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1. 发明专利

JP2004343103A Lithographic apparatus, method of manufacturing device, and anglar encoder 有权
公开(公告)号：JP2004343103A
公开(公告)日：2004-12-02
申请号：JP2004133419
申请日：2004-04-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： LEENDERS MARTINUS HENDRIKUS AN , MEIJER HENDRICUS JOHANNES MARI , VAN DER PASCH ENGELBERTUS ANTO , RENKENS MICHAEL JOZEF MATHIJS , RUIJL THEO ANJES MARIA
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70258 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a method of manufacturing device and an anglar decoder.
SOLUTION: A system for measuring the position of a projection system PL with respect to a reference frame RF in the lithographic system includes a sensor rigidly mounted in relation to a corresponding sensor of a system for measuring the position of a substrate table WT. Rotation of the projection system PL about its optical axis is measured using an anglar decoder for transmitting a light from a target 41 to two optical paths having an opposite inclination sensitivity.
COPYRIGHT: (C)2005,JPO&NCIPI

2. 发明专利

JP2004165666A Lithographic apparatus and device manufacturing method 有权
公开(公告)号：JP2004165666A
公开(公告)日：2004-06-10
申请号：JP2003381339
申请日：2003-11-11
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： LOF JOERI , DE SMIT JOANNES THEODOOR , RITSEMA ROELOF AEILKO SIEBRAND , SIMON KLAUS , MODDERMAN THEODORUS MARINUS , MULKENS JOHANNES CATHARINUS HU , MEIJER HENDRICUS JOHANNES MARI , LOOPSTRA ERIK ROELOF
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7003 , G03F9/7034 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To provide a method and apparatus for accurately aligning and/or leveling a substrate in an immersion lithography apparatus.
SOLUTION: A map of the surface of a substrate is formed at a measurement station. Then the substrate W is moved to the place of which space between a projection lens and the substrate is filled with liquid. Subsequently, the substrate is aligned with, for example, a transmission image sensor to expose exactly according to the map formed previously. In this way, the mapping is never carried out under an environment of liquid.
COPYRIGHT: (C)2004,JPO

