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1. 发明专利

JP2006165549A Lithographic apparatus, device manufacturing method, and device manufactured therewith 有权
标题翻译：光刻设备，器件制造方法及其制造的器件
公开(公告)号：JP2006165549A
公开(公告)日：2006-06-22
申请号：JP2005347566
申请日：2005-12-01
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KRUIJSWIJK STEFAN G , LOOPSTRA ERIK ROELOF
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70075 , G03F7/70083
摘要： PROBLEM TO BE SOLVED: To provide an illumination system preparing an improved substrate illumination. SOLUTION: The present invention relates to a lithographic apparatus, a device manufacturing method, and a device thus manufactured. The lithographic apparatus is a scanning type in which a target portion of a substrate is scanned through a patterned radiation beam. Inhomogeneities in the radiation beam may become visible in the form of stripes on the substrate. During scanning, the overall homogeneity of the illumination may be improved by smearing out the inhomogeneities like this in such a way that additional movement is applied to a substrate table of the apparatus and a patterning device selected optionally in a direction at an angle with the scanning movement. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种制备改进的基板照明的照明系统。解决方案：本发明涉及光刻设备，器件制造方法和由此制造的器件。光刻设备是其中通过图案化的辐射束扫描基板的目标部分的扫描类型。辐射束中的不均匀性可能以基板上的条纹的形式变得可见。在扫描期间，可以通过如下方式来改善照明的整体均匀性：使得附加的移动被施加到装置的基板台上，以及可选地沿与扫描成一定角度的方向选择的图案形成装置运动。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2005322904A Lithography system and device manufacturing method 有权
标题翻译： LITHOGRAPHY系统和器件制造方法
公开(公告)号：JP2005322904A
公开(公告)日：2005-11-17
申请号：JP2005129262
申请日：2005-04-27
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VADIM YEVGENYEVICH BANINE , BAKKER LEVINUS PIETER , JONKERS JEROEN , LOOPSTRA ERIK ROELOF
IPC分类号： G02B5/08 , G03B27/54 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70008 , G03F7/7005
摘要： PROBLEM TO BE SOLVED: To provide lithography system which enhances the output of an EUV radiation source by combining the outputs of a plurality of EUV radiation sources.
SOLUTION: The lithography system includes an illumination system for providing a radiation beam, a support for supporting a pattern forming device, a substrate table, and a projection system. Further, the lithography system includes the plurality of EUV radiation sources for providing the illumination system with EUV radiation, and a distribution means for transforming EUV radiation from each of the EUV radiation sources to the intermediate radiation beam. The intermediate radiation beam is directed from the distribution means to a first direction by mirror surface. The distribution means further includes a rotating mirror array, whose axis of rotation is non-parallel with the mirror surface.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供通过组合多个EUV辐射源的输出来增强EUV辐射源的输出的光刻系统。解决方案：光刻系统包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑件，衬底台和投影系统。此外，光刻系统包括用于向照明系统提供EUV辐射的多个EUV辐射源，以及用于将来自EUV辐射源中的每一个的EUV辐射转换成中间辐射束的分配装置。中间辐射束从分布装置通过镜面指向第一方向。分配装置还包括旋转镜阵列，其旋转轴与镜面不平行。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2005167211A Lithographic apparatus 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2005167211A
公开(公告)日：2005-06-23
申请号：JP2004311712
申请日：2004-10-27
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： CHRISTIAAN ALEXANDER HOOGENDAM , STREEFKERK BOB , MULKENS JOHANNES CATHARINUS HU , BIJLAART ERIK THEODORUS MARIA , KOLESNYCHENKO ALEKSEY YURIEVIC , LOOPSTRA ERIK ROELOF , MERTENS JEROEN JOHANNES SOPHIA , SLAGHEKKE BERNARDUS ANTONIUS , TINNEMANS PATRICIUS ALOYSIUS J , VAN SANTEN HELMAR
IPC分类号： G03F7/20 , B05C11/00 , G03B27/42 , G03B27/52 , H01L21/00 , H01L21/027
