaded transmission portion in the hard disc 106 at a speed faster than a speed of reading the reading portion.
摘要翻译：提供复制设备。当通过记录复制内容时，在记录目的地的记录介质中，与复制源的记录介质中记录的内容相同的内容，即使读取速度比写入速度慢，复制设备也可以减少重复时间尽可能多。复制装置100从记录有内容的光盘D读取内容的读取部分，并且与该读取并行地，从分发服务器200下载包含读取部分以外的内容的一部分的传输部分，并将阅读部分和下载的传输部分以比阅读部分读取速度快的速度记录在硬盘106中。

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