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1. 发明申请

WO2008057105A1 SYSTEM AND METHOD FOR HIGH-ENERGY SPUTTERING USING RETURN CONDUCTORS 审中-公开
标题翻译：使用返回导体进行高能量溅射的系统和方法
公开(公告)号：WO2008057105A1
公开(公告)日：2008-05-15
申请号：PCT/US2006/045808
申请日：2006-11-30
申请人： APPLIED MATERIALS, INC. , STOWELL, Michael, W. , RUSKE, Manfred
发明人： STOWELL, Michael, W. , RUSKE, Manfred
IPC分类号： C23C14/00 , C23C14/32
CPC分类号： H01J37/34 , H01J37/32082 , H01J37/3244 , H01J37/3438
摘要： A system and method for sputtering is described. One embodiment includes a sputtering system that includes a vacuum chamber; a gas box secured to the inner surface of the vacuum chamber; a plurality of return conductors engaged with the gas box, the plurality of return conductors extending through the vacuum chamber; and a plurality of seals configured to engage corresponding ones of the plurality of return conductors, the plurality of seal configured to maintain the vacuum inside the vacuum chamber.
摘要翻译：描述了用于溅射的系统和方法。一个实施例包括一个包括真空室的溅射系统; 固定在真空室的内表面上的气箱; 与所述气箱接合的多个返回导体，所述多个返回导体延伸穿过所述真空室; 以及多个密封件，其构造成接合所述多个返回导体中的相应的一个，所述多个密封件构造成将所述真空保持在所述真空室内。

2. 发明申请

WO2012148621A4 APPARATUS AND METHODS FOR MICROWAVE PROCESSING OF SEMICONDUCTOR SUBSTRATES 审中-公开
公开(公告)号：WO2012148621A4
公开(公告)日：2012-11-01
申请号：PCT/US2012/031140
申请日：2012-03-29
申请人： APPLIED MATERIALS, INC. , STOWELL, Michael W. , FOAD, Majeed A. , HOFMANN, Ralf , ADERHOLD, Wolfgang R. , MOFFATT, Stephen
发明人： STOWELL, Michael W. , FOAD, Majeed A. , HOFMANN, Ralf , ADERHOLD, Wolfgang R. , MOFFATT, Stephen
IPC分类号： H01L21/324
摘要： Methods and apparatus for radiation processing of semiconductor substrates using microwave or millimeter wave energy are provided. The microwave or millimeter wave energy may have a frequency between about 600 MHz and about 1 THz. Alternating current from a magnetron is coupled to a leaky microwave emitter that has an inner conductor and an outer conductor, the outer conductor having openings with a dimension smaller than a wavelength of the emitted radiation. The inner and outer conductors are separated by an insulating material. Interference patterns produced by the microwave emissions may be uniformized by phase modulating the power to the emitter and/or by frequency modulating the frequency of the power itself. Power from a single generator may be divided to two or more emitters by a power divider.

3. 发明申请

WO2009105565A3 INDEX MODIFIED COATING ON POLYMER SUBSTRATE 审中-公开
公开(公告)号：WO2009105565A3
公开(公告)日：2009-08-27
申请号：PCT/US2009/034551
申请日：2009-02-19
申请人： APPLIED MATERIALS, INC. , STOWELL, Michael, W. , CAMPO, Manuel, D.
发明人： STOWELL, Michael, W. , CAMPO, Manuel, D.
IPC分类号： B32B27/36 , B32B7/02 , C08J7/04 , C23C16/513
摘要： The invention includes the structure of a multilayer protective coating, which may have, among other properties, scratch resistance, UV absorption, and an effective refractive index matched to a polymer substrate such as polycarbonate. Each layer may contain multiple components consisting of organic and inorganic materials. The multilayer protective coating includes interleaved organic layers and inorganic layers. The organic layers may have 20% or more organic compounds such as SiOxCyHz. The inorganic layers may have 80% or more inorganic materials, such as SiO 2 , SiOxNy, and ZnO, or mixtures thereof. Each layer of the multilayer protective coating is a micro layer and may have a thickness of 5 angstroms or less in various embodiments. The multilayer protective coating may contain in the order of hundreds or thousands of micro layers, depending upon the design requirement of applications. In each micro layer, the components may have substantially continuous variations in concentration.

