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1. 发明申请

WO2010033389A1 MANAGING THERMAL BUDGET IN ANNEALING OF SUBSTRATES 审中-公开
标题翻译：管理衬底退火中的热预算
公开(公告)号：WO2010033389A1
公开(公告)日：2010-03-25
申请号：PCT/US2009/055838
申请日：2009-09-03
申请人： APPLIED MATERIALS, INC. , MOFFATT, Stephen , MAYUR, Abhilash, J. , RAMAMURTHY, Sundar , RANISH, Joseph , HUNTER, Aaron
发明人： MOFFATT, Stephen , MAYUR, Abhilash, J. , RAMAMURTHY, Sundar , RANISH, Joseph , HUNTER, Aaron
IPC分类号： H01L21/324
CPC分类号： H01L21/324 , H01L21/67115
摘要： A method and apparatus are provided for treating a substrate. The substrate is positioned on a support in a thermal treatment chamber. Electromagnetic radiation is directed toward the substrate to anneal a portion of the substrate. Other electromagnetic radiation is directed toward the substrate to preheat a portion of the substrate. The preheating reduces thermal stresses at the boundary between the preheat region and the anneal region. Any number of anneal and preheat regions are contemplated, with varying shapes and temperature profiles, as needed for specific embodiments. Any convenient source of electromagnetic radiation may be used, such as lasers, heat lamps, white light lamps, or flash lamps.
摘要翻译：提供了一种处理基板的方法和装置。衬底位于热处理室中的支撑件上。电磁辐射被引向衬底以退火衬底的一部分。其他电磁辐射被引向衬底以预热衬底的一部分。预热减少了预热区域和退火区域之间的边界处的热应力。根据具体实施方案的需要，预期任何数量的退火和预热区域具有变化的形状和温度曲线。可以使用任何方便的电磁辐射源，例如激光器，加热灯，白光灯或闪光灯。

2. 发明申请

WO2013070917A1 APPARATUS AND METHOD TO MEASURE TEMPERATURE OF 3D SEMICONDUCTOR STRUCTURES VIA LASER DIFFRACTION 审中-公开
标题翻译：通过激光衍射测量三维半导体结构温度的装置和方法
公开(公告)号：WO2013070917A1
公开(公告)日：2013-05-16
申请号：PCT/US2012/064153
申请日：2012-11-08
申请人： APPLIED MATERIALS, INC. , PAN, Heng , ROGERS, Matthew Scott , HUNTER, Aaron Muir , MOFFATT, Stephen
发明人： PAN, Heng , ROGERS, Matthew Scott , HUNTER, Aaron Muir , MOFFATT, Stephen
IPC分类号： H01L21/66
CPC分类号： G01J5/08 , G01J5/0007 , G01J5/0803 , G01J2005/0074 , G01J2005/0077
摘要： Embodiments of the present invention generally relate to apparatus for and methods of measuring and monitoring the temperature of a substrate having a 3D feature thereon. The apparatus include a light source for irradiating a substrate having a 3D feature thereon, a focus lens for gathering and focusing reflected light, and an emissometer for detecting the emissivity of the focused reflected light. The apparatus may also include a beam splitter and an imaging device. The imaging device provides a magnified image of the diffraction pattern of the reflected light. The method includes irradiating a substrate having a 3D feature thereon with light, and focusing reflected light with a focusing lens. The focused light is then directed to a sensor and the emissivity of the substrate is measured. The reflected light may also impinge upon an imaging device to generate a magnified image of the diffraction pattern of the reflected light.
摘要翻译：本发明的实施例一般涉及用于测量和监测其上具有3D特征的基板的温度的方法的装置。该装置包括用于照射其上具有3D特征的基板的光源，用于聚焦和聚焦反射光的聚焦透镜，以及用于检测聚焦反射光的发射率的发射计。该装置还可以包括分束器和成像装置。成像装置提供反射光的衍射图案的放大图像。该方法包括用光照射具有3D特征的基板，并且将聚焦透镜聚焦在反射光上。然后将聚焦的光导向传感器，并测量衬底的发射率。反射光也可能撞击成像装置以产生反射光的衍射图案的放大图像。

