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1. 发明申请

WO2005064405A3 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：WO2005064405A3
公开(公告)日：2006-03-09
申请号：PCT/EP2004014282
申请日：2004-12-15
申请人： ASML NETHERLANDS BV , VAN SANTEN HELMAR , KOLESNYCHENKO ALEKSEY YURIEVIC
发明人： VAN SANTEN HELMAR , KOLESNYCHENKO ALEKSEY YURIEVIC
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/7085
摘要： A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system (PL), a barrier member (10) and a substrate. The barrier member (10) is not sealed such that, during use, immersion liquid (5) is allowed to flow out the space and between the barrier member (10) and the substrate (W).
摘要翻译：公开了一种用于浸没式光刻投影装置的液体供应系统，其中在投影系统（PL），阻挡构件（10）和基板之间限定空间。阻挡构件（10）不被密封，使得在使用期间，允许浸没液体（5）从空间以及阻挡构件（10）和基底（W）之间流出。

2. 发明申请

WO2005001572A3 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光刻设备和器件制造方法
公开(公告)号：WO2005001572A3
公开(公告)日：2005-04-21
申请号：PCT/EP2004006875
申请日：2004-06-25
申请人： ASML NETHERLANDS BV , KOLESNYCHENKO ALEKSEY YURIEVIC
发明人： KOLESNYCHENKO ALEKSEY YURIEVIC , VAN DER WERF JAN EVERT
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： Liquid is supplied to a space between the final element of the projection system and the substrate, but there is a space between the liquid and the substrate. An evanescent field is formed between the liquid and the substrate allowing some photons to expose the substrate. Due to the refractive index of the liquid, the resolution of the system is improved and liquid on the substrate is avoided.
摘要翻译：将液体供应到投影系统的最终元件和基板之间的空间，但液体和基板之间存在空间。在液体和衬底之间形成瞬逝场，允许一些光子暴露衬底。由于液体的折射率，系统的分辨率得到改善，避免了基板上的液体。

