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1. 发明专利

AU1735401A Laser beam irradiation probe 未知
公开(公告)号：AU1735401A
公开(公告)日：2001-06-18
申请号：AU1735401
申请日：2000-12-08
申请人： YA MAN LTD , YOSHIHIRO IZAWA
发明人： IZAWA YOSHIHIRO , YAMAZAKI IWAO
IPC分类号： A45D26/00 , A61B17/00 , A61B18/20 , A61N5/06
摘要： The objective of the present invention is to irradiate a relatively large skin area evenly with laser beams. A plurality of semiconductor laser diodes are arranged to form two lines with the semiconductor laser diodes of one line staggered with those of the other line, and the semiconductor laser diodes of each line are so inclined that their laser beams may focus on a single line. With this arrangement the plurality of laser beams provide a linear distribution of narrow beam, and the scanning area on the skin can be expanded accordingly. The beauty treatment on the skin or the depilation treatment can be expedited significantly. Advantageously the focussing points of the laser beams are distributed at an increased density, and the irradiation strength averages everywhere to attain the even beauty treatment.

2. 发明授权

US10144849B2 Polishing composition and polishing method using the same 有权
公开(公告)号：US10144849B2
公开(公告)日：2018-12-04
申请号：US12864811
申请日：2009-01-29
申请人： Takahiro Mizuno , Yoshihiro Izawa , Tomohiko Akatsuka
发明人： Takahiro Mizuno , Yoshihiro Izawa , Tomohiko Akatsuka
IPC分类号： C09G1/02 , H01L21/02 , H01L21/3105 , H01L21/321 , C09K3/14
摘要： A polishing composition contains a nitrogen-containing compound and abrasive grains, and the pH of the composition is in the range of 1 to 7. The nitrogen-containing compound in the polishing composition preferably has a structure expressed by a formula: R1—N(—R2)—R3 in which R1, R2, and R3 each represent an alkyl group with or without a characteristic group, two of R1 to R3 may form a part of a heterocycle, and two of R1 to R3 may be identical and form a part of a heterocycle with the remaining one. Alternatively, the nitrogen-containing compound is preferably selected from a group consisting of a carboxybetaine type ampholytic surfactant, a sulfobetaine type ampholytic surfactant, an imidazoline type ampholytic surfactant, and an amine oxide type ampholytic surfactant. A polishing composition may contain a water-soluble polymer and abrasive grains, and the pH of the composition is in the range of 1 to 8.

3. 发明申请

US20130203254A1 POLISHING COMPOSITION AND POLISHING METHOD 有权
标题翻译：抛光组合物和抛光方法
公开(公告)号：US20130203254A1
公开(公告)日：2013-08-08
申请号：US13814644
申请日：2011-08-02
申请人： Shuichi Tamada , Tatsuhiko Hirano , Takahiro Umeda , Kazuya Sumita , Yoshihiro Izawa
发明人： Shuichi Tamada , Tatsuhiko Hirano , Takahiro Umeda , Kazuya Sumita , Yoshihiro Izawa
IPC分类号： H01L21/306
CPC分类号： H01L21/30625 , B24B37/044 , C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/3212
摘要： A polishing composition contains a water-soluble polymer, a polishing accelerator, and an oxidizing agent. The water-soluble polymer is a polyamide-polyamine polymer having an amine value of 150 mg KOH/1 g·solid or greater.
摘要翻译：抛光组合物含有水溶性聚合物，抛光促进剂和氧化剂。水溶性聚合物是胺值为150mg KOH / 1g·固体以上的聚酰胺 - 聚胺聚合物。