3. 发明专利

JP2006259699A Method for producing photolithography patterning device, computer program, patterning device, method for determining position of target image on or near substrate, measuring device, and lithography device 有权
标题翻译：用于制造光刻图案装置的方法，计算机程序，图案装置，用于确定目标图像在或靠近基板上的位置的方法，测量装置和图像装置
公开(公告)号：JP2006259699A
公开(公告)日：2006-09-28
申请号：JP2006025174
申请日：2006-02-02
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： MICKAN UWE , MEIJER HENDRICUS JOHANNES MARI
IPC分类号： G03F1/00 , G03F1/24 , H01L21/027
CPC分类号： G03F7/70433 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70283 , G03F7/70666 , G03F9/7003 , G03F9/7076 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a photolithography patterning device, and a lithography device using the method.
SOLUTION: Target dimensions and orientations are defined at the stage of creating a patterning device, and the effective shadow angle of the radiation is calculated at a plurality of points. Based on this, the thickness of the absorber layer or the intensity attenuation of the absorber of the patterning device is adjusted so as to compensate the displacement and the dimension errors of the desired image. The lithography device is a projection and exposure device using the patterning device. It is equipped with a measuring device used for determining the target position of the image, and composed so that the position and the dimension errors of the target image can be compensated for, corresponding to the result of the detection by the detector.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于制造光刻图案形成装置的方法和使用该方法的光刻装置。解决方案：在创建图案形成装置的阶段中定义目标尺寸和取向，并且在多个点处计算辐射的有效阴影角。基于此，调整吸收层的厚度或图案形成装置的吸收体的强度衰减，以补偿期望图像的位移和尺寸误差。光刻设备是使用图案形成装置的投影和曝光装置。它配备有用于确定图像的目标位置的测量装置，并且被构成使得可以根据检测器的检测结果来补偿目标图像的位置和尺寸误差。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2006041499A Transfer of lithography apparatus and patterning device 有权
标题翻译：转印装置和图案装置的传送
公开(公告)号：JP2006041499A
公开(公告)日：2006-02-09
申请号：JP2005183273
申请日：2005-06-23
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： HAM ERIK LEONARDUS , HEERENS GERT-JAN , LANSBERGEN ROBERT GABRIEL M , MEIJER ELLARD A , MEIJER HENDRICUS JOHANNES MARI , MEILING HANS , MERTENS BASTIAAN MATTHIAS , MOORS JOHANNES HUBERTUS JOSEPH
IPC分类号： H01L21/027 , B65G49/00 , G03B27/52 , G03B27/62 , G03F7/20 , H01L21/677
CPC分类号： G03B27/52 , G03F7/70741
摘要： PROBLEM TO BE SOLVED: To provide a box which is capable of protecting a lithography patterning device against external contaminants and making its throughput optimal.
SOLUTION: The transfer box 2 is equipped with an internal space 10 provided with a housing position at which the patterning device is housed and a container 8 provided with an opening used for transferring the patterning device. The internal space 10 is pressurized before the patterning device is transferred from the internal space 10 to a lithography apparatus. The box is equipped with a closure which closes the opening and/or a channel system 18 which discharges gas from the internal space 10 of the box to / and/or supplies the gas from / to the internal space of the box, and the lithography apparatus which is so constituted as to collaborate with the box device is included.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够保护光刻图案形成装置免受外部污染物并使其吞吐量最优化的盒子。解决方案：转印盒2配备有内部空间10，内部空间10设置有容纳图案形成装置的容纳位置，容器8具有用于转印图案形成装置的开口。在图案形成装置从内部空间10传送到光刻装置之前，内部空间10被加压。该箱子装有封闭开口和/或通道系统18，该通道系统18将来自箱体的内部空间10的气体从盒子的内部空间排出和/或从气体的内部空间供应气体，并且光刻包括与盒装置协作的装置。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2005005707A Lithography apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHY设备和设备制造方法
公开(公告)号：JP2005005707A
公开(公告)日：2005-01-06
申请号：JP2004169275
申请日：2004-06-08
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： JOERI LOF , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARI , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , VAN SCHAIK FRANK , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , BIJLAART ERIK THEODORUS MARIA , CHRISTIAAN ALEXANDER HOOGENDAM , VAN SANTEN HELMAR , VAN DE KERKHOF MARCUS ADRIANUS , KROON MARK , DEN BOEF ARIE JEFFREY , OTTENS JOOST JEROEN , MERTENS JEROEN JOHANNES SOPHIA
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The highlights of this invention are that the lithography apparatus is equipped with a radiation system Ex to provide the projection beams PB of radiation including a radioactive source LA, a primary object table (mask table) MT connected to a primary positioning means to correctly position a mask against IL and a member PL, a secondary object table (substrate table) WT connected to a secondary positioning means to correctly position a substrate against the member PL, and a projection system PL to form an image of the irradiated part of the mask MA on the target part of the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供具有改进的功能的浸没式光刻投影装置。解决方案：本发明的亮点在于，光刻设备配备有辐射系统Ex以提供包括放射源LA的辐射投影束PB，连接到主要定位的主要物体台（掩模台）MT 用于将掩模正确地定位在IL和构件PL上的装置，连接到二次定位装置以将衬底正确地定位在构件PL上的第二对象台（衬底台）WT，以及用于形成照射的图像的投影系统PL 在基板W的目标部分上的掩模MA的一部分。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2004289127A Lithography system and process for fabricating device 有权
标题翻译：雕刻系统和制作装置的过程
公开(公告)号：JP2004289127A
公开(公告)日：2004-10-14
申请号：JP2003417260
申请日：2003-11-11
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： LOF JOERI , BIJLAART ERIK THEODORUS MARIA , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBER , HOOGENDAM CHRISTIAAN ALEXANDER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARI , MERTENS JEROEN JOHANNES SOPHIA , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , SCHAIK FRANK VAN , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOHANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , VAN SANTEN HELMAR
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： PROBLEM TO BE SOLVED: To disclose a lithography projector in which a space between the final element of a projection system and a substrate is filled with liquid. SOLUTION: Hermetic edge sealing members 17 and 117 surround a substrate W on a substrate table WT or another object at least partially thus preventing the catastrophic loss of the liquid when the edge part of the substrate is imaged or illuminated. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：公开一种其中投影系统的最终元件和基板之间的空间被液体填充的光刻投影仪。解决方案：密封边缘密封构件17和117围绕基板台WT或另一物体上的基板W，至少部分地防止当基板的边缘部分成像或照明时液体的灾难性损失。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2004312002A Y-direction position correction of masked object shift caused by z-direction offset and oblique lighting 有权
公开(公告)号：JP2004312002A
公开(公告)日：2004-11-04
申请号：JP2004105078
申请日：2004-03-31
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN DER PASCH ENGELBERTUS ANTO , BEEMS MARCEL HENDRIKUS MARIA , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARI , GALBURT DANIEL N
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70775 , G03F7/70233 , G03F7/70283 , G03F7/70725 , G03F9/7003 , G03F9/7034
摘要： PROBLEM TO BE SOLVED: To provide a method for Y-direction position correction of masked object shifts caused by Z-direction offset and oblique lighting.
SOLUTION: In a reflective lithographic projection apparatus, shifts of a mask pattern image in the scanning direction, which are caused by changes in the position of the mask pattern surface along the optical axis, are corrected by shifting the relative position(s) of the mask and/or a substrate in the scanning direction. Rotating the relative position(s) of the mask and/or the substrate around the optical axis can correct image rotation errors. After installing the mask in the lithographic projection apparatus, changes in the position of the mask pattern surface along the optical axis can be determined by using an interferometer. These changes can be mapped and stored to be used for controlling the lithographic projection apparatus.
COPYRIGHT: (C)2005,JPO&NCIPI