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： PROBLEM TO BE SOLVED: To provide a liquid supply system which minimizes voltage variation and/or temperature variation of liquid without causing unnecessary disturbance due to mechanical vibration, in a lithographic apparatus. SOLUTION: Liquid is supplied to a reservoir 10 between a final element of a projection system PS and a substrate by an inlet 21. An overflow removes the liquid above a given level. The overflow is arranged above the inlet and thus the liquid is constantly refreshed and the pressure in the liquid remains substantially constant. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种在光刻设备中使液体的电压变化和/或温度变化最小化而不引起由于机械振动引起的不必要的干扰的液体供应系统。解决方案：通过入口21将液体供应到投影系统PS的最终元件和基底之间的储存器10.溢流器将液体移至高于给定水平的位置。溢流口布置在入口的上方，因此液体不断刷新，液体中的压力基本保持不变。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2005045253A Lithographic system, method of manufacturing device, and device manufactured by the method 有权
标题翻译：光刻系统，制造装置的方法以及由该方法制造的装置
公开(公告)号：JP2005045253A
公开(公告)日：2005-02-17
申请号：JP2004212414
申请日：2004-07-21
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN DE VEN BASTIAAN LAMBERTUS , HEERENS GERT-JAN , LANSBERGEN ROBERT GABRIEL M , LEENDERS MARTINUS HENDRIKUS AN , LOOPSTRA ERIK ROELOF
IPC分类号： G03F7/20 , H01L21/00 , H01L21/027
CPC分类号： G03F7/709 , G03F7/707 , G03F7/70716 , G03F7/70741 , G03F7/70783 , G03F7/70825
摘要： PROBLEM TO BE SOLVED: To provide a lithographic system that improves the accuracy of images projected upon a substrate and, at the same time, is shortened in idling time. SOLUTION: The lithographic system is provided with a coupling system which positions a patterning means with respect to a reticle stage. The projecting system of the lithographic system has an operation cycle containing a projecting phase in which a patterned beam is projected upon the target portion of a substrate. The reticle stage supports the patterning means and an exchanging phase in which the patterning means is exchanged with another patterning means. The coupling system positions the exchanged patterning means with respect to the reticle stage. Since the coupling system is separated from the patterning means during the projecting phase, more accurate projected images can be obtained. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种提高投影在基板上的图像的精度的光刻系统，同时在空转时间上缩短。解决方案：光刻系统设有耦合系统，其将图案化装置相对于掩模版台定位。光刻系统的投影系统具有包含投影相位的操作周期，其中图案化的光束投影到基板的目标部分上。刻线台支撑图形装置和交换阶段，其中图形装置与另一图案形成装置交换。耦合系统将交换的图案形成装置相对于标线片台定位。由于耦合系统在投影阶段与图案化装置分离，所以可以获得更准确的投影图像。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2005005714A Moving stage for lithography projection equipment system, lithography projection equipment, and method for manufacturing device 有权
标题翻译：平面投影设备系统的移动阶段，平面投影设备和制造设备的方法
公开(公告)号：JP2005005714A
公开(公告)日：2005-01-06
申请号：JP2004172056
申请日：2004-06-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： LOOPSTRA ERIK ROELOF , MUNNIG SCHMIDT ROBERT-HAN
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68
CPC分类号： G03F7/70766 , G03F7/70716 , G03F7/70758 , G03F7/709
摘要： PROBLEM TO BE SOLVED: To provide a moving stage whose movement can be accurately controlled. SOLUTION: A moving stage system 10 for lithography projection equipment 1 is equipped with at least a base 12, a platform 11 movable relative to the base, a balance mass 13, 14 which are movable relative to the base and compensate a force produced from the platform, and a driving mechanism 15 to 19 which is constituted to move the platform and balance mass relative to the base. The driving mechanism is equipped with; at least one of belt transmission apparatuses 15 to 17, 151 to 152 which connect the platform and balance mass to move the balance mass at least partially in the opposite moving direction 21, 22 when the platform moves in the moving direction 20; and the driving apparatus 19 which mechanically engages with at least one of the balance mass or platform to directly drive the platform and balance mass. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供可以精确控制其移动的移动台。解决方案：用于光刻投影设备1的移动平台系统10装备有至少一个基座12，相对于基座可移动的平台11，平衡块13,14，其可相对于底座移动并且补偿力以及驱动机构15〜19，其构成为使平台移动并相对于基座平衡质量。驱动机构配备; 至少一个带传送装置15至17,151至152，当平台在移动方向20上移动时，连接平台并平衡质量以使平衡块至少部分地沿相反移动方向21,22移动; 以及与平衡块或平台中的至少一个机械地接合以直接驱动平台并平衡质量的驱动装置19。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2004343062A Lithographic apparatus and method for manufacturing device 有权