3. 发明申请

WO2013090581A1 MULTIPLE BEAM COMBINER FOR LASER PROCESSING APPARATUS 审中-公开
标题翻译：用于激光加工设备的多光束组合器
公开(公告)号：WO2013090581A1
公开(公告)日：2013-06-20
申请号：PCT/US2012/069518
申请日：2012-12-13
申请人： APPLIED MATERIALS, INC. , MOFFATT, Stephen , HOLMGREN, Douglas E. , HOWELLS, Samuel C. , TONG, Edric , ADAMS, Bruce E. , LI, Jiping , HUNTER, Aaron Muir
发明人： MOFFATT, Stephen , HOLMGREN, Douglas E. , HOWELLS, Samuel C. , TONG, Edric , ADAMS, Bruce E. , LI, Jiping , HUNTER, Aaron Muir
IPC分类号： H01L21/268 , H01L21/26
CPC分类号： G02B27/106 , G02B17/0888 , G02B27/0025 , G02B27/10 , G02B27/1006 , G02B27/12 , G02B27/123 , G02B27/126 , G02B27/14 , G02B27/143 , G02B27/30
摘要： Apparatus and methods for combining beams of amplified radiation are disclosed. A beam combiner has a collimating optic positioned to receive a plurality of coherent radiation beams at a constant angle of incidence with respect to an optical axis of the collimating optic. The respective angles of incidence may also be different in some embodiments. The collimating optic has an optical property that collimates the beams. The optical property may be refractive or reflective, or a combination thereof. A collecting optic may also be provided to direct the plurality of beams to the collimating optic. The beam combiner may be used in a thermal processing apparatus to combine more than two beams of coherent amplified radiation, such as lasers, into a single beam.
摘要翻译：公开了用于组合放大辐射束的装置和方法。光束组合器具有准直光学器件，其被定位成以相对于准直光学器件的光轴的恒定入射角接收多个相干辐射束。在一些实施例中，相应的入射角也可以不同。准直光学元件具有使光束准直的光学特性。光学性质可以是折射或反射的，或其组合。还可以提供收集光学器件以将多个光束引导到准直光学元件。光束组合器可以用在热处理装置中，以将多于两个的相干放大辐射束（例如激光器）组合成单个光束。

4. 发明申请

WO2012115681A1 AMBIENT LAMINAR GAS FLOW DISTRIBUTION IN LASER PROCESSING SYSTEMS 审中-公开
标题翻译：激光加工系统中的环境层流气体分布
公开(公告)号：WO2012115681A1
公开(公告)日：2012-08-30
申请号：PCT/US2011/045968
申请日：2011-07-29
申请人： APPLIED MATERIALS, INC. , MOFFATT, Stephen , HUNTER, Aaron Muir
发明人： MOFFATT, Stephen , HUNTER, Aaron Muir
IPC分类号： H01L21/324 , H01L21/02
CPC分类号： F27D21/00 , F27D5/0037 , F27D2021/0078 , H01L21/67115
摘要： A method and apparatus for annealing semiconductor substrates is disclosed. The apparatus has an annealing energy source and a substrate support, with a shield member disposed between the annealing energy source and the substrate support. The shield member is a substantially flat member having a dimension larger than a substrate processed on the substrate support, with a window covering a central opening in the substantially flat member. The central opening has a gas inlet portal and a gas outlet portal, each in fluid communication with a gas inlet plenum and gas outlet plenum, respectively. A connection member is disposed around the central opening and holds the window over the central opening. Connection openings in the connection member are in fluid communication with the gas inlet plenum and gas outlet plenum, respectively, through a gas inlet conduit and a gas outlet conduit formed through the connection member.
摘要翻译：公开了半导体衬底退火的方法和装置。该装置具有退火能量源和衬底支撑件，其中屏蔽构件设置在退火能量源和衬底支撑件之间。屏蔽构件是具有大于在基板支撑件上处理的基板的尺寸的基本上平坦的构件，窗口覆盖基本平坦的构件中的中心开口。中心开口具有气体入口入口和气体出口入口，每个入口入口和气体出口通道分别与气体入口气室和气体出口增压室流体连通。连接构件设置在中心开口周围并将窗口保持在中心开口的上方。连接构件中的连接开口分别通过气体入口导管和通过连接构件形成的气体出口导管与气体入口气室和气体出口增压室流体连通。