3. 发明专利

JP2009033201A Lithographic apparatus, and device manufacturing method 有权
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2009033201A
公开(公告)日：2009-02-12
申请号：JP2008274728
申请日：2008-10-24
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC分类号： H01L21/027 , G03F7/20 , H01L21/683
CPC分类号： G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要： PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT includes a drainage groove, i.e. a barrier 40 which surrounds an outer peripheral edge of the substrate W and a barrier 100 which surrounds another object 20 like a sensor present on substantially the same plane with a top surface of the substrate. The barriers 40 and 100 can collect any liquid which is spilt from the liquid supply system while the substrate W is exposed to reduce the risk of contamination of delicate components of the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。解决方案：衬底台WT包括排水槽，即围绕衬底W的外围边缘的阻挡层40，以及围绕另一物体20的阻挡层100，如同位于基本相同的平面上的传感器，顶表面的基底。屏障40和100可以收集从液体供应系统溢出的任何液体，同时暴露基板W，以降低光刻投影设备的精密部件污染的风险。版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2006191087A Imprint lithography 有权
标题翻译： IMPRINT LITHOGRAPHY
公开(公告)号：JP2006191087A
公开(公告)日：2006-07-20
申请号：JP2005377504
申请日：2005-12-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN SANTEN HELMAR , KOLESNYCHENKO ALEKSEY YURIEVIC
IPC分类号： H01L21/027
CPC分类号： G03F7/0002 , B41C1/10 , B82Y10/00 , B82Y40/00
摘要： PROBLEM TO BE SOLVED: To provide an imprinting method and an imprinting apparatus which can effectively utilize a substrate and an imprintable medium.
SOLUTION: According to an embodiment, the imprinting method comprises a step for bringing the imprintable medium on the substrate into contact with a template to form an imprint area in the medium, a step for removing at least a part of the imprintable medium existing outside the imprint area and a step for separating the template from the medium.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供可有效利用基板和可压印介质的压印方法和压印装置。解决方案：根据一个实施例，压印方法包括使可压印介质在基板上与模板接触以在介质中形成压印区域的步骤，用于去除可压印介质的至少一部分的步骤存在于印记区域之外，以及将模板与介质分离的步骤。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2005167211A Lithographic apparatus 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2005167211A
公开(公告)日：2005-06-23
申请号：JP2004311712
申请日：2004-10-27
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： CHRISTIAAN ALEXANDER HOOGENDAM , STREEFKERK BOB , MULKENS JOHANNES CATHARINUS HU , BIJLAART ERIK THEODORUS MARIA , KOLESNYCHENKO ALEKSEY YURIEVIC , LOOPSTRA ERIK ROELOF , MERTENS JEROEN JOHANNES SOPHIA , SLAGHEKKE BERNARDUS ANTONIUS , TINNEMANS PATRICIUS ALOYSIUS J , VAN SANTEN HELMAR
IPC分类号： G03F7/20 , B05C11/00 , G03B27/42 , G03B27/52 , H01L21/00 , H01L21/027
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： PROBLEM TO BE SOLVED: To provide a liquid supply system which minimizes voltage variation and/or temperature variation of liquid without causing unnecessary disturbance due to mechanical vibration, in a lithographic apparatus. SOLUTION: Liquid is supplied to a reservoir 10 between a final element of a projection system PS and a substrate by an inlet 21. An overflow removes the liquid above a given level. The overflow is arranged above the inlet and thus the liquid is constantly refreshed and the pressure in the liquid remains substantially constant. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种在光刻设备中使液体的电压变化和/或温度变化最小化而不引起由于机械振动引起的不必要的干扰的液体供应系统。解决方案：通过入口21将液体供应到投影系统PS的最终元件和基底之间的储存器10.溢流器将液体移至高于给定水平的位置。溢流口布置在入口的上方，因此液体不断刷新，液体中的压力基本保持不变。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2009124182A Radiation source device for suppressing debris particle, lithographic apparatus, illuminating system, and method 审中-公开
标题翻译：用于抑制碎片颗粒的放射源装置，光刻装置，照明系统和方法
公开(公告)号：JP2009124182A
公开(公告)日：2009-06-04
申请号：JP2009053262
申请日：2009-03-06
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VADIM YEVGENYEVICH BANINE , BAKKER LEVINUS PIETER , KOLESNYCHENKO ALEKSEY YURIEVIC , MOORS JOHANNES HUBERTUS J , SCHUURMANS FRANK JEROEN PIETER
IPC分类号： H01L21/027
CPC分类号： G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a radiation source device in which individual provision of gas in an area where radiation travels from a radiation source to an illuminator is extremely small with regard to the suppression of debris particles in the area.
SOLUTION: The lithographic apparatus includes the radiation source for generating the radiation, an illuminating system for adjusting the radiation, a patterning device for patterning the adjusted radiation, and a projection system for projecting the patterned radiation onto a target section of a substrate. The illuminating system includes a debris suppressing system for suppressing the debris particles produced by the generation of the radiation and an optical system for collecting the radiation. The debris suppressing systems are disposed so as to directly evaporate the debris particles, to directly charge the debris particles, to directly generate plasma from the debris particles, or to perform those arbitrary combinations, in a path where the radiation travels from radiation source to the optical system.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种辐射源装置，其中在辐射源从辐射源传播到照明器的区域中单独提供气体对于抑制该区域中的碎屑颗粒是非常小的。解决方案：光刻设备包括用于产生辐射的辐射源，用于调节辐射的照明系统，用于对经调节的辐射进行图案化的图案形成装置，以及用于将图案化辐射投影到基板的目标部分上的投影系统。照明系统包括用于抑制由辐射产生产生的碎屑颗粒的碎片抑制系统和用于收集辐射的光学系统。碎片抑制系统被设置成直接蒸发碎屑颗粒，直接对碎屑颗粒进行充填，从碎片颗粒直接产生等离子体，或者在辐射从辐射源传播到光学系统。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2006191089A Imprint lithography 有权