4. 发明申请

WO2009096952A1 SYSTEM AND METHOD FOR CONTAINMENT SHIELDING OF PECVD DEPOSITION SOURCES 审中-公开
标题翻译：含有PECVD沉积源的屏蔽系统及方法
公开(公告)号：WO2009096952A1
公开(公告)日：2009-08-06
申请号：PCT/US2008/052381
申请日：2008-01-30
申请人： APPLIED MATERIALS, INC. , STOWELL, Michael, W.
发明人： STOWELL, Michael, W.
IPC分类号： C23C16/00
CPC分类号： C23C16/5093 , H01J37/321 , H01J37/32477 , H01J37/32495 , H01J37/32623
摘要： A system and method for treating a surface of a substrate is described. One embodiment includes a system for treating a surface of a substrate, the system comprising a process chamber, a substrate support positioned inside the process chamber, the substrate support configured to support a substrate, an antenna located inside the process chamber, a containment shield partially surrounding the antenna, the containment shield having an inner volume, the containment shield comprising a base material and a coating on the base material, wherein the coating is pre-coated on the base material, a support gas inlet positioned to supply a support gas to the inner volume of the containment shield, and an at least one aperture in the containment shield, the at least one aperture positioned to enable plasma species to escape the inner volume of the containment shield and collide with the precursor gas.
摘要翻译：描述了用于处理基板表面的系统和方法。一个实施例包括用于处理基板的表面的系统，该系统包括处理室，位于处理室内部的基板支撑件，被配置为支撑基板的基板支撑件，位于处理室内部的天线，部分地围绕所述天线，所述防护罩具有内部容积，所述防护罩包括基材和在所述基材上的涂层，其中所述涂层预涂在所述基底材料上，支撑气体入口，定位成将支撑气体供应到所述安全壳屏蔽件的内部容积以及所述安全壳屏蔽件中的至少一个孔口，所述至少一个孔口被定位成使等离子体物质能够逃离所述容纳罩的内部容积并与所述前体气体碰撞。

5. 发明申请

WO2009096951A1 SYSTEM AND METHOD FOR PRE-IONIZATION OF SURFACE WAVE LAUNCHED PLASMA DISCHARGE SOURCES 审中-公开
标题翻译：表面波发射等离子体放电源预先放电的系统和方法
公开(公告)号：WO2009096951A1
公开(公告)日：2009-08-06
申请号：PCT/US2008/052380
申请日：2008-01-30
申请人： APPLIED MATERIALS, INC. , STOWELL, Michael, W.
发明人： STOWELL, Michael, W.
IPC分类号： A62D3/00
CPC分类号： H01J37/32477 , H01J37/32192 , H01J37/32357 , H01J37/32422
摘要： A system and method for treating a surface of a substrate is described. One embodiment includes a method for depositing a film on a substrate, the method comprising generating a first plurality of power pulses, each of the first plurality of power pulses having a first pulse amplitude, providing the first plurality of power pulses to a first discharge tube, generating a plasma about the first discharge tube using the first plurality of power pulses, sustaining the plasma between each of the first plurality of power pulses such that the plasma is not reignited during each of the first plurality of power pulses, disassociating a feedstock gas using the plasma, and depositing at least a portion of the disassociated feedstock gas onto a substrate.
摘要翻译：描述了用于处理基板表面的系统和方法。一个实施例包括用于在衬底上沉积膜的方法，所述方法包括产生第一多个功率脉冲，第一多个功率脉冲中的每一个具有第一脉冲幅度，将第一多个功率脉冲提供给第一放电管使用所述第一多个功率脉冲在所述第一放电管周围产生等离子体，在所述第一多个功率脉冲中的每一个之间维持所述等离子体，使得所述等离子体在所述第一多个功率脉冲期间的每一个期间不重新点燃，使用等离子体，并将至少一部分脱离的原料气体沉积到基底上。