4. 发明授权

US07329252B1 Apparatus for laser depilation 有权
标题翻译：激光脱毛装置
公开(公告)号：US07329252B1
公开(公告)日：2008-02-12
申请号：US10275966
申请日：2000-05-19
申请人： Iwao Yamazaki , Yoshihiro Izawa
发明人： Iwao Yamazaki , Yoshihiro Izawa
IPC分类号： A61B18/20 , A61N5/067
CPC分类号： A61B18/203 , A61B2017/00752 , A61B2018/00029 , A61B2018/00452 , A61B2018/00476 , A61B2018/202
摘要： An apparatus for laser depilation according to the present invention uses a semiconductor laser diode, which is controlled in respect of its energy level, thereby permitting an economical, effective and safe cosmetic treatment. The power output of light of the semiconductor laser diode ranges from 5 to 1500 mW, and the peak wavelength ranges from 600 to 1600 nm. The controller of the semiconductor laser diode comprises pulsating power output control means and radiation period control means for setting a desired length of time for radiation. With these control means the energy level of the beam of light from the laser may be so controlled that a strong beam of light may be thrown for a relatively short time, or that a weak beam of light may be thrown for a relatively long time. Thus, hairs of different thickness and colors can be removed.
摘要翻译：根据本发明的用于激光脱毛的设备使用半导体激光二极管，其被控制在其能量水平上，从而允许经济，有效和安全的美容处理。半导体激光二极管的光功率输出范围为5〜1500mW，峰值波长为600〜1600nm。半导体激光二极管的控制器包括脉动功率输出控制装置和辐射周期控制装置，用于设定期望的辐射时间长度。利用这些控制装置，可以控制来自激光器的光束的能量级别，使得强光束可能被投掷相当短的时间，或者弱的光束可能被投掷相当长的时间。因此，可以去除不同厚度和颜色的毛发。

5. 发明申请

US20050054957A1 Ultrasnic beauty treatment probe 有权
标题翻译：超声波美容治疗探头
公开(公告)号：US20050054957A1
公开(公告)日：2005-03-10
申请号：US10490025
申请日：2001-09-21
申请人： Iwao Yamazaki , Yoshihiro Izawa
发明人： Iwao Yamazaki , Yoshihiro Izawa
IPC分类号： A61H23/02 , A61H1/00
CPC分类号： A61H23/0245 , A61H2201/1604 , A61H2201/1685 , A61H2205/022 , Y10S601/15
摘要： A supersonic beauty treatment device capable of effecting a beauty treatment for the skin and of slimming a selected portion of the body. A face beauty treatment head and body beauty treatment head are prepared, and either one is selectivley attached to the casing of the device. The casing has a tepped receptacle made on its front. Each head has a plug projecting from its base. The plug has threads fromed on its outer circumference. Thus, the head can be attached to the casing by screwing the plug in the receptacle, and two sets of switch contacts are formed on both sides of the center of the insulating bottoem of the receptacle. The electrically conductive inner circumference wall of the receptacle is grounded. The plug as a contact formed at is center, corresponding to the center contact of the receptacle. The plug has an electricaly conductive key formed on its base, corresponding to the set of switch contacts whereas the plug has an electronically conductive key formed on its base, corresponding to the set of switch contacts. Each plug has its sides grounded.
摘要翻译：一种超音速美容治疗装置，其能够对皮肤进行美容治疗，并减轻身体的选定部分。准备面部美容护理头部和身体美容护理头，任一个是选择性连接到设备的外壳。外壳有一个在其前面制成的一个Tepped插座。每个头部具有从其基部突出的插头。插头的外圆上有螺纹。因此，头部可以通过将插头拧入插座中而附接到壳体，并且在插座的绝缘植物的中心的两侧形成两组开关触点。插座的导电内周壁接地。作为形成的触点的插头是中心的，对应于插座的中心触点。插头具有形成在其基座上的导电键，对应于该组开关触点，而插头具有形成在其底座上的电子导电键，对应于该组开关触点。每个插头的侧面都接地。