5. 发明申请

WO2011034641A1 METHODS OF SOLID PHASE RECRYSTALLIZATION OF THIN FILM USING PULSE TRAIN ANNEALING METHOD 审中-公开
标题翻译：使用脉冲火焰退火方法的薄膜固相重组方法
公开(公告)号：WO2011034641A1
公开(公告)日：2011-03-24
申请号：PCT/US2010/035013
申请日：2010-05-14
申请人： APPLIED MATERIALS, INC. , MOFFATT, Stephen , HUNTER, Aaron Muir , ADAMS, Bruce E.
发明人： MOFFATT, Stephen , HUNTER, Aaron Muir , ADAMS, Bruce E.
IPC分类号： H01L21/324 , H01L21/20
CPC分类号： H01L21/02686 , C30B13/24 , C30B29/06 , H01L21/02521
摘要： Embodiments of the present invention provide methods of solid phase recrystallization of thin film using a plurality of pulses of electromagnetic energy. In one embodiment, the methods of the present invention may be used to anneal an entire substrate surface or selected regions of a surface of a substrate by delivering a plurality of pluses of energy to a crystalline seed region or layer upon which an amorphous layer is deposited to recrystallize the amorphous layer so that it has the same grain structure and crystal orientation as that of the underlying crystalline seed region or layer.
摘要翻译：本发明的实施例提供使用多个电磁能脉冲进行薄膜固相重结晶的方法。在一个实施例中，本发明的方法可以用于通过将多个能量递送到沉积非晶层的结晶种子区域或层来退火整个衬底表面或衬底的表面的选定区域使非晶层重结晶，使其具有与下面的结晶种子区域或层相同的晶粒结构和晶体取向。

6. 发明申请

WO2012177743A2 NOVEL THERMAL PROCESSING APPARATUS 审中-公开
标题翻译：新型热处理装置
公开(公告)号：WO2012177743A2
公开(公告)日：2012-12-27
申请号：PCT/US2012/043323
申请日：2012-06-20
申请人： APPLIED MATERIALS, INC. , MOFFATT, Stephen , HOLMGREN, Douglas, E. , HOWELLS, Samuel, C. , TONG, Edric , ADAMS, Bruce, E. , LI, Jiping , HUNTER, Aaron, Muir
发明人： MOFFATT, Stephen , HOLMGREN, Douglas, E. , HOWELLS, Samuel, C. , TONG, Edric , ADAMS, Bruce, E. , LI, Jiping , HUNTER, Aaron, Muir
IPC分类号： H01L21/324 , H01L21/26
CPC分类号： H01L21/477 , B23K26/0006 , B23K26/0081 , B23K26/03 , B23K26/032 , B23K26/04 , B23K26/0608 , B23K26/0622 , B23K26/08 , B23K26/127 , B23K2201/40 , B23K2203/56 , H01L21/268 , H01S3/0057
摘要： The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. An energy source for the optical system is typically a plurality of lasers, which are combined to form the energy field.
摘要翻译：本发明一般涉及能够在包含在基板的表面上的退火区域上可靠地输送均匀的能量的光学系统。光学系统适于在衬底的表面上的期望区域上传送或投影具有期望的二维形状的均匀量的能量。用于光学系统的能量源通常是多个激光器，其被组合以形成能量场。