6. 发明申请

WO2009117229A3 COAXIAL MICROWAVE ASSISTED DEPOSITION AND ETCH SYSTEMS 审中-公开
标题翻译：同轴微波辅助沉积和蚀刻系统
公开(公告)号：WO2009117229A3
公开(公告)日：2009-11-12
申请号：PCT/US2009035325
申请日：2009-02-26
申请人： APPLIED MATERIALS INC , STOWELL MICHAEL W , KRISHNA NETY , HOFMANN RALF , GRIFFITH JOE
发明人： STOWELL MICHAEL W , KRISHNA NETY , HOFMANN RALF , GRIFFITH JOE
IPC分类号： C23C16/511 , C23C14/22 , H01L21/203 , H01L21/205 , H01L21/302
CPC分类号： H05H1/46 , C23C14/34 , C23C14/345 , C23C14/3485 , C23C16/511 , C23C16/515 , H01J37/32091 , H01J37/321 , H01J37/32192 , H01J37/3222 , H01J37/3408
摘要： Disclosed are systems for achieving improved film properties by introducing additional processing parameters, such as a movable position for the microwave source and pulsing power to the microwave source, and extending the operational ranges and processing windows with the assistance of the microwave source. A coaxial microwave antenna is used for radiating microwaves to assist in physical vapor deposition (PVD) or chemical vapor deposition (CVD) systems. The system may use a coaxial microwave antenna inside a processing chamber, with the antenna being movable between a substrate and a plasma source, such as a sputtering target, a planar capacitively generated plasma source, or an inductively coupled source. In a special case when only a microwave plasma source is present, the position of the microwave antenna is movable relative to a substrate. The coaxial microwave antenna adjacent to the plasma source can assist the ionization more homogeneously and allow substantially uniform deposition over large areas.
摘要翻译：公开了通过引入诸如用于微波源的可移动位置和对微波源的脉冲功率的附加处理参数以及在微波源的辅助下延伸操作范围和处理窗口来实现改进的膜性质的系统。同轴微波天线用于辐射微波以辅助物理气相沉积（PVD）或化学气相沉积（CVD）系统。该系统可以在处理室内使用同轴微波天线，天线可在基板和等离子体源之间移动，诸如溅射靶，平面电容产生的等离子体源或电感耦合源。在仅存在微波等离子体源的特殊情况下，微波天线的位置可相对于基板移动。与等离子体源相邻的同轴微波天线可以更均匀地帮助电离并且允许在大面积上的基本均匀的沉积。

7. 发明申请

WO2009117745A3 SURFACE PREHEATING TREATMENT OF PLASTICS SUBSTRATE 审中-公开
公开(公告)号：WO2009117745A3
公开(公告)日：2009-09-24
申请号：PCT/US2009/044213
申请日：2009-05-15
申请人： APPLIED MATERIALS, INC. , STOWELL, Michael, W. , KRISHNA, Nety
发明人： STOWELL, Michael, W. , KRISHNA, Nety
IPC分类号： C23C14/02 , C23C14/50 , C23C16/02
摘要： A source of IR radiation is used to heat a plastic substrate in a fast fashion inside a processing chamber, where the processing chamber is configured to preheat the plastic substrate and to perform thin film deposition, such as chemical vapor deposition (CVD) or physical vapor deposition (PVD), or plasma etching and cleaning. One aspect of using the source of IR radiation is to preheat only the surface of the plastic substrate while the core of the plastic substrate remains substantially unheated, so that the structure of the plastic substrate may remain unchanged. Meanwhile, the surface properties of the plastic substrate may be modified after the preheating treatment. The source of IR radiation may be provided at wavelength selected to substantially match the absorption wavelength of the plastic substrate. The plastic substrate moves through the heat flux zone generated by the source of IR radiation at a controllable speed.

8. 发明申请

WO2009117745A2 SURFACE PREHEATING TREATMENT OF PLASTICS SUBSTRATE 审中-公开
标题翻译：塑料衬底的表面预热处理
公开(公告)号：WO2009117745A2
公开(公告)日：2009-09-24
申请号：PCT/US2009044213
申请日：2009-05-15
申请人： APPLIED MATERIALS INC , STOWELL MICHAEL W , KRISHNA NETY
发明人： STOWELL MICHAEL W , KRISHNA NETY
IPC分类号： C23C14/02 , C23C14/50 , C23C16/02
CPC分类号： B05D3/0227 , B05D1/60 , B05D1/62 , B05D7/02 , C23C14/541 , C23C16/46
摘要： A source of IR radiation is used to heat a plastic substrate in a fast fashion inside a processing chamber, where the processing chamber is configured to preheat the plastic substrate and to perform thin film deposition, such as chemical vapor deposition (CVD) or physical vapor deposition (PVD), or plasma etching and cleaning. One aspect of using the source of IR radiation is to preheat only the surface of the plastic substrate while the core of the plastic substrate remains substantially unheated, so that the structure of the plastic substrate may remain unchanged. Meanwhile, the surface properties of the plastic substrate may be modified after the preheating treatment. The source of IR radiation may be provided at wavelength selected to substantially match the absorption wavelength of the plastic substrate. The plastic substrate moves through the heat flux zone generated by the source of IR radiation at a controllable speed.
摘要翻译：红外辐射源用于在处理室内以快速方式加热塑料衬底，其中处理室被配置为预热塑料衬底并执行薄膜沉积，诸如化学气相沉积（CVD）或物理蒸气沉积（PVD）或等离子体蚀刻和清洁。使用IR辐射源的一个方面是仅预热塑料基材的表面，而塑料基材的核心基本保持不加热，使得塑料基材的结构可以保持不变。同时，塑料基材的表面性质可以在预热处理后改变。 IR辐射源可以被提供在被选择为与塑料衬底的吸收波长基本匹配的波长处。塑料基板以可控的速度移动通过IR辐射源产生的热通量区。