6. 发明授权

US06736807B2 Laser beam irradiation probe 失效
标题翻译：激光束照射探头
公开(公告)号：US06736807B2
公开(公告)日：2004-05-18
申请号：US10148168
申请日：2002-05-31
申请人： Iwao Yamazaki , Yoshihiro Izawa
发明人： Iwao Yamazaki , Yoshihiro Izawa
IPC分类号： A61B1820
CPC分类号： A61B18/203 , A61B2018/00452 , A61B2018/00476 , A61N2005/0644 , A61N2005/0652
摘要： The instrument of the present invention irradiates a relatively large skin area evenly with laser beams. A plurality of semiconductor laser diodes are arranged to form two lines with the semiconductor laser diodes of one line staggered with those of the other line, and the semiconductor laser diodes of each line are so inclined that their laser beams may focus on a single line. With this arrangement the plurality of laser beams provide a linear distribution of narrow beam, and the scanning area on the skin can be expanded accordingly. The beauty treatment on the skin or the depilation treatment can be expedited significantly. Advantageously the focusing points of the laser beams are distributed at an increased density, and the irradiation strength averages everywhere to attain the even beauty treatment.
摘要翻译：本发明的仪器用激光束照射较大的皮肤区域。多个半导体激光二极管被布置成形成两行，其中一行的半导体激光二极管与另一条线交错，并且每条线的半导体激光二极管倾斜，使得其激光束可以聚焦在单个线上。利用这种布置，多个激光束提供窄光束的线性分布，并且可以相应地扩展皮肤上的扫描区域。皮肤上的美容治疗或脱毛治疗可以加快。有利地，激光束的聚焦点以增加的密度分布，并且辐射强度在各处平均以达到均匀的美容处理。

7. 发明授权

US06860835B2 Exercise signal generator of exercise load meter 失效
标题翻译：运动负荷计运动信号发生器
公开(公告)号：US06860835B2
公开(公告)日：2005-03-01
申请号：US10275967
申请日：2001-05-14
申请人： Iwao Yamazaki , Yoshihiro Izawa , Kimiyo Yamazaki
发明人： Iwao Yamazaki , Yoshihiro Izawa , Kimiyo Yamazaki
IPC分类号： A61B5/11 , A61B5/22 , A63B24/00 , A63B71/06 , G01C9/06 , A63B21/00
CPC分类号： A63B24/0062 , A61B5/1126 , A61B5/222 , A63B2220/17 , A63B2220/18 , A63B2220/80 , A63B2220/801 , G01C9/06 , G01C2009/064
摘要： Disclosed is an exercise amount measuring device using as an exercise signal generator an inclination detector commercially available, which can detect two-dimensional movements. Use of such inclination detectors facilitates the assembly of exercise amount measuring devices. The inclination detector 1 is connected to a counter circuit via an input circuit, and the input circuit and the counter circuit are connected to an MPU via an input-and-output port. The input circuit comprises a CR circuit or a flip-flop circuit. The counter circuit counts input pulses post-chattering exclusion, which input pulses are caused by the on-and-off switching actions, which are brought every time the contact ball touches selected contact electrodes in the inclination detector.
摘要翻译：公开了一种运动量测量装置，其使用可以检测二维运动的市售的倾斜检测器作为运动信号发生器。使用这种倾斜检测器有助于组装运动量测量装置。倾斜检测器1通过输入电路连接到计数器电路，并且输入电路和计数器电路经由输入和输出端口连接到MPU。输入电路包括CR电路或触发电路。计数器电路对抖动后排除的输入脉冲进行计数，该输入脉冲是由每次接触球与倾斜检测器中选定的接触电极接触时的开 - 关切换动作引起的。