7. 发明申请

WO2011123500A2 LASER BEAM POSITIONING SYSTEM 审中-公开
标题翻译：激光束定位系统
公开(公告)号：WO2011123500A2
公开(公告)日：2011-10-06
申请号：PCT/US2011/030453
申请日：2011-03-30
申请人： APPLIED MATERIALS, INC. , TERTITSKI, Leonid, M. , KUTTANNAIR, Krishna, Kumar , HUNTER, Aaron , MOFFATT, Stephen
发明人： TERTITSKI, Leonid, M. , KUTTANNAIR, Krishna, Kumar , HUNTER, Aaron , MOFFATT, Stephen
IPC分类号： H01L21/324
CPC分类号： B23K26/0066 , B23K26/0006 , B23K26/0823 , B23K26/0876 , B23K26/12 , B23K26/127 , B23K2201/40 , B23K2203/52 , B23K2203/56 , Y10T29/41
摘要： A method and apparatus for targeting a beam of radiation is provided. A beam steering mirror and a beam capture mirror are movably disposed along an optical pathway. A controller moves the beam steering mirror and the beam capture mirror in an x-y plane, and rotates the mirrors, to target the beam to a target location on a surface, while keeping the optical path length substantially constant for all target locations on the surface. The surface is rotated by a rotational actuator to bring all target locations to positions accessible by the beam targeting optics. Imprecision in targeting and optical path length may be compensated by providing an actuated aperture at the beam entry point and/or a variable focus lens with an optical range finding detector, all in communication with the controller.
摘要翻译：提供了一种用于瞄准辐射束的方法和装置。光束导向镜和光束捕获镜沿着光学路径可移动地设置。控制器将光束导向反射镜和光束捕获镜移动到x-y平面中，并且使反射镜旋转以将光束瞄准到表面上的目标位置，同时保持光学表面上的所有目标位置的光程长度基本恒定。该表面由旋转致动器旋转以将所有目标位置移动到由光束瞄准光学器件接近的位置。可以通过在光束入口点处提供致动孔径和/或具有光学测距探测器的可变焦距透镜来全部与控制器通信来补偿瞄准和光路长度的不精确性。

8. 发明申请

WO2010036621A2 DEFECT-FREE JUNCTION FORMATION USING OCTADECABORANE SELF-AMORPHIZING IMPLANTS 审中-公开
标题翻译：使用OCTADECABORANE自补偿植入物进行无缺陷断层形成
公开(公告)号：WO2010036621A2
公开(公告)日：2010-04-01
申请号：PCT/US2009/057708
申请日：2009-09-21
申请人： APPLIED MATERIALS, INC. , LI, Jiping , HUNTER, Aaron Muir , ADAMS, Bruce E. , MOFFITT, Theodore , MOFFATT, Stephen
发明人： LI, Jiping , HUNTER, Aaron Muir , ADAMS, Bruce E. , MOFFITT, Theodore , MOFFATT, Stephen
IPC分类号： H01L21/265
CPC分类号： H01L21/265 , H01J37/32357 , H01J37/32412 , H01L21/26513 , H01L21/324
摘要： A method and apparatus for implanting a semiconductor substrate with boron clusters. A substrate is implanted with octadecaborane by plasma immersion or ion beam implantation. The substrate surface is then annealed to completely dissociate and activate the boron clusters. The annealing may take place by melting the implanted regions or by a sub-melt annealing process.
摘要翻译：一种用硼簇植入半导体衬底的方法和装置。通过等离子体浸渍或离子束注入，注入十八硼烷衬底。然后将衬底表面退火以完全解离并激活硼簇。退火可以通过熔化注入区域或通过亚熔融退火工艺进行。