9. 发明申请

WO2011006128A2 CURVED MICROWAVE PLASMA LINE SOURCE FOR COATING OF THREE-DIMENSIONAL SUBSTRATES 审中-公开
标题翻译：三维基底涂层的曲面微波等离子体线源
公开(公告)号：WO2011006128A2
公开(公告)日：2011-01-13
申请号：PCT/US2010/041609
申请日：2010-07-09
申请人： APPLIED MATERIALS, INC. , STOWELL, Michael, W.
发明人： STOWELL, Michael, W.
IPC分类号： C23C14/22 , C23C14/34 , C23C14/50
CPC分类号： H01J27/16 , C23C16/04 , C23C16/511 , H01J37/32192 , H01J37/3222 , H05H1/46
摘要： Deposition system and methods for dynamic and static coatings are provided. A deposition system for dynamic coating includes a processing chamber, a non-linear coaxial microwave source, and a substrate support member disposed inside the processing chamber for holding a non-planar substrate. The substrate has a first contour along a first direction and a second contour along a second direction orthogonal to the first direction. The deposition system further includes a carrier gas line for providing a flow of sputtering agents inside the processing chamber and a feedstock gas line for providing a flow of precursor gases. The deposition system for static coating includes a substrate support member disposed inside the processing chamber for holding a non-planar substrate and an array of curved coaxial microwave sources within the processing chamber. The curved coaxial microwave sources are spaced along the second direction to cover the substrate.
摘要翻译：提供了动态和静态涂层的沉积系统和方法。用于动态涂覆的沉积系统包括处理室，非线性同轴微波源以及设置在处理室内用于保持非平面基板的基板支撑构件。衬底具有沿着第一方向的第一轮廓和沿着与第一方向正交的第二方向的第二轮廓。沉积系统还包括用于在处理室内提供溅射剂流的载气管线和用于提供前体气体流的原料气管线。用于静态涂覆的沉积系统包括设置在处理室内部的基板支撑构件，用于在处理室内保持非平面基板和弯曲同轴微波源阵列。弯曲的同轴微波源沿第二方向隔开以覆盖基板。

10. 发明申请

WO2011006109A2 HIGH EFFICIENCY LOW ENERGY MICROWAVE ION/ELECTRON SOURCE 审中-公开
标题翻译：高效低能微波离子/电子源
公开(公告)号：WO2011006109A2
公开(公告)日：2011-01-13
申请号：PCT/US2010/041585
申请日：2010-07-09
申请人： APPLIED MATERIALS, INC. , STOWELL, Michael W.
发明人： STOWELL, Michael W.
IPC分类号： H01J27/16 , H01J37/08 , H05H1/46 , C23C14/22
CPC分类号： H01J27/16 , C23C14/221 , H01J37/32192 , H01J37/3222 , H05H1/46
摘要： A microwave charged particle source is provided according to various embodiments of the invention. The microwave charged particle source can include a coaxial antenna for generating microwaves and a dielectric layer surrounding the antenna. The microwave charged particle source can also include a first gas line outside the dielectric layer for providing sputtering gases and/or a second gas line for providing cooling gas in a space between the antenna and dielectric layer. The microwave charged particle source can further include a containment shield partially surrounding the dielectric layer and an extraction grid disposed on or near an aperture in the containment shield. In use, charged particles can be formed with the generated microwaves from sputtering gases. And the charged particles can be accelerated under an electric field created from a voltage applied to the extraction grid. A method for providing microwave charged particle source is also provided.
摘要翻译：根据本发明的各种实施例提供微波带电粒子源。微波带电粒子源可以包括用于产生微波的同轴天线和围绕天线的介电层。微波带电粒子源还可以包括在介电层之外的用于提供溅射气体的第一气体线路和/或用于在天线和介电层之间的空间中提供冷却气体的第二气体线路。微波带电粒子源还可以包括部分地围绕电介质层的容纳罩和设置在容纳罩中的孔上或附近的引出格栅。在使用中，可以利用溅射气体产生的微波形成带电粒子。带电粒子可以在施加到抽取网格的电压所产生的电场下加速。还提供了一种提供微波带电粒子源的方法。

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