公开(公告)号：JP2004343062A
公开(公告)日：2004-12-02
申请号：JP2004066538
申请日：2004-03-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： HOL SVEN ANTOIN JOHAN , COMPTER JOHAN CORNELIS , LOOPSTRA ERIK ROELOF , VREUGDEWATER PATRICIA
IPC分类号： H01L21/027 , G03F7/20 , H02K41/02 , H02K41/03
CPC分类号： G03F7/70758 , H02K41/031 , H02K2201/18
摘要： PROBLEM TO BE SOLVED: To provide a linear motor having a large driving force, a high efficiency and a small vertical force. SOLUTION: The linear motor comprises an armature 13 including two opposing magnet tracks 11 and 12, and three open coil sets. A stage, especially a mask stage, can be driven in a lithographic projector using the linear motor. COPYRIGHT: (C)2005,JPO&NCIPI

7. 发明专利

JP2006191085A Imprint lithography 有权
标题翻译： IMPRINT LITHOGRAPHY
公开(公告)号：JP2006191085A
公开(公告)日：2006-07-20
申请号：JP2005377244
申请日：2005-12-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KOLESNYCHENKO ALEKSEY YURIEVIC , LOOPSTRA ERIK ROELOF , VAN SANTEN HELMAR , KRUIJT-STEGEMAN YVONNE V
IPC分类号： H01L21/027 , B81C99/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： PROBLEM TO BE SOLVED: To provide an imprint lithography method in which resolution and superposition accuracy are improved.
SOLUTION: The imprint lithography method comprises: a step for subjecting an imprintable medium on a substrate to a condition that the medium is at a first temperature which may subject the medium to a flowable state, where the imprintable medium comprises an imprint material selected from a group consisting of a crystalline material and a polycrystalline material; a step for pressing a template into the medium to form an imprint in the medium; a step for cooling the medium to a second temperature which may subject the medium to a substantially non-flowable state while the medium is brought into contact with the template 46; and a step for separating the medium from the template 46 in the substantially non-flowable state.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供其中提高分辨率和叠加精度的压印光刻方法。压印光刻方法包括：将基材上的可压印介质经受介质处于可能使介质处于可流动状态的第一温度的条件的步骤，其中可压印介质包括压印材料选自由结晶材料和多晶材料组成的组; 将模板压入介质以在介质中形成印记的步骤; 将介质冷却到第二温度的步骤，该第二温度可以在介质与模板46接触的同时使介质达到基本上不可流动的状态; 以及在基本上不可流动的状态下将培养基与模板46分离的步骤。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2006191062A Lithographic device and method of manufacturing the same 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：JP2006191062A
公开(公告)日：2006-07-20
申请号：JP2005375313
申请日：2005-12-27
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： MARIA VAN DER WIJST MARC W , FRANKEN DOMINICUS JACOBUS PETR , LOOPSTRA ERIK ROELOF , RAVENSBERGEN MARIUS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70266 , G03F7/70825
摘要： PROBLEM TO BE SOLVED: To provide a device and a method for improving the level of correction that can be achieved with a transmissive deformable lens element in a lithographic device. SOLUTION: The lithographic device has: a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate; and a deformable lens actuator configured to transmit, at a plurality of sub-regions on the deformable lens element independently, a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于提高可以通过光刻设备中的透射性可变形透镜元件实现的校正水平的装置和方法。解决方案：光刻设备具有：可变形透镜元件，图案化的辐射束通过该可变形透镜元件布置成在到达基板之前通过; 以及可变形透镜致动器，其被配置为在所述可变形透镜元件上的多个子区域独立地传送基本上平行于所述投影系统的光轴的力的组合和围绕基本上垂直于所述光学器件的轴线的局部扭矩轴。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2006179908A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2006179908A
