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1. 发明专利

JP2005109497A Lithographic equipment and device-manufacturing method 有权
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2005109497A
公开(公告)日：2005-04-21
申请号：JP2004282006
申请日：2004-09-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： BASTIAAN LAMBERTUS WILHELMUS M , HAM ERIK LEONARDUS
IPC分类号： B65G49/00 , G03F7/20 , H01L21/027 , H01L21/677 , H01L21/68
CPC分类号： G03F7/70741
摘要： PROBLEM TO BE SOLVED: To enable a conventional vessel, which does not have vacuum adaptation to be used for a conveying vessel conveyed by accommodating a patterning means (mask or the like), which should be replaced in lithographic projection equipment, used in vacuum environment so that it is not contaminated with particles.
SOLUTION: Since the conveying vessel accommodating the patterning means is combined with a storing vessel forming storing space inside, after transferring the patterning means into the storing space, it is surrounded with gliding walls, and the inside of the gliding walls is exhausted to be a vacuum chamber, and the conventional vessel can be used because vacuum adaptation is not necessary for the conveying vessel itself. Furthermore, since only a small part of the conveying vessel and the storage vessel, can enter the storage space, together with the patterning means in this conveyance, if these vessels are contaminated, only a small part of them is carried into the storage space, and the storage space can easily be kept clean, as it is, essentially without particles.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了使不具有真空适应性的常规容器用于通过容纳在平版印刷设备中应更换的图案形成装置（掩模等）输送的输送容器，所使用的容器在真空环境中，使其不被颗粒污染。解决方案：由于容纳图案形成装置的输送容器与形成存储空间的储存容器组合在一起，在将图案形成装置转移到储存空间中之后，其被滑动壁包围，滑动壁的内部被排出成为真空室，并且可以使用常规的容器，因为输送容器本身不需要真空适应。此外，由于输送容器和储存容器的只有一小部分能够在该输送中与图案形成装置一起进入存储空间，如果这些容器被污染，则只有少部分容器被运送到存储空间中，并且存储空间可以容易地保持清洁，基本上没有颗粒。版权所有（C）2005，JPO＆NCIPI

2. 发明专利

JP2007221101A Method for manufacturing lithography system and electrostatic clamp for lithography system 有权
标题翻译：用于制图系统的方法和静电夹
公开(公告)号：JP2007221101A
公开(公告)日：2007-08-30
申请号：JP2006337682
申请日：2006-12-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN MIERLO HUBERT ADRIANN , HAM ERIK LEONARDUS , MEIJER HENDRICUS JOHANNES MARI , JOSEPHINA MOORS JOHANNES HUBER , HENDRIK ANTONY JOHANNES NEERHO , OTTENS JOOST JEROEN , JOHANNES ADRIANUS PETRUS LEIJT , MARCO LE KLUSE , JAN HOPMAN
IPC分类号： H01L21/027 , H01L21/683 , H02N13/00
CPC分类号： H01L21/6831 , G03F7/70708 , Y10T29/49117
摘要： PROBLEM TO BE SOLVED: To provide an electrostatic clamp for a lithography system which does not contain contaminant and does not cause damages to layers and to provide a method for manufacturing it. SOLUTION: A first layer and a second layer are formed of dielectric material. Electrodes 7, 9a and 9b are formed of conventional material such as aluminum or silicon. One or several spaces 15 and 17 are filled with first or second dielectric material and the contaminant is prevented from penetrating the volumes between the first part 7 and the second parts 9a and 9b. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种不含污染物的光刻系统的静电夹具，并且不会对层造成损害并提供其制造方法。解决方案：第一层和第二层由电介质材料形成。电极7,9a和9b由常规材料如铝或硅形成。一个或几个空间15和17填充有第一或第二电介质材料，并且防止污染物渗透第一部分7和第二部分9a和9b之间的体积。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2004006784A TRANSFER METHOD FOR MASK OR SUBSTRATE, STORAGE BOX ADAPTED FOR USE IN SUCH METHOD, DEVICE OR APPARATUS AND DEVICE MANUFACTURING METHOD COMPRISING SUCH METHOD 审中-公开
公开(公告)号：JP2004006784A
公开(公告)日：2004-01-08
申请号：JP2003100900
申请日：2003-02-27
申请人： ASML NETHERLANDS BV
发明人： HEERENS GERT-JAN , VAN DE VEN BASTIAAN LAMBERTUS , LANSBERGEN ROBERT GABRIEL M , HAM ERIK LEONARDUS
IPC分类号： G03F1/66 , G03F7/20 , H01L21/027 , H01L21/673 , H01L21/677 , H01L21/68 , G03F1/14
摘要： PROBLEM TO BE SOLVED: To provide a transfer method which greatly reduces or completely eliminate transfer of contaminants into a protective environment. SOLUTION: The method includes steps of fixing a storage box on an openable wall part 21 of a wall of an enclosed protective environment of the device or apparatus such that an openable cover part 12 of the storage box overlaps the openable wall part of the protective environment; constituting the protective environment so as to be filled with an inert gas or to be evacuated; opening the operable cover part of the storage box and the openable wall part of the protective environment whereby the cover of the storage box forms the part of the wall of the protective environment and the inside of the storage box becomes the part of the protective environment; and transferring at least one of the substrates or masks MA from the inside space of the storage box to the inside space of the wall of the protective environment or vice versa. COPYRIGHT: (C)2004,JPO