标题翻译： IMPRINT LITHOGRAPHY
公开(公告)号：JP2006191089A
公开(公告)日：2006-07-20
申请号：JP2005377640
申请日：2005-12-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KOLESNYCHENKO ALEKSEY YURIEVIC , VAN SANTEN HELMAR , KRUIJT-STEGEMAN YVONNE V
IPC分类号： H01L21/027 , B81C99/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a manufacture template for imprint lithography. SOLUTION: This imprint lithography is provided with a process for forming first imprint on a medium by bringing the first target region of an imprintable medium on a manufacturing template substrate into contact with a master template, therein the imprint is made to decide the section of a manufacturing template pattern, a process for separating the master template from the imprinted medium, a process for forming second imprint on the medium by bringing the second target region of the medium into contact with the master template, therein the second imprint is made to decide the other section of the manufacturing template pattern and a process for separating the master template from the imprinted medium. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供用于制造用于压印光刻的制造模板的方法。解决方案：该压印光刻被提供有通过使可印制介质的第一目标区域在制造模板基板上与主模板接触来在介质上形成第一印记的方法，其中印记被确定为制造模板图案的截面，用于从压印介质分离主模板的处理，通过使介质的第二目标区域与主模板接触而在介质上形成第二压印的处理，其中进行第二压印以决定制造模板图案的另一部分以及从压印介质分离主模板的过程。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2005303316A Lithographic equipment and method of manufacturing device 有权
标题翻译： LITHOGRAPHIC设备及其制造方法
公开(公告)号：JP2005303316A
公开(公告)日：2005-10-27
申请号：JP2005115241
申请日：2005-04-13
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要： PROBLEM TO BE SOLVED: To provide a substrate table of a immersion lithographic equipment which is made so as to prevent contamination due to an immersion liquid.
SOLUTION: A substrate table WT is provided with a drainage groove, i.e. a barrier 40 which surrounds an outer periphery of a substrate W and a barrier 100 which surrounds another object 20 such as a sensor which exists in the substantially same surface as the upper surface of the substrate W. Since the barriers 40 and 100 can collect all liquid which falls from a liquid feed system while exposing the substrate W, a risk that fine components of the lithographic projection equipment is contaminated is reduced.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供浸没式光刻设备的基板台，其被制成以防止由于浸没液体而引起的污染。解决方案：衬底台WT设置有排水槽，即围绕衬底W的外周的阻挡层40和围绕另一物体20的阻挡物100，例如传感器，其存在于基本相同的表面中基板W的上表面。由于阻挡层40和100可以收集从液体供给系统落下的所有液体同时暴露基板W，所以降低了光刻投影设备的精细分量被污染的风险。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2009044185A Lithographic apparatus and device manufacturing method 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2009044185A
公开(公告)日：2009-02-26
申请号：JP2008274716
申请日：2008-10-24
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC分类号： H01L21/027 , G03F7/20 , H01L21/683
CPC分类号： G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要： PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus which is configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT is provided with a drainage ditch or barrier 40 surrounding an outer circumferential edge of the substrate W and a barrier 100 surrounding other objects 20 like sensors positioned in the same plane substantially as the upper surface of the substrate W. The barriers 40 and 100 are configured to collect all of liquid spilled from a liquid supply system while the substrate W is exposed, so thereby reducing the risk of contamination of fine components in the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT

10. 发明专利

JP2007129238A Imprint lithography 有权
标题翻译： IMPRINT LITHOGRAPHY
公开(公告)号：JP2007129238A
公开(公告)日：2007-05-24
申请号：JP2006300285
申请日：2006-11-06
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： WUISTER SANDER F , KOLESNYCHENKO ALEKSEY YURIEVIC , DIJKSMAN JOHAN F , KRUIJT-STEGEMAN YVONNE W , SCHRAM IVAR
IPC分类号： H01L21/027 , B29C33/38
CPC分类号： B29C59/022 , B29C35/0888 , B29C2035/0827 , B29C2035/0838 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： PROBLEM TO BE SOLVED: To solve the problem that manufacturing and duplicating of a quarts template is troublesome, though a template used for UV imprint is often constructed using quarts for transparency and hardness to radiation. SOLUTION: Imprint lithography equipment is provided with an imprint template having a polymeric surface provided with a structure of COPYRIGHT: (C)2007,JPO&INPIT

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