公开(公告)日：2006-07-06
申请号：JP2005364267
申请日：2005-12-19
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： MOORS JOHANNES HUBERTUS J , HAM ERIK LEONARDUS , HEERENS GERT-JAN , LIEBREGTS PAULUS MARTINUS MARI , LOOPSTRA ERIK ROELOF , WERIJ HENRI GERARD C
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70933 , G03F7/70908
摘要： PROBLEM TO BE SOLVED: To reduce stain particles of a surface, when the surface of a reticle or a mask is exposed to the air of the optics compartment of a lithographic apparatus. SOLUTION: The lithographic apparatus includes an optics compartment that contains the patterned surface of a patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to a substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection; a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment, and to create a region adjacent to the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：当掩模版或掩模的表面暴露于光刻设备的光学隔室的空气时，为了减少表面的污渍颗粒。解决方案：光刻设备包括光学隔室，其包含图案形成装置和光学元件的图案化表面，以及通过连接器连接到光学隔室的衬底隔间，该连接被布置成将图案化的辐射束从光学元件。该设备还包括第一冲洗气体入口，布置成将第一冲洗气体供应到连接中; 邻近所述图案化表面的第二冲洗气体入口并且布置成将第二冲洗气体供应到所述光学隔室中，并且产生与所述图案化表面相邻的区域，在所述区域中所述第二冲洗气体沿着与正常和远离的部件的方向一起流动并且布置成泵送来自光学隔室的冲洗气体的气泵。版权所有（C）2006，JPO＆NCIPI

10. 发明专利

JP2006054468A Lithography apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHY设备和设备制造方法
公开(公告)号：JP2006054468A
公开(公告)日：2006-02-23
申请号：JP2005233909
申请日：2005-08-12
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： CADEE THEODORUS PETRUS MARIA , JACOBS JOHANNES HENRICUS WILHE , KATE NICOLAAS TEN , LOOPSTRA ERIK ROELOF , VAN MEER ASCHWIN LODEWIJK HEND , MERTENS JEROEN JOHANNES SOPHIA , DE MOL CHRISTIANUS GERARDUS MA , MUITJENS MARCEL JOHANNUS ELISA , VAN DER NET ANTONIUS J , OTTENS JOOST JEROEN , QUAEDACKERS JOHANNES ANNA , REUHMAN-HUISKEN MARIA ELISABET , STAVENGA MARCO KOERT , TINNEMANS PATRICIUS ALOYSIUS J , VERHAGEN MARTINUS CORNELIS MAR , VERSPAIJ JACOBUS JOHANNUS LEON , DE JONG FREDERIK EDUARD , GOORMAN KOEN , MENCHTCHIKOV BORIS , BOOM HERMAN , NIHTIANOV STOYAN , MOERMAN RICHARD , SMEETS MARTIN FRANS PIERRE , SCHOONDERMARK BART LEONARD PET , JANSSEN FRANCISCUS JOHANNES JO , RIEPEN MICHEL
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： PROBLEM TO BE SOLVED: To provide a system for reducing lithographic errors caused by immersion liquid. SOLUTION: A lithography apparatus comprises an illumination system so constituted as to control a radiation beam, a support so constituted as to support a pattern forming device which imparts patterns on a crosssection of the radiation beam to form a patternized radiation beam, a substrate table so constituted as to hold a substrate, a projection system so constituted as to project the patternized radiation beam on the target of the substrate, a liquid supply system so constituted as to fill at least part of a space between a final element of the projection system and the substrate with the liquid, a sealing member so disposed as to substantially enclose the liquid inside the space between the final element of the projection system and the substrate, and an element for controlling and/or compensate evaporation of the immersion liquid from the substrate. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种减少浸没液引起的平版印刷误差的系统。解决方案：光刻设备包括照明系统，其被构造成控制辐射束，支撑件被构造成支撑图案形成装置，其在辐射束的横截面上施加图案以形成图案化的辐射束，衬底台，其被构造成保持衬底;投影系统，其被构造成将图案化的辐射束投射到衬底的靶上;液体供应系统，其被构造成填充所述衬底的最终元件之间的至少一部分空间; 投影系统和具有液体的基板，密封构件，其被设置为基本上将液体包围在投影系统的最终元件和基板之间的空间内，以及用于控制和/或补偿浸没液体的蒸发的元件底物。版权所有（C）2006，JPO＆NCIPI

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