4. 发明专利

JP2006179908A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2006179908A
公开(公告)日：2006-07-06
申请号：JP2005364267
申请日：2005-12-19
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： MOORS JOHANNES HUBERTUS J , HAM ERIK LEONARDUS , HEERENS GERT-JAN , LIEBREGTS PAULUS MARTINUS MARI , LOOPSTRA ERIK ROELOF , WERIJ HENRI GERARD C
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70933 , G03F7/70908
摘要： PROBLEM TO BE SOLVED: To reduce stain particles of a surface, when the surface of a reticle or a mask is exposed to the air of the optics compartment of a lithographic apparatus. SOLUTION: The lithographic apparatus includes an optics compartment that contains the patterned surface of a patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to a substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection; a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment, and to create a region adjacent to the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：当掩模版或掩模的表面暴露于光刻设备的光学隔室的空气时，为了减少表面的污渍颗粒。解决方案：光刻设备包括光学隔室，其包含图案形成装置和光学元件的图案化表面，以及通过连接器连接到光学隔室的衬底隔间，该连接被布置成将图案化的辐射束从光学元件。该设备还包括第一冲洗气体入口，布置成将第一冲洗气体供应到连接中; 邻近所述图案化表面的第二冲洗气体入口并且布置成将第二冲洗气体供应到所述光学隔室中，并且产生与所述图案化表面相邻的区域，在所述区域中所述第二冲洗气体沿着与正常和远离的部件的方向一起流动并且布置成泵送来自光学隔室的冲洗气体的气泵。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2006041499A Transfer of lithography apparatus and patterning device 有权
标题翻译：转印装置和图案装置的传送
公开(公告)号：JP2006041499A
公开(公告)日：2006-02-09
申请号：JP2005183273
申请日：2005-06-23
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： HAM ERIK LEONARDUS , HEERENS GERT-JAN , LANSBERGEN ROBERT GABRIEL M , MEIJER ELLARD A , MEIJER HENDRICUS JOHANNES MARI , MEILING HANS , MERTENS BASTIAAN MATTHIAS , MOORS JOHANNES HUBERTUS JOSEPH
IPC分类号： H01L21/027 , B65G49/00 , G03B27/52 , G03B27/62 , G03F7/20 , H01L21/677
CPC分类号： G03B27/52 , G03F7/70741
摘要： PROBLEM TO BE SOLVED: To provide a box which is capable of protecting a lithography patterning device against external contaminants and making its throughput optimal.
SOLUTION: The transfer box 2 is equipped with an internal space 10 provided with a housing position at which the patterning device is housed and a container 8 provided with an opening used for transferring the patterning device. The internal space 10 is pressurized before the patterning device is transferred from the internal space 10 to a lithography apparatus. The box is equipped with a closure which closes the opening and/or a channel system 18 which discharges gas from the internal space 10 of the box to / and/or supplies the gas from / to the internal space of the box, and the lithography apparatus which is so constituted as to collaborate with the box device is included.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够保护光刻图案形成装置免受外部污染物并使其吞吐量最优化的盒子。解决方案：转印盒2配备有内部空间10，内部空间10设置有容纳图案形成装置的容纳位置，容器8具有用于转印图案形成装置的开口。在图案形成装置从内部空间10传送到光刻装置之前，内部空间10被加压。该箱子装有封闭开口和/或通道系统18，该通道系统18将来自箱体的内部空间10的气体从盒子的内部空间排出和/或从气体的内部空间供应气体，并且光刻包括与盒装置协作的装置。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2002324757A MASK HANDLING METHOD, MASK, TOOL OR APPARATUS INCLUDING GRIPPER THEREFOR, DEVICE MANUFACTURING METHOD AND DEVICE MANUFACTURED THEREBY 审中-公开
公开(公告)号：JP2002324757A
公开(公告)日：2002-11-08
申请号：JP2002051332
申请日：2002-02-27
申请人： ASML NETHERLANDS BV
发明人： HEERENS GERRIT-JAN , HAM ERIK LEONARDUS , VAN DE VEN BASTIAAN LAMBERTUS
IPC分类号： B65G49/00 , G03F7/20 , H01L21/027 , H01L21/673 , H01L21/68 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide a simple mask handling method and an apparatus therefor which greatly reduced generation of contaminant particles disturbing the forming of a clear image of a reflective mask pattern for lithographic projectors using EUV and has a good mask layout reproducibility. SOLUTION: Three brackets 10 respectively having grooves 11b directed toward the center point of a mask are disposed around the mask. The mask handling apparatus has a gripper 20 having pins 21b with balls 22b at positions corresponding to the grooves. For holding the mask on a gripper 20 by the gravitational force, the balls 22b are partly inserted in the grooves 11b to dynamically position the mask, thus positioning very accurately with minimum growth of contaminant particles. Gripping from above by the electrostatic force, etc., uses grooves 11a and pins 21a.