9. 发明申请

WO2007103643A2 METHOD AND APPARATUS FOR THERMAL PROCESSING STRUCTURES FORMED ON A SUBSTRATE 审中-公开
标题翻译：在基材上形成的热处理结构的方法和装置
公开(公告)号：WO2007103643A2
公开(公告)日：2007-09-13
申请号：PCT/US2007/062672
申请日：2007-02-23
申请人： APPLIED MATERIALS, INC. , MAYUR, Abhilash , YAM, Mark , BALAKRISHNA, Ajit , CAREY, Paul , JENNINGS, Dean , MOFFATT, Stephen , SCHAFFER, William , LERNER, Alexander, N. , THOMAS, Timothy, N. , HUNTER, Aaron, Muir
发明人： MAYUR, Abhilash , YAM, Mark , BALAKRISHNA, Ajit , CAREY, Paul , JENNINGS, Dean , MOFFATT, Stephen , SCHAFFER, William , LERNER, Alexander, N. , THOMAS, Timothy, N. , HUNTER, Aaron, Muir
IPC分类号： H01L21/76
CPC分类号： H01L21/823418 , H01L21/823425 , H01L21/823475
摘要： The present invention generally describes one ore more apparatuses and various methods that are used to perform an annealing process on desired regions of a substrate. In one embodiment, an amount of energy is delivered to the surface of the substrate to preferentially melt certain desired regions of the substrate to remove unwanted damage created from prior processing steps, more evenly distribute dopants in various regions of the substrate, and/or activate various regions of the substrate. The preferential melting processes will allow more uniform distribution of the dopants in the melted region, due to the increased diffusion rate and solubility of the dopant atoms in the molten region of the substrate. The creation of a melted region thus allows: 1) the dopant atoms to redistribute more uniformly, 2) defects created in prior processing steps to be removed, and 3) regions that have hyper-abrupt dopant concentrations to be formed.
摘要翻译：本发明通常描述了一种更多的装置和各种方法，用于对基底的期望区域进行退火处理。在一个实施例中，一定量的能量被传送到衬底的表面以优先地熔化衬底的某些所需区域以去除由先前的处理步骤产生的不需要的损伤，更均匀地分布衬底的各个区域中的掺杂剂和/或激活衬底的各个区域。由于掺杂剂原子在衬底的熔融区域中的扩散速率和溶解度增加，优选熔融过程将允许掺杂剂在熔融区域中更均匀地分布。熔融区域的产生因此允许：1）掺杂剂原子更均匀地重新分布，2）在先前的待处理步骤中产生的缺陷，以及3）具有要突变的掺杂剂浓度的区域。

10. 发明申请

WO2012148621A4 APPARATUS AND METHODS FOR MICROWAVE PROCESSING OF SEMICONDUCTOR SUBSTRATES 审中-公开
公开(公告)号：WO2012148621A4
公开(公告)日：2012-11-01
申请号：PCT/US2012/031140
申请日：2012-03-29
申请人： APPLIED MATERIALS, INC. , STOWELL, Michael W. , FOAD, Majeed A. , HOFMANN, Ralf , ADERHOLD, Wolfgang R. , MOFFATT, Stephen
发明人： STOWELL, Michael W. , FOAD, Majeed A. , HOFMANN, Ralf , ADERHOLD, Wolfgang R. , MOFFATT, Stephen
IPC分类号： H01L21/324
摘要： Methods and apparatus for radiation processing of semiconductor substrates using microwave or millimeter wave energy are provided. The microwave or millimeter wave energy may have a frequency between about 600 MHz and about 1 THz. Alternating current from a magnetron is coupled to a leaky microwave emitter that has an inner conductor and an outer conductor, the outer conductor having openings with a dimension smaller than a wavelength of the emitted radiation. The inner and outer conductors are separated by an insulating material. Interference patterns produced by the microwave emissions may be uniformized by phase modulating the power to the emitter and/or by frequency modulating the frequency of the power itself. Power from a single generator may be divided to two or more emitters by a power divider.

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