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    • 5. 发明申请
    • THIN FILM TRANSISTOR, THIN FILM TRANSISTOR SUBSTRATE INCLUDING THE SAME AND METHOD OF MANUFACTURING THE SAME
    • 薄膜晶体管,包括其的薄膜晶体管基板及其制造方法
    • US20100022055A1
    • 2010-01-28
    • US12573385
    • 2009-10-05
    • YANG-HO BAEChang-Oh JeongByeong-Beom Kim
    • YANG-HO BAEChang-Oh JeongByeong-Beom Kim
    • H01L21/336
    • H01L29/458H01L27/124
    • A thin film transistor showing desirable contact characteristics during contact with indium tin oxide (ITO) or indium zinc oxide (IZO), in which a first conductive pattern including a gate electrode and a second conductive pattern including a source electrode and a drain electrode are formed without an etching process, a TFT substrate including the TFTs, and a method of manufacturing the same. The thin film transistor includes a gate electrode formed of a first conductive layer, a gate insulating layer covering the gate electrode, a semiconductor layer forming a channel on the gate insulating layer; an ohmic contact layer formed on the semiconductor layer, and a source electrode and a drain electrode formed of a second conductive layer and of a third conductive layer. The second conductive layer includes an aluminum-nickel alloy and nitrogen and is formed on the semiconductor layer. The third conductive layer includes an aluminum-nickel alloy and is formed on the second conductive layer.
    • 在与铟锡氧化物(ITO)或铟锌氧化物(IZO)接触期间显示出期望的接触特性的薄膜晶体管,其中形成包括栅电极的第一导电图案和包括源电极和漏电极的第二导电图案 没有蚀刻处理,包括TFT的TFT基板及其制造方法。 薄膜晶体管包括由第一导电层形成的栅电极,覆盖栅电极的栅极绝缘层,在栅极绝缘层上形成沟道的半导体层; 形成在半导体层上的欧姆接触层,以及由第二导电层和第三导电层形成的源电极和漏电极。 第二导电层包括铝 - 镍合金和氮,并形成在半导体层上。 第三导电层包括铝镍合金,并形成在第二导电层上。
    • 9. 发明授权
    • Thin film transistor array panel
    • 薄膜晶体管阵列面板
    • US07276732B2
    • 2007-10-02
    • US11234470
    • 2005-09-23
    • Je Hun LeeYang Ho BaeBeom Seok ChoChang Oh Jeong
    • Je Hun LeeYang Ho BaeBeom Seok ChoChang Oh Jeong
    • H01L29/04
    • H01L29/458G02F1/1368H01L27/12H01L27/124H01L27/1288
    • A thin film transistor array panel includes a source electrode and a drain electrode composed of a Mo alloy layer and a Cu layer, and an alloying element of the Mo alloy layer forms a nitride layer as a diffusion barrier against the Cu layer. The nitride layer can be formed between the Mo alloy layer and the Cu layer, between the Mo alloy layer and the semiconductor layer or in the Mo alloy layer. A method of fabricating a thin film transistor array panel includes forming a data line having a first conductive layer and a second conductive layer, the first conductive layer containing a Mo alloy and the second conductive layer containing Cu, and performing a nitrogen treatment so that an alloying element in the first conductive layer forms a nitride layer. The nitrogen treatment can be performed before forming the first conductive layer, after forming the first conductive layer, or during forming the first conductive layer.
    • 薄膜晶体管阵列面板包括由Mo合金层和Cu层构成的源电极和漏电极,Mo合金层的合金元素形成氮化物层作为对Cu层的扩散阻挡层。 可以在Mo合金层和Cu层之间,Mo合金层和半导体层之间或Mo合金层中形成氮化物层。 制造薄膜晶体管阵列面板的方法包括:形成具有第一导电层和第二导电层的数据线,所述第一导电层含有Mo合金,所述第二导电层含有Cu,并进行氮处理,使得 第一导电层中的合金元素形成氮化物层。 在形成第一导电层之前,在形成第一导电层之后,或者在形成第一导电层期间,可以进行氮处理。