7. 发明专利

DE60219844D1 未知
公开(公告)号：DE60219844D1
公开(公告)日：2007-06-14
申请号：DE60219844
申请日：2002-02-27
申请人： ASML NETHERLANDS BV
发明人： HEERENS GERRIT-JAN , HAM ERIK LEONARDUS , VAN DE VEN BASTIAAN LAMBERTUS
IPC分类号： G03F7/20 , B65G49/00 , H01L21/027 , H01L21/673 , H01L21/68 , H01L21/683
摘要： A mask for use in a lithographic projection apparatus comprises three brackets arranged on the circumference of the mask. The brackets are provided with grooves directed to a common imaginary point and are intend to cooperate with three pins provided on a mask gripper present in a mask handling apparatus or device. Preferably, the pins are provided with a rounded top for insertion in associated grooves of the brackets to provide a kinematically-determined mechanical position of the mask on the gripper.

8. 发明专利

DE60118669T2 未知
公开(公告)号：DE60118669T2
公开(公告)日：2007-01-11
申请号：DE60118669
申请日：2001-08-23
申请人： ASML NETHERLANDS BV
发明人： MOORS JOHANNES HUBERTUS JOSEPH , BANINE VADIM YEVGENYEVICH , LEENDERS MARTINUS HENDRIKUS AN , WERIJ HENRI GERARD CATO , VISSER HUGO MATTHIEU , HEERENS GERRIT-JAN , HAM ERIK LEONARDUS , MEILING HANS , LOOPSTRA EROK ROELOF , DONDERS SJOERD NICOLAAS LAMBER
IPC分类号： G03F1/14 , G03F7/20 , H01L21/027 , H01L21/673 , H01L21/677
摘要： In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.

9. 发明专利

DE60219844T2 未知
公开(公告)号：DE60219844T2
公开(公告)日：2008-01-17
申请号：DE60219844
申请日：2002-02-27
申请人： ASML NETHERLANDS BV
发明人： HEERENS GERRIT-JAN , HAM ERIK LEONARDUS , VAN DE VEN BASTIAAN LAMBERTUS
IPC分类号： G03F7/20 , B65G49/00 , H01L21/027 , H01L21/673 , H01L21/68 , H01L21/683
摘要： A mask for use in a lithographic projection apparatus comprises three brackets arranged on the circumference of the mask. The brackets are provided with grooves directed to a common imaginary point and are intend to cooperate with three pins provided on a mask gripper present in a mask handling apparatus or device. Preferably, the pins are provided with a rounded top for insertion in associated grooves of the brackets to provide a kinematically-determined mechanical position of the mask on the gripper.

10. 发明专利

SG110197A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知
公开(公告)号：SG110197A1
公开(公告)日：2005-04-28
申请号：SG200405764
申请日：2004-09-22
申请人： ASML NETHERLANDS BV
发明人： VAN DE VEN BASTIAAN LAMBERTUS , HAM ERIK LEONARDUS
IPC分类号： B65G49/00 , G03F7/20 , H01L21/027 , H01L21/677
摘要： The invention relates to a lithographic apparatus (1) including an illumination system for providing a projection beam of radiation, a support structure for supporting patterning means, the patterning means serving to impart the projection beam with a pattern in its cross-section, a particle-tight storage container (4) defining a storage space for storing patterning structures (8), wherein the storage container (4) is arranged to be coupled with a transfer container (6) such that the transfer container (6) for exchanging patterning structures (8) between the transfer container (6) and the lithographic apparatus (1) through a closeable passage (26) between the transfer container (6) and the storage container (4), a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. Furthermore, the invention relates to a method of using such an apparatus.

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