8. 发明专利

JP2007013149A System for electrically connecting mask to earth and mask 有权
标题翻译：将面罩电气连接到接地面罩的系统
公开(公告)号：JP2007013149A
公开(公告)日：2007-01-18
申请号：JP2006176008
申请日：2006-06-27
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： MEIJER HENDRICUS JOHANNES MARI , MICKAN UWE , KLUSE MARCO LE
IPC分类号： H01L21/027 , G03F1/16
CPC分类号： G03F7/70941 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/38 , G03F1/40 , G03F7/707 , G03F7/70708 , G21K2201/06
摘要： PROBLEM TO BE SOLVED: To provide an earthing system and a mask avoiding such a problem that particles may be generated due to damage to a conductive coating by a conducting pin used for grounding a mask surface, in order to avoid errors caused by electrostatic charging during making a reflective mask for a lithographic apparatus using extreme ultraviolet radiation (EUV) and using the mask for an EUV lithographic apparatus.
SOLUTION: This system comprises a conductor CN connected to the earth and formed in such a manner as to make electric contact with a conductive coating 50 covering at least a part of a mask MA. This conductive coating comprises a layer comprising a metal-based compound. The conductive coating of the metal-based compound has sufficiently high conductivity, shows high hardness and high chemical stability, and possesses wear resistance. Accordingly, there are few possibilities of generating particles due to the damage to the coating by pressure applied on the conductor CN.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供接地系统和掩模，避免了由于用于使掩模表面接地的导电针导致的导电性涂层的损坏而可能产生颗粒的问题，以避免由于在制造用于使用极紫外辐射（EUV）的光刻设备的反射掩模和使用用于EUV光刻设备的掩模时的静电充电。解决方案：该系统包括连接到地球并且以与覆盖掩模MA的至少一部分的导电涂层50进行电接触的方式形成的导体CN。该导电涂层包括包含金属基化合物的层。金属类化合物的导电性涂层具有足够高的导电性，显示出高的硬度和高的化学稳定性，并且具有耐磨性。因此，由于施加在导体CN上的压力对涂层的损伤，几乎没有产生颗粒的可能性。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2007235179A Lithography apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHY设备和设备制造方法
公开(公告)号：JP2007235179A
公开(公告)日：2007-09-13
申请号：JP2007159104
申请日：2007-06-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JOERI LOF , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARI , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , VAN SCHAIK FRANK , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , BIJLAART ERIK THEODORUS MARIA , CHRISTIAAN ALEXANDER HOOGENDAM , VAN SANTEN HELMAR , VAN DE KERKHOF MARCUS ADRIANUS , KROON MARK , DEN BOEF ARIE JEFFREY , OTTENS JOOST JEROEN , MERTENS JEROEN JOHANNES SOPHIA
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有改进的功能的浸没式光刻投影装置。光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2007，JPO＆INPIT

10. 发明专利

JP2007221101A Method for manufacturing lithography system and electrostatic clamp for lithography system 有权
标题翻译：用于制图系统的方法和静电夹
公开(公告)号：JP2007221101A
公开(公告)日：2007-08-30
申请号：JP2006337682
申请日：2006-12-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN MIERLO HUBERT ADRIANN , HAM ERIK LEONARDUS , MEIJER HENDRICUS JOHANNES MARI , JOSEPHINA MOORS JOHANNES HUBER , HENDRIK ANTONY JOHANNES NEERHO , OTTENS JOOST JEROEN , JOHANNES ADRIANUS PETRUS LEIJT , MARCO LE KLUSE , JAN HOPMAN
IPC分类号： H01L21/027 , H01L21/683 , H02N13/00
CPC分类号： H01L21/6831 , G03F7/70708 , Y10T29/49117
摘要： PROBLEM TO BE SOLVED: To provide an electrostatic clamp for a lithography system which does not contain contaminant and does not cause damages to layers and to provide a method for manufacturing it. SOLUTION: A first layer and a second layer are formed of dielectric material. Electrodes 7, 9a and 9b are formed of conventional material such as aluminum or silicon. One or several spaces 15 and 17 are filled with first or second dielectric material and the contaminant is prevented from penetrating the volumes between the first part 7 and the second parts 9a and 9b. COPYRIGHT: (C)2007,JPO&INPIT

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