8. 发明授权

US06453203B1 Electrode tights for pulse shape-up apparatus 有权
标题翻译：用于脉冲整形装置的电极紧身衣
公开(公告)号：US06453203B1
公开(公告)日：2002-09-17
申请号：US09509526
申请日：2000-03-31
申请人： Iwao Yamazaki , Yoshihiro Izawa
发明人： Iwao Yamazaki , Yoshihiro Izawa
IPC分类号： A61N100
CPC分类号： A61N1/0484 , A61N1/0452 , A61N1/0476 , A61N1/32
摘要： A pair of electrode tights which does not require that one be naked when lying down to take a beauty treatment. Six pairs of flat electrodes EL1 to EL6, ER1 to ER6 are attached to selected places symmetrical relative to the center fine inside of the garment, with the flat electrodes facing the underbelly, the inguinal region, the hip, the femoral region, the rear side of the knee and the calf of the body. These flat electrodes are connected to a pulse beauty treatment apparatus via electrically conductive press studs and a bundle of electric wires. The pair of electrode tights may have an elongated tubular bag for containing the bundle of electric wires. The elongated tubular bag has a fastener running along its full length for holding together two parts of the bag, and a plurality of relay terminals fixed inside for connecting the electric wires to the flat electrodes.
摘要翻译：一对电极紧身衣，不需要一个裸体躺下来做美容治疗。将六对平面电极EL1〜EL6，ER1〜ER6安装在相对于衣服的中心微细对称的选定部位，平面电极面向下腹部，腹股沟区域，髋部，股骨部位，后侧的膝盖和身体的小腿。这些扁平电极通过导电按压螺栓和一束电线连接到脉冲美容治疗装置。一对电极紧固件可以具有用于容纳电线束的细长管状袋。细长管状袋具有沿着其整个长度延伸的紧固件，用于保持袋的两个部分，以及固定在内部的多个中继端子，用于将电线连接到扁平电极。

9. 发明申请

US20230122598A1 COSMETIC TREATMENT DEVICE 有权
公开(公告)号：US20230122598A1
公开(公告)日：2023-04-20
申请号：US17908741
申请日：2021-03-12
申请人： Yoshihiro IZAWA , AMPLY CO., LTD. , Rhythm Co., Ltd.
发明人： Yoshihiro IZAWA
IPC分类号： A61H23/02
摘要： A cosmetic treatment device includes a treatment surface that faces a human body, at least three head portions, and an oscillation portion. The head portions are arranged at a spacing with each other on the treatment surface, each head portion including an ultrasonic vibrator and being configured to vibrate together with the ultrasonic vibrator. The oscillation portion is configured to cause the ultrasonic vibrators to vibrate.

10. 发明申请

US20100301014A1 Polishing Composition and Polishing Method Using the Same 审中-公开
标题翻译：抛光组合物和使用其的抛光方法
公开(公告)号：US20100301014A1
公开(公告)日：2010-12-02
申请号：US12864811
申请日：2009-01-29
申请人： Takahiro Mizuno , Yoshihiro Izawa , Tomohiko Akatsuka
发明人： Takahiro Mizuno , Yoshihiro Izawa , Tomohiko Akatsuka
IPC分类号： C03C15/02 , C09K13/00
CPC分类号： C09G1/02 , C09K3/1436 , C09K3/1463 , H01L21/02024 , H01L21/31053 , H01L21/3212
摘要： A polishing composition contains a nitrogen-containing compound and abrasive grains, and the pH of the composition is in the range of 1 to 7. The nitrogen-containing compound in the polishing composition preferably has a structure expressed by a formula: R1—N(—R2)—R3 in which R1, R2, and R3 each represent an alkyl group with or without a characteristic group, two of R1 to R3 may form a part of a heterocycle, and two of R1 to R3 may be identical and form a part of a heterocycle with the remaining one. Alternatively, the nitrogen-containing compound is preferably selected from a group consisting of a carboxybetaine type ampholytic surfactant, a sulfobetaine type ampholytic surfactant, an imidazoline type ampholytic surfactant, and an amine oxide type ampholytic surfactant. A polishing composition may contain a water-soluble polymer and abrasive grains, and the pH of the composition is in the range of 1 to 8.
摘要翻译：抛光组合物含有含氮化合物和磨粒，组合物的pH在1〜7的范围内。抛光组合物中的含氮化合物优选具有由下式表示的结构：R 1 -N（ -R2）-R3，其中R1，R2和R3各自表示具有或不具有特征基团的烷基，R 1至R 3中的两个可以形成杂环的一部分，并且R 1至R 3中的两个可以相同并形成剩下的杂环的一部分。或者，含氮化合物优选选自羧基甜菜碱型两性表面活性剂，磺基甜菜碱型两性表面活性剂，咪唑啉型两性表面活性剂和氧化胺型两性表面活性剂。抛光组合物可以含有水溶性聚合物和磨粒，组合物的pH值在1〜8的范围内。

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