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    • 7. 发明专利
    • Method for manufacturing semiconductor device
    • 制造半导体器件的方法
    • JP2008177279A
    • 2008-07-31
    • JP2007008107
    • 2007-01-17
    • Hitachi Ltd株式会社日立製作所
    • ODA TETSUOKOBAYASHI MASAYOSHIMATSUURA KATSUYATAKAYANAGI YUJIKAWASE DAISUKE
    • H01L29/78H01L21/336
    • PROBLEM TO BE SOLVED: To provide a method for stably manufacturing semiconductor device such as a trench gate type MOS transistor that is not easily affected by a defect resulting from variation in manufacturing processes and assures small variation in the threshold voltages among semiconductor devices.
      SOLUTION: In the method for manufacturing semiconductor device including a first conductive semiconductor layer, a second conductive channel region on the front surface of the same semiconductor layer, a first conductive source region on the front surface of the channel region, a trench region extended to the semiconductor layer from the source region through the channel region, a gate insulating film of the trench region, and a gate electrode, the channel region is formed by conducting the predetermined heat treatment after ion injection of an impurity, an acceleration voltage in the ion injection is in the range of 200 to 300 keV, and the predetermined heat treatment is continued for 30 to 600 minutes under the temperature range of 1,000 to 1,200°C in the non-oxidizing atmosphere.
      COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:提供一种用于稳定地制造诸如沟槽栅型MOS晶体管的半导体器件的方法,其不容易受到由制造工艺的变化引起的缺陷的影响,并且确保半导体器件中的阈值电压的小的变化 。 解决方案:在包括第一导电半导体层的半导体器件的制造方法中,在同一半导体层的前表面上的第二导电沟道区,沟道区的前表面上的第一导电源区,沟槽 通过沟道区域从源极区域延伸到半导体层,沟槽区域的栅极绝缘膜和栅电极,通过在离子注入杂质之后进行预定热处理形成沟道区域,加速电压 离子注入的范围为200〜300keV,在非氧化性气氛中,在1000〜1200℃的温度范围内,进行规定的热处理持续30〜600分钟。 版权所有(C)2008,JPO&INPIT